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1. 发明授权

US6016241A Magnetoresistive sensor utilizing a granular magnetoresistive layer 失效
标题翻译：利用粒状磁阻层的磁阻传感器
公开(公告)号：US6016241A
公开(公告)日：2000-01-18
申请号：US445479
申请日：1995-05-22
申请人： Kevin Robert Coffey , James Kent Howard , Todd Lanier Hylton , Michael Andrew Parker
发明人： Kevin Robert Coffey , James Kent Howard , Todd Lanier Hylton , Michael Andrew Parker
IPC分类号： C23C14/14 , G01R33/09 , G11B5/39 , H01F10/00 , H01F10/32 , H01L43/08 , H01L43/10
CPC分类号： B82Y25/00 , B82Y10/00 , G01R33/09 , G01R33/093 , G11B5/3903 , H01F10/007 , H01F10/3231 , H01L43/10 , G11B2005/3996
摘要： A heterogeneous thin film structure including a discontinuous layer of ferromagnetic material deposited on an insulating substrate and overcoated with a layer of nonmagnetic electrically conductive material exhibits giant magnetoresistance in saturation fields on the order of 350 Oersteds. A layer of ferromagnetic material is deposited on a heated insulating substrate by high vacuum evaporation techniques to form a layer of isolated ferromagnetic particles and overcoated with a nonmagnetic conductive material to form a plurality of ferromagnetic particles embedded in a nonmagnetic conductive matrix. As the ferromagnetic and nonmagnetic materials are deposited separately, it is not required that the two materials be immiscible and subsequent annealing is not required to induce phase separation.
摘要翻译：包括沉积在绝缘衬底上并用非磁性导电材料层涂覆的铁磁材料不连续层的异质薄膜结构在350奥斯特数量级的饱和场中表现出巨大的磁阻。通过高真空蒸发技术将一层铁磁材料沉积在加热的绝缘基板上，以形成隔离的铁磁颗粒层，并用非磁性导电材料涂覆以形成嵌入在非磁性导电基体中的多个铁磁性颗粒。由于铁磁和非磁性材料分开沉积，所以不要求两种材料是不混溶的，并且不需要随后的退火以诱导相分离。

2. 发明授权

US06679976B2 System and method for performing sputter deposition with multiple targets using independent ion and electron sources and independent target biasing with DC pulse signals 有权
标题翻译：使用独立离子和电子源执行多个靶的溅射沉积的系统和方法以及具有DC脉冲信号的独立目标偏置
公开(公告)号：US06679976B2
公开(公告)日：2004-01-20
申请号：US10137897
申请日：2002-05-02
申请人： David Alan Baldwin , Todd Lanier Hylton
发明人： David Alan Baldwin , Todd Lanier Hylton
IPC分类号： C23C1434
CPC分类号： H01J37/3233 , C23C14/46 , C23C14/54 , H01J37/3178 , H01J37/34
摘要： A system and method for performing sputter deposition includes at least one ion source that generates at least one ion current directed at first and second targets, at least one electron source that generates at least one electron current directed at the first and second targets, and circuitry that biases the first and second targets with independent first and second DC voltage pulse signals. A first current sensor, coupled to the biasing circuitry, monitors a positive current and a negative current from the first target during one or more cycles of the first DC voltage pulse signal, and a second current sensor, coupled to the biasing circuitry, monitors a positive current and a negative current from the second target during one or more cycles of the second DC voltage pulse signal. A controller, coupled to the first and second current sensors, varies the at least one ion current independently from the at least one electron current.
摘要翻译：用于执行溅射沉积的系统和方法包括至少一个离子源，其产生指向第一和第二靶的至少一个离子电流，至少一个电子源，其产生指向第一和第二靶的至少一个电子电流，以及电路它利用独立的第一和第二直流电压脉冲信号偏置第一和第二目标。耦合到偏置电路的第一电流传感器在第一DC电压脉冲信号的一个或多个周期期间监测来自第一目标的正电流和负电流，并且耦合到偏置电路的第二电流传感器监视一个在第二DC电压脉冲信号的一个或多个周期期间来自第二目标的正电流和负电流。耦合到第一和第二电流传感器的控制器独立于至少一个电子电流改变至少一个离子电流。

