专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08460850B2 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same 有权
标题翻译：光化感光或辐射敏感树脂组合物和使用其的图案形成方法
公开(公告)号：US08460850B2
公开(公告)日：2013-06-11
申请号：US12493830
申请日：2009-06-29
申请人： Kenichiro Sato , Akinori Shibuya , Shuhei Yamaguchi , Hiroshi Inada
发明人： Kenichiro Sato , Akinori Shibuya , Shuhei Yamaguchi , Hiroshi Inada
IPC分类号： G03F7/039 , G03F7/30
CPC分类号： G03F7/0395 , C08F220/18 , C08F220/24 , C08F220/28 , C08F220/60 , C08F230/08 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/0758 , G03F7/2041
摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin having at least two of repeating units represented by general formula (1) below and exhibiting increased solubility in an alkali developer when acted on by an acid, and (B) a compound that generates an acid when exposed to actinic rays or radiation. In the formula, each of R, A, R0, Z, L and n represents the same as defined in the claims and in the specification.
摘要翻译：光化射线敏感性或辐射敏感性树脂组合物包含（A）具有下述通式（1）表示的重复单元中的至少两个的树脂，并且当通过酸作用时在碱显影剂中表现出增加的溶解度，（B ）当暴露于光化射线或辐射时产生酸的化合物。在该式中，R，A，R 0，Z，L和n中的每一个与权利要求书和说明书中所定义的相同。

2. 发明授权

US08299055B2 8-substituted isoquinoline derivative and the use thereof 有权
标题翻译： 8-取代的异喹啉衍生物及其用途
公开(公告)号：US08299055B2
公开(公告)日：2012-10-30
申请号：US12571601
申请日：2009-10-01
申请人： Shunsuke Kaneko , Kenichiro Sato , Daisuke Shikanai , Rintaro Yamada , Katsuhiko Sakurada
发明人： Shunsuke Kaneko , Kenichiro Sato , Daisuke Shikanai , Rintaro Yamada , Katsuhiko Sakurada
IPC分类号： C07D401/12 , A61K31/47
CPC分类号： C07D401/12 , C07D217/02 , C07D401/10 , C07D401/14 , C07D405/14 , C07D409/14 , C07D413/12 , C07D413/14 , C07D417/14
摘要： The present invention relates to a compound represented by the following formula (1): wherein D1, A1, D2, R1, D3, and R2 each have the same meaning as defined in the present specification or a salt thereof. The compound represented by the formula (1) or a salt thereof has an IKKβ inhibiting activity and the like and is useful for the prevention and/or treatment of IKKβ-associated diseases or symptoms and the like.
摘要翻译：本发明涉及由下式（1）表示的化合物：其中D1，A1，D2，R1，D3和R2各自具有与本说明书中定义的相同的含义或其盐。由式（1）表示的化合物或其盐具有IKK＆bgr; 抑制活性等，并且可用于预防和/或治疗IKK和相关疾病或症状等。

3. 发明申请

US20120218068A1 ANTENNA 审中-公开
标题翻译：天线
公开(公告)号：US20120218068A1
公开(公告)日：2012-08-30
申请号：US13279805
申请日：2011-10-24
申请人： Hiroyuki Yamakawa , Yasuo Ito , Kenichiro Sato , Shigenori Shimokawa
发明人： Hiroyuki Yamakawa , Yasuo Ito , Kenichiro Sato , Shigenori Shimokawa
IPC分类号： H01F27/02 , H01F27/28
CPC分类号： H01Q7/04 , B60L53/12 , H01F27/365 , H01F38/14 , H01Q1/3225 , Y02T10/7005 , Y02T10/7072 , Y02T90/122 , Y02T90/14
摘要： An antenna includes: a case body having a bottom plate portion, side plate portions extending from the bottom plate portion, and an opening portion surrounded by the side plate portions; a magnetic resonance antenna portion placed in the case body; and a magnetic shield body disposed on a side closer to the opening portion than the magnetic resonance antenna portion.
摘要翻译：天线包括：具有底板部分的壳主体，从底板部分延伸的侧板部分和由侧板部分包围的开口部分; 放置在壳体内的磁共振天线部; 以及设置在比磁共振天线部分更靠近开口部分的一侧的磁屏蔽体。

