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    • 4. 发明授权
    • Thin film transistors in pixel and driver portions characterized by surface roughness
    • 具有表面粗糙度的像素和驱动器部分的薄膜晶体管
    • US08097883B2
    • 2012-01-17
    • US11954716
    • 2007-12-12
    • Hong-Ro Lee
    • Hong-Ro Lee
    • H01L29/04H01L29/786H01L27/12
    • H01L27/12H01L27/1214H01L27/1285H01L29/04
    • A thin film transistor and a fabrication method thereof, in which one excimer laser annealing (ELA) makes a pixel portion and a driver portion different from each other in surface roughness and grain size. The thin film transistor includes: a substrate including a pixel portion and a driver portion; a first semiconductor layer disposed in the pixel portion and having a first surface roughness; a second semiconductor layer disposed in the driver portion and having a second surface roughness smaller than the first surface roughness; a gate insulating layer formed on the substrate including the first and second semiconductor layers; a first gate electrode placed to correspond to the first semiconductor layer on the gate insulating layer; a second gate electrode placed to correspond to the second semiconductor layer on the gate insulating layer; an interlayer insulating layer formed on the substrate including the first and second gate electrodes; first source and drain electrodes formed on the interlayer insulating layer and electrically connected with the first semiconductor layer; and second source and drain electrodes formed on the interlayer insulating layer and electrically connected with the second semiconductor layer.
    • 一种薄膜晶体管及其制造方法,其中一个准分子激光退火(ELA)使得像素部分和驱动器部分在表面粗糙度和晶粒尺寸上彼此不同。 薄膜晶体管包括:包括像素部分和驱动器部分的基板; 第一半导体层,设置在像素部分中并具有第一表面粗糙度; 第二半导体层,设置在所述驱动器部分中,具有小于所述第一表面粗糙度的第二表面粗糙度; 形成在包括所述第一半导体层和所述第二半导体层的所述基板上的栅极绝缘层; 第一栅极电极,被放置成对应于栅极绝缘层上的第一半导体层; 第二栅极电极,被放置为对应于栅极绝缘层上的第二半导体层; 在包括所述第一和第二栅电极的所述基板上形成的层间绝缘层; 形成在所述层间绝缘层上并与所述第一半导体层电连接的第一源极和漏极; 以及第二源极和漏极,形成在层间绝缘层上并与第二半导体层电连接。
    • 9. 发明申请
    • Laser annealing apparatus for processing semiconductor devices in inline manner
    • 用于以线内方式处理半导体器件的激光退火装置
    • US20050133565A1
    • 2005-06-23
    • US10995473
    • 2004-11-24
    • Hong-Ro Lee
    • Hong-Ro Lee
    • H01L21/324H04N1/46
    • H01L21/268
    • A laser annealing apparatus is provided, which can simultaneously process a plurality of moving semiconductor devices in an inline manner using one annealing laser. The apparatus may include a laser beam emitting unit, which emits laser beams to target regions of a to-be-processed object. Also included may be a plurality of first nozzles and a plurality of second nozzles, through which gas used for controlling an atmosphere of the target regions of the to-be-processed object is introduced or exhausted. The first and second nozzles may face each other so that the laser beams emitted from the laser beam emitting unit fall therebetween. The apparatus may further include a moving unit, which horizontally moves the to-be-processed object, to which the laser beams are emitted, at approximately the same transport speed.
    • 提供一种激光退火装置,其可以使用一个退火激光器以直线方式同时处理多个移动的半导体器件。 该装置可以包括激光束发射单元,其将激光束发射到待处理物体的目标区域。 还包括多个第一喷嘴和多个第二喷嘴,用于控制被处理物体的目标区域的气氛的气体被引入或排出。 第一和第二喷嘴可以彼此面对,使得从激光束发射单元发射的激光束落在其间。 该装置还可以包括以大致相同的传送速度水平地移动被激光束被发射的被处理物体的移动单元。