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1. 发明授权

US07059849B2 Heat treatment system and a method for cooling a loading chamber 有权
标题翻译：热处理系统和冷却装载室的方法
公开(公告)号：US07059849B2
公开(公告)日：2006-06-13
申请号：US09934756
申请日：2001-08-23
申请人： Kazunari Sakata , Koyu Hasegawa , Keiichi Katabuchi , Shingo Watanabe , Shinya Mochizuki , Motoki Akimoto , Hiroshi Motono
发明人： Kazunari Sakata , Koyu Hasegawa , Keiichi Katabuchi , Shingo Watanabe , Shinya Mochizuki , Motoki Akimoto , Hiroshi Motono
IPC分类号： F27D9/00
CPC分类号： H01L21/67373 , F27B5/04 , F27B17/0025 , F27D3/0084 , F27D5/0037 , H01L21/67017 , H01L21/67109 , H01L21/67379 , H01L21/67389 , H01L21/67393 , H01L21/67739 , H01L21/67769 , H01L21/67772 , H01L21/67775 , H01L21/67778 , H01L21/68707 , Y10S269/903 , Y10S414/135 , Y10S414/137
摘要： A heat treatment system and method for cooling a loading chamber that includes a heat treatment furnace for heat-treating an object to be treated. The heat treatment furnace includes a throat for carrying the object in and out, and a cooling mechanism for cooling the vicinity of the throat. The cooling mechanism has a ventilating unit with a ventilating port for sending a cooling fluid toward the vicinity of the throat and a heat exchanger arranged so as to face the ventilating port in the vicinity of the throat. The cooling mechanism also has an intake fan for sucking the cooling fluid in the vicinity of the throat over the heat exchanger. When the object to be treated is carried in, the structure of various mechanisms in the vicinity of the throat is simplified, and space is saved.
摘要翻译：一种用于冷却装载室的热处理系统和方法，其包括用于对待处理物体进行热处理的热处理炉。热处理炉包括用于输入和输出物体的喉部和用于冷却喉部附近的冷却机构。冷却机构具有通风单元，其具有用于向喉部附近发送冷却流体的通风口和布置成面对喉部附近的通气口的热交换器。冷却机构还具有用于吸引热交换器上的喉部附近的冷却流体的进气扇。当被处理物被携带时，喉部附近的各种机构的结构被简化，节省了空间。

