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1. 发明申请

US20060169921A1 ION SOURCE FOR USE IN AN ION IMPLANTER 有权
标题翻译：离子源在离子植入物中使用
公开(公告)号：US20060169921A1
公开(公告)日：2006-08-03
申请号：US11049913
申请日：2005-02-03
申请人： Klaus Becker , Werner Baer , Klaus Petry
发明人： Klaus Becker , Werner Baer , Klaus Petry
IPC分类号： H01J37/317 , H01J37/08
CPC分类号： H01J37/08 , H01J27/08 , H01J37/3171
摘要： An ion implanter having a source, a workpiece support and a transport system for delivering ions from the source to an ion implantation chamber that contains the workpiece support. The ion source has an arc chamber for ionizing a source material routed into the arc chamber that defines an exit aperture for routing ions to the transport system and including an arc chamber flange attached to the arc chamber and including a first surface that defines a gas inlet which accepts gas from a source and a gas outlet which opens into the arc chamber. An arc chamber support includes a support flange having a conforming surface that sealingly engages the first surface of arc chamber flange at a region of the gas inlet and further includes a throughpassage that aligns with the gas inlet. A gas supply line routes gas from a gas source through the throughpassage of the support flange and into the gas inlet of said arc chamber flange.
摘要翻译：一种离子注入机，其具有源，工件支撑和用于将离子从源输送到包含工件支撑件的离子注入室的输送系统。离子源具有电弧室，用于电离导入电弧室的源材料，其限定用于将离子引导到输送系统的出口孔，并且包括附接到电弧室的电弧室凸缘，并且包括限定气体入口的第一表面其接收来自源的气体和通向电弧室的气体出口。电弧室支撑件包括具有适配表面的支撑凸缘，其密封地接合在气体入口的区域处的电弧室凸缘的第一表面，并且还包括与气体入口对准的通道。气体供应管线将来自气体源的气体通过支撑凸缘的通孔引入到所述电弧室凸缘的气体入口中。

2. 发明授权

US07105840B2 Ion source for use in an ion implanter 有权
标题翻译：用于离子注入机的离子源
公开(公告)号：US07105840B2
公开(公告)日：2006-09-12
申请号：US11049913
申请日：2005-02-03
申请人： Klaus Becker , Werner Baer , Klaus Petry
发明人： Klaus Becker , Werner Baer , Klaus Petry
IPC分类号： G21K5/10 , H01J37/08
CPC分类号： H01J37/08 , H01J27/08 , H01J37/3171
摘要： An ion implanter having a source, a workpiece support and a transport system for delivering ions from the source to an ion implantation chamber that contains the workpiece support. The ion source has an arc chamber for ionizing a source material routed into the arc chamber that defines an exit aperture for routing ions to the transport system and including an arc chamber flange attached to the arc chamber and including a first surface that defines a gas inlet which accepts gas from a source and a gas outlet which opens into the arc chamber. An arc chamber support includes a support flange having a conforming surface that sealingly engages the first surface of arc chamber flange at a region of the gas inlet and further includes a throughpassage that aligns with the gas inlet. A gas supply line routes gas from a gas source through the throughpassage of the support flange and into the gas inlet of said arc chamber flange.
摘要翻译：一种离子注入机，其具有源，工件支撑和用于将离子从源输送到包含工件支撑件的离子注入室的输送系统。离子源具有电弧室，用于电离导入电弧室的源材料，其限定用于将离子引导到输送系统的出口孔，并且包括附接到电弧室的电弧室凸缘，并且包括限定气体入口的第一表面其接收来自源的气体和通向电弧室的气体出口。电弧室支撑件包括具有适配表面的支撑凸缘，其密封地接合在气体入口的区域处的电弧室凸缘的第一表面，并且还包括与气体入口对准的通道。气体供应管线将来自气体源的气体通过支撑凸缘的通孔引入到所述电弧室凸缘的气体入口中。

