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    • 1. 发明授权
    • Pigment dispersions containing dispersants prepared by controlled radical polymerization
    • 含有通过控制自由基聚合制备的分散剂的颜料分散体
    • US06326420B1
    • 2001-12-04
    • US09464947
    • 1999-12-16
    • Kevin C. OlsonSimion CocaJames B. O'DwyerKarl F. Schimmel
    • Kevin C. OlsonSimion CocaJames B. O'DwyerKarl F. Schimmel
    • C08L300
    • C09B67/009C09D17/001
    • A pigment dispersion which includes a pigment, an aqueous carrier and a pigment dispersant. The pigment dispersant is prepared by controlled radical polymerization initiated in the presence of a monomeric initiator having at least two radically transferable groups. The pigment dispersant has at least one of the following polymer chain structures: &phgr;-[(G)p—(E)s—T]z and &phgr;-[(E)3—(G)p—T]z where G is a hydrophobic residue of at least one radically polymerizable ethylenically unsaturated monomer; E is a hydrophilic residue of at least one radically polymerizable ethylenically unsaturated monomer; &phgr; is a residue of or derived from the initiator, and is free of the radically transferable group; T is or is derived from the radically transferable group of the initiator; z is 2 to 10; p and s are at least one and are selected such that the pigment dispersant has a number average molecular weight of at least 500.
    • 颜料分散体,其包含颜料,水性载体和颜料分散剂。 在具有至少两个可自由基转移基团的单体引发剂的存在下引发的受控自由基聚合来制备颜料分散剂。 颜料分散剂具有以下聚合物链结构中的至少一种:其中G是至少一个可自由基聚合的烯属不饱和单体的疏水残基; E是至少一种可自由基聚合的烯属不饱和单体的亲水性残基; phi是引发剂的残基或衍生自起始物,不含可自由基转移基团; T衍生自引发剂的可自由转移基团; z为2〜10; p和s是至少一个,并且被选择为使得颜料分散剂的数均分子量为至少500。
    • 9. 发明授权
    • Method of forming solid blind vias through the dielectric coating on high density interconnect (HDI) substrate materials
    • 通过高密度互连(HDI)衬底材料上的电介质涂层形成固体盲孔的方法
    • US08409982B2
    • 2013-04-02
    • US13182838
    • 2011-07-14
    • Kevin C. OlsonAlan E. Wang
    • Kevin C. OlsonAlan E. Wang
    • H01L21/4763
    • H05K3/44H05K3/108H05K3/388H05K3/445H05K3/4647H05K2201/09554H05K2203/0582H05K2203/0733H05K2203/135
    • A method includes forming a first substrate by (a) applying an electrodepositable dielectric coating onto a conductive surface; (b) curing the dielectric coating; (c) depositing an adhesion layer and a seed layer onto the dielectric coating; (d) applying a layer of a first removable material to the seed layer; (e) forming openings in the first removable material to expose areas of the seed layer; (f) electroplating a first conductive material to the exposed areas of the seed layer; (g) applying a layer of a second removable material; (h) forming openings in the second removable material to expose areas of the first conductive material; (i) plating a second conductive material to the exposed areas of the first conductive material; (j) removing the first and second removable materials; (k) removing unplated portions of the seed layer; repeating steps (a) through (k) to form a second substrate; and laminating the first and second substrates together with a layer of dielectric material between the first and second substrates to form at least one interconnect between the first and second substrates.
    • 一种方法包括通过以下步骤形成第一衬底:(a)将电沉积介电涂层施加到导电表面上; (b)固化电介质涂层; (c)在所述电介质涂层上沉积粘附层和种子层; (d)将第一可移除材料层施加到种子层; (e)在第一可移除材料中形成开口以暴露种子层的区域; (f)将第一导电材料电镀到种子层的暴露区域; (g)施加第二可移除材料层; (h)在所述第二可移除材料中形成开口以暴露所述第一导电材料的区域; (i)将第二导电材料镀覆到第一导电材料的暴露区域; (j)移除第一和第二可移除材料; (k)去除种子层的未镀层的部分; 重复步骤(a)至(k)以形成第二衬底; 以及将所述第一和第二基板与第一和第二基板之间的介电材料层一起层压,以在所述第一和第二基板之间形成至少一个互连。