专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5347356A Substrate aligning device using interference light generated by two beams irradiating diffraction grating 失效
$Substrate aligning device using interference light generated by two beams irradiating diffraction grating$
标题翻译：使用由两束照射衍射光栅产生的干涉光的基板对准装置
公开(公告)号：US5347356A
公开(公告)日：1994-09-13
申请号：US982129
申请日：1992-11-25
申请人： Kazuya Ota , Nobutaka Magome , Hideo Mizutani , Kouichiro Komatsu
发明人： Kazuya Ota , Nobutaka Magome , Hideo Mizutani , Kouichiro Komatsu
IPC分类号： G01B11/00 , G01B9/02 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F9/7049 , G01B9/02002 , G01B9/02003 , G01B9/02097 , G03F7/70633 , G03F7/70691 , G01B2290/30 , G01B2290/60 , G01B2290/70
摘要： An aligning device for aligning a substrate with a predetermined point on the basis of a detection signal from a photoelectric detector uses interference light generated by light diffracted from a diffraction grating. A calculating device calculates at least one of a crossing angle of two coherent beams irradiating the grating and the rotational error of a crossing line between a plane containing principal rays of the beams and the surface of the substrate, with respect to the direction of arrangement of the grating, based on the phase difference between detection signals of the photoelectric detector corresponding to interference light generated from different portions of the crossing area. The output of the calculating device may be used to adjust the crossing angle and/or to correct the rotational error.
摘要翻译：基于来自光电检测器的检测信号将基板与预定点对准的对准装置使用由衍射光栅衍射的光产生的干涉光。计算装置计算照射光栅的两个相干光束的交叉角度与包含光束的主光线和基板表面的平面之间的交叉线的旋转误差中的至少一个相对于基于光电检测器的检测信号之间的相位差对应于由交叉区域的不同部分产生的干涉光的光栅。可以使用计算装置的输出来调整交叉角度和/或校正旋转误差。

2. 发明授权

US5118953A Substrate alignment apparatus using diffracted and reflected radiation beams 失效
$Substrate alignment apparatus using diffracted and reflected radiation beams$
标题翻译：使用衍射和反射辐射束的基板对准装置
公开(公告)号：US5118953A
公开(公告)日：1992-06-02
申请号：US528244
申请日：1990-05-24
申请人： Kazuya Ota , Nobutaka Magome , Hideo Mizutani , Kouichiro Komatsu
发明人： Kazuya Ota , Nobutaka Magome , Hideo Mizutani , Kouichiro Komatsu
IPC分类号： G01B11/00 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F9/7065 , G03F9/7049
摘要： An alignment apparatus is provided with a first beam receiving device arranged to receive an interference beam which is produced at a diffraction grating of a substrate as a result of illumination with a pair of beams which intersect each other on the substrate, and a second beam receiving device arranged to receive a reference beam which is produced by the interference between regularly reflected beams of the pair of beams occurring on the substrate, wherein the positional offset of the substrate is obtained on the basis of a comparison between the output signal of the first beam receiving device and the output signal of the second beam receiving device. Since a beam transmitting path for transmitting a measurement beam is substantially common to a beam transmitting path for a reference beam, even if the fluctuations of air occur, both the measurement beam and the reference beam substantially equally reflect the influence of the fluctuations, whereby it is possible to cancel the same.
摘要翻译：对准装置设置有第一光束接收装置，该第一光束接收装置被布置成接收在基板的衍射光栅处产生的干涉光束，所述干涉光束是由于在基板上彼此相交的一对光束照明的结果而产生的，并且第二光束接收该设备被布置为接收由基板上出现的一对光束的规则反射光束之间的干涉产生的参考光束，其中基于第一光束的输出信号之间的比较获得基板的位置偏移接收装置和第二光束接收装置的输出信号。由于用于发送测量光束的光束传输路径对于参考光束的光束传输路径基本上是共同的，所以即使发生空气的波动，测量光束和参考光束都基本上等同地反映了波动的影响，由此有可能取消相同的。