3. 发明授权

US07828504B2 Combination load lock for handling workpieces 有权
标题翻译：用于处理工件的组合装载锁
公开(公告)号：US07828504B2
公开(公告)日：2010-11-09
申请号：US11432923
申请日：2006-05-12
申请人： Michel Pharand , Klaus Becker , Klaus Petry , Marvin R. LaFontaine , Michael R. Mitrano
发明人： Michel Pharand , Klaus Becker , Klaus Petry , Marvin R. LaFontaine , Michael R. Mitrano
IPC分类号： H01L21/677
CPC分类号： H01L21/67201 , H01L21/67265 , H01L21/67294 , H01L21/67748
摘要： A combination load lock apparatus is provided, wherein a chamber is coupled to two or more valves in selective fluid communication with two or more respective volumes. A support member for supporting a workpiece is disposed within an interior portion of the chamber, wherein a translation apparatus is operably coupled thereto. The translation apparatus is operable to rotate and/or translate the workpiece on the support member about and/or along a first axis, wherein a detection apparatus associated with the chamber is operable to detect one or more characteristics of the workpiece during the rotation and/or translation thereof. The workpiece may be further rotated in a predetermined manner based on the one or more detected characteristics. A recess is further defined in the interior portion of the chamber, wherein the translation apparatus is operable to translate the workpiece into and out of the recess to reduce particulate contamination thereon.
摘要翻译：提供一种组合式加载锁定装置，其中腔室与两个或更多个相应体积选择性流体连通的两个或更多个阀联接。用于支撑工件的支撑构件设置在腔室的内部部分内，其中平移装置可操作地联接到其上。翻译装置可操作以沿着第一轴线旋转和/或平移在支撑构件上的工件，其中与腔室相关联的检测装置可操作以在旋转期间检测工件的一个或多个特性，和/ 或其翻译。可以基于一个或多个检测到的特性以预定方式进一步旋转工件。在腔室的内部部分中进一步限定凹部，其中平移装置可操作以将工件平移到凹槽中并减少其中的颗粒污染物。

4. 发明申请

US20060033045A1 ION BEAM MEASUREMENT SYSTEMS AND METHODS FOR ION IMPLANT DOSE AND UNIFORMITY CONTROL 有权
标题翻译：离子束测量系统和离子植入剂量和均匀性控制的方法
公开(公告)号：US20060033045A1
公开(公告)日：2006-02-16
申请号：US10917597
申请日：2004-08-13
申请人： Klaus Petry , Joseph Ferrara , Klaus Becker
发明人： Klaus Petry , Joseph Ferrara , Klaus Becker
IPC分类号： H01J37/317 , H01J37/20
CPC分类号： H01J37/3171 , H01J37/20 , H01J37/304 , H01J2237/20207 , H01J2237/20214 , H01J2237/20235 , H01J2237/20242 , H01J2237/24528 , H01J2237/31703
摘要： Dosimetry systems and methods are also presented for measuring a scanned ion beam at a plurality of points along a curvilinear path at a workpiece location in a process chamber. An illustrated dosimetry system comprises a sensor and a mounting apparatus that supports support the sensor and selectively positions the sensor at a plurality of points along the curvilinear path, wherein the mounting apparatus can selectively position the sensor to point toward a vertex of the scanned ion beam.
摘要翻译：还提出了测量系统和方法，用于在处理室中的工件位置处沿着曲线路径的多个点处测量扫描离子束。所示的剂量测定系统包括传感器和安装设备，其支撑传感器并且选择性地将传感器定位在沿着曲线路径的多个点处，其中安装设备可以选择性地将传感器定位成朝向扫描离子束的顶点。

5. 发明申请

US20130020940A1 CURRENT LIMITER FOR HIGH VOLTAGE POWER SUPPLY USED WITH ION IMPLANTATION SYSTEM 有权
标题翻译：用于离子植入系统使用的高压电源的电流限制
公开(公告)号：US20130020940A1
公开(公告)日：2013-01-24
申请号：US13187905
申请日：2011-07-21
申请人： Klaus Becker , Klaus Petry , Piotr Lubicki
发明人： Klaus Becker , Klaus Petry , Piotr Lubicki
IPC分类号： H01J7/44
CPC分类号： H01J37/241 , H01J27/022 , H01J37/3171 , H01J2237/0203 , H01J2237/0206 , H02H9/02
摘要： Disclosed is a surge protection system for use with an ion source assembly. The system comprises a high voltage power source coupled in series with a thermionic diode and an ion source assembly. The high voltage power supply is enclosed in the pressure tank and drives the ion source assembly. The thermionic diode is comprised of an insulating tube disposed between the ion source assembly enclosure and the output of the high voltage power supply and makes use of existing ion source assembly components to limit damage to the power supply during arc failures of the ion source assembly.
摘要翻译：公开了一种用于离子源组件的浪涌保护系统。该系统包括与热离子二极管和离子源组件串联耦合的高压电源。高压电源封装在压力罐中并驱动离子源组件。热离子二极管包括设置在离子源组件外壳和高压电源的输出之间的绝缘管，并且利用现有的离子源组件部件来限制离子源组件的电弧故障期间对电源的损坏。