2. 发明申请

US20070166657A1 Heat treatment system and method therefore 有权
标题翻译：热处理系统和方法因此
公开(公告)号：US20070166657A1
公开(公告)日：2007-07-19
申请号：US11705443
申请日：2007-02-13
申请人： Kazunari Sakata , Koyu Hasegawa , Keiichi Katabuchi , Shingo Watanabe , Shinya Mochizuki , Motoki Akimoto , Hiroshi Motono
发明人： Kazunari Sakata , Koyu Hasegawa , Keiichi Katabuchi , Shingo Watanabe , Shinya Mochizuki , Motoki Akimoto , Hiroshi Motono
IPC分类号： F27D1/18
CPC分类号： H01L21/67373 , F27B5/04 , F27B17/0025 , F27D3/0084 , F27D5/0037 , H01L21/67017 , H01L21/67109 , H01L21/67379 , H01L21/67389 , H01L21/67393 , H01L21/67739 , H01L21/67769 , H01L21/67772 , H01L21/67775 , H01L21/67778 , H01L21/68707 , Y10S269/903 , Y10S414/135 , Y10S414/137
摘要： There is provided a vertical heat treatment system capable of simplifying the structure of various mechanisms in the vicinity of an opening which is formed in a partition wall separating a housing-box transfer area from a treating-object transfer area (a wafer transfer area), and of contributing to space saving, when an object to be treated is carried in the vertical heat treatment system through the opening to carry out a predetermined treatment. In a vertical heat treatment system for carrying an object W to be treated, which is housed in a treating-object housing box 2 closed by an opening/closing lid 10, in a treating-object transfer area 46 via an opening 28, which is formed in a partition wall 26 separating a housing-box transfer area 44 for transferring the treating-object housing box from the treating-object transfer area 46 in an atmosphere of an inert gas, to carry out a predetermined treatment, a standby box transfer means 60 is provided in the housing-box transfer area for holding a treating-object housing box, which houses therein the next object to be carried in the treating-object transfer area, in the vicinity of the opening to cause the treating-object housing box to stand by. Thus, when the object to be treated is carried in via the opening of the partition wall, which separates the housing-box transfer area from the treating-object transfer area (wafer transfer area), to carry out a predetermined treatment, the structure of various mechanisms in the vicinity of the opening is simplified, and the space is saved.
摘要翻译：提供了一种垂直式热处理系统，其能够简化形成在将箱体搬送区域从处理对象搬送区域（晶片转移区域）分离的分隔壁的开口附近的各种机构的结构，并且当通过开口在垂直热处理系统中承载待处理物体时，有助于节省空间，以进行预定处理。在用于承载被打开/关闭盖10封闭的处理对象收纳箱2中的待处理对象物W的立式热处理系统经由开口28在处理对象转移区域46中形成在隔离壁26中，隔离箱26分离用于在惰性气体气氛中将处理对象收纳箱从处理对象转移区域46传送的收纳箱传送区域44，以执行预定处理;待机箱传送装置 60设置在用于保持处理对象收纳箱的收纳箱传送区域中，处理对象收纳箱在其内容纳有待处理对象转移区域中的下一个物体的开口附近，从而使处理对象收纳箱待命因此，当待处理物体经由将箱体转移区域从处理对象转移区域（晶片转移区域）分离的分隔壁的开口进行预定处理时，结构简化了开口附近的各种机构，节省了空间。

3. 发明授权

US07819658B2 Heat treatment system and method therefore 有权
标题翻译：热处理系统和方法因此
公开(公告)号：US07819658B2
公开(公告)日：2010-10-26
申请号：US11705443
申请日：2007-02-13
申请人： Kazunari Sakata , Shinya Mochizuki , Motoki Akimoto , Hiroshi Motono
发明人： Kazunari Sakata , Shinya Mochizuki , Motoki Akimoto , Hiroshi Motono
IPC分类号： F27D5/00
CPC分类号： H01L21/67373 , F27B5/04 , F27B17/0025 , F27D3/0084 , F27D5/0037 , H01L21/67017 , H01L21/67109 , H01L21/67379 , H01L21/67389 , H01L21/67393 , H01L21/67739 , H01L21/67769 , H01L21/67772 , H01L21/67775 , H01L21/67778 , H01L21/68707 , Y10S269/903 , Y10S414/135 , Y10S414/137
摘要： Disclosed herein is a vertical heat treatment system capable of simplifying the structure of various mechanisms in the vicinity of an opening which is formed in a partition wall separating a housing-box transfer area from a treating-object transfer area (a wafer transfer area), and of contributing to space saving, when an object to be treated is carried in the vertical heat treatment system through the opening to carry out a predetermined treatment. In a vertical heat treatment system for carrying an object W to be treated, which is housed in a treating-object housing box closed by an opening/closing lid, in a treating-object transfer area via an opening, which is formed in a partition wall 26 separating a housing-box transfer area for transferring the treating-object housing box from the treating-object transfer area 46 in an atmosphere of an inert gas, to carry out a predetermined treatment, a standby box transfer means is provided in the housing-box transfer area for holding a treating-object housing box, which houses therein the next object to be carried in the treating-object transfer area, in the vicinity of the opening to cause the treating-object housing box to stand by.
摘要翻译：本发明公开了一种立式热处理系统，其能够简化形成在将箱体转移区域从处理对象转移区域（晶片转移区域）分离的分隔壁的开口附近的各种机构的结构，并且当通过开口在垂直热处理系统中承载待处理物体时，有助于节省空间，以进行预定处理。在用于承载待处理对象物W的垂直热处理系统中，所述待处理物体被容纳在由打开/关闭盖关闭的处理对象收容箱中的处理对象转移区域中，所述开口形成在隔板分离用于在惰性气体气氛中将处理对象收纳箱从处理对象转移区域46传送的收容箱传送区域的壁26，进行预定处理，待机盒传送装置设置在壳体用于保持处理对象收纳箱的箱传送区域，其中容纳处理对象传送区域中的下一物体被放置在处理对象容纳箱中，使得处理对象收纳箱待机。

