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    • 1. 发明授权
    • Ink jet recording head including beams dividing supply ports
    • 喷墨记录头包括分配供应端口的光束
    • US07934810B2
    • 2011-05-03
    • US12369259
    • 2009-02-11
    • Kazuhiro HayakawaMakoto Terui
    • Kazuhiro HayakawaMakoto Terui
    • B41J2/05
    • B41J2/1631B41J2/14145B41J2/1603
    • An ink jet recording head has sufficient and uniform ink refill for all orifices and separate flow paths even though the substrate has high rigidity by dividing a supply port into a plurality of ports. The substrate of the ink jet recording head has a plurality of separate flow paths corresponding to discharge pressure generating elements, a common flow path communicating with the separate flow paths, an ink supply port communicating with the common flow path and supplying ink to the common flow path, and a plurality of beam portions dividing the ink supply port. A recess is formed on the common flow path, extending to the separate flow paths formed nearest to the beam portion.
    • 喷墨记录头对于所有孔和分离的流动路径具有足够且均匀的填充墨水,即使基板通过将供给口分成多个端口而具有高刚性。 喷墨记录头的基板具有与排出压力产生元件相对应的多个单独的流路,与分开的流路连通的公共流路,与公共流路连通并将墨水供给到公共流 路径和分割供墨口的多个光束部分。 在公共流动路径上形成一个凹槽,延伸到最靠近梁部分形成的独立流动路径。
    • 6. 发明授权
    • Substrate processing method and ink jet recording head substrate manufacturing method
    • 基板处理方法和喷墨记录头基板的制造方法
    • US07323115B2
    • 2008-01-29
    • US10777108
    • 2004-02-13
    • Kazuhiro HayakawaMakoto Terui
    • Kazuhiro HayakawaMakoto Terui
    • G01D15/02
    • B41J2/1603B41J2/14145B41J2/1629
    • A substrate (wafer) processing method for producing an ink jet recording head substrate in which the reverse surface thereof, that is, the surface having the larger of the two openings of the ink supply hole, is precisely covered by a protective film to the very edge of the hole, including: a step for forming a protective film on the substrate; a step for etching the surface of the protective film; a step for forming an etching resistant film on the etched surface of the protective film; a step for forming an ink supply hole pattern through the etchant-resistant film and protective film; a step for forming the ink supply hole through the substrate by etching; a step for removing a portion of the protective film left projecting into the ink supply hole while forming the ink supply hole; and a step for removing the etchant-resistant film.
    • 用于制造喷墨记录头基板的基板(晶片)处理方法,其中其反面,即具有供墨孔的两个开口中较大的表面的表面被正好被保护膜覆盖 所述孔的边缘包括:在所述基板上形成保护膜的步骤; 蚀刻保护膜的表面的步骤; 在保护膜的蚀刻表面上形成耐蚀刻膜的步骤; 通过耐蚀刻膜和保护膜形成供墨孔图案的步骤; 通过蚀刻形成通过基板的供墨孔的步骤; 在形成供墨孔的同时除去留在供墨孔中的保护膜的一部分的步骤; 以及去除耐蚀刻膜的步骤。