6. 发明授权

US08766209B2 Current limiter for high voltage power supply used with ion implantation system 有权
标题翻译：用于离子注入系统的高压电源限流器
公开(公告)号：US08766209B2
公开(公告)日：2014-07-01
申请号：US13187905
申请日：2011-07-21
申请人： Klaus Becker , Klaus Petry , Piotr Lubicki
发明人： Klaus Becker , Klaus Petry , Piotr Lubicki
IPC分类号： H01J27/00
CPC分类号： H01J37/241 , H01J27/022 , H01J37/3171 , H01J2237/0203 , H01J2237/0206 , H02H9/02
摘要： Disclosed is a surge protection system for use with an ion source assembly. The system comprises a high voltage power source coupled in series with a thermionic diode and an ion source assembly. The high voltage power supply is enclosed in the pressure tank and drives the ion source assembly. The thermionic diode is comprised of an insulating tube disposed between the ion source assembly enclosure and the output of the high voltage power supply and makes use of existing ion source assembly components to limit damage to the power supply during arc failures of the ion source assembly.
摘要翻译：公开了一种用于离子源组件的浪涌保护系统。该系统包括与热离子二极管和离子源组件串联耦合的高压电源。高压电源封装在压力罐中并驱动离子源组件。热离子二极管包括设置在离子源组件外壳和高压电源的输出之间的绝缘管，并且利用现有的离子源组件部件来限制离子源组件的电弧故障期间对电源的损坏。

7. 发明申请

US20070264105A1 Combination load lock for handling workpieces 有权
标题翻译：用于处理工件的组合装载锁
公开(公告)号：US20070264105A1
公开(公告)日：2007-11-15
申请号：US11432923
申请日：2006-05-12
申请人： Michel Pharand , Klaus Becker , Klaus Petry , Marvin LaFontaine , Michael Mitrano
发明人： Michel Pharand , Klaus Becker , Klaus Petry , Marvin LaFontaine , Michael Mitrano
IPC分类号： H01L21/677
CPC分类号： H01L21/67201 , H01L21/67265 , H01L21/67294 , H01L21/67748
摘要： A combination load lock apparatus is provided, wherein a chamber is coupled to two or more valves in selective fluid communication with two or more respective volumes. A support member for supporting a workpiece is disposed within an interior portion of the chamber, wherein a translation apparatus is operably coupled thereto. The translation apparatus is operable to rotate and/or translate the workpiece on the support member about and/or along a first axis, wherein a detection apparatus associated with the chamber is operable to detect one or more characteristics of the workpiece during the rotation and/or translation thereof. The workpiece may be further rotated in a predetermined manner based on the one or more detected characteristics. A recess is further defined in the interior portion of the chamber, wherein the translation apparatus is operable to translate the workpiece into and out of the recess to reduce particulate contamination thereon.
摘要翻译：提供一种组合式加载锁定装置，其中腔室与两个或更多个相应体积选择性流体连通的两个或更多个阀联接。用于支撑工件的支撑构件设置在腔室的内部部分内，其中平移装置可操作地联接到其上。翻译装置可操作以沿着第一轴线旋转和/或平移在支撑构件上的工件，其中与腔室相关联的检测装置可操作以在旋转期间检测工件的一个或多个特性，和/ 或其翻译。可以基于一个或多个检测到的特性以预定方式进一步旋转工件。在腔室的内部部分中进一步限定凹部，其中平移装置可操作以将工件平移到凹槽中并减少其中的颗粒污染物。

8. 发明授权

US06992309B1 Ion beam measurement systems and methods for ion implant dose and uniformity control 有权
标题翻译：离子束测量系统和离子注入剂量和均匀性控制方法
公开(公告)号：US06992309B1
公开(公告)日：2006-01-31
申请号：US10917597
申请日：2004-08-13
申请人： Klaus Petry , Joseph Ferrara , Klaus Becker
发明人： Klaus Petry , Joseph Ferrara , Klaus Becker
IPC分类号： H01J37/317
CPC分类号： H01J37/3171 , H01J37/20 , H01J37/304 , H01J2237/20207 , H01J2237/20214 , H01J2237/20235 , H01J2237/20242 , H01J2237/24528 , H01J2237/31703
摘要： Dosimetry systems and methods are also presented for measuring a scanned ion beam at a plurality of points along a curvilinear path at a workpiece location in a process chamber. An illustrated dosimetry system comprises a sensor and a mounting apparatus that supports support the sensor and selectively positions the sensor at a plurality of points along the curvilinear path, wherein the mounting apparatus can selectively position the sensor to point toward a vertex of the scanned ion beam.
摘要翻译：还提出了测量系统和方法，用于在处理室中的工件位置处沿着曲线路径的多个点处测量扫描离子束。所示的剂量测定系统包括传感器和安装设备，其支撑传感器并且选择性地将传感器定位在沿着曲线路径的多个点处，其中安装设备可以选择性地将传感器定位成朝向扫描离子束的顶点。

