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1. 发明授权

US08431332B2 Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern 有权
标题翻译：用于形成用于浸渍曝光的上层膜的组合物，用于浸渍曝光的上层膜，以及形成光致抗蚀剂图案的方法
公开(公告)号：US08431332B2
公开(公告)日：2013-04-30
申请号：US12680200
申请日：2008-09-10
申请人： Daita Kouno , Norihiko Sugie , Gouji Wakamatsu , Norihiro Natsume , Yukio Nishimura , Makoto Sugiura
发明人： Daita Kouno , Norihiko Sugie , Gouji Wakamatsu , Norihiro Natsume , Yukio Nishimura , Makoto Sugiura
IPC分类号： G03F7/11 , G03F7/09 , G03F7/38
CPC分类号： G03F7/11 , G03F7/2041
摘要： The object of the invention is to provide a composition for forming an upper layer film for immersion exposure capable of forming an upper layer film effectively inhibited from developing defects through an immersion exposure process, such as a watermark defect and dissolution residue defect. Also provided are an upper layer film for immersion exposure and a method of forming a resist pattern. The composition for forming an upper layer film includes a resin ingredient and a solvent. The resin ingredient includes a resin (A) having at least one kind of repeating units selected among those represented by the formulae (1-1) to (1-3) and at least either of the two kinds of repeating units represented by the formulae (2-1) and (2-2). (1-1) (1-2) (1-3) (2-1) (2-2) [In the formulae, R1 represents hydrogen or methyl; R2 and R3 each represents methylene, linear or branched C2-6 alkylene, or alicyclic C4-12 alkylene; R4 represents hydrogen or methyl; and R5 represents a single bond, methylene, or linear or branched C2-6 alkylene.].
摘要翻译：本发明的目的是提供一种用于形成用于浸渍曝光的上层膜的组合物，其能够通过诸如水印缺陷和溶解残留缺陷的浸渍曝光工艺有效地防止显影缺陷的形成。还提供了用于浸渍曝光的上层膜和形成抗蚀剂图案的方法。用于形成上层膜的组合物包括树脂成分和溶剂。树脂成分包括具有选自由式（1-1）〜（1-3）表示的重复单元中的至少一种重复单元的树脂（A）和由式（2-1）和（2-2）。（1-1）（1-2）（1-3）（2-1）（2-2）[式中，R1表示氢或甲基; R2和R3各自表示亚甲基，直链或支链C 2-6亚烷基或脂环族C 4-12亚烷基; R4代表氢或甲基; 并且R 5表示单键，亚甲基或直链或支链C 2-6亚烷基。

2. 发明申请

US20100021852A1 COMPOSITION FOR FORMATION OF UPPER LAYER FILM, AND METHOD FOR FORMATION OF PHOTORESIST PATTERN 有权
标题翻译：用于形成上层膜的组合物和形成光电子图案的方法
公开(公告)号：US20100021852A1
公开(公告)日：2010-01-28
申请号：US12445152
申请日：2007-10-11
申请人： Yukio Nishimura , Norihiko Sugie , Hiromitsu Nakashima , Norihiro Natsume , Daita Kouno
发明人： Yukio Nishimura , Norihiko Sugie , Hiromitsu Nakashima , Norihiro Natsume , Daita Kouno
IPC分类号： G03F7/00 , C09D133/04
CPC分类号： G03F7/11 , G03F7/2041
摘要： A composition for formation of upper layer film, which is used for forming an upper layer film on the surface of a photoresist film and which comprises a resin (A) having a repeating unit represented by the following general formula (1-1) and not having a repeating unit represented by the following general formula (1-2), and a resin (B) having a repeating unit represented by the following general formula (1-2) and not having a repeating unit represented by the following general formula (1-1). [In the general formulas (1-1) and (1-2), R1 is hydrogen or the like; R2 is single bonds or the like; and R3 is a fluorine-substituted, linear or branched alkyl group having 1 to 12 carbon atoms, or the like.] The composition can form an upper layer film giving a sufficiently high receded contact angle.
摘要翻译：一种用于形成上层膜的组合物，其用于在光致抗蚀剂膜的表面上形成上层膜，并且其包含具有由以下通式（1-1）表示的重复单元的树脂（A），而不包含具有由以下通式（1-2）表示的重复单元和具有由以下通式（1-2）表示的重复单元并且不具有由以下通式表示的重复单元的树脂（B） 1-1）。 [通式（1-1）和（1-2）中，R 1为氢等， R2是单键等; R3是具有1〜12个碳原子的氟取代的直链或支链烷基等。]组合物可以形成具有足够高的后退接触角的上层膜。