3. 发明授权

US5568257A Adjusting device for an alignment apparatus 失效
标题翻译：对准装置的调整装置
公开(公告)号：US5568257A
公开(公告)日：1996-10-22
申请号：US441062
申请日：1995-05-15
申请人： Kazuya Ota , Hideo Mizutani , Kouichiro Komatsu
发明人： Kazuya Ota , Hideo Mizutani , Kouichiro Komatsu
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G01B9/02 , G01B11/00
CPC分类号： G03F9/70
摘要： The structure of an alignment apparatus is as follows: The illuminating areas of the two laser beams for the use of alignment, which are irradiated onto a diffraction grating on a substrate and a diffraction grating mark on a fiducial member, are relatively driven by a field diaphragm and a diaphragm member. A photoelectric detector receives the interference light generated from a first portion in the area on the above-mentioned diffraction mark where the two laser beams intersect following the above-mentioned relative driving, and receives the interference light generated from a second portion in the aforesaid area. A main control system calculates the intersecting angles or rotational error of the two laser beams on the basis of the phase difference of the detection signals from the aforesaid photoelectric detector. The intersecting angles or rotational error is corrected by allowing the parallel flat glasses, which are arranged on the light path, to be slanted.
摘要翻译：对准装置的结构如下：照射到基板上的衍射光栅上的两个用于对准的激光束的照明区域和基准部件上的衍射光栅标记相对地被场地驱动隔膜和隔膜构件。光电检测器接收由上述相关驱动之后两个激光束相交的上述衍射标记上的区域中的第一部分产生的干涉光，并接收由上述区域中的第二部分产生的干涉光。主控制系统根据来自上述光电检测器的检测信号的相位差来计算两个激光束的相交角或旋转误差。通过使布置在光路上的平行平板眼镜倾斜来校正交叉角度或旋转误差。

4. 发明授权

US5489986A Position detecting apparatus 失效
标题翻译：位置检测装置
公开(公告)号：US5489986A
公开(公告)日：1996-02-06
申请号：US233081
申请日：1994-04-25
申请人： Nobutaka Magome , Kazuya Ota , Hideo Mizutani , Kouichiro Komatsu
发明人： Nobutaka Magome , Kazuya Ota , Hideo Mizutani , Kouichiro Komatsu
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G03F9/70
摘要： In a position detecting apparatus having an object optical system, two beams are generated for irradiating a diffraction grating formed on an object from two directions at a predetermined intersect angle for forming an interference fringe, the beams passing through a pupil plane of the object optical system spaced apart a predetermined distance from each other. An opto-electric detector receives diffracted light from the grating via the object optical system and outputs a detection signal, and the position of the object is determined on the basis of the detection signal. An adjustable optical member provided in a light path between an optical source and the object changes incident angles at which the two beams are incident on the grating while keeping the intersect angle between the two beams substantially constant.
摘要翻译：在具有物体光学系统的位置检测装置中，产生两个光束，用于以形成干涉条纹的预定相交角从两个方向照射形成在物体上的衍射光栅，通过物镜光学系统的光瞳面彼此隔开预定的距离。光电检测器经由对象光学系统从光栅接收衍射光并输出检测信号，并且基于检测信号确定物体的位置。设置在光源和物体之间的光路中的可调节光学构件改变两个光束入射到光栅上的入射角，同时保持两个光束之间的相交角基本上恒定。

5. 发明授权

US5151750A Alignment apparatus 失效
标题翻译：校准装置
公开(公告)号：US5151750A
公开(公告)日：1992-09-29
申请号：US505504
申请日：1990-04-06
申请人： Nobutaka Magome , Kazuya Ota , Hideo Mizutani , Kouichiro Komatsu
发明人： Nobutaka Magome , Kazuya Ota , Hideo Mizutani , Kouichiro Komatsu
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F9/7049 , G03F7/70725 , G03F9/7076
摘要： There is disclosed an apparatus for transferring a reticle pattern onto a wafer, in which the reticle and the wafer are mutually aligned by irradiating an alignment mark of the wafer with light beams and detecting the optical information from the mark. Depending on the shape of the wafer mark, suitably selected is a first light beam passing through the center of entrance pupil of an objective optical system, or a pair of second light beams passing through the entrance pupil point-symmetrically with respect to its center. The wafer mark consists of a main mark and an auxiliary mark, and the main mark contains a diffraction grating pattern. The second paired light beams and the main mark are used for determining the positional error within an integral fraction of the pitch of the diffraction grating pattern, and the first light beam and the auxiliary mark are used for determining the positional error of an integral multiple of the pitch of the diffraction grating pattern.
摘要翻译：公开了一种用于将掩模版图案转印到晶片上的装置，其中通过用光束照射晶片的对准标记并且从标记检测光学信息来将标线片和晶片相互对准。根据晶片标记的形状，适当地选择通过物镜光学系统的入射光瞳的中心的第一光束或相对于其中心点对称地通过入射光瞳的一对第二光束。晶片标记由主标记和辅助标记组成，主标记包含衍射光栅图案。第二配对光束和主标记用于确定衍射光栅图案的间距的整数分数内的位置误差，并且第一光束和辅助标记用于确定衍射光栅图案的整数倍的位置误差衍射光栅图案的间距。

