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    • 2. 发明授权
    • Contact holes of a different pitch in an application specific integrated
circuit
    • 在专用集成电路中具有不同音高的接触孔
    • US5929469A
    • 1999-07-27
    • US992542
    • 1997-12-17
    • Kenichiro MimotoMotohiro EnkakuTakehiko Hojo
    • Kenichiro MimotoMotohiro EnkakuTakehiko Hojo
    • H01L21/3205H01L21/768H01L21/82H01L21/8234H01L23/52H01L27/088H01L27/118
    • H01L27/11807H01L2924/0002
    • In a first inter-layer insulator film above source/drain regions of basic cells constituting a gate array, first contact holes (joint contacts) are placed, so that wings (joint plates) electrically connected with the source/drain regions via plugs in those joint contacts is locally placed above the source/drain regions. Above the wings is formed a second inter-layer insulator film, above which is formed a first level interconnection which constitutes one of metal wiring layers. In the second inter-layer insulator film are formed second contact holes, so that a semi-custom ASIC is provided in which the wings and the first level interconnection are electrically interconnected via the plugs in those second contact holes. The first and second contact holes, first level interconnection, etc. are automatically designed by use of a computer based on a grid pattern in the basic cells. According to the present invention, the basic cells need not be re-designed even if a first pitch of a pattern of the first contact holes is different from a second pitch of a pattern of the second contact holes, thus easily enabling automatic customization. Without increasing the area of the source/drain regions in the basic cells, any pitch of the wiring layers can be selected, thus increasing the integration density without deteriorating the performance of MOS FETs at the same time as reducing time required for the customization.
    • 在构成门阵列的基本单元的源极/漏极区域上方的第一层间绝缘膜中,放置第一接触孔(接合触点),使得通过插头在源极/漏极区域中电连接的翼(接合板) 接头接点局部放置在源极/漏极区域之上。 翼上方形成有第二层间绝缘膜,其上形成有构成金属布线层之一的第一层互连。 在第二层间绝缘体膜中形成第二接触孔,从而提供半定制ASIC,其中翼和第一级互连通过那些第二接触孔中的插塞电互连。 通过使用基于基本单元格中的网格图案的计算机来自动设计第一和第二接触孔,第一层互连等。 根据本发明,即使第一接触孔的图案的第一间距与第二接触孔的图案的第二间距不同,基本单元也不需要重新设计,因此容易实现自动定制。 在不增加基本单元中的源极/漏极区域的面积的情况下,可以选择布线层的任何间距,从而在降低定制所需时间的同时增加集成密度,而不会降低MOS FET的性能。
    • 6. 发明授权
    • Semiconductor memory device and method of testing the device
    • 半导体存储器件及其测试方法
    • US06985395B2
    • 2006-01-10
    • US10884105
    • 2004-07-01
    • Takanori YoshimatsuTakehiko HojoKaoru Tokushige
    • Takanori YoshimatsuTakehiko HojoKaoru Tokushige
    • G11C7/00
    • G11C29/44
    • A semiconductor memory device is disclosed, which includes a memory cell array including memory cells arranged in rows and columns, a word line, a bit line, a row decoder and a column decoder, a sense amplifier provided for each of the columns of the memory cell array, a write latch circuit configured to store externally input data and sets data of one row of the memory cell array in the sense amplifiers in test mode, a read latch circuit configured to store data of one row, which is read from the memory cell array and set in the sense amplifiers in test mode, a first comparison circuit configured to compare the data stored in the write latch circuit and the data stored in the read latch circuit, and a first comparison result register configured to store a comparison result of the first comparison circuit.
    • 公开了一种半导体存储器件,其包括存储单元阵列,该存储单元阵列包括以行和列排列的存储单元,字线,位线,行解码器和列解码器,为存储器的每列提供的读出放大器 单元阵列,写锁存电路,被配置为存储外部输入数据,并以测试模式设置读出放大器中的一行存储单元阵列的数据;读锁存器电路,被配置为存储从存储器读取的一行数据 单元阵列,并且在测试模式下设置在读出放大器中,第一比较电路,被配置为将存储在写入锁存电路中的数据与存储在读取锁存电路中的数据进行比较;第一比较结果寄存器,被配置为存储比较结果 第一个比较电路。
    • 7. 发明申请
    • Semiconductor memory device and method of testing the device
    • 半导体存储器件及其测试方法
    • US20050068816A1
    • 2005-03-31
    • US10884105
    • 2004-07-01
    • Takanori YoshimatsuTakehiko HojoKaoru Tokushige
    • Takanori YoshimatsuTakehiko HojoKaoru Tokushige
    • G11C29/12G11C11/401G11C29/04G11C29/44G11C7/00
    • G11C29/44
    • A semiconductor memory device is disclosed, which comprises a memory cell array including memory cells arranged in rows and columns, a word line, a bit line, a row decoder and a column decoder, a sense amplifier provided for each of the columns of the memory cell array, a write latch circuit configured to store externally input data and sets data of one row of the memory cell array in the sense amplifiers in test mode, a read latch circuit configured to store data of one row, which is read from the memory cell array and set in the sense amplifiers in test mode, a first comparison circuit configured to compare the data stored in the write latch circuit and the data stored in the read latch circuit, and a first comparison result register configured to store a comparison result of the first comparison circuit.
    • 公开了一种半导体存储器件,其包括存储单元阵列,该存储单元阵列包括以行和列排列的存储单元,字线,位线,行解码器和列解码器,为存储器的每列提供的读出放大器 单元阵列,写锁存电路,被配置为存储外部输入数据,并以测试模式设置读出放大器中的一行存储单元阵列的数据;读锁存器电路,被配置为存储从存储器读取的一行数据 单元阵列,并且在测试模式下设置在读出放大器中,第一比较电路,被配置为将存储在写入锁存电路中的数据与存储在读取锁存电路中的数据进行比较;第一比较结果寄存器,被配置为存储比较结果 第一个比较电路。
    • 9. 发明授权
    • Storage device
    • 储存设备
    • US07782662B2
    • 2010-08-24
    • US12181926
    • 2008-07-29
    • Masaharu WadaTakehiko Hojo
    • Masaharu WadaTakehiko Hojo
    • G11C11/50G11C5/06G11C11/00
    • G11C17/16G11C13/00G11C13/004G11C13/0069
    • A storage device includes: a wiring including a first conductor with a first conductivity; and first, second and third contacts, each including a second conductor with a second conductivity and contacting the wiring. The storage device also includes: a write switching circuit controlling current for writing information that flows through the first contact, the wiring, and the second contact, and changing resistance values of the first contact to write information; and a read switching circuit controlling current for reading information that flows through the first contact, the wiring, and the third contact.
    • 存储装置包括:包括具有第一导电性的第一导体的布线; 以及第一,第二和第三触点,每个包括具有第二导电性的第二导体并接触布线。 存储装置还包括:写入切换电路,控制用于写入流经第一触点,布线和第二触点的信息的电流,以及改变第一触点的电阻值以写入信息; 以及读取切换电路,控制用于读取流过第一触点,布线和第三触点的信息的电流。