3. 发明授权

US06419802B1 System and method for controlling deposition thickness by synchronously varying a sputtering rate of a target with respect to a position of a rotating substrate 有权
标题翻译：通过相对于旋转基板的位置同步改变靶的溅射速度来控制沉积厚度的系统和方法
公开(公告)号：US06419802B1
公开(公告)日：2002-07-16
申请号：US09810720
申请日：2001-03-16
申请人： David Alan Baldwin , Todd Lanier Hylton
发明人： David Alan Baldwin , Todd Lanier Hylton
IPC分类号： C23C1434
CPC分类号： C23C14/225 , C23C14/34 , C23C14/547
摘要： A system and method for controlling a circumferential deposition thickness distribution on a substrate includes a motor that rotates the substrate and a position sensor that senses a position of the substrate. At least one deposition thickness sensor senses the deposition thickness of the substrate at multiple positions on a circumference of a circle centered about an axis of rotation of the substrate. At least one controller drives a vapor source used to emit material for a deposition on a substrate. The at least one controller is coupled to the position sensor and the deposition thickness sensor. The controller synchronously varies an emission rate of material from the vapor source with respect to the position of the substrate to control the circumferential deposition thickness distribution.
摘要翻译：用于控制基板上的圆周沉积厚度分布的系统和方法包括使基板旋转的马达和感测基板的位置的位置传感器。至少一个沉积厚度传感器感测基板围绕基板的旋转轴线的圆周的多个位置处的沉积厚度。至少一个控制器驱动用于在衬底上沉积的材料的蒸气源。至少一个控制器耦合到位置传感器和沉积厚度传感器。控制器相对于基板的位置同步地改变来自蒸气源的材料的排放速率，以控制圆周沉积厚度分布。

4. 发明授权

US07316764B2 System and method for performing sputter etching using independent ion and electron sources and a substrate biased with an a-symmetric bi-polar DC pulse signal 失效
标题翻译：使用独立离子和电子源进行溅射蚀刻的系统和方法以及用对称双极性DC脉冲信号偏置的衬底
公开(公告)号：US07316764B2
公开(公告)日：2008-01-08
申请号：US10812409
申请日：2004-03-29
申请人： David Alan Baldwin , Todd Lanier Hylton
发明人： David Alan Baldwin , Todd Lanier Hylton
IPC分类号： C23C14/35
CPC分类号： C23C14/46 , C23C14/54 , H01J37/3178 , H01J37/3233 , H01J37/34
摘要： A system and method for performing sputter etching includes an ion source that generates an ion current that is directed at a substrate and an electron source that generates an electron current directed at the substrate. Biasing circuitry biases the substrate with an a-symmetric bi-polar DC voltage pulse signal. The biasing circuitry is formed from a positive voltage source with respect to ground, a negative voltage source with respect to ground and a high frequency switch. At least one current sensor, coupled to the biasing circuitry, monitors a positive current and a negative current from the substrate during one or more cycles of the a-symmetric bi-polar DC voltage pulse signal. A control system, coupled to the at least one current sensor, varies the ion current independently from the electron current. The ion and electron sources create a continuous plasma that is proximate the substrate and the biasing circuitry causes the substrate to alternatively attract ions and electrons from the plasma. The ions attracted from the plasma sputter etch the substrate. The electrons attracted from the plasma neutralize accumulated charge on the substrate.
摘要翻译：用于执行溅射蚀刻的系统和方法包括产生针对衬底的离子电流的离子源和产生指向衬底的电子电流的电子源。偏置电路利用对称双极直流电压脉冲信号来偏置衬底。偏置电路由相对于地的正电压源，相对于地的负电压源和高频开关形成。耦合到偏置电路的至少一个电流传感器在a对称双极性DC电压脉冲信号的一个或多个周期期间监测来自衬底的正电流和负电流。耦合到至少一个电流传感器的控制系统独立于电子电流改变离子电流。离子和电子源产生邻近衬底的连续等离子体，并且偏置电路使衬底交替地从等离子体吸引离子和电子。从等离子体溅射吸引的离子蚀刻衬底。从等离子吸引的电子可以中和基板上的累积电荷。

