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1. 发明授权

US08119267B2 Glass substrate for magnetic disk and manufacturing method of the same 有权
标题翻译：磁盘用玻璃基板及其制造方法
公开(公告)号：US08119267B2
公开(公告)日：2012-02-21
申请号：US12665623
申请日：2008-09-26
申请人： Kinobu Osakabe , Hideki Isono , Katsuyuki Iwata , Shinji Eda , Kenichiro Terada
发明人： Kinobu Osakabe , Hideki Isono , Katsuyuki Iwata , Shinji Eda , Kenichiro Terada
IPC分类号： C03C3/078 , G11B5/706 , B23Q3/00
CPC分类号： G11B5/7315 , C03C21/002 , G11B5/8404
摘要： A glass substrate for a magnetic disk of the invention is a disk-shaped glass substrate for a magnetic disk where the substrate has a main surface and end face and is subjected to chemical reinforcement treatment, and is characterized in that the penetration length in the uppermost-portion stress layer on the main surface is 49.1 μm or less, and that assuming that an angle between the main surface and compressive stress in the stress profile by a Babinet compensator method is θ, a value y of {12·t·ln(tan θ)+(49.1/t)} is the penetration length in the uppermost-portion stress layer or less.
摘要翻译：本发明的磁盘用玻璃基板是用于磁盘的盘状玻璃基板，其中基板具有主表面和端面并进行化学强化处理，其特征在于，最上面的穿透长度主表面的应力层为49.1μm以下，假设通过Babinet补偿方法在应力分布中的主表面与压缩应力之间的角度为θ，则{12·t·ln （tan＆amp; t s）+（49.1 / t）}是最上部应力层的贯通长度以下。

2. 发明授权

US08783063B2 Glass substrate for magnetic disk and manufacturing method of the same 有权
标题翻译：磁盘用玻璃基板及其制造方法
公开(公告)号：US08783063B2
公开(公告)日：2014-07-22
申请号：US13349495
申请日：2012-01-12
申请人： Kinobu Osakabe , Hideki Isono , Katsuyuki Iwata , Shinji Eda , Kenichiro Terada
发明人： Kinobu Osakabe , Hideki Isono , Katsuyuki Iwata , Shinji Eda , Kenichiro Terada
IPC分类号： C03B9/14 , B05C3/00 , G11B5/73 , C03C21/00 , G11B17/08
CPC分类号： G11B5/7315 , C03C21/002 , G11B5/8404
摘要： A glass substrate for a magnetic disk of the invention is a disk-shaped glass substrate for a magnetic disk where the substrate has a main surface and end face and is subjected to chemical reinforcement treatment, and is characterized in that the penetration length in the uppermost-portion stress layer on the main surface is 49.1 μm or less, and that assuming that an angle between the main surface and compressive stress in the stress profile by a Babinet compensator method is θ, a value y of {12·t·ln(tan θ)+(49.1/t)} is the penetration length in the uppermost-portion stress layer or less.
摘要翻译：本发明的磁盘用玻璃基板是用于磁盘的盘状玻璃基板，其中基板具有主表面和端面并进行化学强化处理，其特征在于，最上面的穿透长度主表面的应力层为49.1μm以下，假设通过Babinet补偿方法在应力分布中的主表面与压缩应力之间的角度为θ，则{12·t·ln （tan＆amp; t s）+（49.1 / t）}是最上部应力层的贯通长度以下。

