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1. 发明申请

US20100167015A1 ETCHING RESIST 有权
标题翻译：蚀刻抵抗力
公开(公告)号：US20100167015A1
公开(公告)日：2010-07-01
申请号：US12638349
申请日：2009-12-15
申请人： Kazuma Kurihara , Takashi Nakano , Takayuki Shima , Junji Tominaga , Kazuya Fujioka , Ichiro Suehiro
发明人： Kazuma Kurihara , Takashi Nakano , Takayuki Shima , Junji Tominaga , Kazuya Fujioka , Ichiro Suehiro
IPC分类号： B32B3/00 , C23F1/08 , C23F1/00 , C01B21/20
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G02B3/0012 , Y10T428/24479
摘要： An etching resist containing a metallic oxynitride. The etching resist of the present invention can be suitably used, for example, in the production of a molded article for surface-working an optical member such as a microlens sheet, a light diffusing sheet, a non-reflective sheet, a sheet for encapsulating photosemiconductor elements, an optical waveguide, an optical disk, or a photosensor.
摘要翻译：含有金属氮氧化物的抗蚀剂。本发明的抗蚀剂可以适用于例如在微型透镜片，光漫射片，非反射片，封装用片等的光学部件的表面加工用的成型体的制造中光半导体元件，光波导，光盘或光传感器。

2. 发明授权

US08734964B2 Etching resist 有权
标题翻译：蚀刻抗蚀剂
公开(公告)号：US08734964B2
公开(公告)日：2014-05-27
申请号：US12638349
申请日：2009-12-15
申请人： Kazuma Kurihara , Takashi Nakano , Takayuki Shima , Junji Tominaga , Kazuya Fujioka , Ichiro Suehiro
发明人： Kazuma Kurihara , Takashi Nakano , Takayuki Shima , Junji Tominaga , Kazuya Fujioka , Ichiro Suehiro
IPC分类号： B32B3/00 , C23F1/08 , C23F1/00 , C01B21/20
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G02B3/0012 , Y10T428/24479
摘要： An etching resist has a first heat-generating layer, a second heat-generating layer, and a metal compound layer including a metallic oxynitride layer containing a metallic oxynitride. The first heat-generating layer, the metallic oxynitride layer, and the second heat-generating layer are directly or indirectly laminated such that the metallic oxynitride layer is positioned between the first heat-generating layer and the second heat-generating layer.
摘要翻译：蚀刻抗蚀剂具有第一发热层，第二发热层和包含含有金属氮氧化物的金属氮氧化物层的金属化合物层。第一发热层，金属氧氮化物层和第二发热层直接或间接层压，使得金属氧氮化物层位于第一发热层和第二发热层之间。

3. 发明申请

US20100091639A1 OPTICAL RECORDING MEDIUM FOR PERFORMING SUPER RESOLUTION REPRODUCTION AND OPTICAL RECORDING AND REPRODUCTION METHOD THEREOF 审中-公开
标题翻译：用于执行超分辨率再现和光学记录的光学记录介质及其再现方法
公开(公告)号：US20100091639A1
公开(公告)日：2010-04-15
申请号：US12516492
申请日：2008-07-16
申请人： Takayuki Shima , Takashi Nakano , Kazuma Kurihara , Junji Tominaga
发明人： Takayuki Shima , Takashi Nakano , Kazuma Kurihara , Junji Tominaga
IPC分类号： G11B7/24
CPC分类号： G11B7/00718 , G11B7/252 , G11B7/259 , G11B2007/2571 , G11B2007/25713
摘要： The invention performs super resolution reproduction with a recording layer and a signal reproducing functional layer laminated on a grooved substrate. A length of a mark recorded in a Mark Position method is only one length that is less than the resolution limit in an optical system to be used, and recording marks are formed both on a land and in a groove of the grooved substrate.
摘要翻译：本发明通过层叠在带槽基板上的记录层和信号再现功能层执行超分辨率再现。在Mark Position方法中记录的标记的长度只是在要使用的光学系统中小于分辨率极限的一个长度，并且在凹槽基板的陆地和凹槽中形成记录标记。

