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    • 1. 发明授权
    • Semiconductor strain gauge
    • 半导体应变计
    • US4404539A
    • 1983-09-13
    • US236934
    • 1981-02-23
    • Kazuji YamadaMotohisa NishiharaHideo SatoSeiko SuzukiRyoichi Kobayashi
    • Kazuji YamadaMotohisa NishiharaHideo SatoSeiko SuzukiRyoichi Kobayashi
    • G01L9/04G01L9/00G01L9/06H01L29/84G01L1/22
    • G01L9/0054G01L9/065
    • A semiconductor strain gauge is arranged as a bridge having four piezoresistive elements which each include a low impurity concentration diffused portion and a heavily-doped diffused portion. The resistance values of the two low impurity concentration diffused portions opposite each other in the bridge are greater than the resistance values of the other two lower impurity concentration portions. The resistances of the heavily-doped diffused portion are selected so that the resistance of the piezoresistive elements are equal. However, by virtue of the fact that the resistance temperature coefficient of the low impurity portions are greater than the resistance temperature coefficients of the high impurity portions, the overall resistance temperature coefficients of the bridge arms will be different. This permits the zero-point voltage of the bridge to always increase with an increase in temperature.
    • 半导体应变仪布置为具有四个压阻元件的桥,每个压阻元件包括低杂质浓度扩散部分和重掺杂扩散部分。 在桥中彼此相对的两个低杂质浓度扩散部分的电阻值大于其它两个较低杂质浓度部分的电阻值。 选择重掺杂扩散部分的电阻,使得压阻元件的电阻相等。 然而,由于低杂质部分的电阻温度系数大于高杂质部分的电阻温度系数,所以桥臂的整体电阻温度系数将不同。 这允许桥接器的零点电压总是随着温度的升高而增加。
    • 2. 发明授权
    • Semiconductor absolute pressure transducer assembly and method
    • 半导体绝对压力传感器组件及方法
    • US4291293A
    • 1981-09-22
    • US76813
    • 1979-09-19
    • Kazuji YamadaSeiko SuzukiMotohisa NishiharaKanji KawakamiHideo SatoShigeyuki KoboriRyosaku KanzawaMinoru TakahashiHitoshi Minorikawa
    • Kazuji YamadaSeiko SuzukiMotohisa NishiharaKanji KawakamiHideo SatoShigeyuki KoboriRyosaku KanzawaMinoru TakahashiHitoshi Minorikawa
    • G01L9/04G01L9/00H01L23/08H01L29/84G01L1/22
    • G01L9/0042G01L9/0054
    • A semiconductor pressure transducer assembly comprising a silicon diaphragm assembly and a glass covering member. The silicon diaphragm assembly has a circular diaphragm portion of thin silicon which is formed using etching, and a thick supporting portion therearound. Piezoresistive elements of a piezoresistive bridge circuit and conducting paths for electrically connection thereof are formed on the silicon diaphragm assembly. On a surface of the silicon diaphragm assembly, a passivating layer of silicon dioxide are formed in uniform thickness, and further on a surface of the passivating layer is formed a layer of polysilicon on the supporting portion of the silicon diaphragm assembly. In the passivating layer, a contacting window is formed, through which the polysilicon layer is electrically connected to the silicon diaphragm assembly. The covering member of borosilicate glass having a circular well is mounted and bonded onto the silicon diaphragm assembly in contact with the polysilicon layer using Anodic Bonding method. And the processed silicon diaphragm assembly has a flat surface thereof, on which the piezoresistive elements and the conducting paths are constructed using Ion Implantation method, or reforming a silicon dioxide layer thereon after removing another silicon dioxide layer used as mask in diffusing process.
    • 一种半导体压力传感器组件,包括硅膜组件和玻璃覆盖件。 硅膜组件具有通过蚀刻形成的薄硅的圆形隔膜部分和其周围的厚的支撑部分。 在硅膜组件上形成压阻电桥电路的压阻元件和用于电连接的导电路径。 在硅膜组件的表面上形成均匀厚度的二氧化硅钝化层,并且在钝化层的表面上进一步在硅膜组件的支撑部分上形成多晶硅层。 在钝化层中,形成接触窗,多晶硅层通过该接触窗电连接到硅膜组件。 使用阳极接合方法将具有圆形孔的硼硅酸盐玻璃的覆盖部件安装并接合到与硅多晶硅层接触的硅膜组件上。 并且经处理的硅膜组件具有平坦的表面,在其上使用离子注入方法构建压阻元件和导电路径,或者在去除扩散过程中用作掩模的另一二氧化硅层之后重新形成二氧化硅层。