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1. 发明授权

US5972780A Thin film forming apparatus and method 失效
标题翻译：薄膜成膜装置及方法
公开(公告)号：US5972780A
公开(公告)日：1999-10-26
申请号：US911845
申请日：1997-08-15
申请人： Katsuyuki Machida , Hakaru Kyuragi , Hideo Akiya , Kazuo Imai
发明人： Katsuyuki Machida , Hakaru Kyuragi , Hideo Akiya , Kazuo Imai
IPC分类号： B29C43/56 , B32B37/18 , H05K3/20 , H01L21/30 , H01L21/46
CPC分类号： B29C43/56 , B32B37/00 , H05K3/20 , B29C2043/561 , B29C43/32 , B32B2309/68 , B32B37/025 , B32B37/18 , Y10T156/12 , Y10T156/1343 , Y10T156/1705
摘要： A thin film forming apparatus includes a specimen holder on which a substrate for thin film formation is placed, a transfer plate opposing the specimen holder, on which a sheet film having a thin film formed on a surface is placed, a thin film forming chamber comprising the specimen holder and the transfer plate, a pressure unit for moving at least one of the specimen holder and the transfer plate and pressing the specimen holder against the transfer plate for a predetermined time while the substrate and the thin film formed on the sheet film are in contact with each other, a heating unit for heating the substrate at a predetermined temperature, and an exhausting unit for vacuum-exhausting the thin film forming chamber.
摘要翻译：一种薄膜形成装置，包括：试样保持体，配置有用于形成薄膜的基板;与该试样支架相对的转印板，在其上放置表面形成有薄膜的薄膜，薄膜形成室，样品架和转印板，用于移动样本保持架和转印板中的至少一个的压力单元，并且在基板和形成在薄膜上的薄膜的同时将样本架抵靠转印板按压预定时间彼此接触，用于在预定温度下加热基板的加热单元和用于真空排出薄膜形成室的排气单元。

2. 发明授权

US6092578A Transferring thin film to a substrate 失效
标题翻译：将薄膜转移到基材上
公开(公告)号：US6092578A
公开(公告)日：2000-07-25
申请号：US026119
申请日：1998-02-19
申请人： Katsuyuki Machida , Hakaru Kyuragi , Hideo Akiya , Kazuo Imai
发明人： Katsuyuki Machida , Hakaru Kyuragi , Hideo Akiya , Kazuo Imai
IPC分类号： B29C43/56 , B32B37/18 , H05K3/20 , B32B35/00 , H01L21/30
CPC分类号： B29C43/56 , B32B37/00 , H05K3/20 , B29C2043/561 , B29C43/32 , B32B2309/68 , B32B37/025 , B32B37/18 , Y10T156/12 , Y10T156/1343 , Y10T156/1705
摘要： A thin film forming apparatus includes a specimen holder on which a substrate for thin film formation is placed, a transfer plate opposing the specimen holder, on which a sheet film having a thin film formed on a surface is placed, a thin film forming chamber comprising the specimen holder and the transfer plate, a pressure unit for moving at least one of the specimen holder and the transfer plate and pressing the specimen holder against the transfer plate for a predetermined time while the substrate and the thin film formed on the sheet film are in contact with each other, a heating unit for heating the substrate at a predetermined temperature, and an exhausting unit for vacuum-exhausting the thin film forming chamber.
摘要翻译：一种薄膜形成装置，包括：试样保持体，配置有用于形成薄膜的基板;与该试样支架相对的转印板，在其上放置表面形成有薄膜的薄膜，薄膜形成室，样品架和转印板，用于移动样本保持架和转印板中的至少一个的压力单元，并且在基板和形成在薄膜上的薄膜的同时将样本架抵靠转印板按压预定时间彼此接触，用于在预定温度下加热基板的加热单元和用于真空排出薄膜形成室的排气单元。

