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1. 发明申请

US20050253519A1 Plasma display panel, its manufacturing method, and its protective layer material 失效
标题翻译：等离子显示面板，其制造方法及其保护层材料
公开(公告)号：US20050253519A1
公开(公告)日：2005-11-17
申请号：US10517782
申请日：2004-03-03
申请人： Kazuyuki Hasegawa , Yoshinao Oe , Hiroyuki Kado , Kaname Mizokami , Hirokazu Nakaue
发明人： Kazuyuki Hasegawa , Yoshinao Oe , Hiroyuki Kado , Kaname Mizokami , Hirokazu Nakaue
IPC分类号： H01J9/02 , H01J11/12 , H01J11/22 , H01J11/34 , H01J11/40 , H01J17/49
CPC分类号： H01J11/12 , H01J9/02 , H01J11/40
摘要： The present invention provides a plasma display panel that has a fast response in discharge generation to voltage application owing to a short discharge delay time, and at the same time suppresses the change in the discharge delay time to temperature. In the plasma display panel, dielectric layer (9) is formed so that it covers scanning electrode (5) and sustain electrode (6) formed on front substrate (4), and protective layer (10) is formed on dielectric layer (9), where protective layer (10) includes carbon and silicon, and in addition, protective layer (10) is made of magnesium oxide including silicon of 5×1018 atoms/cm3 to 2×1021 atoms/cm3 and carbon of 1×1018 atoms/cm3 to 2×1021 atoms/cm3.
摘要翻译：本发明提供了一种等离子体显示面板，其由于放电延迟时间短而对放电产生对施加电压具有快速响应，并且同时抑制了放电延迟时间对温度的变化。在等离子体显示面板中，形成电介质层（9），覆盖形成在前基板（4）上的扫描电极（5）和维持电极（6），在电介质层（9）上形成保护层（10），其中保护层（10）包括碳和硅，此外，保护层（10）由包含5×10 18原子/ cm 3的硅的氧化镁制成，至 2×10 21原子/ cm 3和1×10 18原子/ cm 3至2×10 12的碳， / SUP> atoms / cm 3。

2. 发明授权

US07196472B2 Plasma display panel, its manufacturing method, and its protective layer material 失效
标题翻译：等离子显示面板，其制造方法及其保护层材料
公开(公告)号：US07196472B2
公开(公告)日：2007-03-27
申请号：US10517782
申请日：2004-03-03
申请人： Kazuyuki Hasegawa , Yoshinao Oe , Hiroyuki Kado , Kaname Mizokami , Hirokazu Nakaue
发明人： Kazuyuki Hasegawa , Yoshinao Oe , Hiroyuki Kado , Kaname Mizokami , Hirokazu Nakaue
IPC分类号： H01J17/49 , H01J9/00 , H01J9/24
CPC分类号： H01J11/12 , H01J9/02 , H01J11/40
摘要： The present invention provides a plasma display panel that has a fast response in discharge generation to voltage application owing to a short discharge delay time, and at the same time suppresses the change in the discharge delay time to temperature. In the plasma display panel, dielectric layer (9) is formed so that it covers scanning electrode (5) and sustain electrode (6) formed on front substrate (4), and protective layer (10) is formed on dielectric layer (9), where protective layer (10) includes carbon and silicon, and in addition, protective layer (10) is made of magnesium oxide including silicon of 5×1018 atoms/cm3 to 2×1021 atoms/cm3 and carbon of 1×1018 atoms/cm3 to 2×1021 atoms/cm3.
摘要翻译：本发明提供了一种等离子体显示面板，其由于放电延迟时间短而对放电产生对施加电压具有快速响应，并且同时抑制了放电延迟时间对温度的变化。在等离子体显示面板中，形成电介质层（9），覆盖形成在前基板（4）上的扫描电极（5）和维持电极（6），在电介质层（9）上形成保护层（10），其中保护层（10）包括碳和硅，此外，保护层（10）由包含5×10 18原子/ cm 3的硅的氧化镁制成，至 2×10 21原子/ cm 3和1×10 18原子/ cm 3至2×10 12的碳， / SUP> atoms / cm 3。

