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1. 发明授权

US5777722A Scanning exposure apparatus and method 失效
标题翻译：扫描曝光装置和方法
公开(公告)号：US5777722A
公开(公告)日：1998-07-07
申请号：US654382
申请日：1996-05-28
申请人： Seiji Miyazaki , Tsuyoshi Narabe , Kei Nara , Tomohide Hamada , Kazuaki Saiki , Hideji Goto , Muneyasu Yokota
发明人： Seiji Miyazaki , Tsuyoshi Narabe , Kei Nara , Tomohide Hamada , Kazuaki Saiki , Hideji Goto , Muneyasu Yokota
IPC分类号： G03F7/20 , G03F9/00 , G03B27/42 , G03B27/32 , G01B11/00
CPC分类号： G03F7/70275 , G03F7/70358 , G03F9/70
摘要： A scanning exposure apparatus is arranged to illuminate a mask, to project an image of the mask through a projection optical system onto a photosensitive substrate, and to move the mask and the photosensitive substrate relative to the projection optical system, thereby effecting exposure of an entire surface of the mask on the photosensitive substrate, and the exposure apparatus comprises a position detector which detects a relative positional relation between the mask and the photosensitive substrate; a memory which stores positional information obtained by the position detector; a position correcting device which corrects the relative positional relation between the mask and the photosensitive substrate, based on the positional information read out from the memory device; and a controller which makes the position detector detect the relative positional relation between the mask and the photosensitive substrate while the mask and the photosensitive substrate are carried past a projection region of the projection optical system to an exposure start position, and makes the position correcting device correct the relative positional relation between the mask and the photosensitive substrate, based on the positional information read out from the memory, while the mask and the photosensitive substrate are stopped at the exposure start position and/or during the exposure.
摘要翻译：扫描曝光装置被布置为照亮掩模，通过投影光学系统将光掩模的图像投射到感光基板上，并且使掩模和感光基板相对于投影光学系统移动，从而实现整个曝光感光基板上的掩模表面，曝光装置包括检测掩模和感光基板之间的相对位置关系的位置检测器; 存储器，其存储由所述位置检测器获取的位置信息; 基于从存储装置读出的位置信息来校正掩模和感光基板之间的相对位置关系的位置校正装置; 以及控制器，其使得位置检测器在将掩模和感光基板通过投影光学系统的投影区域到曝光开始位置时检测掩模和感光基板之间的相对位置关系，并使位置校正装置基于从存储器读出的位置信息，掩模和感光基板在曝光开始位置和/或曝光期间停止时，校正掩模和感光基板之间的相对位置关系。

2. 发明授权

US06084244A Scanning exposure apparatus that compensates for positional deviation caused by substrate inclination 失效
标题翻译：用于补偿由基板倾斜引起的位置偏差的扫描曝光装置
公开(公告)号：US06084244A
公开(公告)日：2000-07-04
申请号：US126639
申请日：1998-07-30
申请人： Kazuaki Saiki , Tomohide Hamada
发明人： Kazuaki Saiki , Tomohide Hamada
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G01N21/86
CPC分类号： G03F7/70358 , G03F9/7034
摘要： A scanning exposure apparatus of the present invention is constructed in such an arrangement that while a mask and a substrate are moved relatively to a projection optical system, a pattern formed on the mask is projected for exposure through the projection optical system onto the substrate. The scanning exposure apparatus is provided with a leveling control portion for successively controlling an amount of relative inclination between the substrate and the mask with movement thereof, based on a predetermined leveling angle command .theta., so that an exposure area of the substrate becomes approximately coincident with an image plane of the pattern of the mask, a positional deviation measuring and control portion for measuring and controlling an amount of relative positional deviation between the mask and the substrate, and a positional deviation calculating and correcting portion for calculating an amount of relative positional deviation between the mask and the substrate, which will be caused by the control of the leveling control portion, based on the leveling angle command, and effecting correction of the relative positional deviation on the positional deviation measuring and control portion.
摘要翻译：本发明的扫描曝光装置被构造成这样一种布置，即当掩模和基片相对于投影光学系统移动时，形成在掩模上的图案被投影以通过投影光学系统曝光到基底上。扫描曝光装置设置有调平控制部分，用于基于预定的调平角度指令θ来连续地控制基板和掩模之间的相对倾斜量，使得基板的曝光区域大致与掩模图案的图像平面，用于测量和控制掩模和基板之间的相对位置偏差量的位置偏差测量和控制部分，以及用于计算相对位置偏差量的位置偏差计算和校正部分基于平整角度指令，由调平控制部的控制引起的掩模和基板之间的位置偏差测量和控制部的相对位置偏差的校正。