4. 发明申请

US20120037554A1 Oil Separator 审中-公开
公开(公告)号：US20120037554A1
公开(公告)日：2012-02-16
申请号：US13263936
申请日：2010-04-08
申请人： Akira Sakano , Kenichiro Sato
发明人： Akira Sakano , Kenichiro Sato
IPC分类号： F25B43/02
CPC分类号： B04C5/103 , F25B43/02 , F25B2400/02
摘要： Provided is an oil separator which can separate refrigerant and refrigeration machine oil with high efficiency, which can effectively prevent the outflow of separated oil towards the refrigerant discharge path side, which can reduce pressure loss in the flow of refrigerant, and which can be made compact especially in the radial direction. The oil separator is provided with: a tubular outer pipe which is disposed on the compressor outlet side; an inlet pipe for introducing refrigerant containing refrigeration machine oil into the tubular outer pipe in such a manner as to produce a downward helical flow of refrigerant containing refrigeration machine oil along the inner surface of the tubular outer pipe; a refrigerant outlet pipe which has an external outflow port for the outflow of refrigerant to outside the tubular outer pipe, has a section extending in the axial direction of the tubular outer pipe at the central position of the tubular outer pipe, and allows the inflow, from the lower end of the above-mentioned section, of refrigerant separated from the refrigerant containing refrigeration machine oil having flowed down in the helical flow, and wherein the flow direction has been inverted in relation to the vertical direction at a first refrigerant inversion part; a refrigerant return pipe which extends in the axial direction of the tubular outer pipe at the central position of the tubular outer pipe, below the refrigerant outlet pipe, and which allows the inflow, from the lower end thereof, of refrigerant separated from the refrigerant containing refrigeration machine oil having flowed down in the helical flow, and wherein the flow direction has been inverted in relation to the vertical direction at a second refrigerant inversion part; and an oil storage part which is formed at the bottom of the tubular outer pipe. Furthermore, a part exhibiting a reflector function for preventing refrigeration machine oil stored in the oil storage part from flowing out into the refrigerant outlet pipe is provided between the refrigerant return pipe and the inner surface of the tubular outer pipe.

5. 发明申请

US20100261701A1 8-Substituted isoquinoline derivative and the use thereof 有权
标题翻译： 8-取代的异喹啉衍生物及其用途
公开(公告)号：US20100261701A1
公开(公告)日：2010-10-14
申请号：US12571601
申请日：2009-10-01
申请人： Shunsuke Kaneko , Kenichiro Sato , Daisuke Shikanai , Rintaro Yamada , Katsuhiko Sakurada
发明人： Shunsuke Kaneko , Kenichiro Sato , Daisuke Shikanai , Rintaro Yamada , Katsuhiko Sakurada
IPC分类号： A61K31/4725 , C07D401/12 , C07D409/14 , A61K31/496 , C07D401/14 , A61K31/501 , C07D413/14 , A61K31/5377 , A61K31/506 , C07D405/14 , C07D401/10 , C07D417/14 , A61P29/00 , A61P35/00 , A61P37/06
CPC分类号： C07D401/12 , C07D217/02 , C07D401/10 , C07D401/14 , C07D405/14 , C07D409/14 , C07D413/12 , C07D413/14 , C07D417/14
摘要： The present invention relates to a compound represented by the following formula (1): wherein D1, A1, D2, R1, D3, and R2 each have the same meaning as defined in the present specification or a salt thereof. The compound represented by the formula (1) or a salt thereof has an IKKβ inhibiting activity and the like and is useful for the prevention and/or treatment of IKKβ-associated diseases or symptoms and the like.
摘要翻译：本发明涉及由下式（1）表示的化合物：其中D1，A1，D2，R1，D3和R2各自具有与本说明书中定义的相同的含义或其盐。由式（1）表示的化合物或其盐具有IKK＆bgr; 抑制活性等，并且可用于预防和/或治疗IKK和相关疾病或症状等。

6. 发明授权

US07122589B2 Positive resist composition and pattern formation method using the same 有权
标题翻译：正型抗蚀剂组成和使用其的图案形成方法
公开(公告)号：US07122589B2
公开(公告)日：2006-10-17
申请号：US10669603
申请日：2003-09-25
申请人： Fumiyuki Nishiyama , Kenichiro Sato , Kunihiko Kodama
发明人： Fumiyuki Nishiyama , Kenichiro Sato , Kunihiko Kodama
IPC分类号： C08K5/36
CPC分类号： G03F7/0397 , C08K5/45 , G03F7/0045 , H01L21/312 , Y10S430/106 , Y10S430/122
摘要： A positive resist composition comprising: (A) a resin having alicyclic hydrocarbon groups in side chains, containing specified two types of repeating units, which increases the solubility in an alkali developing solution by the action of an acid; and (B) a particular sulfonium compound having a specified structure and capable of generating an acid upon irradiation with an actinic ray or radiation.
摘要翻译：一种正型抗蚀剂组合物，其包含：（A）在侧链中具有脂环族烃基的树脂，其含有特定的两种重复单元，其通过酸的作用增加在碱性显影液中的溶解度; 和（B）具有特定结构并且能够在用光化射线或辐射照射时产生酸的特定锍化合物。

7. 发明授权

US06670095B2 Positive-working resist composition 有权
公开(公告)号：US06670095B2
公开(公告)日：2003-12-30
申请号：US10022363
申请日：2001-12-20
申请人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai
发明人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106
摘要： The present invention provides a high sensitivity chemically amplified positive-working resist composition which eliminates edge roughness on pattern and provides an excellent resist pattern profile. A novel positive-working resist composition is provided comprising (A) a resin containing an alkali-soluble group protected by at least one of moieties containing alicyclic hydrocarbon represented by general formulae (pI) to (pVI) and having a monomer component content of 5% or less of the total pattern area as determined by gel permeation chromatography (GPC), which increases in its solution velocity with respect to an alkaline developer by the action of an acid and (B) a compound which is capable of generating an acid by irradiation with an active ray or radiation.