9. 发明申请

US20140360491A1 SOLAR RADIATION RECEIVER HAVING AN ENTRY WINDOW MADE OF QUARTZ GLASS AND METHOD FOR PRODUCING AN ENTRY WINDOW 有权
标题翻译：具有QUARTZ玻璃的入口窗的太阳辐射接收器和用于产生入口窗的方法
公开(公告)号：US20140360491A1
公开(公告)日：2014-12-11
申请号：US14345233
申请日：2012-09-13
申请人： Klaus Becker , Achim Hofmann , Michael Hünermann , Christian Schenk
发明人： Klaus Becker , Achim Hofmann , Michael Hünermann , Christian Schenk
IPC分类号： F24J2/05 , C03B19/09 , C03B29/02 , F24J2/50
CPC分类号： F24S10/40 , C03B19/09 , C03B19/095 , C03B29/02 , C03B2201/02 , C03B2201/04 , C03C3/06 , C03C4/08 , F24S20/20 , F24S80/52 , F24S2080/503 , Y02E10/41
摘要： Common solar radiation receivers are equipped with a chamber for transmission of an operating gas which is directed along to an absorber for solar radiation for thermal absorption. The absorber has a dome-shaped entry window made of quartz glass, wherein the inner side facing the absorber assumes a nominal interior temperature Ti of at least 950° C. during proper use, preferably at least 1000° C., whereas the outer side facing away from the absorber is exposed to the environment and subject to risk of devitrification. The invention relates to modifying the known solar radiation receiver so that a high absorber temperature can be set and thus a high efficiency of the solar thermal heating is enabled, without increasing the risk of devitrification in the region of the outer side of the entry window.
摘要翻译：普通的太阳辐射接收器配备有用于传输工作气体的腔室，该工作气体沿着用于吸收太阳辐射的吸收器而被引导。吸收器具有由石英玻璃制成的圆顶形入口窗，其中面向吸收器的内侧在适当使用期间呈现至少950℃的标称内部温度Ti，优选地至少为1000℃，而外侧面向远离吸收器暴露在环境中并且有失透的危险。本发明涉及修改已知的太阳辐射接收器，从而可以设定高的吸收器温度，从而能够实现太阳能热加热的高效率，而不增加入口窗外侧区域的失透的风险。

10. 发明授权

US08699149B2 Reversing system for a sighting telescope 有权
标题翻译：瞄准望远镜的反转系统
公开(公告)号：US08699149B2
公开(公告)日：2014-04-15
申请号：US13357678
申请日：2012-01-25
申请人： Dieter Hasselbach , Klaus Becker , Ulrich Böde
发明人： Dieter Hasselbach , Klaus Becker , Ulrich Böde
IPC分类号： G02B15/14 , G02B7/02 , G02B23/00
CPC分类号： F41G1/38 , G02B7/10
摘要： Regarding a sighting telescope reversing system which comprises a guide casing fitted with a linear cam slot, further an external casing fitted with an external cam slot and fixed in the axial direction while rotatably supported on the guide casing, a mount holding a lens element and fitted with a guide pin passing through the linear cam slot as well as through the external cam slot, the present invention stipulates that the guide pin be fitted with a first and a second collar, both collars resting on a common shaft, the first collar being displaceable within the external cam slot and the second collar being displaceable within the linear cam slot.
摘要翻译：关于包括装配有直线凸轮槽的引导壳体的瞄准望远镜反转系统，还有一个装配有外部凸轮槽并在轴向方向固定的外壳，同时可旋转地支撑在引导壳体上，安装件保持透镜元件并安装通过引导销通过线性凸轮槽以及通过外部凸轮槽，本发明规定，引导销装配有第一和第二套环，两个套环位于公共轴上，第一套环可移位在外部凸轮槽内并且第二套环可在线性凸轮槽内移动。

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