3. 发明授权

US06744511B1 Stage device having drive mechanism for driving a movable stage, and exposure apparatus and method of detecting position of the stage 有权
标题翻译：具有用于驱动可动台的驱动机构的舞台装置，以及检测舞台位置的曝光装置和方法
公开(公告)号：US06744511B1
公开(公告)日：2004-06-01
申请号：US09372343
申请日：1999-08-11
申请人： Kazuaki Saiki , Tomohide Hamada
发明人： Kazuaki Saiki , Tomohide Hamada
IPC分类号： G01B1102
CPC分类号： G03F7/70725
摘要： An exposure device which includes a stage device having a first stage which movably supports an object and a drive mechanism which drives the first stage in at least a first direction. The first stage has a first portion coupled to the drive mechanism and a second portion for supporting the object. The first stage device is configured with a first position measuring device which measures the position of the first portion in a predetermined measurement direction. The exposure device further includes a first stage control system which controls the drive mechanism to control the position of the object in at least a first direction based on a measurement result obtained by the first position measuring device.
摘要翻译：一种曝光装置，包括具有可移动地支撑物体的第一台和在至少第一方向上驱动第一台的驱动机构的平台装置。第一级具有联接到驱动机构的第一部分和用于支撑物体的第二部分。第一级装置配置有测量第一部分在预定测量方向上的位置的第一位置测量装置。曝光装置还包括第一级控制系统，其基于由第一位置测量装置获得的测量结果控制驱动机构以至少在第一方向上控制物体的位置。

4. 发明授权

US5920378A Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US5920378A
公开(公告)日：1999-07-06
申请号：US853389
申请日：1997-05-09
申请人： Masaichi Murakami , Hiroshi Shirasu , Tomohide Hamada , Kazuaki Saiki , Susumu Mori
发明人： Masaichi Murakami , Hiroshi Shirasu , Tomohide Hamada , Kazuaki Saiki , Susumu Mori
IPC分类号： G03F7/20 , G03F9/00 , G03B27/42 , G01B11/00
CPC分类号： G03F7/70691 , G03F7/70791 , G03F9/70
摘要： A projection exposure apparatus includes off-axis type plate alignment systems which make it possible to reduce alignment time and thereby increase throughput. Exposure of large photosensitive plates is made possible without increasing the length of the plate stage stroke. Multiple fiducial mark members including fiducial mark members in different positions on a plate stage are utilized. Multiple off-axis type plate alignment systems are used to observe the multiple fiducial marks.
摘要翻译：投影曝光装置包括离轴型板对准系统，其能够缩短对准时间，从而提高生产量。大型感光板的曝光是可能的，而不会增加平板台面行程的长度。使用了多个基准标记，其中包括在平台上不同位置的基准标记成员。多个离轴型板对准系统用于观察多个基准标记。

5. 发明授权

US09178155B2 Flexible substrate, manufacturing method of display element, and manufacturing apparatus of display element 有权
标题翻译：柔性基板，显示元件的制造方法以及显示元件的制造装置
公开(公告)号：US09178155B2
公开(公告)日：2015-11-03
申请号：US12576752
申请日：2009-10-09
申请人： Kei Nara , Tomohide Hamada , Masaki Kato , Tohru Kiuchi
发明人： Kei Nara , Tomohide Hamada , Masaki Kato , Tohru Kiuchi
IPC分类号： B05D5/12 , B65G47/26 , B65G1/133 , H01L51/00 , H01L51/52 , H01L51/56
CPC分类号： H01L51/00 , H01L51/52 , H01L51/56 , H01L2251/5338 , Y10T428/24479
摘要： In a manufacturing apparatus of display element, a display element is formed in a flexible substrate that has a first surface and a second surface that is an opposite surface thereof, and this manufacturing apparatus of display element includes a transportation section that transports the flexible substrate in a predetermined direction that intersects with a width direction of the flexible substrate; a first partition wall formation section that forms a first partition wall for a display element in the first surface; and a second partition wall formation section that forms a second partition wall in the second surface.
摘要翻译：在显示元件的制造装置中，显示元件形成在柔性基板中，该柔性基板具有作为其相对表面的第一表面和第二表面，并且该显示元件的制造装置包括：输送柔性基板的输送部与柔性基板的宽度方向相交的预定方向; 第一分隔壁形成部，其形成第一表面中的显示元件的第一分隔壁; 以及在所述第二表面中形成第二隔壁的第二分隔壁形成部。

