专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07625604B2 Heat treatment method and heat treatment apparatus 有权
标题翻译：热处理方法和热处理装置
公开(公告)号：US07625604B2
公开(公告)日：2009-12-01
申请号：US10523803
申请日：2003-08-08
申请人： Keisuke Suzuki , Wenling Wang , Tsukasa Yonekawa , Toshiyuki Ikeuchi , Toru Sato
发明人： Keisuke Suzuki , Wenling Wang , Tsukasa Yonekawa , Toshiyuki Ikeuchi , Toru Sato
IPC分类号： C23C16/00
CPC分类号： H01L21/67253 , C23C16/46 , C23C16/52 , H01L21/0217 , H01L21/02211 , H01L21/02238 , H01L21/02255 , H01L21/02271 , H01L21/31662 , H01L21/67109 , H01L21/67248 , H01L22/20 , Y10T436/25
摘要： The present invention relates to a thermal processing method includes a first thermal processing step that carries out thermal processing steps using a plurality of first substrates, wherein thin films are formed on surfaces of the plurality of first substrates by means of less consumption of the process gas than on surfaces of production substrates. Then, a second thermal processing step carries out thermal processing steps by using a plurality of second substrates, wherein thin films are formed on surfaces of the plurality of second substrates by means of more consumption of the process gas than on the surfaces of the plurality of first substrates, and wherein heating units are respectively adjusted to respective temperature set values set during the previous step. Then, a third thermal processing step carries out thermal processing steps by using production substrates as the plurality of substrates, wherein the plurality of heating units are respectively adjusted to the respective temperature set values corrected during the previous step.
摘要翻译：热处理方法技术领域本发明涉及一种热处理方法，其包括使用多个第一基板进行热处理步骤的第一热处理步骤，其中通过较少的处理气体的消耗在多个第一基板的表面上形成薄膜比生产基板的表面。然后，第二热处理步骤通过使用多个第二基板进行热处理步骤，其中通过更多的处理气体的消耗而在多个第二基板的表面上形成薄膜，而不是在多个第二基板的表面上形成薄膜第一基板，并且其中加热单元分别被调整到在前一步骤期间设置的相应温度设定值。然后，第三热处理步骤通过使用生产基板作为多个基板来进行热处理步骤，其中多个加热单元分别被调整到在前一步骤期间校正的各个温度设定值。

2. 发明申请

US20050201894A1 Heat treatment method and heat treament apparatus 有权
公开(公告)号：US20050201894A1
公开(公告)日：2005-09-15
申请号：US10523803
申请日：2003-08-08
申请人： Keisuke Suzuki , Wenling Wang , Tsukasa Yonekawa , Toshiyuki Ikeuchi , Toru Sato
发明人： Keisuke Suzuki , Wenling Wang , Tsukasa Yonekawa , Toshiyuki Ikeuchi , Toru Sato
IPC分类号： H01L21/31 , C23C16/46 , C23C16/52 , H01L21/00 , H01L21/316 , H01L21/66 , B01L3/00 , G01N1/00
CPC分类号： H01L21/67253 , C23C16/46 , C23C16/52 , H01L21/0217 , H01L21/02211 , H01L21/02238 , H01L21/02255 , H01L21/02271 , H01L21/31662 , H01L21/67109 , H01L21/67248 , H01L22/20 , Y10T436/25
摘要： The present invention relates to a thermal processing method including thermal processing steps having: a step of holding a plurality of substrates by means of a substrate holder, a step of conveying the substrate holder into a reaction container, a step of heating a plurality of zones of thermal process atmosphere in the reaction container by means of a plurality of heating units, respectively, and a step of forming thin films on surfaces of the plurality of substrates by introducing a process gas into the reaction container. The thermal processing method includes: a first thermal processing step of carrying out the thermal processing steps by using a plurality of first substrates as the plurality of substrates, wherein thin films are formed on surfaces of the plurality of first substrates by means of less consumption of the process gas than on surfaces of production substrates; a first measuring step of measuring a thickness of the thin films formed on the surfaces of the plurality of first substrates for each of the plurality of zones of the thermal process atmosphere in the reaction container; and a first setting step of setting respective temperature set values of the plurality of heating units in such a manner that the thickness measured for each of the plurality of zones substantially coincides with a target thickness of thin films to be formed on the surfaces of production substrates, based on measurement result of the first measuring step. Then, a second thermal processing step of carrying out the thermal processing steps by using a plurality of second substrates as the plurality of substrates, wherein thin films are formed on surfaces of the plurality of second substrates by means of more consumption of the process gas than on the surfaces of the plurality of first substrates, and wherein the plurality of heating units are respectively adjusted to the respective temperature set values set by the first setting step; a second measuring step of measuring a thickness of the thin films formed on the surfaces of the plurality of second substrates for each of the plurality of zones of the thermal process atmosphere in the reaction container; and a second correcting step of correcting the respective temperature set values of the plurality of heating units in such a manner that the thickness measured for each of the plurality of zones substantially coincides with the target thickness of thin films to be formed on the surfaces of production substrates, based on measurement result of the second measuring step; are carried out. Then, a third thermal processing step of carrying out the thermal processing steps by using at least a plurality of production substrates as the plurality of substrates, wherein the plurality of heating units are respectively adjusted to the respective temperature set values corrected by the second correcting step, is carried out.

