专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08951709B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08951709B2
公开(公告)日：2015-02-10
申请号：US13280969
申请日：2011-10-25
申请人： Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
发明人： Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
IPC分类号： G03F7/00 , G03F7/20 , G03F7/004 , G03F7/039
CPC分类号： G03F7/2041 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A resist composition contains a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, wherein Raa1 represents a hydrogen atom and a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group etc.; Raa2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; Rab1 represents a hydrogen atom and a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group etc.; W1 represents an optionally substituted C4 to C36 alicyclic hydrocarbon group; n represents 1 or 2; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group.
摘要翻译：抗蚀剂组合物含有具有由式（aa）表示的结构单元的树脂和由式（ab）表示的结构单元; 和酸产生剂，其中Raa1表示氢原子和甲基; Aaa1表示可以具有取代基的C1〜C6烷二基等。 Raa2表示任选取代的C1至C18脂族烃基; Rab1表示氢原子和甲基; Aab1表示单键，任选取代的C 1至C 6烷二基等; W1表示任选取代的C4至C36脂环族烃基; n表示1或2; Aab2各自独立地表示任选取代的C 1至C 6脂族烃基; Rab2各自独立地表示C1〜C12氟化烷基。

2. 发明授权

US09291893B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US09291893B2
公开(公告)日：2016-03-22
申请号：US13281145
申请日：2011-10-25
申请人： Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
发明人： Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition contains; a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, wherein Raa1 represents a hydrogen atom and a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group etc.; Raa2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; Rab1 represents a hydrogen atom and a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group etc.; W1 represents an optionally substituted C4 to C24 alicyclic hydrocarbon group; n represents 1 or 2; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group.
摘要翻译：抗蚀剂组合物含有具有由式（aa）表示的结构单元的树脂和由式（ab）表示的结构单元; 和酸产生剂，其中Raa1表示氢原子和甲基; Aaa1表示可以具有取代基的C1〜C6烷二基等。 Raa2表示任选取代的C1至C18脂族烃基; Rab1表示氢原子和甲基; Aab1表示单键，任选取代的C 1至C 6烷二基等; W1表示任选取代的C4至C24脂环族烃基; n表示1或2; Aab2各自独立地表示任选取代的C 1至C 6脂族烃基; Rab2各自独立地表示C1〜C12氟化烷基。

3. 发明授权

US08574811B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08574811B2
公开(公告)日：2013-11-05
申请号：US13221597
申请日：2011-08-30
申请人： Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
发明人： Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
IPC分类号： G03F7/004 , G03F7/30 , G03F7/38 , G03F7/039
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , G03F7/30 , G03F7/38 , Y10S430/111 , Y10S430/126
摘要： A resist composition contains; a resin having a structural unit derived from a compound represented by the formula (a); and an acid generator. wherein R1 represents a hydrogen atom or a methyl group; R2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; A1 represents an optionally substituted C1 to C6 alkanediyl group or a group represented by the formula (a-g1); wherein s represents 0 or 1; A10 and A12 independently represent an optionally substituted C1 to C5 aliphatic hydrocarbon group; A11 represents a single bond or an optionally substituted C1 to C5 aliphatic hydrocarbon group; X10 and X11 independently represents an oxygen atom, a carbonyl group, a carbonyloxy group or an oxycarbonyl group; provided that a total number of the carbon atom of A10, A11, A12, X10 and X11 is 6 or less.
摘要翻译：抗蚀剂组合物含有具有衍生自由式（a）表示的化合物的结构单元的树脂; 和酸发生剂。其中R1表示氢原子或甲基; R2代表任选取代的C1至C18脂族烃基; A1表示任意取代的C1〜C6烷二基或式（a-g1）表示的基团。其中s表示0或1; A10和A12独立地表示任选取代的C1至C5脂族烃基; A11表示单键或任选取代的C1至C5脂族烃基; X 10和X 11独立地表示氧原子，羰基，羰氧基或氧羰基; A10，A11，A12，X10和X11的碳原子总数为6以下。