5. 发明授权

US06723209B2 System and method for performing thin film deposition or chemical treatment using an energetic flux of neutral reactive molecular fragments, atoms or radicals 有权
标题翻译：使用中性反应性分子片段，原子或自由基的能量通量进行薄膜沉积或化学处理的系统和方法
公开(公告)号：US06723209B2
公开(公告)日：2004-04-20
申请号：US10200578
申请日：2002-07-22
申请人： David Alan Baldwin , Todd Lanier Hylton
发明人： David Alan Baldwin , Todd Lanier Hylton
IPC分类号： C23C1434
CPC分类号： H01J37/3233 , C23C14/46 , C23C14/54 , H01J37/3178 , H01J37/34
摘要： A system and method for forming a chemically reacted layer proximate an exposed surface of a substrate is disclosed. A gas supply provides a chemically reactive molecular gas to an ion source that generates a divergent ion current directed at a target. The ion current contains at least one species of chemically reactive molecular ion, and the target is disposed in a chamber having a partial vacuum. A voltage source applies a bias to the target such that chemically reactive molecular ions from the ion source are accelerated toward the target with sufficient kinetic energy to dissociate at least some of the chemically reactive molecular ions by collision with the surface of the target.
摘要翻译：公开了一种在衬底的暴露表面附近形成化学反应层的系统和方法。气体供应为离子源提供化学反应性分子气体，其产生指向靶的发散离子电流。离子电流包含至少一种化学反应性分子离子，并且靶被设置在具有部分真空的室中。电压源向靶施加偏压，使得来自离子源的化学反应性分子离子以足够的动能朝向靶加速，以通过与靶的表面碰撞来解离至少一些化学反应性分子离子。

6. 发明授权

US06402904B1 System and method for performing sputter deposition using independent ion and electron sources and a target biased with an a-symmetric bi-polar DC pulse signal 有权
标题翻译：使用独立的离子和电子源进行溅射沉积的系统和方法以及用对称双极直流脉冲信号偏置的目标
公开(公告)号：US06402904B1
公开(公告)日：2002-06-11
申请号：US09810687
申请日：2001-03-16
申请人： David Alan Baldwin , Todd Lanier Hylton
发明人： David Alan Baldwin , Todd Lanier Hylton
IPC分类号： C23C1434
CPC分类号： H01J37/3233 , C23C14/46 , C23C14/54 , H01J37/34
摘要： A system and method for performing sputter deposition on a substrate include ion and electron sources that generate ion and electron currents directed at a target. Biasing circuitry biases the target with an a-symmetric bi-polar DC voltage pulse signal. The biasing circuitry is formed from positive and negative voltage sources and a high frequency switch. A current sensor, coupled to the biasing circuitry, monitors positive and negative currents from the target. A control system, coupled to the current sensor, varies the ion and electron currents independently. The ion and electron sources create a continuos plasma that is proximate the target. Ions attracted from the plasma sputter the target, and material from the target is deposited on the substrate. Electrons attracted from the plasma neutralize accumulated charge on the target.
摘要翻译：用于在衬底上进行溅射沉积的系统和方法包括产生指向靶的离子和电子电流的离子和电子源。偏置电路用对称双极直流电压脉冲信号偏压目标。偏置电路由正，负电压源和高频开关构成。耦合到偏置电路的电流传感器监测来自目标的正和负电流。耦合到电流传感器的控制系统独立地改变离子和电子电流。离子和电子源产生接近目标的连续等离子体。从等离子体吸引的离子溅射靶，并且来自靶的材料沉积在基底上。从等离子体吸引的电子中和目标上的累积电荷。

7. 发明授权

US06402901B1 System and method for performing sputter deposition using a spherical geometry 有权
标题翻译：使用球形几何进行溅射沉积的系统和方法
公开(公告)号：US06402901B1
公开(公告)日：2002-06-11
申请号：US09810809
申请日：2001-03-16
申请人： David Alan Baldwin , Todd Lanier Hylton
发明人： David Alan Baldwin , Todd Lanier Hylton
IPC分类号： C23C1434
CPC分类号： C23C14/3407 , C23C14/46 , H01J37/3178 , H01J2237/3146
摘要： A system and method for simultaneously performing sputter deposition on a plurality of planar substrates. An ion current source generates an ion beam in which ions are directed toward a target. The target is formed from a section of a sphere. Each of the plurality of planar substrates has a deposition surface that is tangent to a surface of the sphere. In addition, a substrate that is a section of a sphere may be used. The deposition thickness across the spherically-shaped substrate is uniform.
摘要翻译：一种在多个平面基板上同时进行溅射沉积的系统和方法。离子电流源产生离子束，其中离子指向靶。目标由球体的一部分形成。多个平面基板中的每一个具有与球体的表面相切的沉积表面。此外，可以使用作为球体的一部分的基板。横跨球形基底的沉积厚度是均匀的。

