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    • 1. 发明授权
    • Copper foil for printed circuits and process for producing the same
    • 印刷电路用铜箔及其制造方法
    • US5366814A
    • 1994-11-22
    • US153327
    • 1993-11-16
    • Keisuke YamanishiHideo OshimaKazuhiko Sakaguchi
    • Keisuke YamanishiHideo OshimaKazuhiko Sakaguchi
    • C25D7/06C25F3/02H05K1/09H05K3/38B32B15/20
    • H05K3/384H05K2201/0355H05K2203/0307H05K2203/0723Y10S428/935Y10T428/12438Y10T428/12472Y10T428/1291Y10T428/12993
    • A copper foil for printed circuits has a roughened layer formed on the side of the foil to be bonded to a base, the roughened layer consisting of a number of protuberant copper electrodeposits containing chromium tungsten or both. It may also have a copper plating layer covering the roughened layer and a treatment layer covering the copper plating layer and formed of either a metal selected from the group consisting of copper, chromium, nickel, iron, cobalt, and zinc, or an alloy of two or more such metals. When necessary, the copper foil may contain an anticorrosive layer including various chromate treated layers further formed on the treatment layer. The copper foil is produced by electrolyzing a raw foil as a cathode in an acidic copper electrolytic bath at a current density close to the critical density, thereby forming the roughened layer, the electrolytic bath containing 0.001-5 g/l of chromium ion tungsten ion or both. The roughened layer is electrolytically overcoated with the treatment layer following the formation of a copper plating layer, which, when necessary, is anti-corrosively treated.
    • 用于印刷电路的铜箔具有形成在箔的与基底结合的一侧上的粗糙层,该粗糙层由许多包含铬钨或两者的突出铜电沉积物组成。 还可以具有覆盖粗糙层的铜镀层和覆盖铜镀层的处理层,并且由选自铜,铬,镍,铁,钴和锌的金属形成,或者由 两种或更多种这样的金属。 必要时,铜箔可以含有在处理层上进一步形成的各种铬酸盐处理层的防腐层。 铜箔通过在酸性铜电解槽中以接近临界密度的电流密度电解原料箔作为阴极,由此形成粗糙层,电解槽含有0.001-5g / l的铬离子钨离子 或两者。 在形成镀铜层之后,用处理层对粗化层进行电解过涂层,当需要时,其被抗腐蚀处理。
    • 2. 发明授权
    • Surface treatment method of a copper foil for printed circuits
    • 印刷电路用铜箔的表面处理方法
    • US5456817A
    • 1995-10-10
    • US327138
    • 1994-10-21
    • Eiji HinoKeisuke YamanishiKazuhiko Sakaguchi
    • Eiji HinoKeisuke YamanishiKazuhiko Sakaguchi
    • C23C22/24C25D11/38H05K3/06H05K3/24H05K3/38C25D3/56H05K1/09
    • H05K3/244C23C22/24C25D11/38H05K3/384H05K2201/0355H05K2203/0723H05K3/064Y10S205/92
    • There is disclosed a treating process whereby the thermal oxidation resistance on the shiny side of a copper foil is enhanced so that the shiny side will not discolor on heating to higher temperatures than usual, without impairing the foil's solder wettability, adhesion to resist, and other properties. A Zn-Ni alloy layer which comprises 50-97 wt % Zn and 3-50 wt % Ni or a Zn-Co alloy layer which comprises 50-97 wt % Zn and 3-50 wt % Co is formed on the shiny side of a copper foil at a deposition quantity of 100-500 .mu.g/dm.sup.2 and then the alloy surface is treated for Cr-base corrosion-preventive coating. The Cr-base corrosion-preventive treatment comprises (1) a treatment for forming a coating film of chromium oxide alone, (2) a treatment for forming a mixed coating film of chromium oxide and zinc and/or zinc oxide or (1)+(2). The roughened side of the copper foil may be treated to form thereon a layer of single metal or alloy of two or more metals chosen from among Cu, Cr, Ni, Fe, Co, and Zn. The shiny side does not cause discoloration upon exposure to high-temperature conditions of 240.degree. C. for 30 minutes or 270.degree. C. for 10 minutes.