3. 发明申请

US20100190038A1 GLASS SUBSTRATE FOR MAGNETIC DISK AND MANUFACTURING METHOD OF THE SAME 有权
标题翻译：用于磁盘的玻璃基板及其制造方法
公开(公告)号：US20100190038A1
公开(公告)日：2010-07-29
申请号：US12665623
申请日：2008-09-26
申请人： Kinobu Osakabe , Hideki Isono , Katsuyuki Iwata , Shinji Eda , Kenichiro Terada
发明人： Kinobu Osakabe , Hideki Isono , Katsuyuki Iwata , Shinji Eda , Kenichiro Terada
IPC分类号： G11B5/73 , B05D1/18 , G11B5/82 , G11B5/84
CPC分类号： G11B5/7315 , C03C21/002 , G11B5/8404
摘要： A glass substrate for a magnetic disk of the invention is a disk-shaped glass substrate for a magnetic disk where the substrate has a main surface and end face and is subjected to chemical reinforcement treatment, and is characterized in that the penetration length in the uppermost-portion stress layer on the main surface is 49.1 μm or less, and that assuming that an angle between the main surface and compressive stress in the stress profile by a Babinet compensator method is θ, a value y of {12·t·ln(tan θ)+(49.1/t)} is the penetration length in the uppermost-portion stress layer or less.
摘要翻译：本发明的磁盘用玻璃基板是用于磁盘的盘状玻璃基板，其中基板具有主表面和端面并进行化学强化处理，其特征在于，最上面的穿透长度主表面的应力层为49.1μm以下，假设通过Babinet补偿方法在应力分布中的主表面与压缩应力之间的角度为θ，则{12·t·ln （tan＆amp; t s）+（49.1 / t）}是最上部应力层的贯通长度以下。

4. 发明授权

US08652660B2 Glass substrate for magnetic recording medium and its use 有权
标题翻译：用于磁记录介质的玻璃基板及其用途
公开(公告)号：US08652660B2
公开(公告)日：2014-02-18
申请号：US13331667
申请日：2011-12-20
申请人： Hideki Isono , Kinobu Osakabe , Katsuyuki Iwata , Mikio Ikenishi , Naomi Matsumoto
发明人： Hideki Isono , Kinobu Osakabe , Katsuyuki Iwata , Mikio Ikenishi , Naomi Matsumoto
IPC分类号： C03C3/00 , G11B5/02 , G11B5/65
CPC分类号： G11B5/7315
摘要： An aspect of the present invention relates to a glass substrate for a magnetic recording medium, which is comprised of glass with a glass transition temperature of equal to or greater than 600° C., an average coefficient of linear expansion at 100 to 300° C. of equal to or greater than 70×10−7/° C., a Young's modulus of equal to or greater than 81 GPa, a specific modulus of elasticity of equal to or greater than 30 MNm/kg, and a fracture toughness value of equal to or greater than 0.9 MPa·m1/2.
摘要翻译：本发明的一个方面涉及一种用于磁记录介质的玻璃基板，其由玻璃化转变温度等于或大于600℃的玻璃组成，在100至300℃的平均线性膨胀系数，等于或大于70×10-7 /℃，杨氏模量等于或大于81GPa，比模弹性等于或大于30MNm / kg，断裂韧性值等于或大于0.9MPa·m1 / 2。

5. 发明授权

US08413464B2 Method for producing glass substrate for magnetic disk and method for producing magnetic disk 有权
标题翻译：制造磁盘用玻璃基板的方法及其制造方法
公开(公告)号：US08413464B2
公开(公告)日：2013-04-09
申请号：US12088815
申请日：2007-09-12
申请人： Katsuyuki Iwata , Hideki Isono , Kenichiro Terada
发明人： Katsuyuki Iwata , Hideki Isono , Kenichiro Terada
IPC分类号： C03C21/00
CPC分类号： G11B5/7315 , C03C17/008 , C03C21/001 , C03C21/002 , C03C21/005 , G11B5/8404
摘要： The present invention provides a method for producing a glass substrate for a magnetic disk in which the occurrence of micro-waviness on the glass substrate is prevented in a cooling step after a chemically strengthening step so that the glass substrate has a significantly smooth principal surface, and provides a method for producing a magnetic disk in which head crash, thermal asperity failures, and the like are prevented, the flying height of a magnetic head can be decreased, and high-density recording is enabled.In a method for producing a glass substrate for a magnetic disk including a chemically strengthening step in which a glass substrate is immersed in a heated chemically strengthening salt solution prepared by dissolving a chemically strengthening salt under heating, and metal ions in the glass substrate are ion-exchanged with metal ions in the chemically strengthening salt, wherein the chemically strengthening step is carried out using a chemically strengthening salt solution in which the dissolved chemically strengthening salt does not solidify until the temperature decreases to a temperature that provides hardness at which the surface shape of the glass substrate is not deformed by a force applied to the glass substrate when the chemically strengthening salt having adhered onto the glass substrate solidifies.
摘要翻译：本发明提供了一种制造用于磁盘的玻璃基板的方法，其中在化学强化步骤之后在冷却步骤中防止在玻璃基板上发生微波纹，使得玻璃基板具有显着平滑的主表面，并且提供了一种制造磁头的方法，其中防止头部碰撞，热凹凸不平等，可以降低磁头的飞行高度，并且能够进行高密度记录。在一种用于制造用于磁盘的玻璃基板的方法中，包括化学强化步骤，其中将玻璃基板浸入通过在加热下溶解化学强化盐而制备的加热的化学强化盐溶液中，并且玻璃基板中的金属离子是离子与化学强化盐中的金属离子交换，其中化学强化步骤使用化学强化盐溶液进行，其中溶解的化学强化盐不固化，直到温度降低到提供硬度的温度，其中表面形状当玻璃基板附着的化学强化盐固化时，玻璃基板的作用力不会施加到玻璃基板上。