6. 发明授权

US07726051B2 Wheel-type working machine and method of controlling the same 失效
标题翻译：轮式作业机及其控制方法
公开(公告)号：US07726051B2
公开(公告)日：2010-06-01
申请号：US11919181
申请日：2006-04-21
申请人： Masaaki Imaizumi , Tomohide Hamada
发明人： Masaaki Imaizumi , Tomohide Hamada
IPC分类号： E02F5/02
CPC分类号： E02F9/265 , E02F9/2033 , E02F9/226
摘要： A hydraulic excavator includes: an oil-pressure cut valve for suspending pressure oil supply to a PPC valve; a lock switch for operating the oil-pressure cut valve; and a control device for controlling a switching of the oil-pressure cut valve. The control device includes: a lock-state determining unit that determines a lock state of working equipment by considering the status of the lock switch; a traveling-state determining unit that determines a traveling state of the hydraulic excavator; an alert-issuing controlling unit that issues an alert urging locking of the working equipment; and a relay control unit that actuates the oil-pressure cut valve to suspend the flow of pressure oil. The alert-issuing controlling unit issues the alert and the relay control unit actuates the oil pressure cut valve when the hydraulic excavator is determined to be traveling and the working equipment is determined not to be in the lock state.
摘要翻译：液压挖掘机包括：用于将压力油供给到PPC阀的油压切断阀; 用于操作所述油压切断阀的锁定开关; 以及用于控制油压切断阀的切换的控制装置。控制装置包括：锁定状态确定单元，其通过考虑锁定开关的状态来确定工作设备的锁定状态; 确定液压挖掘机的行驶状态的行驶状态判定单元; 警报发布控制单元，发出促使对工作设备的锁定的警报; 以及继电器控制单元，其驱动所述油压切断阀使所述压力油流动。警报发布控制单元发出警报，并且当确定液压挖掘机正在行驶并且确定工作设备不处于锁定状态时，继电器控制单元致动油压切断阀。

7. 发明授权

US06570641B2 Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US06570641B2
公开(公告)日：2003-05-27
申请号：US09955116
申请日：2001-09-19
申请人： Tomohide Hamada , Hiroshi Shirasu , Yukio Kakizaki , Kinya Kato
发明人： Tomohide Hamada , Hiroshi Shirasu , Yukio Kakizaki , Kinya Kato
IPC分类号： G03B2118
CPC分类号： G03F7/70775 , G03F7/70358 , G03F7/70716 , G03F9/70
摘要： The projection exposure apparatus can include an illumination optical system for illuminating a portion of a mask pattern on a mask with an exposing radiation flux of a predetermined shape, a fixed support, a projection optical system fixed to the fixed support for projecting the image of the illuminated portion of the mask pattern onto a substrate, and a carriage for integrally holding the mask and the substrate, the carriage being movable in a predetermined direction with respect to the projection optical system successively exposing the substrate with the image of the mask pattern formed by the exposing radiation flux. The projection exposure apparatus further includes a long mirror elongated in the predetermined direction and fixed to the fixed support, the length of the long mirror being at least equal to the stroke of the carriage movement in the predetermined direction, and a measurement system for measuring the position of the mask and the position of the substrate with respect to the long mirror to determine the position of the mask relative to the substrate in a direction perpendicular to the predetermined direction.
摘要翻译：投影曝光装置可以包括照射光学系统，用于以掩模形式的一部分掩模图案照射预定形状的曝光辐射通量，固定支撑件，固定在固定支架上的投影光学系统，用于投影图像的图像掩模图案的照明部分到基板上，以及滑架，用于一体地保持掩模和基板，滑架可相对于投影光学系统沿预定方向移动，连续地将基板与由曝光辐射通量。投影曝光装置还包括在预定方向上延伸并固定到固定支撑件上的长镜，长反射镜的长度至少等于滑架在预定方向上的行程的行程，以及测量系统掩模的位置和基板相对于长镜的位置，以确定掩模相对于基板在垂直于预定方向的方向上的位置。