3. 发明授权

US07462989B2 Plasma display panel, method for producing same and material for protective layer of such plasma display panel 失效
标题翻译：等离子体显示面板，其制造方法以及等离子体显示面板的保护层材料
公开(公告)号：US07462989B2
公开(公告)日：2008-12-09
申请号：US10520905
申请日：2004-05-14
申请人： Kazuyuki Hasegawa , Yoshinao Oe , Kaname Mizokami , Hirokazu Nakaue , Hiroyuki Kado
发明人： Kazuyuki Hasegawa , Yoshinao Oe , Kaname Mizokami , Hirokazu Nakaue , Hiroyuki Kado
IPC分类号： H01J17/49
CPC分类号： H01J11/12 , H01J9/02 , H01J11/40
摘要： A plasma display panel (PDP) includes front plate, scan electrodes and sustain electrodes both formed on front plate, dielectric layer covering scan and sustain electrodes, and protective layer formed on dielectric layer. Protective layer contains silicon (Si) and nitrogen (N), and is made of magnesium oxide (MgO) including Si of which atoms count in the range from 5×1018 pieces/cm3 to 8×1021 pieces/cm3. The foregoing construction allows the PDP to shorten a discharge-delay time, achieve a quick response of discharge to a voltage applied, and suppress changes of the discharge-delay time with respect to a temperature.
摘要翻译：等离子体显示面板（PDP）包括前板，扫描电极和维持电极，两者都形成在前板，介电层覆盖扫描和维持电极以及形成在电介质层上的保护层。保护层含有硅（Si）和氮（N），并且由包含Si的氧化镁（MgO）制成，其中原子计数在5×10 18个/ cm 3至8×10 21个/ cm 3的范围内。上述结构允许PDP缩短放电延迟时间，实现对施加的电压的放电的快速响应，并且抑制放电延迟时间相对于温度的变化。

4. 发明申请

US20050258753A1 Plasma display panel, method for producing same and material for protective layer of such plasma display panel 失效
标题翻译：等离子体显示面板，其制造方法以及等离子体显示面板的保护层材料
公开(公告)号：US20050258753A1
公开(公告)日：2005-11-24
申请号：US10520905
申请日：2004-05-14
申请人： Kazuyuki Hasegawa , Yoshinao Oe , Kaname Mizokami , Hirokazu Nakaue
发明人： Kazuyuki Hasegawa , Yoshinao Oe , Kaname Mizokami , Hirokazu Nakaue
IPC分类号： C23C14/24 , H01J9/02 , H01J11/12 , H01J11/22 , H01J11/24 , H01J11/26 , H01J11/34 , H01J11/40 , H01J17/49
CPC分类号： H01J11/12 , H01J9/02 , H01J11/40
摘要： A plasma display panel (PDP) includes front plate, scan electrodes and sustain electrodes both formed on front plate, dielectric layer covering scan and sustain electrodes, and protective layer formed on dielectric layer. Protective layer contains silicon (Si) and nitrogen (N), and is made of magnesium oxide (MgO) including Si of which atoms count in the range from 5×1018 pieces/cm3 to 8×1021 pieces/cm3. The foregoing construction allows the PDP to shorten a discharge-delay time, achieve a quick response of discharge to a voltage applied, and suppress changes of the discharge-delay time with respect to a temperature.
摘要翻译：等离子体显示面板（PDP）包括前板，扫描电极和维持电极，两者都形成在前板，介电层覆盖扫描和维持电极以及形成在电介质层上的保护层。保护层含有硅（Si）和氮（N），并且由包含Si的氧化镁（MgO）制成，其中原子计数在5×10 18个/ cm 3 / 超过8×10 21个/ cm 3。上述结构允许PDP缩短放电延迟时间，实现对施加的电压的放电的快速响应，并且抑制放电延迟时间相对于温度的变化。

5. 发明授权

US5203924A Method of and apparatus for synthesizing diamondlike thin film 失效
标题翻译：用于合成DIAMONDLIKE薄膜的方法和装置
公开(公告)号：US5203924A
公开(公告)日：1993-04-20
申请号：US558241
申请日：1990-07-26
申请人： Tsutomu Mitani , Hirokazu Nakaue , Hideo Kurokawa
发明人： Tsutomu Mitani , Hirokazu Nakaue , Hideo Kurokawa
IPC分类号： C23C16/26 , C23C16/452 , C23C16/54 , H01J37/32
CPC分类号： H01J37/32449 , C23C16/26 , C23C16/452 , C23C16/545 , H01J37/32082 , H01J37/32357 , H01J2237/338 , H01J2237/339 , Y10S427/106
摘要： A method of and an apparatus for synthesizing a diamondlike thin film on a substrate, the method comprising the steps of: generating plasma of gas containing hydrocarbon gas, in a first vacuum vessel having an inflow portion and an outflow portion for the gas such that the substrate is provided in a second vacuum vessel maintained at a pressure lower, by one figure or more, than that of the first vacuum vessel due to flow resistance of the gas between the outflow portion and the substrate; and irradiating the plasma onto the substrate by pressure difference between the first vacuum vessel and the second vacuum vessel while an AC power is being applied to at least one of the substrate and an internal electrode provided in the first vacuum vessel.