3. 发明申请

US20060223001A1 Radiation-sensitive resin composition 审中-公开
标题翻译：辐射敏感树脂组合物
公开(公告)号：US20060223001A1
公开(公告)日：2006-10-05
申请号：US11387711
申请日：2006-03-24
申请人： Isao Nishimura , Hiromi Egawa , Norihiko Sugie , Norihiro Natsume , Junichi Takahashi
发明人： Isao Nishimura , Hiromi Egawa , Norihiko Sugie , Norihiro Natsume , Junichi Takahashi
IPC分类号： G03C1/00
CPC分类号： G03F7/0757 , G03F7/0045 , G03F7/0046
摘要： A radiation-sensitive resin composition useful as a chemically amplified resist excelling particularly in depth of focus (DOF) and capability of substantially decreasing development defects, while maintaining excellent basic performance as a resist is provided. The radiation-sensitive resin composition comprises (A) a siloxane resin containing an acid-dissociable group and (B) a photoacid generator, wherein when a coating formed from the radiation-sensitive resin composition is exposed to radiation and heated, the contact angle (α) with water in an unexposed area and the contact angle (β) with water in an exposed area satisfy an inequality formula of (α−β)>5. The component (A) is preferably a compound having a structural unit (I) shown by the following formula (I) and a structural unit (II) shown by the following formula (II), wherein A represents a substituted or unsubstituted divalent cyclic hydrocarbon group, R1 represents a monovalent acid-dissociable group, X represents a single bond or a substituted or unsubstituted divalent hydrocarbon group, Y represents a single bond or a divalent coupling means, and Z represents a single bond or a substituted or unsubstituted divalent hydrocarbon group.
摘要翻译：提供了用作化学放大抗蚀剂的辐射敏感性树脂组合物，其具有特别优异的焦深（DOF）和显着减少显影缺陷的能力，同时保持了作为抗蚀剂的优异的基本性能。该辐射敏感性树脂组合物包含（A）含有酸解离基团的硅氧烷树脂和（B）光致酸产生剂，其中当将由该辐射敏感性树脂组合物形成的涂层暴露于辐射并加热时，其接触角 α）与暴露区域中的水的接触角（β）满足不等式（α-β）> 5。组分（A）优选是具有由下式（I）表示的结构单元（I）的化合物和由下式（II）表示的结构单元（II），其中A表示取代或未取代的二价环状烃基团R 1表示一价酸解离基团，X表示单键或取代或未取代的二价烃基，Y表示单键或二价键合方式，Z表示单键或取代或未取代的二价烃基。

