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    • 1. 发明授权
    • Multiplexer controlling absorption of delay fluctuation on individual transmission path
    • 多路复用器控制单个传输路径上延迟波动的吸收
    • US06928079B2
    • 2005-08-09
    • US09803790
    • 2001-03-12
    • Kimihide OnoHideki Mori
    • Kimihide OnoHideki Mori
    • H04L12/885H04L12/951H04Q11/04H04J3/06
    • H04L49/254H04J2203/0076H04J2203/0089H04L49/206H04L49/30H04L49/3009H04L2012/5649H04L2012/5671
    • A multiplexer is provided for making data into a plurality of cells and then for transmitting the plurality of cells through a cell transmission path. The multiplexer includes a first delay-fluctuation adding unit adding a first maximum value of delay fluctuation occurring when the multiplexer transmits the cell, to a predetermined area of the cell; a second delay-fluctuation adding unit adding a second maximum value of delay fluctuation occurring when the multiplexer reproduces the data from the cell, to the predetermined area; a storage unit storing the data; and a data-read control unit controlling reading the data stored in the storage unit by following a maximum value of delay fluctuation stored in the predetermined area. Accordingly, the multiplexer can control absorption of the delay fluctuation individually for each cell transmission path.
    • 提供多路复用器用于将数据制成多个单元,然后用于通过单元传输路径发送多个单元。 多路复用器包括:第一延迟波动加法单元,将多路复用器发送单元发生的延迟波动的第一最大值加到单元的预定区域; 第二延迟波动加法单元,将当多路复用器从单元再现数据时发生的延迟波动的第二最大值加到预定区域; 存储所述数据的存储单元; 以及数据读取控制单元,通过跟随存储在预定区域中的延迟波动的最大值来控制存储在存储单元中的数据。 因此,多路复用器可以分别控制每个单元传输路径的延迟波动的吸收。
    • 2. 发明授权
    • Image forming apparatus having transfer belt spacing mechanism
    • 具有转印带间隔机构的图像形成装置
    • US08463161B2
    • 2013-06-11
    • US13036284
    • 2011-02-28
    • Hideki Mori
    • Hideki Mori
    • G03G15/08
    • G03G15/1605G03G21/1623G03G21/168G03G2221/1642
    • An image forming apparatus includes an image bearing member; a belt unit which is rotatable in contact with the image bearing member and which is capable of being drawn out of a main assembly of the image forming apparatus; a cam member for switching a position of the belt member relative to the image bearing member; a motor for rotating the cam member; a controller for controlling the motor to contact and space the belt member relative to the image bearing member; a lever movable between a first position in which the belt member is fixed to the main assembly of the image forming apparatus and a second position in which the belt member is capable of being drawn out of the main assembly of the image forming apparatus; and a spacing mechanism for spacing the belt member from the image bearing member by converting movement of the lever from the first position to the second position to a rotation of the cam member, when the belt member is contacted to the image bearing member.
    • 图像形成装置包括:图像承载部件; 带单元,其能够与图像承载构件接触地旋转并且能够从图像形成装置的主组件中拉出; 凸轮构件,用于切换带构件相对于图像承载构件的位置; 用于使所述凸轮构件旋转的马达; 控制器,用于控制马达相对于图像承载部件接触和间隔皮带部件; 可在第一位置和第二位置之间移动的杆,其中,所述带构件固定到所述图像形成装置的主组件,在所述第二位置,所述带构件能够从所述图像形成装置的主组件引出; 以及间隔机构,用于当带构件与图像承载构件接触时,通过将杠杆的运动从第一位置转移到第二位置,使带构件与图像承载构件间隔开。
    • 4. 发明申请
    • INSPECTION DEVICE FOR DISK-SHAPED SUBSTRATE
    • 用于盘形基板的检查装置
    • US20100246934A1
    • 2010-09-30
    • US12738760
    • 2008-10-22
    • Yoshinori HayashiHiroshi WakabaYoko OnoKoichi MiyazonoHideki Mori
    • Yoshinori HayashiHiroshi WakabaYoko OnoKoichi MiyazonoHideki Mori
    • G06K9/00
    • H01L22/20G01N21/9503H01L22/12
    • An inspection apparatus of a disk-shaped substrate able to precisely quantitatively inspect positions of formation of film layers formed on the surface of a disk-shaped substrate is provided, that is, an inspection apparatus of a disk-shaped substrate on which film layers are formed designed to generate captured image data expressing a captured image corresponding to a field of view based on image signals successively output from an image capturing unit capturing an image of a predetermined surface at an outer circumference part of the disk-shaped substrate and to generate film layer edge position information Y4E24 (θ) expressing longitudinal direction positions at corresponding positions (θ) along the circumferential direction of an edge line E24 of a film layer image part ISa (24) corresponding to the film layer 24 on the surface image ISa with reference to, from the captured image data, longitudinal direction positions YE15aL (θ) at the different positions (θ) along the circumferential direction of a boundary line E15a between a surface image part ISa corresponding to the predetermined surface on the captured image and its outer image part IBKL.