4. 发明授权

US07217313B2 Dehumidification system and dehumidification method 失效
标题翻译：除湿系统和除湿方法
公开(公告)号：US07217313B2
公开(公告)日：2007-05-15
申请号：US10513754
申请日：2003-05-26
申请人： Hiroshi Motono , Takashi Tanahashi , Masaji Kurosawa , Katsuhiro Yamashita
发明人： Hiroshi Motono , Takashi Tanahashi , Masaji Kurosawa , Katsuhiro Yamashita
IPC分类号： B01D53/06 , B01D53/28
CPC分类号： F24F3/1423 , B01D53/06 , B01D53/261 , B01D2253/108 , B01D2253/25 , B01D2253/3425 , B01D2256/12 , B01D2257/70 , B01D2257/80 , B01D2258/0216 , B01D2259/4009 , F24F2203/1032 , F24F2203/1056 , F24F2203/1072 , F24F2203/108 , F24F2203/1084 , F24F2203/1088
摘要： A dehumidifying system supplies a gas free of organic substances. The dehumidifying system includes a holding case, and a rotor rotatably held in the holding case and bearing an adsorbent. The interior of the holding case is divided into an adsorbing zone and a regenerating zone by partition plates attached to the holding case. A process gas is supplied into the adsorbing zone. The process gas processed in the adsorbing zone is supplied into an objective space. A regenerating gas is supplied into the regenerating zone to eliminate moisture and organic substances adsorbed by the adsorbent in the adsorbing zone from the adsorbent.
摘要翻译：除湿系统提供无有机物质的气体。除湿系统包括保持壳体和可旋转地保持在保持壳体中并承载吸附剂的转子。保持壳体的内部通过附接到保持壳体上的分隔板分成吸附区域和再生区域。工艺气体被供应到吸附区。在吸附区域中处理的工艺气体被供应到目标空间中。将再生气体供给再生区，以从吸附剂中除去吸附区中的吸附剂吸附的水分和有机物质。

5. 发明授权

US07258485B2 X-ray thin film inspection apparatus and thin film inspection apparatus and method for patterned wafer 有权
标题翻译： X射线薄膜检查装置及薄膜检查装置及图案化晶片的方法
公开(公告)号：US07258485B2
公开(公告)日：2007-08-21
申请号：US11259191
申请日：2005-10-26
申请人： Asao Nakano , Takao Kinefuchi , Hiroshi Motono , Atsunori Kiku
发明人： Asao Nakano , Takao Kinefuchi , Hiroshi Motono , Atsunori Kiku
IPC分类号： H05G1/02 , A61B6/08 , G01N23/20 , G01N23/223
CPC分类号： G01N23/20025 , G01N23/20016 , G01N2223/076 , G01N2223/1016 , G01N2223/61
摘要： An X-ray thin film inspection apparatus including a sample table on which an inspection target such as a product wafer or the like is mounted, a positioning mechanism for moving the sample table, a goniometer having first and second swing arms, at least one X-ray irradiation unit that are mounted on the first swing arm and containing an X-ray tube and an X-ray optical element in a shield tube, an X-ray detector mounted on a second swing arm, and an optical camera for subjecting the inspection target disposed on the sample table to pattern recognition.
摘要翻译：一种X射线薄膜检查装置，包括：样品台，其上安装有诸如产品晶片等的检查对象;移动样品台的定位机构;具有第一和第二摆臂的测角器;至少一个X 射线照射单元，其安装在第一摆臂上并且在屏蔽管中容纳X射线管和X射线光学元件，安装在第二摆臂上的X射线检测器和用于使检查对象放置在样品台上进行图案识别。