6. 发明申请

US20090277222A1 METHOD FOR PRODUCING GLASS SUBSTRATE FOR MAGNETIC DISK AND METHOD FOR PRODUCING MAGNETIC DISK 有权
标题翻译：用于生产用于磁盘的玻璃基板的方法和用于制造磁盘的方法
公开(公告)号：US20090277222A1
公开(公告)日：2009-11-12
申请号：US12088815
申请日：2007-09-12
申请人： Katsuyuki Iwata , Hideki Isono , Kenichiro Terada
发明人： Katsuyuki Iwata , Hideki Isono , Kenichiro Terada
IPC分类号： C03C21/00
CPC分类号： G11B5/7315 , C03C17/008 , C03C21/001 , C03C21/002 , C03C21/005 , G11B5/8404
摘要： The present invention provides a method for producing a glass substrate for a magnetic disk in which the occurrence of micro-waviness on the glass substrate is prevented in a cooling step after a chemically strengthening step so that the glass substrate has a significantly smooth principal surface, and provides a method for producing a magnetic disk in which head crash, thermal asperity failures, and the like are prevented, the flying height of a magnetic head can be decreased, and high-density recording is enabled.In a method for producing a glass substrate for a magnetic disk including a chemically strengthening step in which a glass substrate is immersed in a heated chemically strengthening salt solution prepared by dissolving a chemically strengthening salt under heating, and metal ions in the glass substrate are ion-exchanged with metal ions in the chemically strengthening salt, wherein the chemically strengthening step is carried out using a chemically strengthening salt solution in which the dissolved chemically strengthening salt does not solidify until the temperature decreases to a temperature that provides hardness at which the surface shape of the glass substrate is not deformed by a force applied to the glass substrate when the chemically strengthening salt having adhered onto the glass substrate solidifies.
摘要翻译：本发明提供了一种制造用于磁盘的玻璃基板的方法，其中在化学强化步骤之后在冷却步骤中防止在玻璃基板上发生微波纹，使得玻璃基板具有显着平滑的主表面，并且提供了一种制造磁头的方法，其中防止头部碰撞，热凹凸不平等，可以降低磁头的飞行高度，并且能够进行高密度记录。在一种用于制造用于磁盘的玻璃基板的方法中，包括化学强化步骤，其中将玻璃基板浸入通过在加热下溶解化学强化盐而制备的加热的化学强化盐溶液中，并且玻璃基板中的金属离子是离子与化学强化盐中的金属离子交换，其中化学强化步骤使用化学强化盐溶液进行，其中溶解的化学强化盐不固化，直到温度降低到提供硬度的温度，其中表面形状当玻璃基板附着的化学强化盐固化时，玻璃基板的作用力不会施加到玻璃基板上。