4. 发明授权

US09176379B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US09176379B2
公开(公告)日：2015-11-03
申请号：US13441205
申请日：2012-04-06
申请人： Koji Ichikawa , Takahiro Yasue , Tatsuro Masuyama
发明人： Koji Ichikawa , Takahiro Yasue , Tatsuro Masuyama
IPC分类号： G03F7/004 , G03F7/027 , G03F7/20 , G03F7/039
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/027 , G03F7/0397 , G03F7/20 , G03F7/2041
摘要： A resist composition includes (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having a structure to be cleaved by the action of an alkaline developer, and (C) a compound represented by the formula (I), wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently represent an integer of 0 to 4.
摘要翻译：抗蚀剂组合物包括（A）在碱性水溶液中不溶或难溶的树脂，但是通过酸的作用可溶于碱性水溶液中，（B）具有要通过碱性显影剂，和（C）由式（I）表示的化合物，其中R1和R2各自独立地表示C1〜C12烃基，C1〜C6烷氧基，C2〜C7酰基，C2 C7酰氧基，C2〜C7烷氧基羰基，硝基或卤素原子; m和n独立地表示0〜4的整数。

5. 发明授权

US08354217B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US08354217B2
公开(公告)日：2013-01-15
申请号：US12786799
申请日：2010-05-25
申请人： Koji Ichikawa , Masako Sugihara , Tatsuro Masuyama
发明人： Koji Ichikawa , Masako Sugihara , Tatsuro Masuyama
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028 , G03F7/04
CPC分类号： C07D307/80 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A salt represented by the formula (I-AA): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C4 perfluoroalkyl group, X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar1 represents a (m4+1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B1 represents a single bond etc., m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3, and a photoresist composition comprising the salt represented by the formula (I-AA) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：由式（I-AA）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C4全氟烷基，X1表示单键等，Y1表示C1-C36脂族烃基等， A1和A2各自独立地表示C1-C20脂族烃基等，Ar1表示可具有一个或多个取代基的（m4 + 1）价C6-C20芳族烃基，B1表示单键等，m1和 m2独立地表示0至2的整数，m3表示1至3的整数，条件是m1加上m2加m3等于3，m4表示1至3的整数，并且包含表示的盐的光致抗蚀剂组合物通过式（I-AA）和包含具有酸不稳定基团的结构单元的树脂，并且在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱水溶液中。

6. 发明授权

US08318403B2 Salt and photoresist composition containing the same 有权
标题翻译：含有相同的盐和光致抗蚀剂组合物
公开(公告)号：US08318403B2
公开(公告)日：2012-11-27
申请号：US12787184
申请日：2010-05-25
申请人： Koji Ichikawa , Masako Sugihara , Tatsuro Masuyama
发明人： Koji Ichikawa , Masako Sugihara , Tatsuro Masuyama
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028
CPC分类号： C07C381/12 , C07C309/17 , C07C2601/04 , C07C2601/08 , C07C2601/14 , C07C2601/18 , C07C2602/08 , C07C2602/10 , C07C2602/42 , C07C2602/44 , C07C2603/68 , C07C2603/74 , C07C2603/86 , C07D307/77 , C07D307/93 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A salt represented by the formula (I-CC): wherein Q1 and Q2 each independently represent a fluorine atom etc., X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar1 represents a (m4+1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B1 represents a single bond etc., B2 represents a group capable of being eliminated by the action of an acid, m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3, and a photoresist composition comprising the salt represented by the formula (I-CC) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：由式（I-CC）表示的盐：其中Q1和Q2各自独立地表示氟原子等，X1表示单键等，Y1表示C1-C36脂族烃基等，A1和A2各自独立地表示代表C1-C20脂族烃基等，Ar1表示可以具有一个或多个取代基的（m4 + 1）价的C6〜C20芳香族烃基，B1表示单键等，B2表示可以为通过酸的作用消除，m1和m2独立地表示0〜2的整数，m3表示1〜3的整数，条件是m1 + m2 + m3等于3，m4表示1〜 3和包含式（I-CC）表示的盐的光致抗蚀剂组合物和包含具有酸不稳定基团的结构单元的树脂，其在碱性水溶液中不溶或难溶，但溶于碱水溶液通过酸的作用。

7. 发明授权

US08765357B2 Resin and photoresist composition comprising same 有权
标题翻译：包含其的树脂和光致抗蚀剂组合物
公开(公告)号：US08765357B2
公开(公告)日：2014-07-01
申请号：US13447796
申请日：2012-04-16
申请人： Tatsuro Masuyama , Koji Ichikawa
发明人： Tatsuro Masuyama , Koji Ichikawa
IPC分类号： G03F7/038 , G03F7/039 , G03F7/30 , C08F236/20
CPC分类号： G03F7/2041 , G03F7/0046 , G03F7/0397
摘要： The present invention provides a resin comprising a structural unit derived from a compound represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, A2 represents a divalent fluorine-containing C1-C12 hydrocarbon group, and A1 represents a group represented by the formula (a-g1): A10-X10sA11- (a-g1) wherein A10 is independently in each occurrence a C1-C5 aliphatic hydrocarbon group, A11 represents a C1-C5 aliphatic hydrocarbon group, X10 is independently in each occurrence —O—, —CO—, —CO—O— or —O—CO—, and s represents an integer of 0 to 2, and a photoresist composition comprising the resin and an acid generator.
摘要翻译：本发明提供包含由式（I）表示的化合物衍生的结构单元的树脂：其中R1表示氢原子或甲基，A2表示二价含氟C1-C12烃基，A1表示由式（a-g1）表示的基团：A10-X10sA11-（a-g1）其中A10在每次出现时独立地为C1-C5脂族烃基，A11表示C1-C5脂族烃基，X10各自独立地表示出现-O-，-CO-，-CO-O-或-O-CO-，s表示0〜2的整数，以及包含树脂和酸发生剂的光致抗蚀剂组合物。