6. 发明授权

US5320877A Method for forming thin film and apparatus therefor 失效
标题翻译：薄膜形成方法及其设备
公开(公告)号：US5320877A
公开(公告)日：1994-06-14
申请号：US785752
申请日：1991-10-31
申请人： Hirokazu Nakaue , Hideo Kurokawa , Tsutomo Mitani
发明人： Hirokazu Nakaue , Hideo Kurokawa , Tsutomo Mitani
IPC分类号： C23C14/24 , C23C14/34 , C23C14/50 , C23C16/27 , C23C16/44 , C23C16/458 , B05D3/06 , B05C13/00 , B05D3/12
CPC分类号： C23C14/505
摘要： In an apparatus for forming a thin film on substrates, two substrate supporters having respective recesses therein are connected by a shaft so that the recesses oppose one another, and opposing ends of many rod-like substrates are supported on the side walls of the recesses. Then, the substrates are rotated on the side walls as the substrate supporters are revolved, and the substrates shift their positions under their own weight. In this state, deposition particles impinge against the substrates from a material source, while the rod-like substrates are stirred so that each region of the outer peripheries thereof has an equal probability of having the film deposited thereon. Thus, a uniform thin film is formed on the surface of every substrate. The numbers of recesses may be two or more. Further, a nest of substrate supporters may be used.
摘要翻译：在用于在基板上形成薄膜的装置中，其中具有各自凹部的两个基板支撑件通过轴连接，使得凹部彼此相对，并且许多棒状基板的相对端支撑在凹部的侧壁上。然后，当基板支撑件旋转时，基板在侧壁上旋转，并且基板在它们自己的重量下移动它们的位置。在这种状态下，沉积颗粒从材料源撞击基板，同时搅拌棒状基板，使得其外周的每个区域具有沉积在其上的膜的相同概率。因此，在每个基板的表面上形成均匀的薄膜。凹部的数量可以是两个以上。此外，可以使用基底支持体的巢。

7. 发明授权

US08419911B2 Deposition method by physical vapor deposition and target for deposition processing by physical vapor deposition 失效
标题翻译：通过物理气相沉积沉积法和通过物理气相沉积沉积处理的目标物
公开(公告)号：US08419911B2
公开(公告)日：2013-04-16
申请号：US11339506
申请日：2006-01-26
申请人： Hideki Yamashita , Takafumi Okuma , Hiroshi Hayata , Hitoshi Yamanishi , Tadashi Kimura , Hirokazu Nakaue
发明人： Hideki Yamashita , Takafumi Okuma , Hiroshi Hayata , Hitoshi Yamanishi , Tadashi Kimura , Hirokazu Nakaue
IPC分类号： C23C14/06
CPC分类号： C23C14/3414 , H01J37/3423
摘要： A deposition apparatus includes a processing chamber internally having a reduced-pressure space for deposition process to be carried out therein, a base material holding member for holding a base material to be subjected to the deposition process, a target support member for supporting a target thereon, and a power supply unit for applying electric power to the target support member to generate a plasma in the reduced-pressure space. In the deposition apparatus, deposition process is carried out by using the target, which has a recess portion in its surface and in which a powder target formed of a powder material is placed in an inner surface of the recess portion. Thus, the in-plane uniformity of deposition rate is improved and a stable film deposition is fulfilled.
摘要翻译：沉积装置包括内部具有用于在其中进行沉积处理的减压空间的处理室，用于保持要进行沉积处理的基底材料的基材保持构件，用于支撑靶材的靶支撑构件以及用于向目标支撑构件施加电力以在减压空间中产生等离子体的电源单元。在沉积装置中，通过使用在其表面上具有凹部的靶，并且由粉末材料形成的粉末靶放置在凹部的内表面中来进行沉积工艺。因此，提高了沉积速率的面内均匀性，并且实现了稳定的膜沉积。