    • 提供了能够精确地定量检查形成在盘状基板的表面上的膜层的形成位置的盘状基板的检查装置,即,其中膜层为 被形成为基于从在盘状基板的外周部分捕获预定表面的图像的图像捕获单元连续输出的图像信号生成表示与视场相对应的拍摄图像的拍摄图像数据,并且生成胶片 沿着与表面图像ISa上的薄膜层24相对应的薄膜层图像部分ISa(24)的边缘线E24的圆周方向的相应位置(&θ)表示纵向位置的层边缘位置信息Y4E24(& 参考来自拍摄图像数据的不同位置处的纵向位置YE15aL(& tas)沿着与捕获图像上的预定表面相对应的表面图像部分ISa与其外部图像部分IBKL之间的边界线E15a的圆周方向。
    • 5. 发明申请
    • DISC WAFER INSPECTING DEVICE AND INSPECTING METHOD
    • 光盘检测设备和检查方法
    • US20100177953A1
    • 2010-07-15
    • US12376469
    • 2007-08-09
    • Yoshinori HayashiTakeki KogawaHideki MoriAkimasa Hori
    • Yoshinori HayashiTakeki KogawaHideki MoriAkimasa Hori
    • G06K9/00
    • G01B11/08G01B11/24G01N21/9503G01R31/311
    • [Problem] An inspecting device and an inspecting method enabling better precision inspection for a processing region formed on a surface of a semiconductor wafer or other disc wafer are provided.[Means for Solution] The inspecting device is configured having image capturing means 130a, 130b for capturing an image of an outer edge and its neighboring region of a rotating wafer 10, wafer outer edge position measuring means 200 for measuring the radial direction position of the outer edge at each of the plurality of rotational angle positions θn of the wafer 10 based on the images obtained by the image capturing means 130a, 130b, an edge-to-edge distance measuring means 200 for measuring the edge-to-edge distance Bθn, between the outer edge of the wafer 10 and the edge of an insulating film 11 at each of the plurality of rotational angle positions θn based on the images obtained by the image capturing means 130a, and an inspection information generating means 200 for generating predetermined inspection information based on the radial direction position Aθn of the outer edge of the wafer 10 and the edge-to-edge distance Bθn.
    • [问题]提供一种检查装置和对形成在半导体晶片或其他盘晶片的表面上的处理区域进行更好的精密检查的检查方法。 [解决方案]检查装置配置有用于捕获旋转晶片10的外边缘及其相邻区域的图像的图像捕获装置130a,130b,用于测量旋转晶片10的径向位置的晶片外边缘位置测量装置200 基于由图像捕获装置130a,130b获得的图像的晶片10的多个旋转角度位置& t的每一个的外边缘; n边缘到边缘距离测量装置200,用于测量边缘到边缘 距离B& N; n,基于由图像捕获装置130a获得的图像,在多个旋转角度位置& tt中的每一个的晶片10的外边缘和绝缘膜11的边缘之间; n, n是根据晶片10的外边缘的径向位置A和距离n以及边缘到边缘距离B的关系产生预定检查信息的装置; n。
    • 6. 发明申请
    • SURFACE INSPECTION APPARATUS
    • 表面检查装置
    • US20100066998A1
    • 2010-03-18
    • US12595699
    • 2008-04-25
    • Yoshinori HayashiMasao KawamuraHideki Mori
    • Yoshinori HayashiMasao KawamuraHideki Mori
    • G01N21/00
    • G01N21/9503
    • [Problem] To provide a surface inspection apparatus able to suitably inspect the outer circumference edge part of a semiconductor wafer or other plate-shaped member.[Technical Solution] A semiconductor wafer inspection apparatus 10 has a camera lens 22 arranged facing an outer circumference edge part 101 of a semiconductor wafer 100, an imaging surface 24 arranged facing an outer circumference end face of a semiconductor wafer 100 via the camera lens 22, a mirror 12 forming an image of a first outer circumference bevel surface 101b of the semiconductor wafer 100 on the imaging surface 24 via the camera lens 22, a mirror 14 forming an image of a second outer circumference bevel surface 101c of the semiconductor wafer 100 on the imaging surface 24 via the camera lens 22, a correction lens 26 forming an image of an outer circumference end face 101a of the semiconductor wafer 100 on the imaging surface 24 via the center part of the camera lens 22, and an illumination light guide lamp part 18 illuminating surfaces so that, compared with the outer circumference end face 101a, the first outer circumference bevel surface 101b and second outer circumference bevel surface 101c become brighter.