3. 发明授权

US06232216B1 Thin film forming method 失效
标题翻译：薄膜成型方法
公开(公告)号：US06232216B1
公开(公告)日：2001-05-15
申请号：US08835992
申请日：1997-04-11
申请人： Katsuyuki Machida , Hakaru Kyuragi , Hideo Akiya
发明人： Katsuyuki Machida , Hakaru Kyuragi , Hideo Akiya
IPC分类号： C23C16511
CPC分类号： H01L21/02126 , C23C16/045 , H01L21/02164 , H01L21/022 , H01L21/02211 , H01L21/02222 , H01L21/02274 , H01L21/02282 , H01L21/02304 , H01L21/02362 , H01L21/31633 , H01L21/76801 , H01L21/76819 , H01L21/76834
摘要： In this thin film forming method, a first thin film is formed on a semiconductor substrate having the step height by chemical vapor deposition using a high density plasma. A base member on which a second thin film is formed is placed on the semiconductor substrate such that the first and second thin films oppose each other. The semiconductor substrate is heated to a first temperature to form the second thin film on the first thin film. The base member is peeled off from the second thin film. The second thin film formed on the first thin film is heated to a second temperature higher than the first temperature.
摘要翻译：在该薄膜形成方法中，通过使用高密度等离子体的化学气相沉积在具有台阶高度的半导体基板上形成第一薄膜。其上形成有第二薄膜的基底构件被放置在半导体衬底上，使得第一和第二薄膜彼此相对。半导体衬底被加热到第一温度以在第一薄膜上形成第二薄膜。基底构件从第二薄膜剥离。形成在第一薄膜上的第二薄膜被加热到高于第一温度的第二温度。

4. 发明授权

US6086699A Thin film-forming method and thin film-forming apparatus therefor 失效
标题翻译：薄膜形成方法及其薄膜形成装置
公开(公告)号：US6086699A
公开(公告)日：2000-07-11
申请号：US79112
申请日：1998-05-14
申请人： Akira Nakashima , Atsushi Tonai , Ryo Muraguchi , Michio Komatsu , Katsuyuki Machida , Hakaru Kyuragi , Kazuo Imai
发明人： Akira Nakashima , Atsushi Tonai , Ryo Muraguchi , Michio Komatsu , Katsuyuki Machida , Hakaru Kyuragi , Kazuo Imai
IPC分类号： H01L21/3205 , B05D1/28 , H01L21/00 , H01L21/31 , H01L21/316 , H01L21/768 , B32B33/00 , B05D5/00 , B05D7/24 , B05D7/26
CPC分类号： H01L21/6715 , B05D1/28 , H01L21/67132
摘要： Disclosed is a thin film-forming apparatus comprising a coating liquid feed means 6 for feeding a thin film-forming coating liquid onto a surface of a transfer roll 2, a transfer means 4 including the transfer roll 2 a surface of which is coated with the thin film-forming coating liquid fed from the coating liquid feed means to form a transfer thin film 8, and a substrate conveying means 16 for continuously conveying a substrate 9 under the transfer roll, a surface of said substrate 9 to be provided with a thin film, wherein the transfer means is so fabricated that the transfer roll surface having the transfer thin film thereon is closely contacted with the surface of the substrate conveyed by the substrate conveying means, to transfer the transfer thin film formed on the transfer roll surface to the substrate surface. Also disclosed is a thin film-forming method using the thin film-forming apparatus. By the apparatus and the method, formation of a planar thin film on a substrate such as a semiconductor wafer can be carried out continuously, stably and at a low cost, and quality lowering of the thin film and property change thereof with time caused by adherence of impurities to the thin film or contamination of the thin film with impurities are avoidable. Moreover, the apparatus and the method are applicable to large-sized substrates.
摘要翻译：公开了一种薄膜形成装置，其包括用于将薄膜形成涂布液供给到转印辊2的表面上的涂布液供给装置6，包括转印辊2的转印装置4，转印辊2的表面涂覆有从涂布液供给装置供给的薄膜形成用涂布液，形成转印薄膜8，以及用于在转印辊下连续输送基板9的基板输送机构16，所述基板9的表面设置有薄的膜，其中转印装置被制造成使得其上具有转印薄膜的转印辊表面与由基板输送装置输送的基板的表面紧密接触，以将形成在转印辊表面上的转印薄膜转印到基材表面。还公开了使用该薄膜形成装置的薄膜形成方法。通过该装置和方法，可以连续，稳定地且低成本地在诸如半导体晶片的基板上形成平面薄膜，并且随着粘附时间的推移，薄膜的质量降低及其性能变化杂质对薄膜的污染或杂质污染薄膜是可以避免的。此外，该装置和方法适用于大尺寸基板。

