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    • 4. 发明申请
    • SEMICONDUCTOR DEVICE
    • 半导体器件
    • US20110261864A1
    • 2011-10-27
    • US13177583
    • 2011-07-07
    • Yoshiyuki KUROKAWATakayuki IKEDAMasami ENDOHiroki DEMBODaisuke KAWAETakayuki INOUE
    • Yoshiyuki KUROKAWATakayuki IKEDAMasami ENDOHiroki DEMBODaisuke KAWAETakayuki INOUE
    • H04B1/56
    • G06K19/07749
    • In a case where an ASK method is used for a communication method between a semiconductor device and a reader/writer, the amplitude of a radio signal is changed by data transmitted from the semiconductor device to the reader/writer when data is not transmitted from the reader/writer to the semiconductor device. Therefore, in some cases, the semiconductor device mistakes data transmitted from the semiconductor device itself for data transmitted from the reader/writer to the semiconductor device. The semiconductor device includes an antenna circuit, a transmission circuit, a reception circuit, and an arithmetic processing circuit. The antenna circuit transmits and receives a radio signal. The transmission circuit outputs to the reception circuit a signal showing whether or not the antenna circuit is transmitting the radio signal.
    • 在使用ASK方式进行半导体装置与读取器/写入器之间的通信方式的情况下,通过从半导体装置发送到读取器/写入器的数据,无线信号的振幅由数据不从 读取器/写入器到半导体器件。 因此,在某些情况下,半导体器件将从半导体器件本身发送的数据错误地从读取器/写入器发送到半导体器件的数据。 半导体器件包括天线电路,发送电路,接收电路和运算处理电路。 天线电路发送和接收无线电信号。 发送电路向接收电路输出表示天线电路是否正在发送无线信号的信号。
    • 6. 发明申请
    • Semiconductor Device and Method for Manufacturing the Same
    • 半导体装置及其制造方法
    • US20100258802A1
    • 2010-10-14
    • US12754393
    • 2010-04-05
    • Hiromichi GODOTakayuki INOUE
    • Hiromichi GODOTakayuki INOUE
    • H01L29/786H01L21/336
    • H01L29/7869H01L27/1225
    • An object is to provide an n-channel transistor and a p-channel transistor having a preferred structure using an oxide semiconductor. A first source or drain electrode which is electrically connected to a first oxide semiconductor layer and is formed using a stacked-layer structure including a first conductive layer containing a first material and a second conductive layer containing a second material, and a second source or drain electrode which is electrically connected to a second oxide semiconductor layer and is formed using a stacked-layer structure including a third conductive layer containing the first material and a fourth conductive layer containing the second material are included. The first oxide semiconductor layer is in contact with the first conductive layer of the first source or drain electrode, and the second oxide semiconductor layer is in contact with the third and the fourth conductive layers of the second source or drain electrode.
    • 目的是提供使用氧化物半导体的具有优选结构的n沟道晶体管和p沟道晶体管。 第一源极或漏极,其电连接到第一氧化物半导体层,并且使用包括包含第一材料的第一导电层和包含第二材料的第二导电层的堆叠层结构形成,以及第二源极或漏极 电连接到第二氧化物半导体层并且使用包括包含第一材料的第三导电层和包含第二材料的第四导电层的层叠结构形成的电极。 第一氧化物半导体层与第一源极或漏极的第一导电层接触,并且第二氧化物半导体层与第二源极或漏极的第三导电层和第四导电层接触。