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    • 3. 发明授权
    • Aluminum nitride wiring substrate and method for production thereof
    • 氮化铝接线基板及其制造方法
    • US5928769A
    • 1999-07-27
    • US821448
    • 1997-03-21
    • Jun MonmaHironori Asai
    • Jun MonmaHironori Asai
    • B32B15/01B32B15/02H01L23/13H05K1/03H05K1/09H05K3/46B32B15/04
    • H05K1/092B32B15/01B32B15/02H05K3/4629Y10S428/901Y10T428/24926
    • This invention provides an aluminum nitride wiring substrate in which a wiring metal layer for forming a signal wiring layer is densified to micropattern a signal wiring portion of an aluminum nitride package incorporating a semiconductor element therein and to increase the signal processing speed of the semiconductor element itself, the electric resistance of the wiring metal layer is reduced while keeping high thermal conductivity and insulating characteristics inherent in the aluminum nitride material to make it possible to mount a high-speed and high-output semiconductor element, and the wiring metal layer is prevented from defective wire continuity, odd appearance, or etc, and a method for the production thereof. In an aluminum nitride wiring substrate comprising an aluminum nitride substrate and a wiring metal layer provided in at least either of the surface and the interior of the aluminum nitride substrate and formed by sintering the aluminum nitride wiring substrate and the wiring metal layer, the wiring metal layer contains manganese and at least one selected from the group consisting of copper, silver, a copper alloy, and a silver alloy.
    • 本发明提供了一种氮化铝配线基板,其中用于形成信号布线层的布线金属层被致密化以将其中包含半导体元件的氮化铝封装的信号布线部分微图形化,并且增加半导体元件本身的信号处理速度 在保持高导热率和氮化铝材料固有的绝缘特性的同时,减少了布线金属层的电阻,从而能够安装高速高输出半导体元件,并且防止了布线金属层 导线连续性不佳,外观奇怪等,以及其制造方法。 在包含氮化铝衬底和设置在氮化铝衬底的表面和内部的至少之一中并通过烧结氮化铝配线衬底和布线金属层而形成的布线金属层的氮化铝布线衬底中,布线金属 层含有锰和选自铜,银,铜合金和银合金中的至少一种。