8. 发明授权

US5923409A Scanning-type exposure apparatus including a vertically disposed holder surface and method thereof 失效
标题翻译：包括垂直设置的保持器表面的扫描型曝光装置及其方法
公开(公告)号：US5923409A
公开(公告)日：1999-07-13
申请号：US917226
申请日：1997-08-25
申请人： Tomohide Hamada , Hiroshi Shirasu
发明人： Tomohide Hamada , Hiroshi Shirasu
IPC分类号： G03B27/58 , G03F7/20 , G03B27/42 , G03B27/62
CPC分类号： G03F7/70691 , G03B27/58 , G03F7/70358 , G02F1/1303
摘要： In a scanning-type exposure apparatus, a mask and a light-sensitive substrate are disposed substantially vertically in opposed relation to each other, with an optical projection system disposed between the mask and the substrate. Optical projection system includes a plurality of optical elements for projecting an equal-size, erected image of a mask pattern onto the light-sensitive substrate, and these optical elements are arranged in a predetermined direction. A scanning device scanningly moves the mask and the light-sensitive substrate in synchronism with each other relative to the optical projection system in a direction which is perpendicular to both of the predetermined direction and an optical axis of the optical projection system.
摘要翻译：在扫描型曝光装置中，掩模和感光基板以彼此相对的方式大致垂直地设置，并且光学投影系统设置在掩模和基板之间。光学投影系统包括多个光学元件，用于将相同尺寸的竖立的掩模图案的图像投影到感光基板上，并且这些光学元件沿预定方向布置。扫描装置相对于光学投影系统在垂直于光学投影系统的预定方向和光轴的方向上彼此同步地扫描地移动掩模和感光基板。

9. 发明授权

US5523574A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5523574A
公开(公告)日：1996-06-04
申请号：US448659
申请日：1995-05-24
申请人： Tomohide Hamada , Hiroshi Shirasu
发明人： Tomohide Hamada , Hiroshi Shirasu
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G21K5/00
CPC分类号： G03F7/70358 , G03F9/70
摘要： An exposure apparatus has an illumination system for illuminating a mask with a light beam, a projection optical system for projecting a mask pattern on a photosensitive substrate and a carriage for integrally holding the mask and the photosensitive substrate. The exposure apparatus further has a detection system for detecting a change in attitude of the carriage and a correction system for correcting a positional deviation between the mask and the photosensitive substrate on the basis of a detected result of the detection system.
摘要翻译：曝光装置具有用于用光束照射掩模的照明系统，用于在感光基板上投射掩模图案的投影光学系统和用于整体地保持掩模和感光基板的滑架。曝光装置还具有用于检测滑架的姿态变化的检测系统和用于基于检测系统的检测结果校正掩模和感光基板之间的位置偏差的校正系统。

10. 发明授权

US09172063B2 Method and apparatus for manufacturing display devices 有权
标题翻译：用于制造显示装置的方法和装置
公开(公告)号：US09172063B2
公开(公告)日：2015-10-27
申请号：US12102509
申请日：2008-04-14
申请人： Tomohide Hamada , Kei Nara
发明人： Tomohide Hamada , Kei Nara
IPC分类号： B05D5/12 , H01L51/56 , G02F1/13 , H01J9/24 , G02F1/1333 , H01L27/32 , H01L51/00
CPC分类号： H01L51/56 , G02F1/1303 , G02F2001/133302 , G02F2001/133325 , H01J9/241 , H01J9/242 , H01L27/3246 , H01L51/0005 , H01L51/0022
摘要： A method for fabricating a display device including forming a standard mark in a flexible substrate fed in a first direction, forming a partition wall in the flexible substrate, and forming an electrode by applying a conductive member at a predetermined position between the partition walls by an applicator based on the standard mark. An apparatus is provided that includes a transportation unit to transport a flexible substrate in a first direction, a mark formation unit to form a standard mark in the flexible substrate, a partition wall formation unit to form a partition wall in the flexible substrate, and an application unit to apply a conductive member to a predetermined position between the partition walls based on the standard mark. A display device is provided that includes a flexible substrate, a partition wall formed by pressing the flexible substrate, and an electrode formed by application between the partition walls.
摘要翻译：一种制造显示装置的方法，包括在沿第一方向馈送的柔性基板中形成标准标记，在柔性基板中形成分隔壁，并通过在隔壁之间的预定位置处施加导电构件，形成电极，涂抹器基于标准标记。提供了一种装置，其包括：沿第一方向输送柔性基板的输送单元，在柔性基板中形成标准标记的标记形成单元，在柔性基板中形成分隔壁的分隔壁形成单元，应用单元基于标准标记将导电构件施加到分隔壁之间的预定位置。提供一种显示装置，其包括柔性基板，通过按压柔性基板形成的分隔壁以及通过在分隔壁之间施加形成的电极。

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