4. 发明申请

US20100255416A1 COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UPPER LAYER FILM FOR IMMERSION EXPOSURE, AND METHOD OF FORMING PHOTORESIST PATTERN 有权
标题翻译：用于形成上层暴露的上层膜的组合物，用于浸没曝光的上层膜和形成光电子图案的方法
公开(公告)号：US20100255416A1
公开(公告)日：2010-10-07
申请号：US12680200
申请日：2008-09-10
申请人： Daita Kouno , Norihiko Sugie , Gouji Wakamatsu , Norihiro Natsume , Yukio Nishimura , Makoto Sugiura
发明人： Daita Kouno , Norihiko Sugie , Gouji Wakamatsu , Norihiro Natsume , Yukio Nishimura , Makoto Sugiura
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/11 , G03F7/2041
摘要： The object of the invention is to provide a composition for forming an upper layer film for immersion exposure capable of forming an upper layer film effectively inhibited from developing defects through an immersion exposure process, such as a watermark defect and dissolution residue defect. Also provided are an upper layer film for immersion exposure and a method of forming a resist pattern. The composition for forming an upper layer film includes a resin ingredient and a solvent. The resin ingredient includes a resin (A) having at least one kind of repeating units selected among those represented by the formulae (1-1) to (1-3) and at least either of the two kinds of repeating units represented by the formulae (2-1) and (2-2). (1-1) (1-2) (1-3) (2-1) (2-2) [In the formulae, R1 represents hydrogen or methyl; R2 and R3 each represents methylene, linear or branched C2-6 alkylene, or alicyclic C4-12 alkylene; R4 represents hydrogen or methyl; and R5 represents a single bond, methylene, or linear or branched C2-6 alkylene.].
摘要翻译：本发明的目的是提供一种用于形成用于浸渍曝光的上层膜的组合物，其能够通过诸如水印缺陷和溶解残留缺陷的浸渍曝光工艺有效地防止显影缺陷的形成。还提供了用于浸渍曝光的上层膜和形成抗蚀剂图案的方法。用于形成上层膜的组合物包括树脂成分和溶剂。树脂成分包括具有选自由式（1-1）〜（1-3）表示的重复单元中的至少一种重复单元的树脂（A）和由式（2-1）和（2-2）。（1-1）（1-2）（1-3）（2-1）（2-2）[式中，R1表示氢或甲基; R2和R3各自表示亚甲基，直链或支链C 2-6亚烷基或脂环族C 4-12亚烷基; R4代表氢或甲基; 并且R 5表示单键，亚甲基或直链或支链C 2-6亚烷基。

5. 发明授权

US08895229B2 Composition for formation of upper layer film, and method for formation of photoresist pattern 有权
标题翻译：用于形成上层膜的组合物和形成光致抗蚀剂图案的方法
公开(公告)号：US08895229B2
公开(公告)日：2014-11-25
申请号：US12445152
申请日：2007-10-11
申请人： Yukio Nishimura , Norihiko Sugie , Hiromitsu Nakashima , Norihiro Natsume , Daita Kouno
发明人： Yukio Nishimura , Norihiko Sugie , Hiromitsu Nakashima , Norihiro Natsume , Daita Kouno
IPC分类号： G03F7/20 , G03F7/30 , G03F7/38 , G03F7/11
CPC分类号： G03F7/11 , G03F7/2041
摘要： A composition for formation of upper layer film, which is used for forming an upper layer film on the surface of a photoresist film and which comprises a resin (A) having a repeating unit represented by the following general formula (1-1) and not having a repeating unit represented by the following general formula (1-2), and a resin (B) having a repeating unit represented by the following general formula (1-2) and not having a repeating unit represented by the following general formula (1-1). [In the general formulas (1-1) and (1-2), R1 is hydrogen or the like; R2 is single bonds or the like; and R3 is a fluorine-substituted, linear or branched alkyl group having 1 to 12 carbon atoms, or the like.] The composition can form an upper layer film giving a sufficiently high receded contact angle.
摘要翻译：一种用于形成上层膜的组合物，其用于在光致抗蚀剂膜的表面上形成上层膜，并且其包含具有由以下通式（1-1）表示的重复单元的树脂（A），而不包含具有由以下通式（1-2）表示的重复单元和具有由以下通式（1-2）表示的重复单元并且不具有由以下通式表示的重复单元的树脂（B） 1-1）。 [通式（1-1）和（1-2）中，R 1为氢等， R2是单键等; R3是具有1〜12个碳原子的氟取代的直链或支链烷基等。]组合物可以形成具有足够高的后退接触角的上层膜。

