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1. 发明申请

US20110262859A1 UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD 有权
标题翻译：上层成型和电阻图案方法
公开(公告)号：US20110262859A1
公开(公告)日：2011-10-27
申请号：US13069439
申请日：2011-03-23
申请人： Kazunori KUSABIRAKI , Takahiro Hayama , Norihiko Sugie , Motoyuki Shima , Kiyoshi Tanaka
发明人： Kazunori KUSABIRAKI , Takahiro Hayama , Norihiko Sugie , Motoyuki Shima , Kiyoshi Tanaka
IPC分类号： G03F7/20 , G03F7/004 , C08K5/06
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/0048 , G03F7/0397 , G03F7/2041
摘要： An upper-layer film-forming composition includes (A) a resin that is soluble in an alkaline aqueous solution, and includes a fluorine atom, and (B) a solvent component that includes (B1) a solvent having a boiling point at 101.3 kPa of 150° C. or more and a static surface tension of 23.0 mN/m or less, the upper-layer film-forming composition being used to form an upper-layer film on a photoresist film.
摘要翻译：上层成膜组合物包含（A）可溶于碱性水溶液且含有氟原子的树脂，（B）溶剂成分，其包含（B1）沸点为101.3kPa的溶剂 150℃以上，静态表面张力为23.0mN / m以下，上层成膜组合物用于在光致抗蚀剂膜上形成上层膜。

2. 发明授权

US08501389B2 Upper layer-forming composition and resist patterning method 有权
标题翻译：上层形成组合物和抗蚀剂图案化方法
公开(公告)号：US08501389B2
公开(公告)日：2013-08-06
申请号：US13069439
申请日：2011-03-23
申请人： Kazunori Kusabiraki , Takahiro Hayama , Norihiko Sugie , Motoyuki Shima , Kiyoshi Tanaka
发明人： Kazunori Kusabiraki , Takahiro Hayama , Norihiko Sugie , Motoyuki Shima , Kiyoshi Tanaka
IPC分类号： G03F7/00 , G03F7/004 , G03F7/11
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/0048 , G03F7/0397 , G03F7/2041
摘要： An upper-layer film-forming composition includes (A) a resin that is soluble in an alkaline aqueous solution, and includes a fluorine atom, and (B) a solvent component that includes (B1) a solvent having a boiling point at 101.3 kPa of 150° C. or more and a static surface tension of 23.0 mN/m or less, the upper-layer film-forming composition being used to form an upper-layer film on a photoresist film.
摘要翻译：上层成膜组合物包含（A）可溶于碱性水溶液且含有氟原子的树脂，（B）溶剂成分，其包含（B1）沸点为101.3kPa的溶剂 150℃以上，静态表面张力为23.0mN / m以下，上层成膜组合物用于在光致抗蚀剂膜上形成上层膜。

3. 发明授权

US09261789B2 Liquid immersion lithography upper-layer film-forming composition and photoresist pattern-forming method 有权
标题翻译：液浸光刻上层成膜组合物和光致抗蚀剂图案形成方法
公开(公告)号：US09261789B2
公开(公告)日：2016-02-16
申请号：US13110855
申请日：2011-05-18
申请人： Takahiro Hayama , Kazunori Kusabiraki , Yukio Nishimura , Ken Maruyama , Kiyoshi Tanaka
发明人： Takahiro Hayama , Kazunori Kusabiraki , Yukio Nishimura , Ken Maruyama , Kiyoshi Tanaka
IPC分类号： G03F7/11 , G03F7/20 , C08F220/24 , C08F220/30 , C08F220/18 , G03F7/004 , G03F7/039 , C08F228/02
CPC分类号： G03F7/11 , C08F220/18 , C08F220/24 , C08F220/30 , C08F228/02 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A liquid immersion lithography upper-layer film-forming composition includes (A) a polymer that includes a structural unit (I) shown by the following formula (1), and (S) a solvent. R1 in the formula (1) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. The polymer (A) preferably further includes a structural unit (II) that includes a sulfo group. The polymer (A) preferably further includes a structural unit (III) shown by the following formula (3). R2 in the formula (3) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R3 represents a linear or branched monovalent hydrocarbon group having 1 to 12 carbon atoms or a monovalent alicyclic group having 3 to 20 carbon atoms, provided that at least one hydrogen atom of the hydrocarbon group or the alicyclic group is substituted with a fluorine atom.
摘要翻译：液浸光刻上层成膜组合物包含（A）包含下式（1）所示的结构单元（I）的聚合物和（S）溶剂。式（1）中的R 1表示氢原子，甲基或三氟甲基。聚合物（A）优选还包括包含磺基的结构单元（II）。聚合物（A）优选还包含由下式（3）表示的结构单元（III）。式（3）中的R 2表示氢原子，甲基或三氟甲基。 R 3表示碳原子数1〜12的直链或支链一价烃基或碳原子数3〜20的一价脂环式基，其中烃基或脂环族基中的至少一个氢原子被氟原子取代。