6. 发明授权

US5689339A Alignment apparatus 失效
标题翻译：校准装置
公开(公告)号：US5689339A
公开(公告)日：1997-11-18
申请号：US506132
申请日：1995-07-24
申请人： Kazuya Ota , Kouichirou Komatsu , Hideo Mizutani , Nobutaka Magome
发明人： Kazuya Ota , Kouichirou Komatsu , Hideo Mizutani , Nobutaka Magome
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G03F9/70
摘要： In an alignment apparatus for aligning a mask and a photosensitive substrate (a semiconductor wafer or glass plate applied with a photoresist), and which is suitably used in a projection exposure apparatus (a stepper or aligner), a proximity exposure apparatus, or the like used in a lithography process in the manufacture of a semiconductor element or a liquid crystal display element, two first beams and two second beams differing from the first beams may be radiated on a diffraction grating-like mask mark and a diffraction grating-like substrate mark, respectively, with the two second beams passing through a transparent region adjacent to the mask mark. By detecting diffracted light components of the two first beams and detecting diffracted light components of the two second beams, a relative position shift between the mask and the substrate can be determined. The alignment apparatus advantageously can reduce mixing of alignment light from a mask and alignment light from a wafer (substrate) to a minimum degree, or can sufficiently separate signals corresponding to these light components in a signal processing stage even when mixing inevitably occurs.
摘要翻译：在用于对准掩模和感光基板（涂有光致抗蚀剂的半导体晶片或玻璃板）的对准装置中，适用于投影曝光装置（步进机或对准器）中的接近曝光装置等用于制造半导体元件或液晶显示元件的光刻工艺中，可以将不同于第一光束的两个第一光束和两个第二光束照射在衍射光栅状掩模标记和衍射光栅样基板标记分别与两个第二光束通过与掩模标记相邻的透明区域。通过检测两个第一光束的衍射光分量并检测两个第二光束的衍射光分量，可以确定掩模和基板之间的相对位置偏移。对准装置有利地可以减少来自掩模的对准光和来自晶片（衬底）的对准光到最小程度的混合，或者即使当不可避免地发生混合时，也可以在信号处理阶段中充分地分离与这些光分量对应的信号。

7. 发明授权

US5488230A Double-beam light source apparatus, position detecting apparatus and aligning apparatus 失效
公开(公告)号：US5488230A
公开(公告)日：1996-01-30
申请号：US91501
申请日：1993-07-14
申请人： Hideo Mizutani , Kazuya Ota
发明人： Hideo Mizutani , Kazuya Ota
IPC分类号： G03F9/00 , G01N21/86 , H04N1/00
CPC分类号： G03F9/7049 , G03F9/7076
摘要： A position detecting apparatus comprises a double-beam producing device for producing two beams different in frequency from each other, which are guided to irradiate a diffraction grating on an object to be inspected in two predetermined directions, and a detector photoelectrically detecting through an objective optical system diffracted light produced by the diffraction grating, in which the double-beam producing device comprises a light source for supplying a beam of a single wavelength or multiple wavelengths, a beam splitting device for splitting the beam from the light source into two predetermined beams, a relay optical system for converging the two split beams at a predetermined position, and a frequency difference producing device disposed at or near a converging position by the relay optical system, for producing a predetermined frequency difference between the two split beams.

8. 发明授权

US5171999A Adjustable beam and interference fringe position 失效
标题翻译：可调光束和干涉条纹位置
公开(公告)号：US5171999A
公开(公告)日：1992-12-15
申请号：US762472
申请日：1991-09-19
申请人： Koichiro Komatsu , Hideo Mizutani , Nobutaka Magome , Kazuya Ota
发明人： Koichiro Komatsu , Hideo Mizutani , Nobutaka Magome , Kazuya Ota
IPC分类号： G03F9/00
CPC分类号： G03F9/7049
摘要： A position detection apparatus has a substrate on which a diffraction grating is formed and an alignment optical system for illuminating the diffraction grating with a pair of coherent light beams having different frequencies from each other from different directions. The intensity of interference fringes formed due to the interference of diffracted beams generated in the diffraction grating is detected photo-electrically. The alignment optical system forms the pair of coherent light by using an optical modulator, and two luminous fluxes from the optical modulator pass through independent optical paths positioned symmetrically with the optical axis of the alignment optical system therebetween and reach the diffraction grating from different directions. The alignment optical system has a stop having an opening having an inclined edge with respect to the direction of the grating components of the diffraction grating, the opening being in conjugation with the substrate.
摘要翻译：位置检测装置具有其上形成有衍射光栅的基板和用于用不同方向彼此不同频率的一对相干光束照射衍射光栅的对准光学系统。由于衍射光栅中产生的衍射光束的干涉而形成的干涉条纹的强度被光电检测。对准光学系统通过使用光学调制器形成一对相干光，并且来自光学调制器的两个光束通过独立的光学路径，与对准光学系统的光轴对称地定位并从不同的方向到达衍射光栅。对准光学系统具有具有相对于衍射光栅的光栅部件的方向具有倾斜边缘的开口的开口，该开口与基板共轭。