4. 发明授权

US08226837B2 Mold for optical device with anti-reflection structure, method for producing the same, and optical device 有权
标题翻译：具有防反射结构的光学装置用模具及其制造方法以及光学装置
公开(公告)号：US08226837B2
公开(公告)日：2012-07-24
申请号：US12515188
申请日：2007-10-02
申请人： Kazuma Kurihara , Takayuki Shima , Junji Tominaga
发明人： Kazuma Kurihara , Takayuki Shima , Junji Tominaga
IPC分类号： B29D11/00
CPC分类号： G02B1/118 , B29C33/42 , B29C45/00 , Y10T428/24355
摘要： A process for producing through simple operations a molding die for optical device having an antireflective structure of nano-order microscopic uneven plane on a substratum surface. The molding die for optical device having microscopic uneven plane (antireflective structure die plane) on a surface of substratum is produced by a process comprising forming one or more etching transfer layers on substratum; forming thin film for formation of semispherical microparticles on the etching transfer layers; causing the thin film to undergo aggregation, or decomposition, or nucleation of the material by the use of any of thermal reaction, photoreaction and gas reaction or a combination of these reactions so as to form multiple semispherical islandlike microparticles; and using the multiple islandlike microparticles as a protective mask, carrying out sequential etching of the etching transfer layers and substratum by reactive gas to thereby form a conical pattern on the microscopic surface of the substratum.
摘要翻译：一种用于通过简单操作生产用于在基底表面上具有纳米级微观不平坦面的抗反射结构的光学装置的模具的方法。通过包括在基底上形成一个或多个蚀刻转移层的方法，制备在基底表面上具有微观不平坦平面（抗反射结构裸片平面）的光学器件用成型模具。在蚀刻转印层上形成用于形成半球形微粒的薄膜; 通过使用任何热反应，光反应和气体反应或这些反应的组合，使薄膜发生聚集，分解或成核，从而形成多个半球状的岛状微粒; 并使用多岛状微粒作为保护掩模，通过反应性气体进行蚀刻转移层和底层的顺序蚀刻，从而在基底的微观表面上形成圆锥形图案。

5. 发明申请

US20120300305A1 MOLD FOR OPTICAL DEVICE WITH ANTI-REFLECTION STRUCTURE, METHOD FOR PRODUCING THE SAME, AND OPTICAL DEVICE 审中-公开
标题翻译：具有抗反射结构的光学装置的模具，其制造方法和光学装置
公开(公告)号：US20120300305A1
公开(公告)日：2012-11-29
申请号：US13540364
申请日：2012-07-02
申请人： Kazuma Kurihara , Takayuki Shima , Junji Tominaga
发明人： Kazuma Kurihara , Takayuki Shima , Junji Tominaga
IPC分类号： G02B5/00
CPC分类号： G02B1/118 , B29C33/42 , B29C45/00 , Y10T428/24355
摘要： A process for producing through simple operations a molding die for optical device having an antireflective structure of nano-order microscopic uneven plane on a substratum surface. The molding die for optical device having microscopic uneven plane (antireflective structure die plane) on a surface of substratum is produced by a process comprising forming one or more etching transfer layers on substratum; forming thin film for formation of semisperical microparticles on the etching transfer layers; causing the thin film to undergo aggregation, or decomposition, or nucleation of the material by the use of any of thermal reaction, photoreaction and gas reaction or a combination of these reactions so as to form multiple semispherical islandlike microparticles; and using the multiple island like microparticles as a protective mask, carrying out sequential etching of the etching transfer layers and substratum by reactive gas to thereby form a conical pattern on the microscopic surface of the substratum.
摘要翻译：一种用于通过简单操作生产用于在基底表面上具有纳米级微观不平坦面的抗反射结构的光学装置的模具的方法。通过包括在基底上形成一个或多个蚀刻转移层的方法，制备在基底表面上具有微观不平坦平面（抗反射结构裸片平面）的光学器件用成型模具。在蚀刻转印层上形成用于形成半精细微粒的薄膜; 通过使用任何热反应，光反应和气体反应或这些反应的组合，使薄膜发生聚集，分解或成核，从而形成多个半球状的岛状微粒; 并且使用多岛状微粒作为保护掩模，通过反应性气体进行蚀刻转移层和底层的顺序蚀刻，从而在基底的微观表面上形成圆锥形图案。