6. 发明申请

US20110262859A1 UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD 有权
标题翻译：上层成型和电阻图案方法
公开(公告)号：US20110262859A1
公开(公告)日：2011-10-27
申请号：US13069439
申请日：2011-03-23
申请人： Kazunori KUSABIRAKI , Takahiro Hayama , Norihiko Sugie , Motoyuki Shima , Kiyoshi Tanaka
发明人： Kazunori KUSABIRAKI , Takahiro Hayama , Norihiko Sugie , Motoyuki Shima , Kiyoshi Tanaka
IPC分类号： G03F7/20 , G03F7/004 , C08K5/06
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/0048 , G03F7/0397 , G03F7/2041
摘要： An upper-layer film-forming composition includes (A) a resin that is soluble in an alkaline aqueous solution, and includes a fluorine atom, and (B) a solvent component that includes (B1) a solvent having a boiling point at 101.3 kPa of 150° C. or more and a static surface tension of 23.0 mN/m or less, the upper-layer film-forming composition being used to form an upper-layer film on a photoresist film.
摘要翻译：上层成膜组合物包含（A）可溶于碱性水溶液且含有氟原子的树脂，（B）溶剂成分，其包含（B1）沸点为101.3kPa的溶剂 150℃以上，静态表面张力为23.0mN / m以下，上层成膜组合物用于在光致抗蚀剂膜上形成上层膜。

7. 发明授权

US08501389B2 Upper layer-forming composition and resist patterning method 有权
标题翻译：上层形成组合物和抗蚀剂图案化方法
公开(公告)号：US08501389B2
公开(公告)日：2013-08-06
申请号：US13069439
申请日：2011-03-23
申请人： Kazunori Kusabiraki , Takahiro Hayama , Norihiko Sugie , Motoyuki Shima , Kiyoshi Tanaka
发明人： Kazunori Kusabiraki , Takahiro Hayama , Norihiko Sugie , Motoyuki Shima , Kiyoshi Tanaka
IPC分类号： G03F7/00 , G03F7/004 , G03F7/11
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/0048 , G03F7/0397 , G03F7/2041
摘要： An upper-layer film-forming composition includes (A) a resin that is soluble in an alkaline aqueous solution, and includes a fluorine atom, and (B) a solvent component that includes (B1) a solvent having a boiling point at 101.3 kPa of 150° C. or more and a static surface tension of 23.0 mN/m or less, the upper-layer film-forming composition being used to form an upper-layer film on a photoresist film.
摘要翻译：上层成膜组合物包含（A）可溶于碱性水溶液且含有氟原子的树脂，（B）溶剂成分，其包含（B1）沸点为101.3kPa的溶剂 150℃以上，静态表面张力为23.0mN / m以下，上层成膜组合物用于在光致抗蚀剂膜上形成上层膜。

8. 发明授权

US08497062B2 Resin for formation of upper antireflective film, composition for formation of upper antireflective film, and resist pattern formation method 有权
标题翻译：用于形成上部抗反射膜的树脂，用于形成上部抗反射膜的组合物和抗蚀剂图案形成方法
公开(公告)号：US08497062B2
公开(公告)日：2013-07-30
申请号：US12530624
申请日：2008-03-13
申请人： Norihiro Natsume , Norihiko Sugie , Junichi Takahashi
发明人： Norihiro Natsume , Norihiko Sugie , Junichi Takahashi
IPC分类号： G03F7/32 , C08F12/32 , G03F7/11
CPC分类号： G03F7/091 , C08F212/14 , C08F212/32 , C08F220/04 , C08F222/02 , C08F2220/382 , G03F7/0045
摘要： The objective of the present invention is to provide a resin for forming an upper antireflective film and a composition for forming an upper antireflective film that can reduce a standing wave effect satisfactorily and lead excellent solubility in an alkaline developer in lithography and a method for forming a resist pattern. Specifically, the resin for forming an upper antireflective film has at least one unit selected from a repeating unit represented by the formula (1) and a repeating unit represented by the formula (2), has a weight average molecular weight of 1,000 to 100,000 as measured by GPC method, and is soluble in an alkaline developer. (In the formulae (1) and (2), R1 to R14 independently represent a hydrogen atom, —OH, —COOH or —SO3H, provided that all of R1 to R7 or R8 to R14 do not represent a hydrogen atom in a molecule.)
摘要翻译：本发明的目的是提供一种用于形成上部抗反射膜的树脂和用于形成上部抗反射膜的组合物，其可以令人满意地降低驻波效应并且在平版印刷术中在碱性显影剂中导致优异的溶解度，以及形成抗蚀图案具体地说，用于形成上部抗反射膜的树脂具有选自由式（1）表示的重复单元和式（2）表示的重复单元中的至少一个单元，其重均分子量为1,000至100,000，通过GPC法测量，并且可溶于碱性显影剂。（式（1）和（2）中，R 1〜R 14独立地表示氢原子，-OH，-COOH或-SO 3 H，条件是R 1〜R 7或R 8〜R 14全部不在分子中表示氢原子。）