4. 发明授权

US08038127B2 Method for manufacturing a hydrogen-added water and a device for the same 有权
标题翻译：氢加水制造方法及其装置
公开(公告)号：US08038127B2
公开(公告)日：2011-10-18
申请号：US12159500
申请日：2007-07-06
申请人： Daigo Matsuoka , Maiko Takebe , Takahiro Hayama , Toshinori Harada , Yuuichi Takagaki , Hisakazu Matsui
发明人： Daigo Matsuoka , Maiko Takebe , Takahiro Hayama , Toshinori Harada , Yuuichi Takagaki , Hisakazu Matsui
IPC分类号： B01F3/04
CPC分类号： B01F3/0446 , B01F5/0415 , B01F5/0423 , B01F5/0691 , C02F1/70 , Y10S261/75
摘要： The object of the present invention is to provide a method for manufacturing hydrogen-added water containing a large amount of microscopic bubbles and manufacturing equipment for the same so as to expand the industrial applicability of hydrogen-added water by injecting a large amount of microscopic bubbles. More specifically, a plurality of tubular structures, in which the diffusion chamber (5), having double tubes, is provided, and a porous element (6) having predetermined pore diameters, in the diffusion chamber (5) is provided and are substantially linearly arranged in a longitudinal direction. The raw water and hydrogen are supplied with one of the tubular structures, so as to form the mixture of raw water and hydrogen by mixing supplied raw water and hydrogen in the diffusion chamber (5). The mixture is passed through the porous element (6) and diffused therein. The mixture fluid of raw water and hydrogen is then supplied to an adjacent tubular structure under high pressure.
摘要翻译：本发明的目的是提供一种含有大量微气泡的加氢水的制造方法及其制造装置，通过注入大量的微小气泡来扩大加氢水的工业实用性。更具体地，提供多个管状结构，其中设置有具有双管的扩散室（5），并且在扩散室（5）中提供具有预定孔径的多孔元件（6），并且基本上线性沿纵向布置。原水和氢气被供给管状结构中的一个，以便通过在所述扩散室（5）中混合供应的原水和氢气来形成原水和氢气的混合物。混合物通过多孔元件（6）并在其中扩散。然后将原水和氢气的混合流体在高压下供给到相邻的管状结构。

5. 发明申请

US20100219260A1 Method for Manufacturing a Hydrogen-Added Water and a Device for the Same 有权
标题翻译：氢加水制造方法及其装置
公开(公告)号：US20100219260A1
公开(公告)日：2010-09-02
申请号：US12159500
申请日：2007-07-06
申请人： Daigo Matsuoka , Maiko Takebe , Takahiro Hayama , Toshinori Harada , Yuuichi Takagaki , Hisakazu Matsui
发明人： Daigo Matsuoka , Maiko Takebe , Takahiro Hayama , Toshinori Harada , Yuuichi Takagaki , Hisakazu Matsui
IPC分类号： B01F3/04
CPC分类号： B01F3/0446 , B01F5/0415 , B01F5/0423 , B01F5/0691 , C02F1/70 , Y10S261/75
摘要： The object of the present invention is to provide a method for manufacturing the hydrogen-added water containing a large amount of the microscopic bubbles and a manufacturing equipment for the same so as to expand the industrial applicability of the hydrogen-added water by containing the large amount of the microscopic bubbles. More specifically, a plurality of tubular structures, in which the diffusion chamber 5 having the double tubes is provided, and the porous element 6 having predetermined pore diameters in the diffusion chamber 5 are provided, are substantially linearly arranged in a longitudinal direction. The raw water and the hydrogen are supplied with one of the tubular structures, so as to form the mixture fluid of the raw water and the hydrogen by mixing the supplied raw water and hydrogen in the diffusion chamber 5. The mixture fluid is passed through the porous element 6 and diffused therein. The mixture fluid of the raw water and hydrogen passed through the porous elements 6 is supplied with the adjacent tubular structure under high pressure so as to mix it with the hydrogen in the diffusion chamber 5 of the adjacent tubular structure as well as to pass it through the porous element 6 and diffuse therein. Consequently, the hydrogen-added water containing a large amount of the microscopic bubbles of the hydrogen gas can be continuously produced.
摘要翻译：本发明的目的是提供一种含有大量微气泡的加氢水的制造方法及其制造装置，通过含有大量的氢气来扩大加氢水的工业实用性微量气泡量。更具体地说，设置有多个管状结构，其中设置有具有双管的扩散室5和在扩散室5中具有预定孔径的多孔元件6在纵向方向上大致直线地排列。原水和氢气被供给管状结构中的一个，以便通过将所供应的原水和氢气混合在扩散室5中来形成原水和氢气的混合流体。混合流体通过多孔元件6并在其中扩散。通过多孔元件6的原水和氢气的混合流体在高压下被供给相邻的管状结构，以将其与相邻管状结构的扩散室5中的氢气混合，并将其通过多孔元件6并在其中扩散。因此，可以连续地制造含有大量氢气的微小气泡的加氢水。

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