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1. 发明授权

US06560410B2 Image forming apparatus and method for calibrating the same 失效
标题翻译：图像形成装置及其校准方法
公开(公告)号：US06560410B2
公开(公告)日：2003-05-06
申请号：US09864177
申请日：2001-05-25
申请人： Koji Ichikawa , Makoto Tsugita , Tetsuro Ashida
发明人： Koji Ichikawa , Makoto Tsugita , Tetsuro Ashida
IPC分类号： G03B1500
CPC分类号： H04N17/002 , G03B15/00 , G03B27/32 , H04N1/00289 , H04N1/4078 , H04N1/6033
摘要： A camera section photographs a camera test chart. A calibration controller of the camera section reads out image data of the camera test chart, and executes calibration of the camera section by use of characteristic values of obtained image data and standard data, which is stored in an internal memory. Next, a printer test chart, printed by a printer section, is photographed by the calibrated camera section. Image data of the printer test chart is sent to the printer section from the camera section. A calibration controller of the printer section performs calibration of the printer section by use of characteristic values of obtained image data and standard data, which is stored in an internal memory. By calibrating both the camera and the printer sections, it is possible to execute effective calibration of the apparatus.
摘要翻译：相机部分拍摄相机测试图。相机部分的校准控制器读出相机测试图的图像数据，并通过使用存储在内部存储器中的获得的图像数据和标准数据的特征值来执行相机部分的校准。接下来，由打印机部分打印的打印机测试图由校准的相机部分拍摄。打印机测试图的图像数据将从相机部分发送到打印机部分。打印机部分的校准控制器通过使用存储在内部存储器中的获得的图像数据和标准数据的特征值来执行打印机部分的校准。通过校准摄像机和打印机部分，可以执行设备的有效校准。

2. 发明授权

US07428012B2 Image processing method including generating face region information and a digital camera including face region identification unit 有权
标题翻译：包括生成面部区域信息的图像处理方法和包括面部区域识别单元的数字照相机
公开(公告)号：US07428012B2
公开(公告)日：2008-09-23
申请号：US10689606
申请日：2003-10-22
申请人： Koichi Sakamoto , Makoto Tsugita , Manabu Hyodo , Hirokazu Kobayashi , Koji Ichikawa
发明人： Koichi Sakamoto , Makoto Tsugita , Manabu Hyodo , Hirokazu Kobayashi , Koji Ichikawa
IPC分类号： H04N5/217 , H04N5/228 , H04N5/208 , H04N5/225 , G06K9/00
CPC分类号： H04N5/232 , G06T5/002 , G06T2207/20204 , G06T2207/30201 , H04N5/23219 , H04N5/23245
摘要： Effectively reducing a noise on the face region to improve the picture quality of the entire imageA digital camera according to the invention includes: an digital signal processor for performing image processing including contour correction on a shot image; a face identifying section for analyzing an image after contour correction to generate face region information to identify the face region; a noise reducing section for performing noise reduction on the face region of the image after contour correction based on the face region information; a controller 106 for determining the photographing mode of the shot image and operating the face identifying section and the noise reducing section depending on the photographing mode.
摘要翻译：有效地减少脸部区域上的噪声以提高整个图像的图像质量根据本发明的数字照相机包括：数字信号处理器，用于在拍摄图像上执行包括轮廓校正的图像处理; 面部识别部分，用于在轮廓校正之后分析图像以生成面部区域信息以识别脸部区域; 噪声降低部分，用于基于面部区域信息在轮廓校正之后对图像的面部区域进行降噪; 用于根据拍摄模式确定拍摄图像的拍摄模式并操作面部识别部分和噪声降低部分的控制器106。

3. 发明授权

US09671693B2 Resist composition and method for producing resist pattern 有权
公开(公告)号：US09671693B2
公开(公告)日：2017-06-06
申请号：US13325910
申请日：2011-12-14
申请人： Koji Ichikawa , Takashi Hiraoka , Shingo Fujita
发明人： Koji Ichikawa , Takashi Hiraoka , Shingo Fujita
IPC分类号： G03F7/039 , G03F7/004 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/2041
摘要： A resist composition contains; (A1) a resin having a structural unit represented by the formula (aa) and at least one structural unit selected from the group consisting of a structural unit represented by the formula (a1-1) and a structural unit represented by the formula (a1-2); (A2) a resin which does not have the structural unit represented by the formula (aa) and which is insoluble or poorly soluble in aqueous alkali solution, but becomes soluble in aqueous alkali solution by the action of acid; and (B) an acid generator, wherein Raa1, Aaa1, Raa2, La1, La2, Ra4, Ra5, Ra6, Ra7, m1, n1 and n1′ are defined in the specification.