3. 发明授权

US07304002B2 Method of oxidizing member to be treated 有权
标题翻译：氧化待处理物质的方法
公开(公告)号：US07304002B2
公开(公告)日：2007-12-04
申请号：US10519451
申请日：2003-07-07
申请人： Tatsuo Nishita , Tsukasa Yonekawa , Keisuke Suzuki , Toru Sato
发明人： Tatsuo Nishita , Tsukasa Yonekawa , Keisuke Suzuki , Toru Sato
IPC分类号： H01L21/469 , H01L21/31
CPC分类号： H01L21/02238 , H01L21/02233 , H01L21/02255 , H01L21/31658
摘要： A method for oxidation of an object to be processed is provided wherein an oxide film can provide favorable film quality and a laminate structure of nitride film and oxide film can be obtained by a thermal oxidation of a nitride film.In a method for oxidation of a surface of an object to be processed in a single processing container 8 which can contain a plurality of objects to be processed, at least a nitride film is exposed on said surface, and said oxidation is performed by mainly using active hydroxyl/oxygen species in a vacuum atmosphere, setting a processing pressure to 133 Pa or below, and setting a processing temperature to 400° C. or above. Under these conditions, high interplanar uniformity is maintained and oxide films with favorable film quality are obtained by oxidizing nitride films on the surfaces of a plurality of objects to be processed.
摘要翻译：提供了一种用于氧化被处理物体的方法，其中氧化物膜可以提供良好的膜质量，并且可以通过氮化物膜的热氧化获得氮化物膜和氧化物膜的层压结构。