    • [问题]提供一种能够适当地检查半导体晶片或其他板状部件的外周缘部的表面检查装置。 技术方案半导体晶片检查装置10具有面向半导体晶片100的外周缘部101配置的摄像透镜22,经由照相机镜头22配置成与半导体晶片100的外周端面相对配置的摄像面24 ,通过照相机镜头22在成像面24上形成半导体晶片100的第一外周斜面101b的图像的反射镜12,形成半导体晶片100的第二外周斜面101c的图像的反射镜 通过照相机镜头22在成像表面24上,通过照相机镜头22的中心部分在成像表面24上形成半导体晶片100的外周端面101a的图像的校正透镜26和照明光导 灯部18照射表面,使得与外周端面101a相比,第一外周斜面101b和第二外圆周面 斜面101c变得更亮。
    • 7. 发明申请
    • Surface Roughness Inspection System
    • 表面粗糙度检测系统
    • US20090177415A1
    • 2009-07-09
    • US12086081
    • 2006-12-05
    • Yoshinori HayashiHideki Mori
    • Yoshinori HayashiHideki Mori
    • G01B11/30
    • G01B11/303G01N21/9501
    • [Problem] To provide a surface roughness inspection system enabling suitable inspection even when the surface of the object being inspected is curved.[Means for Solution] A system having an imaging unit 20 having a line sensor 22 and scanning the surface of an object being inspected 101 in a direction perpendicular to the direction of extension of the line sensor 22 and outputting a density signal for each pixel from the line sensor 22 and a processing unit 50 processing the density signal from the line sensor 22 of the imaging unit 20, the processing unit 50 having a means for acquiring a pixel density value based on a density signal from the line sensor 22 (S2) and a density state generating means for generating a density state information Pf showing the density state in the scan direction of the object surface based on all of the pixel density values acquired for the object surface 101 being inspected (S7).
    • [问题]提供一种表面粗糙度检查系统,即使被检查物体的表面弯曲,也能够进行适当的检查。 [解决方案]具有成像单元20的系统具有线传感器22,并且在垂直于线传感器22的延伸方向的方向上扫描被检查物体101的表面,并输出每个像素的浓度信号 线传感器22和处理单元50处理来自成像单元20的线传感器22的浓度信号,处理单元50具有用于基于来自线传感器22的密度信号获取像素密度值的装置(S2) 密度状态产生装置,用于基于对被检测物体表面101获得的所有像素密度值,生成表示物体表面的扫描方向上的浓度状态的浓度状态信息Pf(S7)。
    • 10. 发明授权
    • Semiconductor device and manufacturing method thereof
    • 半导体装置及其制造方法
    • US07122861B2
    • 2006-10-17
    • US11086174
    • 2005-03-22
    • Hideki Mori
    • Hideki Mori
    • H01L29/76H01L21/336
    • H01L29/7816H01L29/0638H01L29/0878H01L29/0882H01L29/0886H01L29/1095H01L29/456H01L29/66681
    • The present invention relates to a semiconductor device including a high withstand voltage MOS transistor and a manufacturing method thereof. The semiconductor device according to the present invention includes a MOS transistor in which a second-conductivity type source region is formed on a first-conductivity type semiconductor region, an offset drain region is interconnected to a second-conductivity type drain region and has a concentration lower than an impurity concentration of a drain region, the offset drain region is composed of a portion that does not overlap a first-conductivity type semiconductor region and a portion that overlaps part of the surface of the first-conductivity type semiconductor region and a gate electrode is formed on the surface extending from a channel region between the source region and the offset drain region to part of the offset drain region through a gate insulating film.Thus, there can be obtained an offset drain type MOS transistor having a stable threshold voltage Vth and a low ON-state resistance.
    • 本发明涉及一种包括高耐压MOS晶体管的半导体器件及其制造方法。 根据本发明的半导体器件包括MOS晶体管,其中在第一导电型半导体区域上形成第二导电型源极区,偏移漏极区域与第二导电型漏极区域互连,并且具有浓度 低于漏极区域的杂质浓度的情况下,偏移漏极区域由不与第一导电型半导体区域重叠的部分和与第一导电型半导体区域的表面的一部分重叠的部分构成, 电极形成在通过栅极绝缘膜从源极区域和偏移漏极区域之间的沟道区域延伸到偏移漏极区域的一部分的表面上。 因此,可以获得具有稳定阈值电压Vth和低导通电阻的偏移漏极型MOS晶体管。