7. 发明申请

US20070003796A1 Method for manufacturing magnetic disk glass substrate and method for manufacturing magnetic disk 审中-公开
标题翻译：制造磁盘玻璃基板的方法和制造磁盘的方法
公开(公告)号：US20070003796A1
公开(公告)日：2007-01-04
申请号：US11445270
申请日：2006-06-02
申请人： Hideki Isono , Katsuyuki Iwata
发明人： Hideki Isono , Katsuyuki Iwata
IPC分类号： C03C15/00 , B05D5/12 , G11B5/66
CPC分类号： C03C21/002 , C03C19/00 , G11B5/7315 , G11B5/8404
摘要： A method for manufacturing a magnetic disk glass substrate including a chemical strengthening step is provided. In the method, chemical strengthening treatment is sufficiently performed over the entire main surfaces of a glass substrate. Consequently, the resulting magnetic disk glass substrate can provide a magnetic disk allowing the magnetic head to have a low flying height and achieving high-density information recording, and particularly a magnetic desk suitably used in small hard disk drives for portable information apparatuses. In the chemical strengthening step, a chemical strengthening agent is brought into contact with a glass substrate to perform ion exchange by allowing the chemical strengthening agent to flow with respect to the glass substrate, or by moving the glass substrate with respect to the chemical strengthening agent.
摘要翻译：提供一种制造包括化学强化步骤的磁盘玻璃基板的方法。在该方法中，在玻璃基板的整个主表面上充分进行化学强化处理。因此，所得到的磁盘玻璃基板可以提供一种允许磁头具有低飞行高度并实现高密度信息记录的磁盘，特别是适合用于便携式信息设备的小型硬盘驱动器中的磁性台。在化学强化工序中，使化学强化剂与玻璃基板接触，通过使化学强化剂相对于玻璃基板流动，或者相对于化学强化剂移动玻璃基板，进行离子交换。

8. 发明授权

US06025596A Method for measuring epitaxial film thickness of multilayer epitaxial wafer 失效
标题翻译：测量多层外延晶片的外延膜厚度的方法
公开(公告)号：US06025596A
公开(公告)日：2000-02-15
申请号：US19049
申请日：1998-02-05
申请人： Hiroshi Shirai , Kenji Akai , Toshio Abe , Chikara Tojima , Katsuyuki Iwata
发明人： Hiroshi Shirai , Kenji Akai , Toshio Abe , Chikara Tojima , Katsuyuki Iwata
IPC分类号： G01B11/06 , H01L21/66 , H01L29/739 , H01L29/78 , G01J5/02
CPC分类号： G01B11/0625
摘要： In a measurement method for measuring the epitaxial film thickness of a multilayer epitaxial wafer, a reflectivity spectrum of a multilayer epitaxial wafer having at least two epitaxial layers of different electric characteristics is measured by using infrared radiation in a far infrared region of at least 500 cm.sup.-1 or less, and frequency-analysis is performed on the reflection spectrum thus obtained by a maximum entropy method, and the film thickness of each epitaxial layer is calculated on the basis of the analysis spectrum thus obtained.
摘要翻译：在用于测量多层外延晶片的外延膜厚度的测量方法中，通过在至少500cm的远红外区域中使用红外辐射来测量具有不同电特性的至少两个外延层的多层外延晶片的反射率光谱 -1以下，对通过最大熵法得到的反射光谱进行频率分析，根据得到的分析光谱计算各外延层的膜厚。