5. 发明授权

US06340641B1 Substrate flattening method and film-coated substrate made thereby 有权
标题翻译：底材平整方法和由此制成的薄膜包衣基材
公开(公告)号：US06340641B1
公开(公告)日：2002-01-22
申请号：US09297343
申请日：1999-04-29
申请人： Ryo Muraguchi , Akira Nakashima , Atsushi Tonai , Michio Kimatsu , Katsuyuki Machida , Hakaru Kyuragi , Kazuo Imai
发明人： Ryo Muraguchi , Akira Nakashima , Atsushi Tonai , Michio Kimatsu , Katsuyuki Machida , Hakaru Kyuragi , Kazuo Imai
IPC分类号： H01L2131
CPC分类号： B05D1/286 , G11B5/8404
摘要： The present invention provides a method of easily planarizing the uneven surface of a substrate having an uneven surface. This method comprises the steps of forming a coating film containing spherical fine particles on a surface of a smooth substrate; sticking the surface of the smooth substrate provided with the coating film containing spherical fine particles to the uneven surface of a substrate having an uneven surface; and transferring the coating film containing spherical fine particles to the uneven surface of the substrate so that the uneven surface is planarized.
摘要翻译：本发明提供一种容易平坦化具有不平坦表面的基板的凹凸表面的方法。该方法包括在平滑基材的表面上形成含有球状微粒的涂膜的步骤; 将具有含有球状微粒的涂膜的光滑基板的表面粘附到具有不平坦表面的基板的凹凸表面上; 并将含有球状微粒的涂膜转印到基板的不平坦表面上，使得凹凸表面平坦化。

6. 发明授权

US07062075B2 Surface shape recognition sensor device 失效
公开(公告)号：US07062075B2
公开(公告)日：2006-06-13
申请号：US10140742
申请日：2002-05-07
申请人： Hiroki Morimura , Toshishige Shimamura , Satoshi Shigematsu , Katsuyuki Machida , Hakaru Kyuragi
发明人： Hiroki Morimura , Toshishige Shimamura , Satoshi Shigematsu , Katsuyuki Machida , Hakaru Kyuragi
IPC分类号： G06K9/00
CPC分类号： G06K9/0002
摘要： A calibration mode signal line to which sensor cells are commonly connected is arranged. In a calibration mode, a calibration mode signal is supplied to the sensor cells through the calibration mode signal line to designate calibration. In each sensor cell, when the calibration mode signal is being supplied from the calibration mode signal line, and the sensor cell is selected by the decoder, calibration operation of adjusting the detection sensitivity of a sensor circuit is executed using a calibration circuit.

7. 发明授权

US06468895B2 Pattern forming method 失效
标题翻译：图案形成方法
公开(公告)号：US06468895B2
公开(公告)日：2002-10-22
申请号：US09826029
申请日：2001-04-03
申请人： Hiromu Ishii , Shouji Yagi , Katsuyuki Machida , Kunio Saito , Tadao Nagatsuma , Hakaru Kyuragi
发明人： Hiromu Ishii , Shouji Yagi , Katsuyuki Machida , Kunio Saito , Tadao Nagatsuma , Hakaru Kyuragi
IPC分类号： H04L214763
CPC分类号： H01L21/7684 , H01L21/3212 , H01L21/76819 , H01L21/7682 , H01L21/76879
摘要： In a pattern forming method, a trench is formed on a flat base. A pattern material is arranged only in and around the trench so as to project upward from the surface of the base and to be larger than the opening of the trench. The pattern material projecting from the surface of the base is removed by chemical mechanical polishing (CMP) so as to be flush with the upper surface of the base.
摘要翻译：在图案形成方法中，在平坦的基底上形成沟槽。图案材料仅布置在沟槽内和周围，以便从基底的表面向上突出并且大于沟槽的开口。从基体表面突出的图案材料通过化学机械抛光（CMP）去除，以与基底的上表面齐平。

8. 发明授权

US06714666B1 Surface shape recognition apparatus 有权
标题翻译：表面形状识别装置
公开(公告)号：US06714666B1
公开(公告)日：2004-03-30
申请号：US09590879
申请日：2000-06-09
申请人： Hiroki Morimura , Satoshi Shigematsu , Katsuyuki Machida , Hakaru Kyuragi
发明人： Hiroki Morimura , Satoshi Shigematsu , Katsuyuki Machida , Hakaru Kyuragi
IPC分类号： G06K900
CPC分类号： G06K9/0002
摘要： A surface shape recognition apparatus includes a plurality of sensor electrodes, passivation film, capacitance detection circuit, and ground electrode. The sensor electrodes are formed on an interlevel insulator on a substrate and insulated from each other. The passivation film is formed on the interlevel insulator to cover the upper and side surfaces of each sensor electrode. The passivation film is formed from a dielectric material. When a target recognition object comes into contact with the surface of the passivation film, the capacitance detection circuit detects an electrostatic capacitance formed between the sensor electrode and the surface of the target recognition object opposing the sensor electrode. The ground electrode passes static electricity on the surface of the passivation film.
摘要翻译：表面形状识别装置包括多个传感器电极，钝化膜，电容检测电路和接地电极。传感器电极形成在基板上的层间绝缘体上并彼此绝缘。钝化膜形成在层间绝缘体上以覆盖每个传感器电极的上表面和侧表面。钝化膜由电介质材料形成。当目标识别对象与钝化膜的表面接触时，电容检测电路检测在传感器电极与与传感器电极相对的目标识别对象的表面之间形成的静电电容。接地电极在钝化膜的表面上传递静电。

