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    • 1. 发明授权
    • Magneto-optical reproducing method using a magnified magnetic domain
    • 使用放大磁畴的磁光再现方法
    • US06298015B1
    • 2001-10-02
    • US09323995
    • 1999-06-02
    • Kazuyoshi IshiiMasakuni YamamotoKoichiro Nishikawa
    • Kazuyoshi IshiiMasakuni YamamotoKoichiro Nishikawa
    • G11B1100
    • G11B11/10595G11B11/10508G11B11/10515G11B11/10528G11B11/1053
    • A method for reproducing information from a magneto-optical medium which includes a memory layer composed of magnetic film and a displacement layer composed of a magnetic film laminated with the memory layer is provided. Information signals are recorded on magnetized areas arranged in a predetermined direction on the memory layer. Domain walls having arc shapes curved in the same direction are formed on borders of the magnetized areas. The method includes the steps of: forming a high temperature area having shape of a circle or an elongated circle in the medium by scanning an array of the magnetized areas on the memory layer with a light spot in a direction toward convexities of the arc shapes of the magnetized areas; transferring one of the magnetized areas together with a domain wall to the displacement layer when a front end of the high temperature area reaches a domain wall at a front end of one of the magnetized areas in the memory layer in accordance with the scanning with the light spot; displacing the domain wall of the magnetized area transferred to the displacement layer toward a center of the high temperature area to magnify the magnetized area; and reproducing information by detecting reflected rays of the light spot in a condition where the magnetized area transferred to the displacement layer is magnified.
    • 提供一种从包括由磁性膜构成的存储层和由层叠有存储层的磁性膜构成的位移层的磁光介质再现信息的方法。 信息信号被记录在存储层上沿预定方向布置的磁化区域上。 在磁化区域的边界上形成具有在相同方向上弯曲的弧形的畴壁。 该方法包括以下步骤:在介质中形成具有圆形或长圆形形状的高温区域,通过扫描存储层上的磁化区域的阵列,使光斑朝向凸起的方向凸出 磁化区域; 当高温区域的前端到达存储层中的一个磁化区域的前端处的畴壁时,根据用光的扫描,将一个磁化区域与畴壁一起转移到位移层 点; 将转移到位移层的磁化区域的畴壁朝向高温区域的中心移位,以放大磁化区域; 并且通过在转移到位移层的磁化区域被放大的状态下检测光斑的反射光线再现信息。
    • 2. 发明授权
    • Light exposure method
    • 曝光方法
    • US06322957B1
    • 2001-11-27
    • US09275444
    • 1999-03-24
    • Masakuni YamamotoKoichiro Nishikawa
    • Masakuni YamamotoKoichiro Nishikawa
    • G03F722
    • G03F7/70466B82Y10/00G03F7/70325G03F7/7035G03F7/70425G03F7/70566
    • A method of exposure to a light pattern containing a first strip-shaped portion extending in a first direction and a second strip-shaped portion extending in a second direction comprises steps of placing, on a light-receiving face, a first mask having a strip-shaped slit corresponding to the first strip-shaped portion extending in a first direction of the pattern, projecting, to the first mask, a first linearly polarized light beam polarized in the second direction to irradiate the light-receiving face through the slit of the first mask, removing the first mask from the light-receiving face, and placing, on the light-receiving face, a second mask having a strip-shaped slit corresponding to the second strip-shaped portion extending in a second direction of the pattern and projecting, to the second mask, a second linearly polarized light beam polarized in the first direction to irradiate the light-receiving face through the slit of the second mask.
    • 一种暴露于包含沿第一方向延伸的第一条形部分和沿第二方向延伸的第二条形部分的光图案的方法包括以下步骤:在光接收面上放置具有条带的第一掩模 形状的狭缝对应于在图案的第一方向上延伸的第一条形部分,向第一掩模投射沿第二方向偏振的第一线偏振光束,以通过所述第二方向的狭缝照射光接收面 第一掩模,从光接收面去除第一掩模,并且在受光面上放置第二掩模,第二掩模具有对应于在图案的第二方向延伸的第二条形部分的条形狭缝, 向所述第二掩模投射沿所述第一方向偏振的第二线偏振光束,以通过所述第二掩模的所述狭缝照射所述光接收面。
    • 6. 植物专利
    • Calendula plant named ‘20123-72D’
    • 金盏花植物名为“20123-72D”
    • USPP26717P2
    • 2016-05-10
    • US14121836
    • 2014-10-23
    • Koichiro Nishikawa
    • Koichiro Nishikawa
    • A01H5/02
    • A01H6/14A01H5/02
    • A new cultivar of Calendula plant, ‘20123-72D’, that is characterized by its strong, compact, creeping plant habit, its inflorescences with double ray florets that are yellow in color on the upper surface and orange in color on the lower surface and disk florets that are deep greyed-red in color, its long flowering time; blooming for 9 months from spring into winter in Noordwijkerhout, The Netherlands, its very high tolerance to powdery mildew, and its very high tolerance to heat and cold, withstanding temperatures below −20° C. in the winter and its ability to be readily propagated by stem cuttings.
    • 金盏花植物新品种“20123-72D”,其特征在于其强大,紧凑,爬行的植物习性,其花序具有双面小花,上表面为黄色,下表面为橙色, 深绿色的圆盘小花,开花时间长; 荷兰Noordwijkerhout从春季到冬季开花9个月,其对白粉病的耐受性非常高,冬季耐寒性低,-20℃以下,其易于繁殖的能力极强。 通过茎切。