8. 发明授权

US06819871B1 Multi-channel optical filter and multiplexer formed from stacks of thin-film layers 失效
标题翻译：由多层薄膜层组成的多通道滤光器和多路复用器
公开(公告)号：US06819871B1
公开(公告)日：2004-11-16
申请号：US09810998
申请日：2001-03-16
申请人： David Alan Baldwin , Todd Lanier Hylton
发明人： David Alan Baldwin , Todd Lanier Hylton
IPC分类号： H04J1402
CPC分类号： G02B6/29367 , G02B5/281 , G02B6/2938
摘要： A multi-channel optical device includes a first plurality of optical structures formed simultaneously using vapor deposition on different regions of a common substrate. Each optical structure in the plurality is comprised of a plurality of thin-film layers. The thickness of each layer in a given optical structure corresponds to a wavelength associated with one of the channels. A reflector has a surface parallel to the common substrate, and a transport region is disposed between the first plurality of optical structures and the reflector. An aperture is disposed at one end of the transport region, and the first plurality of optical structures are disposed along a length of the transport region. When an input optical signal is provided to the aperture, the device functions as an optical demultiplexer and output optical signals associated with different ones of the channels are generated at separate positions along a length of the transport region. When input optical signals are applied to separate positions along the length of the transport region, the device functions as an optical multiplexer and those input optical signals are combined in the transport region and output as a combined optical output signal at the aperture.
摘要翻译：多通道光学器件包括在公共衬底的不同区域上同时使用气相沉积形成的第一多个光学结构。多个中的每个光学结构由多个薄膜层组成。给定光学结构中每层的厚度对应于与一个通道相关联的波长。反射器具有平行于公共基板的表面，并且传输区域设置在第一多个光学结构和反射器之间。孔位于输送区的一端，第一多个光学结构沿输送区的长度设置。当向孔径提供输入光信号时，该装置用作光解复用器，并且在沿着传送区域的长度的分开的位置处产生与不同信道相关联的输出光信号。当输入光信号被施加到沿着传输区域的长度的分离位置时，该器件用作光复用器，并且这些输入光信号在传输区域中组合并作为光圈处的组合光输出信号输出。

9. 发明授权

US06689255B2 System and method for making thin-film structures using a stepped profile mask 失效
标题翻译：使用阶梯轮廓掩模制造薄膜结构的系统和方法
公开(公告)号：US06689255B2
公开(公告)日：2004-02-10
申请号：US10166532
申请日：2002-06-10
申请人： David Alan Baldwin , Todd Lanier Hylton
发明人： David Alan Baldwin , Todd Lanier Hylton
IPC分类号： C23C1434
CPC分类号： C23C14/547 , C23C14/044
摘要： A system and method for manufacturing thin-film structures disposed on a substrate. The thin-film structures have different respective thicknesses that vary along a radius of the substrate. A substrate rotates about an axis of rotation and a source of deposited material is directed at the rotating substrate. A mask having a stepped profile is positioned between the rotating substrate and the source. The stepped mask selectively blocks material emanating from the source from reaching the substrate. Each step of the profile of the mask corresponds to one of the respective thicknesses of the thin-film structures. The radius along which the different respective thicknesses of the film-thin structures vary is measured from the axis of rotation of the rotating substrate, and the substrate includes at least one wafer having a center that is either coincident or offset from the axis of rotation.
摘要翻译：一种用于制造设置在基板上的薄膜结构的系统和方法。薄膜结构具有不同的各自的厚度，其沿衬底的半径变化。衬底围绕旋转轴线旋转，并且沉积材料源指向旋转衬底。具有阶梯轮廓的掩模位于旋转基底和源之间。阶梯式掩模选择性地阻挡从源发出的材料到达衬底。掩模的轮廓的每个步骤对应于薄膜结构的相应厚度之一。薄膜结构的各个不同厚度的不同厚度的半径是从旋转基板的旋转轴测量的，并且基板包括具有与旋转轴线重合或偏离的中心的至少一个晶片。

10. 发明授权

US06610179B2 System and method for controlling deposition thickness using a mask with a shadow that varies with respect to a target 失效
公开(公告)号：US06610179B2
公开(公告)日：2003-08-26
申请号：US09810388
申请日：2001-03-16
申请人： David Alan Baldwin , Todd Lanier Hylton
发明人： David Alan Baldwin , Todd Lanier Hylton
IPC分类号： C23C1435
CPC分类号： C23C14/46 , C23C14/545 , G02B1/10
摘要： A system and method for controlling a deposition thickness distribution over a substrate. A motor rotates the substrate, and at least one sensor senses the deposition thickness of the substrate at two or more radii on the substrate. An actuator varies a shadow of a mask disposed over a target used to sputter material on the substrate. An ion source generates an ion beam that is directed toward the target. The mask is positioned between the ion source and the target, and selectively blocks ion current from the ion source from reaching the target. A process controller is coupled to the deposition thickness sensor and the actuator. In response to the sensed deposition thickness, the process controller varies the shadow of the mask with respect to the target to control the deposition thickness distribution over the substrate.

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