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    • 1. 发明授权
    • Zoom lens
    • 变焦镜头
    • US4465342A
    • 1984-08-14
    • US285012
    • 1981-07-20
    • Kazuo TanakaShigeyuki Suda
    • Kazuo TanakaShigeyuki Suda
    • G02B13/18G02B15/163G02B15/173G02B15/14
    • G02B13/18G02B15/173
    • A zoom lens comprising, from front to rear, a first lens component having a positive focal length, a second lens component having a negative focal length and a third group having a positive focal length, the first and second lens components being moved to effect zooming, and the first lens component being moved to effect focusing. The above-described first, second and third lens components are each provided with at least one aspheric lens. The first lens component has a negative third order aspheric quantity and the second lens component has a positive third order aspheric quantity to realize a zoom lens of high imaging performance with fewer constituent lens elements.
    • 一种变焦透镜,包括从前到后具有正焦距的第一透镜部件,具有负焦距的第二透镜部件和具有正焦距的第三组,所述第一和第二透镜部件被移动以实现变焦 并且第一透镜部件被移动以实现聚焦。 上述第一,第二和第三透镜部件各自设置有至少一个非球面透镜。 第一透镜部件具有负三阶非球面量,并且第二透镜部件具有正三阶非球面数量,以实现具有较少成分透镜元件的高成像性能的变焦透镜。
    • 5. 发明授权
    • Position detecting method
    • 位置检测方法
    • US5396335A
    • 1995-03-07
    • US800271
    • 1991-12-02
    • Masanobu HasegawaKenji SaitohShigeyuki Suda
    • Masanobu HasegawaKenji SaitohShigeyuki Suda
    • G03F9/00H01L21/027H01L21/30G01B11/00
    • G03F9/7088G03F9/7076
    • A method of detecting a positional deviation between a mask and a wafer, wherein a radiation beam having a predetermined intensity distribution is projected to an alignment pattern of the mask whereby a signal beam is produced, and wherein the positional deviation of the mask and the wafer is determined on the basis of the signal beam. The improvements reside in detecting a deviation of the position of incidence of the radiation beam upon the mask from a predetermined position, on the basis of the signal beam; relatively positioning the radiation beam and the mask so as to substantially correct the detected deviation; and determining the positional deviation of the mask and the wafer by using the relatively positioned radiation beam.
    • 一种检测掩模和晶片之间的位置偏差的方法,其中具有预定强度分布的辐射束被投射到掩模的对准图案,由此产生信号光束,并且其中掩模和晶片的位置偏差 是基于信号光束确定的。 改进在于基于信号光束检测辐射束对掩模的入射位置与预定位置的偏差; 相对地定位辐射束和掩模,以便基本上校正检测到的偏差; 以及通过使用相对定位的辐射束来确定掩模和晶片的位置偏差。
    • 6. 发明授权
    • Position detecting device employing marks and oblique projection
    • 位置检测装置采用标记和倾斜投影
    • US5162656A
    • 1992-11-10
    • US841790
    • 1992-03-02
    • Masakazu MatsuguKenji SaitohShigeyuki SudaRyo KurodaYukichi NiwaNoriyuki Nose
    • Masakazu MatsuguKenji SaitohShigeyuki SudaRyo KurodaYukichi NiwaNoriyuki Nose
    • G03F9/00
    • G03F9/7023G03F9/7049
    • A device for detecting positional relationship between a first and second objects in a predetermined direction is disclosed. The device includes light source for projecting light upon the first object so that the light incident on the first object is deflected thereby and emanates therefrom in a direction perpendicular to the predetermined direction; a light receiving portion disposed in a direction in which the light having been deflected perpendicularly to the predetermined direction and having been deflected again by the second object advances, the light receiving portion being operable to detect the position of incidence of the light thereupon, wherein the position of the light upon the light receiving means is changeable with the position of incidence of the light upon the second object; and a detecting system for detecting the positional relationship between the first and second objects in the predetermined direction, on the basis of the detection by the light receiving portion.
    • 公开了一种用于检测预定方向上的第一和第二物体之间的位置关系的装置。 该装置包括用于将光投射到第一物体上的光源,使得入射在第一物体上的光由此偏转,并在垂直于预定方向的方向上从其发出; 光接收部分沿着垂直于预定方向偏转并被第二物体再次偏转的方向设置的方向延伸,光接收部分可操作以检测其上的光的入射位置,其中, 光在光接收装置上的位置可随着第二物体上的光入射位置而改变; 以及检测系统,用于基于光接收部分的检测来检测第一和第二物体在预定方向上的位置关系。
    • 8. 发明授权
    • Method of detecting positional deviation
    • 检测位置偏差的方法
    • US5114235A
    • 1992-05-19
    • US553315
    • 1990-07-17
    • Shigeyuki SudaNaoto Abe
    • Shigeyuki SudaNaoto Abe
    • G01B11/00G03F9/00H01L21/027H01L21/30
    • G03F9/7023G03F9/7049
    • A method of detecting relative positional deviation of first and second substrates, wherein first and second marks with optical powers are formed on the first and second substrates. A radiation beam is projected to the first substrate and, as a result, the first and second marks produce a signal beam whose position of incidence upon a predetermined plane is changeable with the relative positional deviation of the first and second substrates. A sensor is disposed adjacent to the predetermined plane and receives the signal beam to produce an output signal corresponding to the position of incidence of the signal beam upon the sensor. Here, a reference mark is provided to produce, when irradiated with a radiation beam, a reference beam so that it advances along a light path substantially the same as the light path for the signal beam to the sensor when the first and second substrates are in a predetermined positional relation. The produced reference beam is received by the sensor, whereby a reference signal corresponding to the position of incidence of the reference beam upon the sensor is obtained. The relative position of the first and second substrates can be detected on the basis of the output signal and the reference signal.