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    • 2. 发明授权
    • Display device and manufacturing method thereof
    • 显示装置及其制造方法
    • US08174015B2
    • 2012-05-08
    • US12761958
    • 2010-04-16
    • Ki-Hun JeongByeong-Hoon ChoJung-Suk BangSang-Youn HanWoong-Kwon KimSung-Hoon YangSuk Won JungDae-Cheol KimKyung-Sook JeonSeung Mi Seo
    • Ki-Hun JeongByeong-Hoon ChoJung-Suk BangSang-Youn HanWoong-Kwon KimSung-Hoon YangSuk Won JungDae-Cheol KimKyung-Sook JeonSeung Mi Seo
    • H01L29/04
    • G06F3/0421G06F3/0412H01L27/1251H01L27/323
    • A display device includes a lower panel including a lower substrate and a pixel transistor formed on the lower substrate; and an upper panel facing the lower panel, and including an upper substrate, a sensing transistor formed on the upper substrate, and a readout transistor connected to the sensing transistor and transmitting a signal. The readout transistor includes a first lower gate electrode formed on the upper substrate, a first semiconductor layer formed on the first lower gate electrode and overlaps the first gate electrode, and a first source electrode and a first drain electrode disposed on the first semiconductor layer. The sensing transistor includes a light blocking film disposed on the upper substrate, a second lower gate electrode contacting the light blocking film on the light blocking film, a second semiconductor layer overlapping the light blocking film on the second lower gate electrode, a second source electrode and a second drain electrode formed on the second semiconductor layer, and a second upper gate electrode overlapping the second semiconductor layer on the second source electrode and the second drain electrode.
    • 显示装置包括:下面板,包括下基板和形成在下基板上的像素晶体管; 以及面向下面板的上面板,并且包括上基板,形成在上基板上的检测晶体管,以及连接到感测晶体管并传输信号的读出晶体管。 读出晶体管包括形成在上基板上的第一下栅极电极,形成在第一下栅电极上并与第一栅电极重叠的第一半导体层,以及设置在第一半导体层上的第一源电极和第一漏电极。 感测晶体管包括设置在上基板上的遮光膜,与遮光膜接触的第二下栅电极,与第二下栅电极上的遮光膜重叠的第二半导体层,第二源电极 以及形成在第二半导体层上的第二漏电极和与第二源电极和第二漏电极上的第二半导体层重叠的第二上栅电极。
    • 7. 发明授权
    • Display device and manufacturing method thereof
    • 显示装置及其制造方法
    • US09128563B2
    • 2015-09-08
    • US13366683
    • 2012-02-06
    • Suk Won JungSung Hoon YangSang-Youn HanSeung Mi SeoMi-Seon Seo
    • Suk Won JungSung Hoon YangSang-Youn HanSeung Mi SeoMi-Seon Seo
    • H01L29/04H01L29/10H01L31/00G06F3/042G06F3/041G02F1/1333
    • G06F3/042G02F1/13338G06F3/0412
    • A display device includes: a substrate; an infrared sensing transistor on the substrate; a readout transistor connected to the infrared sensing transistor; a power source line; and a light blocking member on the infrared sensing transistor, where the infrared sensing transistor includes a light blocking film on the substrate, a first gate electrode contacting and overlapping the light blocking film and connected to a power source line, a first semiconductor layer on the first gate electrode overlapping the light blocking film, and first source and drain electrodes on the first semiconductor layer, where the readout transistor includes a second gate electrode on the substrate, a second semiconductor layer on the second gate electrode and overlapping the second gate electrode, and second source and drain electrodes the second semiconductor layer, and where the power source line and the first gate electrode are at a same layer.
    • 显示装置包括:基板; 基板上的红外感测晶体管; 连接到红外感测晶体管的读出晶体管; 电源线; 以及所述红外感测晶体管上的遮光构件,其中所述红外感测晶体管在所述基板上包括遮光膜,与所述遮光膜接触并重叠并连接到电源线的第一栅电极, 与遮光膜重叠的第一栅电极以及第一半导体层上的第一源电极和漏电极,其中所述读出晶体管在所述衬底上包括第二栅电极,所述第二栅电极上的第二半导体层与所述第二栅电极重叠, 以及第二源极和漏极,第二半导体层,以及其中电源线和第一栅电极处于同一层。
    • 10. 发明授权
    • Method of forming inductor in semiconductor device
    • 在半导体器件中形成电感器的方法
    • US07452806B2
    • 2008-11-18
    • US11882047
    • 2007-07-30
    • Sang Il HwangSuk Won Jung
    • Sang Il HwangSuk Won Jung
    • H01L21/4763
    • H01L21/31144H01L21/02063H01L21/7681H01L21/76814H01L23/5227H01L28/10H01L2924/0002H01L2924/00
    • Disclosed herein is a method of forming an inductor in a semiconductor device, the method including forming an etching-prevention film, a first interlayer insulating film, and a first hard mask film over a silicon semiconductor substrate in this sequence; selectively etching the first hard mask film to form a hole; forming a second interlayer insulating film over the first hard mask film; forming a second hard mask film over the second interlayer insulating film; forming a photoresist pattern having a trench forming opening over the second hard mask film; removing a part of the second hard mask film and a part of the second interlayer insulating film by using the photoresist pattern as an etching mask, to form a first trench in the second interlayer insulating film; removing the photoresist pattern and polymers produced in the first trench by ashing and cleaning process; etching the second interlayer insulating film by using the second hard mask film as an etching mask until the first hard mask film is exposed to form a second trench in the second interlayer insulating film, and subsequently, etching the first interlayer insulating film by using both the first hard mask film and the second hard mask film as etching masks until the etching-prevention film is exposed, to form a hole in the first interlayer insulating film; and removing polymers produced in the second trench and the second hole by ashing and cleaning processes.
    • 这里公开了一种在半导体器件中形成电感器的方法,该方法包括以下顺序在硅半导体衬底上形成防蚀膜,第一层间绝缘膜和第一硬掩模膜; 选择性地蚀刻第一硬掩模膜以形成孔; 在所述第一硬掩模膜上形成第二层间绝缘膜; 在所述第二层间绝缘膜上形成第二硬掩模膜; 在所述第二硬掩模膜上形成具有沟槽形成开口的光致抗蚀剂图案; 通过使用光致抗蚀剂图案作为蚀刻掩模去除第二硬掩模膜的一部分和第二层间绝缘膜的一部分,以在第二层间绝缘膜中形成第一沟槽; 通过灰化和清洁过程去除在第一沟槽中产生的光致抗蚀剂图案和聚合物; 通过使用第二硬掩模膜作为蚀刻掩模蚀刻第二层间绝缘膜,直到第一硬掩模膜暴露以在第二层间绝缘膜中形成第二沟槽,并且随后使用两者来蚀刻第一层间绝缘膜 第一硬掩模膜和第二硬掩模膜作为蚀刻掩模,直到防蚀膜暴露,以在第一层间绝缘膜中形成孔; 以及通过灰化和清洁方法去除在第二沟槽和第二孔中产生的聚合物。