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    • 1. 发明授权
    • Laser ventilation system
    • 激光通风系统
    • US06414828B1
    • 2002-07-02
    • US09482182
    • 2000-01-12
    • Kay ZimmermanUlrich Rebhan
    • Kay ZimmermanUlrich Rebhan
    • H02H300
    • F24F7/00B23K26/1435B23K26/1438
    • A ventilation system for industrial laser systems is disclosed which can minimize the cooling air intake required during normal operation. Adequate ventilation is maintained even if the housing is opened. Various sensors monitor the condition of the cooling air and can increase the air intake if required for cooling or safety. Such a ventilation system is of particular advantage for excimer lasers in microlithography applications because the consumption of conditioned clean room air is controlled by the actual needs of the laser device.
    • 公开了用于工业激光系统的通风系统,其可以使正常操作期间所需的冷却空气进入最小化。 即使外壳打开,仍保持足够的通风。 各种传感器监测冷却空气的状况,如果冷却或安全需要,可以增加进气口。 这种通风系统对于微光刻应用中的准分子激光器是特别有利的,因为经过激光设备的实际需要来控制空调洁净室空气的消耗。
    • 4. 发明授权
    • Optical materials testing method
    • 光学材料测试方法
    • US06587202B2
    • 2003-07-01
    • US09726871
    • 2000-11-30
    • Ulrich Rebhan
    • Ulrich Rebhan
    • G01N2100
    • G01N21/59G01N21/33
    • A method for testing a material block prior to forming the material block into one or more optical components for use with a sub-micron lithographic, high power, narrow bandwidth laser system having high wavelength stability includes the step of selecting a block of material having appropriate characteristic optical properties for the source laser system being used. The next step is to test the material block for absorption performance. Then, if the block exhibits a sufficient absorption performance, then one of more optical components such as one or more prisms, etalons, and/or windows, etc. are formed from the material block. Finally, the optical components formed from the block are inserted into a wavelength selection module of the resonator of the laser to participate in producing a high power, narrow bandwidth laser beam which may be used in sub-micron photolithographic applications.
    • 在将材料块形成用于具有高波长稳定性的亚微米光刻,高功率,窄带宽激光系统的一个或多个光学部件之前用于测试材料块的方法包括以下步骤:选择具有适当的材料块 使用的源激光系统的特性光学特性。 下一步是测试材料块的吸收性能。 然后,如果块具有足够的吸收性能,则从材料块形成更多的光学部件之一,例如一个或多个棱镜,标准具和/或窗户等。 最后,将从块形成的光学部件插入到激光器的谐振器的波长选择模块中,以参与产生可用于亚微米光刻应用的高功率窄带宽激光束。
    • 6. 发明授权
    • Energy control for an excimer or molecular fluorine laser
    • 准分子或分子氟激光的能量控制
    • US06727731B1
    • 2004-04-27
    • US09688561
    • 2000-10-16
    • Ulrich RebhanGuenter Nowinski
    • Ulrich RebhanGuenter Nowinski
    • H01S313
    • G03F7/70025G03F7/70041G03F7/70575H01S3/036H01S3/038H01S3/134H01S3/22H01S3/225H01S3/2258
    • A method and gas replenishment algorithm for excimer and molecular fluorine lasers is based on parameters upon which gas aging more closely depends than pulse count, such as input energy to the electrical discharge, and also preferably time. A burst control method and algorithm includes measuring the energies of initial pulses of a first burst occurring after a long burst break, calculating values of input voltages for the initial pulses that would bring output energies of the individual laser pulses or groups of pulses to substantially the same values, and applying the calculated voltages in a subsequent first burst after a long burst break to achieve substantially same predetermined output energy values for the pulses or groups of pulses. Similar operations may be performed for one or more subsequent bursts following the first burst. The values for the first burst may be maintained in a first table of input voltage values to be read by a processor which signals a power supply circuit to apply the voltages according to the voltage values in the table. The values for subsequent bursts may be maintained in a second table, and a third table, etc. A final table such as the third table may be used for all subsequent bursts until another long burst break again occurs, after which the first table is again used for the first burst following the long burst break.
    • 准分子和分子氟激光器的方法和气体补充算法基于气体老化比脉冲计数更接近的参数,例如放电的输入能量,并且还优选时间。 脉冲串控制方法和算法包括测量在长突发间隔之后发生的第一脉冲串的初始脉冲的能量,计算将使各个激光脉冲或脉冲组的输出能量基本上达到的初始脉冲的输入电压值 相同的值,并且在长突发间隔之后的随后的第一突发中应用所计算的电压以实现脉冲或脉冲组的基本相同的预定输出能量值。 可以在第一突发之后的一个或多个后续脉冲串执行类似的操作。 第一脉冲串的值可以保持在输入电压值的第一表中,以由处理器读取,该处理器向电源电路发信号,以根据表中的电压值施加电压。 后续脉冲串的值可以保持在第二表中,并且第三表等。对于所有后续脉冲串,可以使用诸如第三表的最终表,直到再次出现另一个长突发中断,此后第一个表再次发生 用于长时间突击后的第一次爆发。
    • 7. 发明授权
    • Beam shutter for excimer laser
    • 光束快门用于准分子激光
    • US06493364B1
    • 2002-12-10
    • US09475775
    • 1999-12-30
    • Jurgen BaumlerUlrich RebhanMarkus Ritcher
    • Jurgen BaumlerUlrich RebhanMarkus Ritcher
    • H01S3123
    • H01S3/03H01S3/225
    • A beam shutter apparatus designed to handle high powered UV radiation is disclosed. The shutter includes a high reflectivity mirror mounted on a plate which can be rotated between a first position where the beam is reflected and redirected to a tool such as a beam dump and a second position where the beam is free to pass out of the laser, where the beam is free to pass out of the laser The shutter includes a support base with an angled upper surface upon which the mirror plate rests when in the second position. The support base has a beam path channel designed so that a beam can pass through the support base and out of the shutter when the mirrored plate is in the first position. The mirrored plate is rotated by a linkage, which is driven by an electrically powered actuator on a rotational magnet. The support base is machined out of a monolithic piece of metal allowing very high precision without the need for cumbersome alignment procedures.
    • 公开了一种设计用于处理高功率UV辐射的光束快门装置。 快门包括安装在板上的高反射率反射镜,该反射镜可以在第一位置和第二位置之间旋转,该第一位置在光束被反射并重定向到诸如光束倾倒的工具和第二位置之间, 其中光束自由地从激光器中通过。快门包括具有成角度的上表面的支撑基座,当处于第二位置时,所述镜板停靠在支撑基座上。 支撑基座具有光束通道通道,其被设计成当镜像板处于第一位置时,光束可以穿过支撑基座并离开快门。 镜面板通过联动装置旋转,联动装置由旋转磁体上的电动致动器驱动。 支撑基座由单块金属制成,允许非常高的精度,而不需要繁琐的对准程序。