4. 发明授权

US09063414B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US09063414B2
公开(公告)日：2015-06-23
申请号：US13190173
申请日：2011-07-25
申请人： Koji Ichikawa , Mitsuhiro Hata , Takahiro Yasue
发明人： Koji Ichikawa , Mitsuhiro Hata , Takahiro Yasue
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/0397
摘要： The present invention provides a photoresist composition comprising a resin which comprises a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, an acid generator and a compound represented by the formula (I): wherein R1 and R2 are independently in each occurrence a C1-C12 hydrocarbon group, a C1-C6 alkoxy group, a C2-C7 acyl group, a C2-C7 acyloxy group, a C2-C7 alkoxycarbonyl group, a nitro group or a halogen atom, and m and n independently each represent an integer of 0 to 4.
摘要翻译：本发明提供一种光致抗蚀剂组合物，其包含树脂，其包含衍生自具有酸不稳定基团的化合物的结构单元，其在碱性水溶液中不溶或难溶于碱性水溶液，但通过酸，酸产生剂和由式（I）表示的化合物：其中R1和R2在每次出现时独立地为C1-C12烃基，C1-C6烷氧基，C2-C7酰基，C2-C7 酰氧基，C 2 -C 7烷氧基羰基，硝基或卤素原子，m和n分别表示0〜4的整数。

5. 发明授权

US08993210B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US08993210B2
公开(公告)日：2015-03-31
申请号：US13027575
申请日：2011-02-15
申请人： Koji Ichikawa , Hiromu Sakamoto
发明人： Koji Ichikawa , Hiromu Sakamoto
IPC分类号： G03F7/004 , G03F7/38 , C07C303/32 , C07C309/06 , C07C309/12 , C07C309/19 , C07D303/17 , C07D303/40 , C07D305/06 , C07D317/72 , C07C381/12 , G03F7/039 , C07D303/12
CPC分类号： C07C381/12 , C07C303/32 , C07C309/06 , C07C309/12 , C07C309/19 , C07D303/12 , C07D303/17 , C07D303/40 , C07D305/06 , C07D317/72 , G03F7/0045 , G03F7/0397 , G03F7/38 , Y10S430/122 , Y10S430/123
摘要： A salt represented by the formula (I): wherein R1 and R2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a C1-C17 divalent saturated hydrocarbon group which can have one or more fluorine atoms and in which one or more —CH2— can be replaced by —O— or —CO—, R3 represents a group having a cyclic ether structure, and Z1+ represents an organic cation.
摘要翻译：由式（I）表示的盐：其中R 1和R 2各自独立地表示氟原子或C 1 -C 6全氟烷基，X 1表示可具有一个或多个氟原子的C 1 -C 17二价饱和烃基，或更多的-CH 2 - 可以被-O-或-CO-代替，R 3表示具有环醚结构的基团，Z 1 +表示有机阳离子。

6. 发明授权

US08778819B2 Dielectric ceramic composition, multilayer dielectric substrate, electronic component, and method for producing dielectric ceramic composition 有权
标题翻译：介电陶瓷组合物，多层电介质基板，电子部件以及电介质陶瓷组合物的制造方法
公开(公告)号：US08778819B2
公开(公告)日：2014-07-15
申请号：US13260060
申请日：2010-03-19
申请人： Junichi Masukawa , Koji Ichikawa
发明人： Junichi Masukawa , Koji Ichikawa
IPC分类号： C03C14/00 , C04B35/465 , C04B35/195
CPC分类号： C04B35/47 , B32B18/00 , C04B35/18 , C04B35/195 , C04B35/462 , C04B35/465 , C04B35/62685 , C04B2235/3201 , C04B2235/3206 , C04B2235/3208 , C04B2235/3213 , C04B2235/3217 , C04B2235/3224 , C04B2235/3227 , C04B2235/3234 , C04B2235/3236 , C04B2235/3262 , C04B2235/3263 , C04B2235/3275 , C04B2235/3281 , C04B2235/3284 , C04B2235/3298 , C04B2235/3409 , C04B2235/3463 , C04B2235/3481 , C04B2235/408 , C04B2235/6025 , C04B2235/604 , C04B2235/656 , C04B2235/80 , C04B2235/9607 , C04B2235/9615 , C04B2237/341 , C04B2237/346 , C04B2237/582 , H01B3/12 , H05K1/0306 , Y10T428/24926
摘要： Disclosed is a dielectric ceramic composition which has high dielectric constant and suppressed low thermal expansion coefficient. Also disclosed are a multilayer dielectric substrate using the dielectric ceramic composition, and an electronic component. Specifically disclosed is a dielectric ceramic composition which contains an ATiO3 (wherein A represents either Ca and/or Sr) phase and an AAl2Si2O8 phase, said dielectric ceramic composition being characterized in that the dielectric constant is not less than 10 at 3 GHz and the average thermal expansion coefficient over the temperature range of 40-600° C. is less than 7 ppm/° C.
摘要翻译：公开了具有高介电常数和低热膨胀系数的介电陶瓷组合物。还公开了使用电介质陶瓷组合物和电子部件的多层电介质基板。具体公开了包含ATiO 3（其中A表示Ca和/或Sr）相和AA 12 Si 2 O 8相的电介质陶瓷组合物，所述介电陶瓷组合物的特征在于，在3GHz下介电常数不小于10，平均在40-600℃的温度范围内的热膨胀系数小于7ppm /℃