4. 发明申请

US20060094248A1 Method of oxidizing member to be treated 有权
标题翻译：氧化待处理物质的方法
公开(公告)号：US20060094248A1
公开(公告)日：2006-05-04
申请号：US10519451
申请日：2003-07-07
申请人： Tatsuo Nishita , Tsukasa Yonekawa , Keisuke Suzuki , Toru Sato
发明人： Tatsuo Nishita , Tsukasa Yonekawa , Keisuke Suzuki , Toru Sato
IPC分类号： H01L21/31
CPC分类号： H01L21/02238 , H01L21/02233 , H01L21/02255 , H01L21/31658
摘要： A method for oxidation of an object to be processed is provided wherein an oxide film can provide favorable film quality and a laminate structure of nitride film and oxide film can be obtained by a thermal oxidation of a nitride film. In a method for oxidation of a surface of an object to be processed in a single processing container 8 which can contain a plurality of objects to be processed, at least a nitride film is exposed on said surface, and said oxidation is performed by mainly using active hydroxyl/oxygen species in a vacuum atmosphere, setting a processing pressure to 133 Pa or below, and setting a processing temperature to 400° C. or above. Under these conditions, high interplanar uniformity is maintained and oxide films with favorable film quality are obtained by oxidizing nitride films on the surfaces of a plurality of objects to be processed.
摘要翻译：提供了一种用于氧化被处理物体的方法，其中氧化物膜可以提供良好的膜质量，并且可以通过氮化物膜的热氧化获得氮化物膜和氧化物膜的层压结构。在可以容纳多个待处理物体的单个处理容器8中对待处理物体的表面进行氧化的方法中，至少在所述表面露出氮化物膜，主要使用活性羟基/氧物质，将处理压力设定在133Pa以下，将处理温度设定为400℃以上。在这些条件下，通过在多个待处理物体的表面上氧化氮化物膜，维持高的晶面间均匀性，获得具有良好的膜质量的氧化物膜。

5. 发明授权

US10426440B2 Subject information obtaining apparatus, method for obtaining subject information, and program 有权
公开(公告)号：US10426440B2
公开(公告)日：2019-10-01
申请号：US14342342
申请日：2012-08-29
申请人： Kenichi Nagae , Hirofumi Taki , Takuya Sakamoto , Toru Sato
发明人： Kenichi Nagae , Hirofumi Taki , Takuya Sakamoto , Toru Sato
IPC分类号： A61B8/08 , G01S7/52 , G01S15/89
摘要： A subject information obtaining apparatus includes: a plurality of conversion elements configured to receive an elastic wave and convert the elastic wave into a plurality of received signals, a storage unit configured to store a plurality of reference signals corresponding to shapes of the object inside a subject, and an FDI adaptive processing unit configured to execute the FDI method and the adaptive signal processing using the plurality of received signals and two or more reference signals among the plurality of reference signals, in order to obtain two or more power intensity distributions for the two or more reference signals.

6. 发明授权

US09448100B2 Signal processing apparatus 有权
标题翻译：信号处理装置
公开(公告)号：US09448100B2
公开(公告)日：2016-09-20
申请号：US13981233
申请日：2012-02-01
申请人： Kenichi Nagae , Hirofumi Taki , Toru Sato
发明人： Kenichi Nagae , Hirofumi Taki , Toru Sato
IPC分类号： G01F17/00 , G01H1/00 , A61B8/14 , A61B8/00 , A61B8/08 , G01S7/52 , G01S15/89
CPC分类号： G01H1/00 , A61B8/14 , A61B8/4488 , A61B8/483 , A61B8/5207 , G01S7/52036 , G01S7/52073 , G01S15/8977
摘要： Provided is a signal processing apparatus including: a transducer that performs scanning through the interior of an object and acquires received waveform data of a plurality of scanlines; an intensity screening unit that outputs a high intensity position at which signal intensity calculated from the received waveform data is higher than a first predetermined value; a correlation calculation unit that calculates a correlation value in a constant-width division for received waveform data of a first scanline and of a second scanline having a predetermined correlation with the first scanline; a position extraction unit that extracts, as a candidate position of a singular region, a position which corresponds to a high intensity position and for which the correlation value is lower than a second predetermined value; and an image processor that performs signal processing of generating image data of the object on the basis of the received waveform data.
摘要翻译：提供一种信号处理装置，包括：换能器，其通过物体内部进行扫描并获取多条扫描线的接收波形数据; 强度筛选单元，其输出从接收波形数据计算出的信号强度高于第一预定值的高强度位置; 相关计算单元，计算与第一扫描线具有预定相关性的第一扫描线和第二扫描线的接收波形数据的恒定宽度除法的相关值; 位置提取单元，其提取与高强度位置对应的位置，并且所述相关值低于第二预定值的单个区域的候选位置; 以及图像处理器，其基于接收到的波形数据执行产生对象的图像数据的信号处理。