    • 公开了一种处理方法,其中铜箔的光泽面上的耐热氧化性提高,使得光泽面在加热时不会比通常更高的温度变色,而不损害箔的焊料润湿性,与抗蚀剂的粘附性等 属性。 包含50-97重量%Zn和3-50重量%Ni的Zn-Ni合金层或包含50-97重量%Zn和3-50重量%Co的Zn-Co合金层形成在 沉积量为100-500g / dm2的铜箔,然后将合金表面处理用于Cr基防腐涂层。 Cr基防腐处理包括(1)单独形成氧化铬的涂膜的处理,(2)形成氧化铬和锌和/或氧化锌的混合涂膜的处理或(1)+ (2)。 可以对铜箔的粗糙面进行处理,在其上形成选自Cu,Cr,Ni,Fe,Co和Zn中的两种或更多种金属的单一金属或合金层。 闪光的一面在240℃的高温条件下暴露30分钟或270℃10分钟时不会变色。
    • 6. 发明申请
    • Method of Forming Electronic Circuit
    • 电子电路形成方法
    • US20110284496A1
    • 2011-11-24
    • US13141753
    • 2009-12-22
    • Keisuke YamanishiKengo KaminagaRyo Fukuchi
    • Keisuke YamanishiKengo KaminagaRyo Fukuchi
    • H05K3/00
    • C23F1/02B32B15/08B32B15/20B32B2307/406B32B2307/50B32B2307/732B32B2457/08C23C22/05C23F1/14C25D3/562C25D5/022C25D5/12C25D5/48C25D7/0614H05K3/06H05K3/067H05K3/384H05K2201/0338H05K2201/0355H05K2203/0723
    • Provided is a method of forming an electronic circuit, wherein a nickel or nickel alloy layer is formed on an etching side of a rolled copper foil or an electrolytic copper foil, the rolled copper foil or the electrolytic copper foil is bonded to a resin substrate to obtain a copper-clad laminate, a resist pattern for forming a circuit is subsequently applied on the copper foil, any unwanted portion of the copper foil and the nickel or nickel alloy layer of the copper-clad laminate other than the portion to which the resist pattern was applied is removed using an etching solution of an aqueous ferric chloride, the resist is further removed, and soft etching is additionally performed in order to remove the remnant nickel or nickel alloy layer and thereby form a circuit in which the space between copper circuit lines is of a width that is double or more from the thickness of copper. This invention aims to form a circuit with a uniform circuit width, improve the etching properties in pattern etching, and prevent the occurrence of short circuits and defects in the circuit width.
    • 提供一种形成电子电路的方法,其中在轧制的铜箔或电解铜箔的蚀刻侧上形成镍或镍合金层,将轧制的铜箔或电解铜箔结合到树脂基板上 得到覆铜层压板,随后在铜箔上涂覆用于形成电路的抗蚀剂图案,铜箔的不需要部分和覆铜层压板的镍或镍合金层除了抗蚀剂的部分 使用氯化铁水溶液的蚀刻溶液除去图案,进一步除去抗蚀剂,另外进行软蚀刻以除去残留的镍或镍合金层,从而形成电路,其中铜电路 线的宽度是铜的厚度的两倍或更多。 本发明旨在形成具有均匀电路宽度的电路,提高图案蚀刻中的蚀刻性能,并且防止电路宽度中的短路和缺陷的发生。
    • 9. 发明授权
    • Method of forming electronic circuit
    • 电子电路形成方法
    • US08357307B2
    • 2013-01-22
    • US13141753
    • 2009-12-22
    • Keisuke YamanishiKengo KaminagaRyo Fukuchi
    • Keisuke YamanishiKengo KaminagaRyo Fukuchi
    • H01B13/00
    • C23F1/02B32B15/08B32B15/20B32B2307/406B32B2307/50B32B2307/732B32B2457/08C23C22/05C23F1/14C25D3/562C25D5/022C25D5/12C25D5/48C25D7/0614H05K3/06H05K3/067H05K3/384H05K2201/0338H05K2201/0355H05K2203/0723
    • Provided is a method of forming an electronic circuit, wherein a nickel or nickel alloy layer is formed on an etching side of a rolled copper foil or an electrolytic copper foil, the rolled copper foil or the electrolytic copper foil is bonded to a resin substrate to obtain a copper-clad laminate, a resist pattern for forming a circuit is subsequently applied on the copper foil, any unwanted portion of the copper foil and the nickel or nickel alloy layer of the copper-clad laminate other than the portion to which the resist pattern was applied is removed using an etching solution of an aqueous ferric chloride, the resist is further removed, and soft etching is additionally performed in order to remove the remnant nickel or nickel alloy layer and thereby form a circuit in which the space between copper circuit lines is of a width that is double or more from the thickness of copper. This invention aims to form a circuit with a uniform circuit width, improve the etching properties in pattern etching, and prevent the occurrence of short circuits and defects in the circuit width.
    • 提供一种形成电子电路的方法,其中在轧制的铜箔或电解铜箔的蚀刻侧上形成镍或镍合金层,将轧制的铜箔或电解铜箔结合到树脂基板上 得到覆铜层压板,随后在铜箔上涂覆用于形成电路的抗蚀剂图案,铜箔的不需要部分和覆铜层压板的镍或镍合金层除了抗蚀剂的部分 使用氯化铁水溶液的蚀刻溶液除去图案,进一步除去抗蚀剂,另外进行软蚀刻以除去残留的镍或镍合金层,从而形成电路,其中铜电路 线的宽度是铜的厚度的两倍或更多。 本发明旨在形成具有均匀电路宽度的电路,提高图案蚀刻中的蚀刻性能,并且防止电路宽度中的短路和缺陷的发生。