7. 发明授权

US08765357B2 Resin and photoresist composition comprising same 有权
标题翻译：包含其的树脂和光致抗蚀剂组合物
公开(公告)号：US08765357B2
公开(公告)日：2014-07-01
申请号：US13447796
申请日：2012-04-16
申请人： Tatsuro Masuyama , Koji Ichikawa
发明人： Tatsuro Masuyama , Koji Ichikawa
IPC分类号： G03F7/038 , G03F7/039 , G03F7/30 , C08F236/20
CPC分类号： G03F7/2041 , G03F7/0046 , G03F7/0397
摘要： The present invention provides a resin comprising a structural unit derived from a compound represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, A2 represents a divalent fluorine-containing C1-C12 hydrocarbon group, and A1 represents a group represented by the formula (a-g1): A10-X10sA11- (a-g1) wherein A10 is independently in each occurrence a C1-C5 aliphatic hydrocarbon group, A11 represents a C1-C5 aliphatic hydrocarbon group, X10 is independently in each occurrence —O—, —CO—, —CO—O— or —O—CO—, and s represents an integer of 0 to 2, and a photoresist composition comprising the resin and an acid generator.
摘要翻译：本发明提供包含由式（I）表示的化合物衍生的结构单元的树脂：其中R1表示氢原子或甲基，A2表示二价含氟C1-C12烃基，A1表示由式（a-g1）表示的基团：A10-X10sA11-（a-g1）其中A10在每次出现时独立地为C1-C5脂族烃基，A11表示C1-C5脂族烃基，X10各自独立地表示出现-O-，-CO-，-CO-O-或-O-CO-，s表示0〜2的整数，以及包含树脂和酸发生剂的光致抗蚀剂组合物。

8. 发明授权

US08765351B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US08765351B2
公开(公告)日：2014-07-01
申请号：US12946243
申请日：2010-11-15
申请人： Koji Ichikawa , Masako Sugihara , Isao Yoshida
发明人： Koji Ichikawa , Masako Sugihara , Isao Yoshida
IPC分类号： G03F7/00 , C07C309/19
CPC分类号： C07D307/93 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W1 represents a C4-C36 lactone ring, R3 is a C1-C6 alkyl group etc., t represents an integer of 0 to 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein L2 represents a single bond etc., ring W2 represents a C3-C36 saturated hydrocarbon ring in which one —CH2— is replaced by —CO— and in which one or more —CH2— can be replaced by —O— or —CO—, R1 represents a C1-C12 hydrocarbon group, R2 is a C1-C6 alkyl group etc., and s represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein L3 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W3 represents a C3-C36 saturated hydrocarbon ring, R4 is a hydroxyl group etc., R5 is a C1-C6 alkyl group etc., v represents an integer of 1 to 3, and w represents an integer of 0 to 2.
摘要翻译：由式（X）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，L1表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被 -O-或-CO-，环W1表示C4-C36内酯环，R3表示C1-C6烷基等，t表示0〜2的整数，Z +表示有机抗衡离子，W10表示由式（X-1）表示：其中L2表示单键等，环W2表示其中一个-CH 2 - 被-CO-替代的C 3 -C 36饱和烃环，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，R1表示C1-C12烃基，R2表示C1-C6烷基等，s表示0〜2的整数，或式（ X-2）：其中L3表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，环W3重复呈现C3-C36饱和烃环，R4为羟基等，R5为C1-C6烷基等，v为1〜3的整数，w为0〜2的整数。

9. 发明授权

US08735047B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08735047B2
公开(公告)日：2014-05-27
申请号：US13551864
申请日：2012-07-18
申请人： Koji Ichikawa , Satoshi Yamaguchi
发明人： Koji Ichikawa , Satoshi Yamaguchi
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, A13, A14, X12, Q1, Q2, L1, ring W1 and Z+ are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸式发生剂和由式（II）表示的酸产生剂，其中R1，A1，A13，A14，X12，Q1，Q2，L1，环W1和Z +在说明书中定义。

10. 发明授权

US08728707B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08728707B2
公开(公告)日：2014-05-20
申请号：US13551860
申请日：2012-07-18
申请人： Koji Ichikawa , Satoshi Yamaguchi
发明人： Koji Ichikawa , Satoshi Yamaguchi
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), an acid generator, and a compound represented by the formula (II), wherein R1, A1, A13, A14, X12, R23 and ring W21 are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂和由式（II）表示的化合物，其中R1，A1，A13，A14，X12，R23和环W21在说明书中定义。

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