6. 发明申请

US20060088139A1 X-ray thin film inspection apparatus and thin film inspection apparatus and method for patterned wafer 有权
标题翻译： X射线薄膜检查装置及薄膜检查装置及图案化晶片的方法
公开(公告)号：US20060088139A1
公开(公告)日：2006-04-27
申请号：US11259191
申请日：2005-10-26
申请人： Asao Nakano , Takao Kinefuchi , Hiroshi Motono , Atsunori Kiku
发明人： Asao Nakano , Takao Kinefuchi , Hiroshi Motono , Atsunori Kiku
IPC分类号： G01N23/20
CPC分类号： G01N23/20025 , G01N23/20016 , G01N2223/076 , G01N2223/1016 , G01N2223/61
摘要： An X-ray thin film inspection apparatus including a sample table on which an inspection target such as a product wafer or the like is mounted, a positioning mechanism for moving the sample table, a goniometer having first and second swing arms, at least one X-ray irradiation unit that are mounted on the first swing arm and containing an X-ray tube and an X-ray optical element in a shield tube, an X-ray detector mounted on a second swing arm, and an optical camera for subjecting the inspection target disposed on the sample table to pattern recognition.
摘要翻译：一种X射线薄膜检查装置，包括：样品台，其上安装有诸如产品晶片等的检查对象;移动样品台的定位机构;具有第一和第二摆臂的测角器;至少一个X 射线照射单元，其安装在第一摆臂上并且在屏蔽管中容纳X射线管和X射线光学元件，安装在第二摆臂上的X射线检测器和用于使检查对象放置在样品台上进行图案识别。

7. 发明申请

US20050172805A1 Dehumidification system and dehumidification method 失效
标题翻译：除湿系统和除湿方法
公开(公告)号：US20050172805A1
公开(公告)日：2005-08-11
申请号：US10513754
申请日：2003-05-26
申请人： Hiroshi Motono , Takashi Tanahashi , Masaji Kurosawa , Katsuhiro Yamashita
发明人： Hiroshi Motono , Takashi Tanahashi , Masaji Kurosawa , Katsuhiro Yamashita
IPC分类号： B01D53/06 , B01D53/08 , B01D53/26 , B01D53/28 , F24F3/14
CPC分类号： F24F3/1423 , B01D53/06 , B01D53/261 , B01D2253/108 , B01D2253/25 , B01D2253/3425 , B01D2256/12 , B01D2257/70 , B01D2257/80 , B01D2258/0216 , B01D2259/4009 , F24F2203/1032 , F24F2203/1056 , F24F2203/1072 , F24F2203/108 , F24F2203/1084 , F24F2203/1088
摘要： A dehumidifying system supplies a gas free of organic substances. The dehumidifying system includes a holding case, and a rotor rotatably held in the holding case and bearing an adsorbent. The interior of the holding case is divided into an adsorbing zone and a regenerating zone by partition plates attached to the holding case. A process gas is supplied into the adsorbing zone. The process gas processed in the adsorbing zone is supplied into an objective space. A regenerating gas is supplied into the regenerating zone to eliminate moisture and organic substances adsorbed by the adsorbent in the adsorbing zone from the adsorbent.
摘要翻译：除湿系统提供无有机物质的气体。除湿系统包括保持壳体和可旋转地保持在保持壳体中并承载吸附剂的转子。保持壳体的内部通过附接到保持壳体上的分隔板分成吸附区域和再生区域。工艺气体被供应到吸附区。在吸附区域中处理的工艺气体被供应到目标空间中。将再生气体供给再生区，以从吸附剂中除去吸附区中的吸附剂吸附的水分和有机物质。

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