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    • 3. 发明申请
    • ACOUSTIC SEMICONDUCTOR DEVICE
    • 声学半导体器件
    • US20120241877A1
    • 2012-09-27
    • US13220116
    • 2011-08-29
    • Kazuhide ABETadahiro SasakiAtsuko IidaKazuhiko ItayaTakashi Kawakubo
    • Kazuhide ABETadahiro SasakiAtsuko IidaKazuhiko ItayaTakashi Kawakubo
    • H01L29/84
    • H03J3/20H03B5/326H03H9/02566
    • According to one embodiment, an acoustic semiconductor device includes an element unit, and a first terminal. The element unit includes an acoustic resonance unit. The acoustic resonance unit includes a semiconductor crystal. An acoustic standing wave is excitable in the acoustic resonance unit and is configured to be synchronously coupled with electric charge density within at least one portion of the semiconductor crystal via deformation-potential coupling effect. The first terminal is electrically connected to the element unit. At least one selected from outputting and inputting an electrical signal is implementable via the first terminal. The electrical signal is coupled with the electric charge density. The outputting the electrical signal is from the acoustic resonance unit, and the inputting the electrical signal is into the acoustic resonance unit.
    • 根据一个实施例,声学半导体器件包括元件单元和第一端子。 元件单元包括声共振单元。 声共振单元包括半导体晶体。 声驻波在声共振单元中是可兴奋的,并且被配置为通过变形电势耦合效应与半导体晶体的至少一部分内的电荷密度同步耦合。 第一端子电连接到元件单元。 从输出和输入电信号中选出的至少一个可经由第一终端实现。 电信号与电荷密度耦合。 输出电信号来自声共振单元,并且输入电信号进入声共振单元。
    • 4. 发明申请
    • SEMICONDUCTOR DEVICE
    • 半导体器件
    • US20120235246A1
    • 2012-09-20
    • US13425735
    • 2012-03-21
    • Kazuhide ABETadahiro SasakiKazuhiko Itaya
    • Kazuhide ABETadahiro SasakiKazuhiko Itaya
    • H01L27/088
    • H03F1/02H01L27/105H03F1/32H03F3/211H03F2200/432
    • One embodiment of a semiconductor device provided with a semiconductor substrate, a device region formed on the semiconductor substrate, a device isolation region, which encloses the device region, a plurality of first gate electrodes arranged so as to be parallel to each other on the device region and electrically connected to each other, and a plurality of second gate electrodes arranged so as to be parallel to a plurality of first gate electrodes on the device region and electrically connected to each other, wherein the first gate electrode is arranged so as to be interposed between the second gate electrodes, a gate width of the first gate electrode is smaller than the gate width of the second gate electrode, and a DC bias voltage higher than that of the second gate electrode is applied to the first gate electrode.
    • 设置有半导体衬底的半导体器件的一个实施例,形成在半导体衬底上的器件区域,封装器件区域的器件隔离区域,在器件上彼此平行布置的多个第一栅极电极 并且彼此电连接;以及多个第二栅电极,其被布置成与所述器件区域上的多个第一栅极平行并且彼此电连接,其中所述第一栅电极被布置为 插入在第二栅电极之间,第一栅电极的栅极宽度小于第二栅电极的栅极宽度,并且将高于第二栅电极的直流偏置电压施加到第一栅电极。
    • 5. 发明申请
    • SEMICONDUCTOR DEVICE
    • 半导体器件
    • US20090243725A1
    • 2009-10-01
    • US12409926
    • 2009-03-24
    • Kazuhide ABETadahiro SasakiKazuhiko Itaya
    • Kazuhide ABETadahiro SasakiKazuhiko Itaya
    • H03F3/185H01L25/065
    • H03F3/195H01L23/585H01L23/66H01L29/0657H01L29/41758H01L29/4238H01L2223/6644H01L2924/0002H01L2924/00
    • A semiconductor device includes a first transistor unit including first field effect transistors with first gate electrodes electrically connected together, first sources electrically connected together, and first drains electrically connected together, the first gate electrodes being electrically connected to the first drains, a second transistor unit including second field effect transistors with second gate electrodes electrically connected together, second sources electrically connected together, and second drains electrically connected together, the second gate electrodes being electrically connected to the first gate electrodes, and dummy gate electrodes electrically isolated from the first gate electrodes and the second gate electrodes. The first gate electrodes, the second gate electrodes, and the dummy gate electrodes are arranged parallel to one another, and at least one dummy gate electrode is located between any one of the first gate electrodes and any one of the second gate electrodes.