7. 发明申请

US20130338944A1 SIGNAL PROCESSING APPARATUS 有权
标题翻译：信号处理装置
公开(公告)号：US20130338944A1
公开(公告)日：2013-12-19
申请号：US13981233
申请日：2012-02-01
申请人： Kenichi Nagae , Hirofumi Taki , Toru Sato
发明人： Kenichi Nagae , Hirofumi Taki , Toru Sato
IPC分类号： G01H1/00
CPC分类号： G01H1/00 , A61B8/14 , A61B8/4488 , A61B8/483 , A61B8/5207 , G01S7/52036 , G01S7/52073 , G01S15/8977
摘要： Provided is a signal processing apparatus including: an transducer that performs scanning over the interior of an object and acquires received waveform data of a plurality of scanlines; an intensity screening unit that outputs a high intensity position at which signal intensity calculated from the received waveform data is higher than a first predetermined value; a correlation calculation unit that calculates a correlation value in a constant-width division for received waveform data of a first scanline and of a second scanline having a predetermined correlation with the first scanline; a position extraction unit that extracts, as a candidate position of a singular region, a position which corresponds to a high intensity position and for which the correlation value is lower than a second predetermined value; and an image processor that performs signal processing of generating image data of the object on the basis of the received waveform data.
摘要翻译：提供一种信号处理装置，包括：换能器，其对物体内部执行扫描并获取多条扫描线的接收波形数据; 强度筛选单元，其输出从接收波形数据计算出的信号强度高于第一预定值的高强度位置; 相关计算单元，计算与第一扫描线具有预定相关性的第一扫描线和第二扫描线的接收波形数据的恒定宽度除法的相关值; 位置提取单元，其提取与高强度位置对应的位置，并且所述相关值低于第二预定值的单个区域的候选位置; 以及图像处理器，其基于接收到的波形数据执行产生对象的图像数据的信号处理。

8. 发明申请

US20120293359A1 RADAR IMAGING APPARATUS, IMAGING METHOD, AND PROGRAM THEREOF 有权
标题翻译：雷达成像装置，成像方法及其程序
公开(公告)号：US20120293359A1
公开(公告)日：2012-11-22
申请号：US13478323
申请日：2012-05-23
申请人： Takeshi FUKUDA , Kenichi Inoue , Toru Sato , Takuya Sakamoto , Kenshi Saho
发明人： Takeshi FUKUDA , Kenichi Inoue , Toru Sato , Takuya Sakamoto , Kenshi Saho
IPC分类号： G01S13/89 , G01S13/42 , G01S13/64 , G01S13/28
CPC分类号： G01S13/288 , G01S3/48 , G01S13/64 , G01S13/89 , G01S2007/2886
摘要： A radar imaging apparatus includes: (i) a delay code generation unit which repeats, for M scan periods, scan processing of generating, using a transmission code, N delay codes in a scan period for scanning N range gates having mutually different distances from the radar imaging apparatus; (ii) a signal storage unit which stores, in association with a range gate and a scan period, a baseband signal; (iii) a memory control unit which repeatedly writes, in the signal storage unit, for the M scan periods, N demodulated signals corresponding to a single scan period, and reads out a group of M demodulated signals corresponding to mutually different scan periods; (iv) a Doppler frequency discrimination unit which performs frequency analysis on demodulated signals having the same range gate; and (v) a direction of arrival calculation unit which estimates a direction of a target.
摘要翻译：一种雷达成像装置包括：（i）延迟码生成单元，对于M个扫描周期，重复使用发送码的扫描处理，用于扫描周期中的N个延迟码，用于扫描距离雷达成像装置; （ii）信号存储单元，其与范围门和扫描周期相关联地存储基带信号; （iii）存储器控制单元，其在信号存储单元中重复地在M个扫描周期中写入与单个扫描周期相对应的N个解调信号，并且读出对应于相互不同的扫描周期的一组M个解调信号; （iv）对具有相同范围门的解调信号进行频率分析的多普勒频率鉴别单元; 和（v）估计目标方向的到达方向计算单元。