8. 发明授权

US5360483A Plasma CVD apparatus and method therefor 失效
标题翻译：等离子体CVD装置及其方法
公开(公告)号：US5360483A
公开(公告)日：1994-11-01
申请号：US030557
申请日：1993-03-12
申请人： Hideo Kurokawa , Tsutomu Mitani , Hirokazu Nakaue
发明人： Hideo Kurokawa , Tsutomu Mitani , Hirokazu Nakaue
IPC分类号： C23C16/26 , C23C16/452 , C23C16/50 , C23C16/00
CPC分类号： C23C16/26 , C23C16/452 , C23C16/50
摘要： A plasma CVD apparatus for continuously forming a diamond-like film on a length of magnetic tape, includes a first vacuum vessel, a plasma generating vessel for transforming a gaseous medium into a plasma, and an electrode for accelerating ions of the plasma toward the substrate. The plasma generating vessel has a gas outflow port of a shape complementary to that of the portion of the magnetic tape readied for deposition. A portion of the plasma generating vessel is disposed within the vacuum vessel, with the gas outflow port facing the substrate. A gap between the substrate and the gas outflow port is set to maintain the pressure of plasma in the gap uniform.
摘要翻译：一种用于在一段磁带上连续形成类金刚石膜的等离子体CVD装置包括第一真空容器，用于将气体介质转换成等离子体的等离子体发生容器和用于将等离子体的离子加速至衬底的电极。等离子体发生容器具有与准备用于沉积的磁带部分的形状互补的形状的气体流出口。等离子体发生容器的一部分设置在真空容器内，气体流出口面向衬底。衬底和气体流出口之间的间隙被设定为使间隙中的等离子体的压力保持均匀。

9. 发明申请

US20090096375A1 Plasma Display Panel and Method for Manufacturing Same 审中-公开
标题翻译：等离子显示面板及其制造方法
公开(公告)号：US20090096375A1
公开(公告)日：2009-04-16
申请号：US11918002
申请日：2006-04-07
申请人： Hideki Yamashita , Takafumi Okuma , Hiroshi Hayata , Yoshimasa Takii , Hirokazu Nakaue , Tadashi Kimura , Masaharu Terauchi
发明人： Hideki Yamashita , Takafumi Okuma , Hiroshi Hayata , Yoshimasa Takii , Hirokazu Nakaue , Tadashi Kimura , Masaharu Terauchi
IPC分类号： H01J17/49 , H01J9/20 , C23C14/34
CPC分类号： H01J9/02 , H01J11/12 , H01J11/40
摘要： A PDP, which has a plurality of display electrodes formed therein, and is provided with a front plate in which the display electrodes are covered with a first dielectric layer and a protective film and a back plate having a plurality of address electrodes that are formed in a direction orthogonal to the display electrode, and covered with a second dielectric layer (backing dielectric layer, is designed so that the protective film has a structure in which grain-state crystals are aggregated and a grain size of the crystals is large, with a void between adjacent crystals being formed with a small size.
摘要翻译：一种PDP，其具有形成在其中的多个显示电极，并且设置有前板，其中显示电极被第一介电层和保护膜覆盖，背板具有形成在多个位置电极中的多个寻址电极与显示电极正交的方向，被第二电介质层（背面电介质层）覆盖，被设计为使得保护膜具有粒状晶体聚集的结构和晶体的晶粒尺寸大，相邻晶体之间的空隙形成为小尺寸。

10. 发明申请

US20060272936A1 Deposition method by physical vapor deposition and target for deposition processing by physical vapor deposition 失效
公开(公告)号：US20060272936A1
公开(公告)日：2006-12-07
申请号：US11339506
申请日：2006-01-26
申请人： Hideki Yamashita , Takafumi Okuma , Hiroshi Hayata , Hitoshi Yamanishi , Tadashi Kimura , Hirokazu Nakaue
发明人： Hideki Yamashita , Takafumi Okuma , Hiroshi Hayata , Hitoshi Yamanishi , Tadashi Kimura , Hirokazu Nakaue
IPC分类号： C23C14/32 , C23C14/00
CPC分类号： C23C14/3414 , H01J37/3423
摘要： A deposition apparatus includes a processing chamber internally having a reduced-pressure space for deposition process to be carried out therein, a base material holding member for holding a base material to be subjected to the deposition process, a target support member for supporting a target thereon, and a power supply unit for applying electric power to the target support member to generate a plasma in the reduced-pressure space. In the deposition apparatus, deposition process is carried out by using the target, which has a recess portion in its surface and in which a powder target formed of a powder material is placed in an inner surface of the recess portion. Thus, the in-plane uniformity of deposition rate is improved and a stable film deposition is fulfilled.

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