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    • 5. 发明授权
    • Method and apparatus for making master optical disk
    • 制作主光盘的方法和装置
    • US07551537B2
    • 2009-06-23
    • US10498693
    • 2003-10-14
    • Sakuya Tamada
    • Sakuya Tamada
    • G11B7/00
    • B82Y10/00G11B7/126G11B7/1378G11B7/1398G11B7/261
    • An optical recording medium master disc exposure apparatus comprises a modulating means 3 for modulating intensity of light from an exposure light source 1 in response to recording information and a focusing optical system 9 for focusing the light modulated by this modulating means 3 on a photoresist 12 on an optical recording medium master disc 11 to thereby pattern-expose the photoresist 12 in response to recording information. The exposure light source 1 is composed of a ultrashort wave pulse laser with a repetitive frequency of an integral multiple ranging from 1 time to 20 times as high as the clock frequency of recording information. This optical recording medium master disc apparatus includes an external synchronizing mechanism to vary the resonator length of this ultrashort wave pulse laser to mode-lock the repetitive frequency of the ultrashort wave pulse laser in synchronism with the clock frequency to cause the ultrashort wave pulse laser to emit pulses, and hence miniscule pits can be formed with high accuracy.
    • 光记录介质母盘曝光装置包括:调制装置3,用于响应于记录信息调制来自曝光光源1的光的强度;以及聚焦光学系统9,用于将由该调制装置3调制的光聚焦到光致抗蚀剂12上 光记录介质母盘11,从而根据记录信息图案曝光光致抗蚀剂12。 曝光光源1由具有从记录信息的时钟频率的1倍到20倍的整数倍的重复频率的超短脉冲激光器组成。 该光记录介质母盘装置包括外部同步机构,用于改变该超短波脉冲激光器的谐振器长度,以与时钟频率同步地模式锁定超短波脉冲激光器的重复频率,以使超短波脉冲激光器 发射脉冲,因此可以高精度地形成微小的凹坑。
    • 7. 发明申请
    • Optical recording medium master disc exposure device and optical recording medium master exposure method
    • 光记录介质母盘曝光装置和光记录介质主曝光方法
    • US20050180302A1
    • 2005-08-18
    • US10498693
    • 2003-10-14
    • Sakuya Tamada
    • Sakuya Tamada
    • G11B7/125G11B7/26G11B7/24
    • B82Y10/00G11B7/126G11B7/1378G11B7/1398G11B7/261
    • An optical recording medium master disc exposure apparatus comprises a modulating means 3 for modulating intensity of light from an exposure light source 1 in response to recording information and a focusing optical system 9 for focusing the light modulated by this modulating means 3 on a photoresist 12 on an optical recording medium master disc 11 to thereby pattern-expose the photoresist 12 in response to recording information. The exposure light source 1 is composed of a ultrashort wave pulse laser with a repetitive frequency of an integral multiple ranging from 1 time to 20 times as high as the clock frequency of recording information. This optical recording medium master disc apparatus includes an external synchronizing mechanism to vary the resonator length of this ultrashort wave pulse laser to mode-lock the repetitive frequency of the ultrashort wave pulse laser in synchronism with the clock frequency to cause the ultrashort wave pulse laser to emit pulses, and hence miniscule pits can be formed with high accuracy.
    • 光记录介质母盘曝光装置包括:调制装置3,用于响应于记录信息调制来自曝光光源1的光的强度;以及聚焦光学系统9,用于将由该调制装置3调制的光聚焦到光致抗蚀剂12上 光记录介质母盘11,从而根据记录信息图案曝光光致抗蚀剂12。 曝光光源1由具有从记录信息的时钟频率的1倍到20倍的整数倍的重复频率的超短脉冲激光器组成。 该光记录介质母盘装置包括外部同步机构,用于改变该超短波脉冲激光器的谐振器长度,以与时钟频率同步地模式锁定超短波脉冲激光器的重复频率,以使超短波脉冲激光器 发射脉冲,因此可以高精度地形成微小的凹坑。