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1. 发明申请

US20090297990A1 Liquid holding apparatus, liquid holding method, exposure apparatus, exposing method, and device fabricating method 审中-公开
标题翻译：液体保持装置，液体保持方法，曝光装置，曝光方法和装置制造方法
公开(公告)号：US20090297990A1
公开(公告)日：2009-12-03
申请号：US12453158
申请日：2009-04-30
申请人： Kazuya ONO , Dai ARAI
发明人： Kazuya ONO , Dai ARAI
IPC分类号： G03F7/20 , G03B27/52 , G03B27/32
CPC分类号： G03F7/70341
摘要： Liquid is held in a prescribed region between a first object and a second object. An electrostatic holder holds the liquid by electrostatic force.
摘要翻译：液体被保持在第一物体和第二物体之间的规定区域中。静电保持器通过静电力保持液体。

2. 发明申请

US20110001953A1 TRANSPORT APPARATUS AND EXPOSURE APPARATUS 有权
标题翻译：运输设备和接触装置
公开(公告)号：US20110001953A1
公开(公告)日：2011-01-06
申请号：US12795939
申请日：2010-06-08
申请人： Kazuya ONO
发明人： Kazuya ONO
IPC分类号： G03B27/58 , H01L21/677
CPC分类号： H01L21/67748 , G03B27/52 , G03F7/7075 , H01L21/67126
摘要： A substrate is transported between a first space and a second space, which are separated by a partition wall, through an opening portion formed in the partition wall. A transport apparatus includes a support device having a support portion which supports the substrate, the support device being provided so as to block the opening portion while a clearance between the partition wall and the support device is formed, the support device moving the support portion from a state where the support portion faces the first space to a state where the support portion faces the second space; and an adjustment device which adjusts an amount of the clearance, thereby suppressing the movement of fluid from the first space to the second space.
摘要翻译：基板通过形成在分隔壁上的开口部分在第一空间和第二空间之间传输，第一空间和第二空间被分隔壁隔开。一种输送装置，具备支撑装置，该支撑装置具有支撑基板的支撑部，支撑装置设置成在形成分隔壁与支撑装置之间的间隙的同时阻挡开口部，支撑装置将支撑部从支撑部分面向第一空间到支撑部分面向第二空间的状态; 以及调节装置，其调节间隙的量，从而抑制流体从第一空间到第二空间的移动。

3. 发明申请

US20100066992A1 Stage apparatus, exposure apparatus, and device fabricating method 审中-公开
标题翻译：舞台装置，曝光装置和装置制造方法
公开(公告)号：US20100066992A1
公开(公告)日：2010-03-18
申请号：US12457914
申请日：2009-06-25
申请人： Kazuya ONO
发明人： Kazuya ONO
IPC分类号： G03B27/58
CPC分类号： G03F7/70758 , G03F7/70691 , G03F7/70716 , G03F7/70775 , G03F7/70808 , G03F7/709 , H01L21/682
摘要： The invention provides a stage apparatus that has a fixed part, which has a prescribed movement surface, and a first movable body, which is capable of moving along the movement surface in a plurality of directions that includes a first direction. The stage apparatus comprises: a substage that, in synchrony with the movement of the first movable body, moves in the first direction with respect to the movement surface; a first measuring apparatus, at least part of which is provided to the substage, that detects information related to the relative position between the substage and the movement surface in the first direction; and a second measuring apparatus at least part of which is provided to the substage, that detects information related to the relative position between the substage and the first movable body in a second direction, which are substantially orthogonal to the first direction and follow along the movement surface.
摘要翻译：本发明提供一种具有规定的移动面的固定部的台架装置和能够沿着包括第一方向的多个方向沿着移动面移动的第一移动体。舞台装置包括：与第一可移动体的运动同步地移动相对于运动表面的第一方向移动的分段; 第一测量装置，其至少一部分设置到所述分段，其检测与所述第一方向上的所述分段和所述运动表面之间的相对位置有关的信息; 以及第二测量装置，其至少一部分设置在所述分段上，所述第二测量装置在与所述第一方向基本正交并跟随所述移动的第二方向上检测与所述子级与所述第一可移动体之间的相对位置相关的信息表面。

4. 发明申请

US20080186465A1 Coupling apparatus, exposure apparatus, and device fabricating method 失效
标题翻译：耦合装置，曝光装置和装置制造方法
公开(公告)号：US20080186465A1
公开(公告)日：2008-08-07
申请号：US12068323
申请日：2008-02-05
申请人： Kazuya ONO , Yuichi SHIBAZAKI
发明人： Kazuya ONO , Yuichi SHIBAZAKI
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/70833
摘要： An exposure apparatus is an exposure apparatus that exposes a substrate by filling a liquid between a projection optical system and the substrate, and projecting a pattern image onto the substrate via the projection optical system and the liquid, wherein the projection optical system has a first group comprising an optical member that contacts the liquid, and a second group that differs from that first group; the first group is supported by a first support member; and the second group is separated from the first group and is supported by the second support member that differs from the first support member.
摘要翻译：曝光装置是曝光装置，其通过在投影光学系统和基板之间填充液体而曝光基板，并且经由投影光学系统和液体将图案图像投影到基板上，其中投影光学系统具有第一组包括与液体接触的光学构件和与第一组不同的第二组; 第一组由第一个支持成员支持; 并且第二组与第一组分离，并且由与第一支撑构件不同的第二支撑构件支撑。

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