9. 发明授权

US06461428B2 Method and apparatus for controlling rise and fall of temperature in semiconductor substrates 有权
标题翻译：用于控制半导体衬底温度升高和降低的方法和装置
公开(公告)号：US06461428B2
公开(公告)日：2002-10-08
申请号：US09729669
申请日：2000-12-05
申请人： Shyuji Tobashi , Tadashi Ohashi , Katsuyuki Iwata , Hiroyuki Saito , Shinichi Mitani , Takaaki Honda , Hideki Arai , Yoshitaka Murofushi , Kunihiko Suzuki , Hidenori Takahashi , Hideki Ito , Hirofumi Katsumata
发明人： Shyuji Tobashi , Tadashi Ohashi , Katsuyuki Iwata , Hiroyuki Saito , Shinichi Mitani , Takaaki Honda , Hideki Arai , Yoshitaka Murofushi , Kunihiko Suzuki , Hidenori Takahashi , Hideki Ito , Hirofumi Katsumata
IPC分类号： C30B2514
CPC分类号： C23C16/45587 , C23C16/4584 , C23C16/46 , C23C16/52 , C30B25/12 , C30B25/16 , C30B31/14 , C30B31/18
摘要： A method of controlling the temperature of a semiconductor substrate for prevention of any cracks from being formed in the semiconductor substrate event though semiconductors having different temperature rise/fall characteristics are fed into a reactor in which each semiconductor substrates is subjected to an oxidation, diffusion, or a chemical vapor deposition process. The temperatures are measured at various points in the semiconductor substrates in the heated reactor; the temperature rise/fall characteristic thereof is determined by computing the rate of temperature rise and the in-plane temperature distribution out of the measured values; a temperature control program adaptable for said temperature rise/fall characteristic is automatically selected out of a plurality of temperature control programs written in advance; the semiconductor substrate is controlled on the basis of the selected temperature control program. Also is provided a susceptor to reduce contamination of the semiconductor substrate with the metal impurities containing gas flow at the time of forming a thin film on the semiconductor substrate, and a gas phase thin film growth apparatus using such susceptor. The susceptor is formed with a gas flow deflector jutting downwardly from the peripheral portion of the reverse side of the susceptor to deflect the gas flow moving upon rotation along the reverse side of the susceptor from the center thereof to the peripheral portion thereof.
摘要翻译：控制半导体基板的温度的方法，即使在具有不同温度上升/下降特性的半导体的半导体衬底的事件中，也可以将半导体衬底的各个半导体衬底进行氧化，扩散，或化学气相沉积工艺。在加热的反应器中的半导体衬底中的各个点测量温度; 其温度上升/下降特性通过计算测量值中的温度升高速率和面内温度分布来确定; 可以从预先书写的多个温度控制程序中自动选择适合于所述温度上升/下降特性的温度控制程序; 基于所选择的温度控制程序来控制半导体衬底。还提供了一种感受器，用于在半导体衬底上形成薄膜时减少含有气体流的金属杂质的半导体衬底的污染，以及使用这种感受体的气相薄膜生长装置。基座形成有从基座的相反侧的周边部分向下突出的气流导流器，以使沿基座的相反侧旋转的气流从其中心偏转到其周边部分。

10. 发明授权

US06485573B2 Apparatus for reduced-pressure epitaxial growth and method of controlling the apparatus 有权
标题翻译：减压外延生长装置及其控制方法
公开(公告)号：US06485573B2
公开(公告)日：2002-11-26
申请号：US09855654
申请日：2001-05-16
申请人： Katsuyuki Iwata , Tadashi Ohashi , Shyuji Tobashi , Shinichi Mitani , Hideki Arai , Hideki Ito
发明人： Katsuyuki Iwata , Tadashi Ohashi , Shyuji Tobashi , Shinichi Mitani , Hideki Arai , Hideki Ito
IPC分类号： C23C1600
CPC分类号： C23C16/45521 , C23C16/45557 , C23C16/4584 , C23C16/52 , C30B25/12 , C30B25/14
摘要： An apparatus for reduced-pressure gaseous phase epitaxial growth by suppressing contamination upon the machine parts constituting the rotary mechanical portion and suppressing contamination upon the semiconductor wafer by maintaining the pressure in the rotary mechanical portion to lie within a particular range, and a method of controlling the above apparatus. The apparatus comprises a purging gas introduction pipe 6 for purging the interior of the rotary mechanical portion, a purging gas exhaust pipe 7 for exhausting the gas introduced through the purging gas introduction pipe, a pressure adjusting valve 41 provided in the purging gas exhaust pipe, a pressure gauge 21 for detecting the pressure in the rotary mechanical portion, and an arithmetic/control unit 31 for executing an arithmetic operation based upon the detected pressure and for controlling the opening degree of the pressure adjusting valve 41 provided in the purging gas exhaust pipe, so that the pressure in the rotary mechanical portion assumes a proper value.
摘要翻译：一种通过抑制构成旋转机械部分的机器部件上的污染并通过将旋转机械部分中的压力维持在特定范围内来抑制半导体晶片上的污染物的减压气相外延生长装置，以及控制方法上述装置。该装置包括用于清洗旋转机械部分内部的净化气体引入管6，用于排出通过吹扫气体导入管引入的气体的净化气体排出管7，设置在净化气体排出管中的压力调节阀41，用于检测旋转机械部分中的压力的压力计21以及用于基于检测到的压力执行算术运算并且用于控制设置在净化气体排出管中的压力调节阀41的开度的运算/控制单元31 ，使得旋转机械部分中的压力呈现适当的值。

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