6. 发明申请

US20100055397A1 MOLD FOR OPTICAL DEVICE WITH ANTI-REFLECTION STRUCTURE, METHOD FOR PRODUCING THE SAME, AND OPTICAL DEVICE 有权
标题翻译：具有抗反射结构的光学装置的模具，其制造方法和光学装置
公开(公告)号：US20100055397A1
公开(公告)日：2010-03-04
申请号：US12515188
申请日：2007-10-02
申请人： Kazuma Kurihara , Takayuki Shima , Junji Tominaga
发明人： Kazuma Kurihara , Takayuki Shima , Junji Tominaga
IPC分类号： B29D11/00 , B29C33/42
CPC分类号： G02B1/118 , B29C33/42 , B29C45/00 , Y10T428/24355
摘要： A process for producing through simple operations a molding die for optical device having an antireflective structure of nano-order microscopic uneven plane on a substratum surface. The molding die for optical device having microscopic uneven plane (antireflective structure die plane) on a surface of substratum is produced by a process comprising forming one or more etching transfer layers on substratum; forming thin film for formation of semispherical microparticles on the etching transfer layers; causing the thin film to undergo aggregation, or decomposition, or nucleation of the material by the use of any of thermal reaction, photoreaction and gas reaction or a combination of these reactions so as to form multiple semispherical island-like microparticles; and using the multiple islandlike microparticles as a protective mask, carrying out sequential etching of the etching transfer layers and substratum by reactive gas to thereby form a conical pattern on the microscopic surface of the substratum.
摘要翻译：一种用于通过简单操作生产用于在基底表面上具有纳米级微观不平坦面的抗反射结构的光学装置的模具的方法。通过包括在基底上形成一个或多个蚀刻转移层的方法，制备在基底表面上具有微观不平坦平面（抗反射结构裸片平面）的光学器件用成型模具。在蚀刻转印层上形成用于形成半球形微粒的薄膜; 通过使用热反应，光反应和气体反应中的任何一种或这些反应的组合使薄膜发生聚集，分解或成核，从而形成多个半球状的岛状微粒; 并使用多岛状微粒作为保护掩模，通过反应性气体进行蚀刻转移层和底层的顺序蚀刻，从而在基底的微观表面上形成圆锥形图案。

7. 发明申请

US20070030776A1 Super-resolution information recording medium, recording/reproducing apparatus, and recording/reproducing method 审中-公开
标题翻译：超分辨率信息记录介质，记录/再现装置和记录/再现方法
公开(公告)号：US20070030776A1
公开(公告)日：2007-02-08
申请号：US11499712
申请日：2006-08-07
申请人： Joo-ho Kim , In-oh Hwang , Narutoshi Fukuzawa , Junji Tominaga , Takashi Kikukawa , Tatsuhiro Kobayashi , Takashi Nakano , Takayuki Shima
发明人： Joo-ho Kim , In-oh Hwang , Narutoshi Fukuzawa , Junji Tominaga , Takashi Kikukawa , Tatsuhiro Kobayashi , Takashi Nakano , Takayuki Shima
IPC分类号： G11B19/02 , G11B3/70
CPC分类号： G11B7/252 , G11B7/00452 , G11B7/0052 , G11B7/24 , G11B7/243 , G11B2007/24304 , G11B2007/24308 , G11B2007/2431 , G11B2007/24314 , G11B2007/24316
摘要： A super-resolution information recording medium, a recording/reproducing apparatus, and a recording/reproducing method uses an information recording medium provides a super-resolution effect by fluid bubbles. The fluid bubbles are formed in at least a portion of the medium by a light beam radiated to reproduce a signal from the information recording medium. Accordingly, the super-resolution information recording medium has improved optical characteristics, so that better recording/reproduction is possible.
摘要翻译：超分辨率信息记录介质，记录/再现装置和记录/再现方法使用信息记录介质通过流体气泡提供超分辨率效果。通过辐射的光束在介质的至少一部分中形成流体气泡，以再现来自信息记录介质的信号。因此，超分辨率信息记录介质具有改善的光学特性，使得更好的记录/再现成为可能。

