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    • 2. 发明申请
    • METHOD AND APPARATUS FOR PRODUCING EPITAXIAL WAFER
    • 用于生产外源波的方法和装置
    • US20120174859A1
    • 2012-07-12
    • US13395677
    • 2010-09-10
    • Kenji SakamotoMasayuki Tsuji
    • Kenji SakamotoMasayuki Tsuji
    • C30B25/16C30B25/02
    • C30B25/12C30B25/02C30B25/16C30B29/06H01L21/02532H01L21/0262
    • After removing deposit on a susceptor in an epitaxial growth furnace by a cleaning recipe (step S101), a first epitaxial wafer is produced by growing an epitaxial layer on a first wafer based on a process recipe A (step S102). Subsequently, a step of producing an epitaxial wafer by growing an epitaxial layer on a wafer based on a process recipe B including second control parameters set such that the epitaxial wafer has approximately the same film thickness profile as the first wafer (step S103) is repeated a plurality of times to successively produce a plurality of epitaxial wafers (step S104). The cleaning recipe, the process recipe A, and the process recipe B repeated a plurality of times are carried out repeatedly (step S105).
    • 在通过清洁配方除去外延生长炉中的基座上的沉积物(步骤S101)之后,通过基于处理配方A在第一晶片上生长外延层来生产第一外延晶片(步骤S102)。 随后,通过基于包括第二控制参数设置为使得外延晶片具有与第一晶片大致相同的膜厚分布的步骤处理B(步骤S103),在晶片上生长外延层来制造外延晶片的步骤(步骤S103) 多次连续制造多个外延晶片(步骤S104)。 重复执行重复多次的清洁配方,处理配方A和处理配方B.(步骤S105)。
    • 5. 发明授权
    • Plasma processing apparatus
    • 等离子体处理装置
    • US08372239B2
    • 2013-02-12
    • US13449304
    • 2012-04-17
    • Takanori TsunodaYoshio MatsubaraYasunori AndoMasayuki Tsuji
    • Takanori TsunodaYoshio MatsubaraYasunori AndoMasayuki Tsuji
    • C23C16/00H01L21/306
    • H01J37/321H01J37/3211
    • An inductively-coupled-plasma (ICP) type plasma processing apparatus is provided. The plasma processing includes an antenna which is substantially straight in a plan view of the antenna. A plasma is generated for performing a plasma treatment to a substrate when a high frequency current is applied to the antenna to form an electric field in a vacuum container. The antenna includes two go-and-return conductors closely disposed to each other in an up-down direction, wherein the up-down direction is perpendicular to a surface of the substrate, and the high frequency current is applied to flow in opposite directions between the two go-and-return conductors. An interval is defined by a distance between the two go-and-return conductors in the up-down direction, varies in a longitudinal direction of the antenna.
    • 提供了一种电感耦合等离子体(ICP)型等离子体处理装置。 等离子体处理包括在天线的平面图中基本上是直的天线。 当对天线施加高频电流以在真空容器中形成电场时,产生等离子体,以对衬底进行等离子体处理。 该天线包括在上下方向上彼此紧密配置的两个去耦导体,其中上下方向垂直于衬底的表面,并且施加高频电流以在相对方向之间流动 两个回归导体。 间隔由上下方向上的两个去导体之间的距离限定,在天线的纵向方向上变化。
    • 6. 发明授权
    • Cache memory system, data processing apparatus, and storage apparatus
    • 高速缓冲存储器系统,数据处理装置和存储装置
    • US08230173B2
    • 2012-07-24
    • US12402114
    • 2009-03-11
    • Masayuki Tsuji
    • Masayuki Tsuji
    • G06F12/00
    • G06F12/0811G06F12/0802Y02D10/13
    • A cache memory system includes a plurality of first storage hierarchical units provided individually to a plurality of processors. A second storage hierarchical unit is provided commonly to the plurality of processors. A control unit controls data transfer between the plurality of first storage hierarchical units and the second storage hierarchical unit. Each of the plurality of processors is capable of executing a no-data transfer store command as a store command that does not require data transfer from the second storage hierarchical unit to the corresponding first storage hierarchical unit, and each of the plurality of first storage hierarchical units outputs a transfer-control signal in response to occurrence of a cache miss hit when executing the no-data transfer store command by the corresponding processor.
    • 高速缓冲存储器系统包括分别提供给多个处理器的多个第一存储分层单元。 第二存储分层单元被共同地提供给多个处理器。 控制单元控制多个第一存储分层单元和第二存储分层单元之间的数据传送。 多个处理器中的每一个能够执行无数据传输存储命令作为不需要从第二存储分层单元到相应的第一存储分层单元的数据传送的存储命令,并且多个第一存储分层 当由对应的处理器执行无数据传输存储命令时,单元响应于高速缓存未命中的发生而输出传送控制信号。
    • 9. 发明申请
    • LIQUID CRYSTAL DISPLAY PANEL
    • 液晶显示面板
    • US20090122223A1
    • 2009-05-14
    • US12300489
    • 2007-03-07
    • Takayuki HayanoDai ChibaMasayuki Tsuji
    • Takayuki HayanoDai ChibaMasayuki Tsuji
    • G02F1/1335G02F1/1333
    • G02F1/133305G02F1/136209
    • A liquid crystal display panel displays an image on a curved display surface, in which light leakage through a space between pixel electrodes is reliably prevented. The liquid crystal display panel includes an active matrix substrate having the pixel electrodes, an opposed substrate having a common electrode arranged to generate a potential difference between the common electrode and each pixel electrode, a liquid crystal layer sandwiched between the substrates and arranged to control a light transmission state in accordance with the potential difference, and a black matrix arranged to prevent light leakage through a space between the pixel electrodes. The black matrix is provided on a liquid crystal layer side on the active matrix substrate.
    • 液晶显示面板在弯曲显示面上显示图像,通过像素电极之间的空间的光泄漏被可靠地防止。 液晶显示面板包括具有像素电极的有源矩阵基板,具有配置成产生公共电极与各像素电极之间的电位差的公共电极的相对基板,夹在基板之间的液晶层, 根据电位差的光透射状态,以及布置成防止通过像素电极之间的空间的光泄漏的黑矩阵。 黑色矩阵设置在有源矩阵基板上的液晶层侧。