9. 发明申请

US20120171613A1 UPPER LAYER FILM-FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN 审中-公开
标题翻译：上层膜成膜组合物和形成光电子图案的方法
公开(公告)号：US20120171613A1
公开(公告)日：2012-07-05
申请号：US13420525
申请日：2012-03-14
申请人： Norihiko SUGIE , Kazunori KUSABIRAKI , Kiyoshi TANAKA , Motoyuki SHIMA , Yoshikazu YAMAGUCHI
发明人： Norihiko SUGIE , Kazunori KUSABIRAKI , Kiyoshi TANAKA , Motoyuki SHIMA , Yoshikazu YAMAGUCHI
IPC分类号： G03F7/20 , G03F7/004 , G03F7/00
CPC分类号： G03F7/038 , G03F7/11 , G03F7/2041
摘要： An upper layer film-forming composition includes a resin and a solvent component. The resin is soluble in a developer. The solvent component includes first solvent which has a boiling point of 180 to 280° C. at 101.3 kPa and a vapor pressure of 0.001 to 0.1 kPa at 20° C. The upper layer film-forming composition is used to form an upper layer film on a photoresist film.
摘要翻译：上层成膜组合物包含树脂和溶剂成分。树脂可溶于显影剂。溶剂成分包括在101.3kPa下沸点为180〜280℃，在20℃下蒸气压为0.001〜0.1kPa的第一溶剂。上层成膜组合物用于形成上层膜在光致抗蚀剂膜上。

10. 发明申请

US20100112475A1 RESIN FOR FORMATION OF UPPER ANTIREFLECTIVE FILM, COMPOSITION FOR FORMATION OF UPPER ANTIREFLECTIVE FILM, AND RESIST PATTERN FORMATION METHOD 有权
标题翻译：用于形成上层抗反射膜的树脂，用于形成上层抗反射膜的组合物和耐蚀图案形成方法
公开(公告)号：US20100112475A1
公开(公告)日：2010-05-06
申请号：US12530624
申请日：2008-03-13
申请人： Norihiro Natsume , Norihiko Sugie , Junichi Takahashi
发明人： Norihiro Natsume , Norihiko Sugie , Junichi Takahashi
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/091 , C08F212/14 , C08F212/32 , C08F220/04 , C08F222/02 , C08F2220/382 , G03F7/0045
摘要： The objective of the present invention is to provide a resin for forming an upper antireflective film and a composition for forming an upper antireflective film that can reduce a standing wave effect satisfactorily and lead excellent solubility in an alkaline developer in lithography and a method for forming a resist pattern. Specifically, the resin for forming an upper antireflective film has at least one unit selected from a repeating unit represented by the formula (1) and a repeating unit represented by the formula (2), has a weight average molecular weight of 1,000 to 100,000 as measured by GPC method, and is soluble in an alkaline developer. (In the formulae (1) and (2), R1 to R14 independently represent a hydrogen atom, —OH, —COOH or —SO3H, provided that all of R1 to R7 or R8 to R14 do not represent a hydrogen atom in a molecule.)
摘要翻译：本发明的目的是提供一种用于形成上部抗反射膜的树脂和用于形成上部抗反射膜的组合物，其可以令人满意地降低驻波效应并且在平版印刷术中在碱性显影剂中导致优异的溶解度，以及形成抗蚀图案具体地说，用于形成上部抗反射膜的树脂具有选自由式（1）表示的重复单元和式（2）表示的重复单元中的至少一个单元，其重均分子量为1,000至100,000，通过GPC法测量，并且可溶于碱性显影剂。（式（1）和（2）中，R 1〜R 14独立地表示氢原子，-OH，-COOH或-SO 3 H，条件是R 1〜R 7或R 8〜R 14全部不在分子中表示氢原子。）

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