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    • 6. 发明授权
    • Electroluminescent device
    • 电致发光器件
    • US5200277A
    • 1993-04-06
    • US454961
    • 1989-12-22
    • Takahiro NakayamaKenichi OnisawaKatsumi TamuraKazuo TaguchiAkira SatoKenichi HashimotoYoshio AbeMasanobu Hanazono
    • Takahiro NakayamaKenichi OnisawaKatsumi TamuraKazuo TaguchiAkira SatoKenichi HashimotoYoshio AbeMasanobu Hanazono
    • C23C14/08H05B33/10H05B33/22
    • H05B33/22C23C14/08H05B33/10Y10S428/917Y10T428/24975Y10T428/265
    • An electroluminescent device including dielectric films each of which consists of first regions made of a material with a strong self-healing type dielectric breakdown characteristic, second regions made of a material with a strong propagating type dielectric breakdown characteristic, and mixed regions consisting of a mixture of these two materials, the first and second regions being arranged alternately in the film thickness direction with the mixed regions therebetween, the mixing ratio of these two materials in the mixed regions changing in such a manner that the ratio of one material gradually decreases from a region of this material toward the adjacent region of the other material, that is, the ratio of the other material increases. Thus, the changes in the mixing ratio of these two materials of the dielectric films in the film thickness direction are continuous and periodic. These dielectric films, with a high breakdown field strength, make it possible to obtain an electroluminescent device having a large drive voltage margin and providing a luminescence of high brightness.
    • 一种电致发光器件,包括电介质膜,每个电介质膜由具有强自愈型电介质击穿特性的材料制成的第一区域,由具有强传播型电介质击穿特性的材料制成的第二区域,以及由混合物组成的混合区域 在这两种材料中,第一和第二区域在膜厚度方向上交替地与它们之间的混合区域布置,这两种材料在混合区域中的混合比以这样的方式变化,使得一种材料的比例从 该材料的区域朝向另一材料的相邻区域,即另一种材料的比例增加。 因此,电介质膜在膜厚方向上的这两种材料的混合比的变化是连续的和周期性的。 具有高击穿场强度的这些电介质膜使得可以获得具有大的驱动电压余量并提供高亮度的发光的电致发光器件。
    • 9. 发明申请
    • Semiconductor integrated circuit device and semiconductor memory using the same
    • 半导体集成电路器件和使用其的半导体存储器
    • US20050082613A1
    • 2005-04-21
    • US10917500
    • 2004-08-13
    • Kazuo Taguchi
    • Kazuo Taguchi
    • H01L21/28H01L21/8238H01L21/8244H01L21/84H01L27/092H01L27/11H01L27/12H01L29/423H01L29/49H01L29/786
    • H01L29/78615H01L21/84H01L27/1104H01L27/1203H01L29/42384H01L29/78621
    • Aspects of the invention can provide a semiconductor device including a transistor having a gate shape, which enables a source area and a body contact area to be connected without using wiring and with no gate part protruding to the source area side, and a semiconductor memory. The semiconductor device can have field regions, a transistor which includes a gate (L type gate), a gate insulating film directly below the gate, a body area directly below the gate insulating film, and a source area and a drain area formed on both sides which hold the body area in between. The gate can consist essentially of a first part extending along a channel width direction on the field region and a second part protruding from one end of the first part in the channel width direction to the drain side, and being formed in the L type gate in a plan view. A body contact area can be provided on the field region on the opposite side to the first part with the second part of the L type gate in between, and a low resistant layer is formed on a surface between the source area and the body contact area.
    • 本发明的方面可以提供一种半导体器件,其包括具有栅极形状的晶体管,其能够在不使用布线并且没有栅极部分突出到源极区侧的情况下连接源极区域和本体接触区域,以及半导体存储器。 半导体器件可以具有场区域,晶体管包括栅极(L型栅极),栅极正下方的栅极绝缘膜,栅极绝缘膜正下方的体区,以及形成在两者上的源极区和漏极区 身体区域之间的两侧。 栅极基本上可以由场区域上的沟道宽度方向延伸的第一部分和从沟道宽度方向上的第一部分的一端突出到漏极侧的第二部分形成在L型栅极中 一个平面图。 可以在与第一部分相反的一侧的场区域上设置体接触区域,其中L型栅极的第二部分在其间,并且在源区域和身体接触区域之间的表面上形成低阻力层 。