8. 发明授权

US08563219B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08563219B2
公开(公告)日：2013-10-22
申请号：US13404871
申请日：2012-02-24
申请人： Koji Ichikawa , Tatsuro Masuyama , Satoshi Yamaguchi
发明人： Koji Ichikawa , Tatsuro Masuyama , Satoshi Yamaguchi
IPC分类号： G03F7/004 , G03F7/30 , G03F7/38 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/30 , G03F7/38 , Y10S430/108 , Y10S430/111
摘要： A resist composition containing; (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) a salt having an anion represented by the formula (IA), wherein R1, A1, R2, R1A and R2A are defined in the specification.
摘要翻译：含有抗蚀剂组合物（A1）具有由式（I）表示的结构单元的树脂，（A2）在碱性水溶液中不溶或难溶的树脂，但是通过酸作用而溶于碱性水溶液中的树脂，（B）酸衍生物，和（D）具有由式（IA）表示的阴离子的盐，其中R1，A1，R2，R1A和R2A在说明书中定义。

9. 发明授权

US08652753B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08652753B2
公开(公告)日：2014-02-18
申请号：US13552242
申请日：2012-07-18
申请人： Koji Ichikawa , Tatsuro Masuyama , Satoshi Yamaguchi
发明人： Koji Ichikawa , Tatsuro Masuyama , Satoshi Yamaguchi
IPC分类号： G03F7/039 , G03F7/30 , G03F7/38 , G03F7/20 , G03F7/004
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition having; a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), an acid generator, and a salt having an anion represented by the formula (IA). wherein R1, A1, A13, X12, A14, R1A and R2A are defined in the specification.
摘要翻译：一种抗蚀剂组合物，具有：具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但是通过酸的作用而溶解在碱性水溶液中，不包括由式（I），酸产生剂和具有由式（IA）表示的阴离子的盐。其中R1，A1，A13，X12，A14，R1A和R2A在说明书中定义。

10. 发明授权

US08278023B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US08278023B2
公开(公告)日：2012-10-02
申请号：US12786726
申请日：2010-05-25
申请人： Koji Ichikawa , Masako Sugihara , Tatsuro Masuyama
发明人： Koji Ichikawa , Masako Sugihara , Tatsuro Masuyama
IPC分类号： G03F7/004 , G03F7/30 , C07C309/00
CPC分类号： C07D493/18 , C07C309/17 , C07C381/12 , C07C2603/74 , C07D307/33 , C07D307/77 , C07D307/93 , C07D309/06 , C07D309/30 , C07D313/04 , G03F7/0045 , G03F7/0046 , G03F7/0392
摘要： A salt represented by the formula (I-BB): wherein Q1 and Q2 each independently represent a fluorine atom etc., X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar1 represents a (m4+1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B1 represents a single bond etc., B2 represents a C4-C36 alicyclic hydrocarbon group which has one or more —OXa groups and which is not capable of being eliminated by the action of an acid etc., and Xa represents a hydrogen atom or a group capable of being eliminated by the action of an acid, m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3.
摘要翻译：由式（I-BB）表示的盐：其中Q1和Q2各自独立地表示氟原子等，X1表示单键等，Y1表示C1-C36脂族烃基等，A1和A2各自独立地表示表示C1-C20脂肪族烃基等，Ar1表示可以具有一个以上取代基的（m4 + 1）价的C6〜C20芳香族烃基，B1表示单键等，B2表示C4-C36脂环族具有一个或多个-OXa基并且不能通过酸等的作用而被除去的烃基，Xa表示氢原子或能够通过酸的作用而被除去的基团，m1和m2 独立地表示0〜2的整数，m3表示1〜3的整数，条件是m1 + m2 + m3等于3，m4表示1〜3的整数。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式