9. 发明授权

US6153886A Alignment apparatus in projection exposure apparatus 失效
标题翻译：投影曝光装置中的对准装置
公开(公告)号：US6153886A
公开(公告)日：2000-11-28
申请号：US407610
申请日：1999-09-28
申请人： Shigeru Hagiwara , Hideo Mizutani , Kazuya Ota
发明人： Shigeru Hagiwara , Hideo Mizutani , Kazuya Ota
IPC分类号： G03F9/00 , G01N21/86
CPC分类号： G03F9/7065 , G03F9/7088
摘要： An alignment apparatus according to the present invention is constructed, for example, which is arranged in an exposure apparatus provided with a projection optical system which projects a predetermined pattern formed on a mask onto a substrate under exposure light, which performs relative positioning between the mask and the substrate, which has light irradiating means for irradiating alignment light in a wavelength region different from that of exposure light onto an alignment mark formed on the substrate through the projection optical system and detecting means for detecting light from the alignment mark through the projection optical system, wherein, for alignment light as irradiation light traveling toward the alignment mark and alignment light as detection light from the alignment mark, there are provided correction optical elements for irradiation light and correction optical elements for detection light to cause axial chromatic aberration and magnification chromatic aberration in the opposite directions to axial chromatic aberration and magnification chromatic aberration of the projection optical system between the mask and the substrate, wherein the alignment light is multi-colored light with a plurality of beams different in wavelength from each other in the wavelength region different from that of exposure light, and wherein the correction optical elements for irradiation light or the correction optical elements for detection light each are provided in correspondence with the plurality of beams different in wavelength.
摘要翻译：根据本发明的对准装置例如被构造成设置在具有投影光学系统的曝光装置中，该投影光学系统将在掩模上形成的预定图案投影到曝光光下的基板上，该曝光装置执行掩模以及基板，其具有用于通过投影光学系统将与曝光光不同的波长区域中的对准光照射到形成在基板上的对准标记上的光照射装置和用于通过投影光学器件检测来自对准标记的光的检测装置系统，其中，对于作为向对准标记行进的照射光的对准光和作为来自对准标记的检测光的对准光，设置有用于照射光的校正光学元件和用于检测光的校正光学元件，以产生轴向色差和倍率色彩像差在与掩模和基板之间的投影光学系统的轴向色差和倍率色差的相反方向上，其中对准光是具有多个不同波长区域的波长不同的多个光束的多色光曝光用光，并且其中用于照射光的校正光学元件或用于检测光的校正光学元件各自对应于波长不同的多个光束。

10. 发明授权

US5569929A Double-beam light source apparatus, position detecting apparatus and aligning apparatus 失效
公开(公告)号：US5569929A
公开(公告)日：1996-10-29
申请号：US470889
申请日：1995-06-06
申请人： Hideo Mizutani , Kazuya Ota
发明人： Hideo Mizutani , Kazuya Ota
IPC分类号： G03F9/00 , G01N21/86 , G06K7/015 , G01B11/00
CPC分类号： G03F9/7049 , G03F9/7076
摘要： A position detecting apparatus comprises a double-beam producing device for producing two beams different in frequency from each other, which are guided to irradiate a diffraction grating on an object to be inspected in two predetermined directions, and a detector photoelectrically detecting through an objective optical system diffracted light produced by the diffraction grating, in which the double-beam producing device comprises a light source for supplying a beam of a single wavelength or multiple wavelengths, a beam splitting device for splitting the beam from the light source into two predetermined beams, a relay optical system for converging the two split beams at a predetermined position, and a frequency difference producing device disposed at or near a converging position by the relay optical system, for producing a predetermined frequency difference between the two split beams.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式