8. 发明授权

US06632586B1 Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US06632586B1
公开(公告)日：2003-10-14
申请号：US09392588
申请日：1999-09-09
申请人： Toshiaki Aoai , Kenichiro Sato
发明人： Toshiaki Aoai , Kenichiro Sato
IPC分类号： G03C172
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A positive resist composition which comprises (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, and (B) a resin which is decomposed by the action of an acid to increase solubility in an alkaline developing solution and contains repeating units represented by formulae (I) and (V):
摘要翻译：一种正型抗蚀剂组合物，其包含（A）在用光化射线或辐射照射时产生酸的化合物，和（B）通过酸的作用分解以增加在碱性显影液中的溶解度的树脂，并且包含重复由式（I）和（V）表示的单元：

9. 发明授权

US06479209B1 Positive photosensitive composition 失效
标题翻译：正光敏组合物
公开(公告)号：US06479209B1
公开(公告)日：2002-11-12
申请号：US09075246
申请日：1998-05-11
申请人： Toshiaki Aoai , Kenichiro Sato , Morio Yagihara
发明人： Toshiaki Aoai , Kenichiro Sato , Morio Yagihara
IPC分类号： G03C173
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： Disclosed is a positive photosensitive composition capable of giving good sensitivity, resolution and resist pattern and exhibiting sufficiently high dry etching resistance on use of an exposure light source of 250 nm or less, particularly 220 nm or less, which composition comprises (A) a compound generating an acid on irradiation of an active light ray or radiation and (B) a resin having (i) at least one polycyclic-type alicyclic group, (ii) at least one ester group which decomposes by the action of an acid and increases the solubility in an alkali developer and (iii) at least one acetal group which decomposes by the action of an acid and increases the solubility in an alkali developer, or comprises (A) a compound generating an acid on irradiation of an active light ray or radiation, (C) a resin having a polycyclic-type alicyclic group and an ester group which decomposes by the action of an acid and increases the solubility in an alkali developer, and (D) a resin having a polycyclic-type alicyclic group and an acetal group which decomposes by the action of an acid and increases the solubility in an alkali developer.
摘要翻译：公开了一种能够提供良好的灵敏度，分辨率和抗蚀剂图案并且在使用250nm或更小，特别是220nm或更小的曝光光源时表现出足够高的耐干蚀刻性的正性光敏组合物，该组合物包含（A）化合物在活性光线或辐射照射时产生酸，和（B）具有（i）至少一种多环式脂环族基团的树脂，（ii）至少一种通过酸的作用分解并增加酸的酯基在碱性显影剂中的溶解度和（iii）至少一种通过酸的作用分解并提高其在碱性显影剂中的溶解度的缩醛基，或包含（A）在活性光线或辐射照射时产生酸的化合物，（C）具有多环型脂环族基团和酯基的树脂，其通过酸的作用而分解并增加在碱性显影剂中的溶解度，（D）具有多环基的树脂 ype脂环族基团和通过酸的作用而分解并增加在碱性显影剂中的溶解度的缩醛基。

10. 发明授权

US06416925B1 Positive working photosensitive composition 失效
标题翻译：正光敏组合物
公开(公告)号：US06416925B1
公开(公告)日：2002-07-09
申请号：US09497281
申请日：2000-02-02
申请人： Toshiaki Aoai , Shiro Tan , Kenichiro Sato
发明人： Toshiaki Aoai , Shiro Tan , Kenichiro Sato
IPC分类号： G03C173
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111 , Y10S430/115
摘要： A positive working photosensitive composition suitable for exposure using a light source of wavelengths of 250 nm or shorter, particularly 220 nm or shorter; comprising (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation and (B) a resin which comprises constitutional repeating units having alicyclic groups of particular structures, including adamantyl groups, and has groups capable of decomposing due to the action of acids to increase the solubility in an alkali developer.
摘要翻译：适用于使用波长为250nm或更短，特别是220nm或更短的光源的曝光的正性工作光敏组合物; 包括（A）能够在光化射线或辐射照射时能够产生酸的化合物和（B）包含具有特定结构的脂环族基团的重复单元的树脂，包括金刚烷基，并且具有能够由于作用而分解的基团的酸以增加在碱性显影剂中的溶解度。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式