    • 半导体器件包括第一晶体管单元,其包括第一场效应晶体管,第一栅电极电连接在一起,电连接在一起的第一源和电连接在一起的第一漏极,第一栅电极电连接到第一漏极,第二晶体管单元 包括第二场效应晶体管,其中第二栅电极电连接在一起,第二源电连接在一起,第二漏极电连接在一起,第二栅电极电连接到第一栅电极,以及虚栅极与第一栅电极电隔离 和第二栅电极。 第一栅电极,第二栅电极和伪栅极彼此平行布置,并且至少一个虚拟栅电极位于第一栅极电极和第二栅极电极中的任一个之间。
    • 7. 发明申请
    • SEMICONDUCTOR DEVICE
    • 半导体器件
    • US20130256660A1
    • 2013-10-03
    • US13685859
    • 2012-11-27
    • Kazuhide ABEAtsuko IIDAKazuhiko ITAYAJunji WADATSUMIShouhei KOUSAI
    • Kazuhide ABEAtsuko IIDAKazuhiko ITAYAJunji WADATSUMIShouhei KOUSAI
    • H01L29/84
    • H01L29/84H01L2924/1461H03H9/2405H03H2009/02314
    • A semiconductor device according to an embodiment has: a semiconductor substrate; an acoustic resonator formed on the semiconductor substrate, having a semiconductor layer including impurity electrically isolated from the substrate by depletion layer and configured to resonate at a predetermined resonance frequency based on acoustic standing wave excited in the semiconductor layer; a temperature detector formed on the semiconductor substrate and configured to detect temperature of the semiconductor substrate; a calculating unit formed on the semiconductor substrate and configured to perform calculation of temperature compensation based on the temperature detected by the temperature detector, kind of the impurity and concentration of the impurity; and a controller formed on the semiconductor substrate and configured to control the resonance frequency based on a result of the calculation by the calculating unit.
    • 根据实施例的半导体器件具有:半导体衬底; 形成在所述半导体衬底上的声谐振器,具有包括通过耗尽层与所述衬底电绝缘的杂质的半导体层,并且被配置为基于在所述半导体层中激发的声驻波以预定的谐振频率谐振; 温度检测器,形成在所述半导体衬底上,并被配置为检测所述半导体衬底的温度; 计算单元,其形成在所述半导体基板上,并且被配置为基于由所述温度检测器检测到的温度进行温度补偿的计算,所述杂质的种类和所述杂质的浓度; 以及控制器,其形成在所述半导体基板上,并且被配置为基于所述计算单元的计算结果来控制所述共振频率。
    • 8. 发明申请
    • METHOD FOR FABTRICATING SEMICONDUCTOR DEVICE
    • 制造半导体器件的方法
    • US20080206924A1
    • 2008-08-28
    • US11963485
    • 2007-12-21
    • Kazuhide ABE
    • Kazuhide ABE
    • H01L21/20
    • H01L29/6606H01L21/0465
    • According to the first aspect of the present invention, a method for fabricating a semiconductor device with a silicon carbide (SiC) film is comprised of a process to grow a silicon carbide film on a substrate; and a process to form a groove in the periphery of a region on the silicon carbide film in which crystal defects are aggregated.According to the second aspect of the present invention, a method for fabricating a semiconductor device with a silicon carbide (SiC) film is comprised of a process to grow a silicon carbide film on a substrate; and a process to form a groove on said silicon carbide film so that a region in which crystal defects are aggregated in said silicon carbide film is removed.
    • 根据本发明的第一方面,一种制造具有碳化硅(SiC)膜的半导体器件的方法包括在衬底上生长碳化硅膜的工艺; 以及在晶圆缺陷聚集的碳化硅膜上的区域的周围形成槽的工序。 根据本发明的第二方面,制造具有碳化硅(SiC)膜的半导体器件的方法包括在衬底上生长碳化硅膜的工艺; 以及在所述碳化硅膜上形成凹槽的过程,从而去除在所述碳化硅膜中晶体缺陷聚集的区域。