9. 发明申请

US20120242389A1 SENSOR CONTROL CIRCUIT AND SENSOR SYSTEM 审中-公开
标题翻译：传感器控制电路和传感器系统
公开(公告)号：US20120242389A1
公开(公告)日：2012-09-27
申请号：US13237042
申请日：2011-09-20
申请人： Toru Sato , Maho Kuwahara , Yosuhiro Hayashi
发明人： Toru Sato , Maho Kuwahara , Yosuhiro Hayashi
IPC分类号： H03L5/00
CPC分类号： H03L5/00 , H03F3/005 , H03F3/211 , H03F3/217 , H03F3/45475 , H03F2200/261 , H03F2200/78 , H03F2203/45522 , H03F2203/45528 , H03F2203/45594 , H03G1/0094 , H03G3/008
摘要： A sensor control circuit according to the present embodiment is provided with an autonomous-oscillation loop part configured to generate a sensor-modulated signal having a carrier signal and an alternating signal output by a sensor and superposed on the carrier signal having the same frequency as the alternating signal, and an amplitude adjustment loop part configured to generate a control signal for amplitude adjustment of the carrier signal, by digital processing of a result of comparison between the carrier signal and a reference voltage level. The autonomous-oscillation loop part includes an amplifier configured to perform amplitude adjustment of the carrier signal, and a switched capacitor having a switch configured to be switched by the control signal, the switched capacitor configured to be capable of controlling a gain of the amplifier in accordance with a switching frequency of the switch.
摘要翻译：根据本实施例的传感器控制电路设置有自主振荡环路部分，被配置为产生具有载波信号和由传感器输出的交流信号的传感器调制信号，并叠加在与交替信号以及被配置为通过对载波信号和参考电压电平进行比较的结果的数字处理来产生用于载波信号的幅度调整的控制信号的幅度调整环路部分。自主振荡环路部分包括被配置为执行载波信号的幅度调整的放大器和具有被配置为由控制信号切换的开关的开关电容器，该开关电容器被配置为能够控制放大器的增益按照开关的开关频率。

10. 发明申请

US20100231114A1 CONDUCTIVE MEMBER, SPACER MADE OF THE CONDUCTIVE MEMBER, AND IMAGE DISPLAY APPARATUS 审中-公开
标题翻译：导电构件，导电构件的间隔件和图像显示装置
公开(公告)号：US20100231114A1
公开(公告)日：2010-09-16
申请号：US12282378
申请日：2008-04-22
申请人： Toru Sato , Shingo Eguchi , Noriaki Oguri
发明人： Toru Sato , Shingo Eguchi , Noriaki Oguri
IPC分类号： H01J5/00 , H01B1/02
CPC分类号： H01B1/16 , H01J29/864 , H01J31/127 , H01J2329/864 , H01J2329/8645
摘要： The present invention provides a conductive member that can be produced at low costs and has excellent resistance temperature characteristics, a spacer made of the conductive member, and an image display apparatus using the spacer. More specifically, the conductive member according to the present invention is a conductive member comprising a base material and conductive particles whose conductivity is larger than that of the base material dispersed in the base material, and the conductive particles are dispersed in the base material in such a way that activation energy of the conductive member is 0.3 eV or less and volume resistivity of the conductive member is 105 Ωcm or more.
摘要翻译：本发明提供一种可以以低成本制造并且具有优异的电阻温度特性的导电构件，由导电构件制成的间隔件和使用间隔件的图像显示装置。更具体地，根据本发明的导电构件是包括基材的导电构件和其导电性大于分散在基材中的基材的导电性粒子的导电性粒子，并且导电性粒子分散在基材中导电部件的活化能为0.3eV以下，导电部件的体积电阻率为105Ω·cm以上的方式。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式