8. 发明授权

US07876665B2 Optical recording medium and method for reproducing information from optical recording medium 有权
标题翻译：光记录介质及从光记录介质再现信息的方法
公开(公告)号：US07876665B2
公开(公告)日：2011-01-25
申请号：US11990076
申请日：2006-08-08
申请人： Takashi Kikukawa , Narutoshi Fukuzawa , Tatsuhiro Kobayashi , Junji Tominaga , Takashi Nakano , Takayuki Shima , Joo-ho Kim , In-oh Hwang
发明人： Takashi Kikukawa , Narutoshi Fukuzawa , Tatsuhiro Kobayashi , Junji Tominaga , Takashi Nakano , Takayuki Shima , Joo-ho Kim , In-oh Hwang
IPC分类号： G11B7/24
CPC分类号： G11B7/24 , G11B7/005 , G11B7/126 , G11B7/243 , G11B7/252 , G11B7/258
摘要： An optical recording medium includes a substrate, a first dielectric layer, a recording layer, a second dielectric layer, a super-resolution layer, and a third dielectric layer, which are provided in that order. The super-resolution layer is formed of a material configured such that voids are generated when the material is irradiated with DC light at a predetermined irradiation power for 1 to 300 seconds. Therefore, super-resolution reproduction can be made such that the irradiation power of a readout laser beam does not depend on the size of a recording mark.
摘要翻译：光记录介质包括依次设置的基板，第一介质层，记录层，第二介质层，超分辨率层和第三介质层。超分辨率层由构造成当以预定照射功率的DC光照射材料1至300秒时产生空隙的材料形成。因此，可以进行超分辨率再现，使得读出激光束的照射功率不依赖于记录标记的尺寸。

9. 发明申请

US20090016205A1 Optical Recording Medium and Method for Reproducing Information From Optical Recording Medium 有权
标题翻译：光记录介质和从光记录介质再现信息的方法
公开(公告)号：US20090016205A1
公开(公告)日：2009-01-15
申请号：US11990076
申请日：2006-08-08
申请人： Takashi Kikukawa , Narutoshi Fukuzawa , Tatsuhiro Kobayashi , Junji Tominaga , Takashi Nakano , Takayuki Shima , Joo-ho Kim , In-oh Hwang
发明人： Takashi Kikukawa , Narutoshi Fukuzawa , Tatsuhiro Kobayashi , Junji Tominaga , Takashi Nakano , Takayuki Shima , Joo-ho Kim , In-oh Hwang
IPC分类号： G11B7/24
CPC分类号： G11B7/24 , G11B7/005 , G11B7/126 , G11B7/243 , G11B7/252 , G11B7/258
摘要： An optical recording medium includes a substrate, a first dielectric layer, a recording layer, a second dielectric layer, a super-resolution layer, and a third dielectric layer, which are provided in that order. The super-resolution layer is formed of a material configured such that voids are generated when the material is irradiated with DC light at a predetermined irradiation power for 1 to 300 seconds. Therefore, super-resolution reproduction can be made such that the irradiation power of a readout laser beam does not depend on the size of a recording mark.
摘要翻译：光记录介质包括依次设置的基板，第一介质层，记录层，第二介质层，超分辨率层和第三介质层。超分辨率层由构造成当以预定照射功率的DC光照射材料1至300秒时产生空隙的材料形成。因此，可以进行超分辨率再现，使得读出激光束的照射功率不依赖于记录标记的尺寸。

10. 发明授权

US08530314B2 Solid-state memory manufacturing method 有权
标题翻译：固态存储器制造方法
公开(公告)号：US08530314B2
公开(公告)日：2013-09-10
申请号：US12998482
申请日：2009-09-28
申请人： Junji Tominaga , Takayuki Shima , Alexander Kolobov , Paul Fons , Robert Simpson , Reiko Kondo
发明人： Junji Tominaga , Takayuki Shima , Alexander Kolobov , Paul Fons , Robert Simpson , Reiko Kondo
IPC分类号： H01L21/336
CPC分类号： H01L45/1625 , H01L45/06 , H01L45/144
摘要： A method of at least one embodiment of the present invention of manufacturing a solid-state memory is a method of manufacturing a solid-state memory, the solid-state memory including a recording film whose electric characteristics are varied by phase transformation, the method including: forming the recording film by forming a laminate of two or more layers so that a superlattice structure is provided, each of the layers having a parent phase which shows solid-to-solid phase-transformation, the recording film being formed at a temperature not lower than a temperature highest among crystallization temperatures of the parent phases. It is thus possible to manufacture a solid-state memory which requires lower current for recording and erasing data and has a greater rewriting cycle number.
摘要翻译：制造固态存储器的本发明的至少一个实施例的方法是制造固态存储器的方法，该固态存储器包括其电特性通过相变而变化的记录膜，该方法包括：通过形成两层或更多层的叠层来形成记录膜，从而提供超晶格结构，每个层具有显示固 - 相相变的母相，记录膜在不是的温度下形成低于母相结晶温度的最高温度。因此，可以制造需要较低电流记录和擦除数据的固态存储器，并具有更大的重写周期数。

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