9. 发明申请

US20050214960A1 Surface shape recognition sensor and method of manufacturing the same 有权
标题翻译：表面形状识别传感器及其制造方法
公开(公告)号：US20050214960A1
公开(公告)日：2005-09-29
申请号：US11102269
申请日：2005-04-07
申请人： Norio Sato , Katsuyuki Machida , Hakaru Kyuragi , Satoshi Shigematsu , Hiroki Morimura , Hiromu Ishii , Toshishige Shimamura
发明人： Norio Sato , Katsuyuki Machida , Hakaru Kyuragi , Satoshi Shigematsu , Hiroki Morimura , Hiromu Ishii , Toshishige Shimamura
IPC分类号： G06K9/00 , H01L21/66 , G01R31/26
CPC分类号： G06K9/0002 , Y10T29/49002 , Y10T29/49007 , Y10T29/49117 , Y10T29/4913
摘要： A method of manufacturing a surface shape recognition sensor. A sacrificial film is formed on an interlevel dielectric to cover a lower electrode while keeping an upper portion of a support electrode exposed. An upper electrode is formed on the sacrificial film and support electrode. The sacrificial film is selectively removed and a protective film is formed on the upper electrode. A photosensitive resin film having photosensitivity is formed on the protective film. A plurality of projections are formed in a region of the protective film above a capacitive detection element. In this manner a plurality of capacitive detection elements each having the lower electrode and upper electrode are formed.
摘要翻译：一种制造表面形状识别传感器的方法。牺牲膜形成在层间电介质上以覆盖下电极，同时保持支撑电极的上部暴露。在牺牲膜和支撑电极上形成上电极。选择性地除去牺牲膜，并在上电极上形成保护膜。在保护膜上形成具有感光性的感光性树脂膜。在电容式检测元件上方的保护膜的区域中形成有多个突起。以这种方式形成多个具有下电极和上电极的电容检测元件。

10. 发明授权

US06917694B1 Surface shape recognition apparatus and method 失效
标题翻译：表面形状识别装置及方法
公开(公告)号：US06917694B1
公开(公告)日：2005-07-12
申请号：US09573615
申请日：2000-05-17
申请人： Katsuyuki Machida , Satoshi Shigematsu , Hiroki Morimura , Hakaru Kyuragi , Takuya Adachi
发明人： Katsuyuki Machida , Satoshi Shigematsu , Hiroki Morimura , Hakaru Kyuragi , Takuya Adachi
IPC分类号： A61B5/117 , G06K9/00 , G06F7/04
CPC分类号： G06K9/00006 , A61B5/1172
摘要： A surface shape recognition apparatus includes detection circuit, comparison circuit, storage circuit, and control circuit. The detection circuit electrically detects a surface shape pattern in a partial region of the target collation surface of an object using a plurality of sensor elements and outputs detection data representing the surface shape pattern. The comparison circuit compares the detection data from the detection circuit with predetermined collation data and outputs a comparison result. The storage circuit stores template data representing the surface shape pattern of the entire target collation surface, the template data being obtained from the object in advance. The control circuit partially reads out, as collation data, the template data stored in the storage circuit from an arbitrary position, outputs the collation data to the comparison circuit, and performs determination for authentication between the template data and the object on the basis of the comparison result from the comparison circuit. A surface shape recognition method is also disclosed.
摘要翻译：表面形状识别装置包括检测电路，比较电路，存储电路和控制电路。检测电路使用多个传感器元件电检测物体的目标核对表面的部分区域中的表面形状图案，并输出表示形状图案的检测数据。比较电路将来自检测电路的检测数据与预定核对数据进行比较，并输出比较结果。存储电路存储表示整个目标对照表面的表面形状图案的模板数据，模板数据是从对象预先获得的。控制电路作为核对数据部分地从任意位置读出存储在存储电路中的模板数据，将对照数据输出到比较电路，并基于该模板数据进行对模板数据与对象之间的认证的确定比较电路的比较结果。还公开了一种表面形状识别方法。

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