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1. 发明授权

US5639515A Method for post-treatment of plated steel sheet for soldering 失效
标题翻译：焊接电镀钢板后处理方法
公开(公告)号：US5639515A
公开(公告)日：1997-06-17
申请号：US494760
申请日：1995-06-26
申请人： Katsumi Kanda , Junichi Fujimoto , Takashi Tanaka , Masashi Ichishima , Yoshikazu Kondo
发明人： Katsumi Kanda , Junichi Fujimoto , Takashi Tanaka , Masashi Ichishima , Yoshikazu Kondo
IPC分类号： B05D7/14 , B23K35/36 , C09D5/08 , C23C22/24 , B05D3/02 , B05D3/12
CPC分类号： B23K35/3618 , B05D7/14 , C09D5/08 , C23C22/24
摘要： Electroplated steel sheet suitable for soldering is provided herein by coating the plated steel sheet with a post-treatment solution in the range of 0.02 to 2 .mu.m in dry thickness. The post-treatment solution contains from 2 to 100 g/l of at least one water-soluble or water-dispersed material. The post-treatment solution may further contain chromium ion, hereafter referred to as Cr.sup.6+, from 0.01 to 3 g/l, and/or organic amine soap from 10 to 100 g/l. A suitable pH value of the post-treatment solution is from 3 to 10.
摘要翻译：这里提供适用于焊接的电镀钢板，通过用0.02〜2μm的干燥厚度的后处理溶液涂覆镀覆钢板。后处理溶液含有2至100g / l的至少一种水溶性或水分散的材料。后处理溶液还可以含有0.01-3g / l的铬离子，以下称为Cr 6+，和/或10至100g / l的有机胺皂。后处理溶液的合适pH值为3至10。

2. 发明授权

US5011711A Method for post-treatment of electroplated steel sheets for soldering 失效
标题翻译：焊接电镀钢板后处理方法
公开(公告)号：US5011711A
公开(公告)日：1991-04-30
申请号：US379172
申请日：1989-07-13
申请人： Katsumi Kanda , Junichi Fujimoto , Masashi Ichishima , Takao Nishimura , Yoshikazu Kondo
发明人： Katsumi Kanda , Junichi Fujimoto , Masashi Ichishima , Takao Nishimura , Yoshikazu Kondo
IPC分类号： B05D7/14 , B23K35/22 , C09D5/08 , C23F11/10
CPC分类号： C09D5/08 , B05D7/14 , B23K35/226 , C23F11/10 , B05D2701/40
摘要： Electroplated steel sheet suitable for soldering is provided by coating the plated steel sheet with a post-treatment solution in the range of 0.01 to 2 um in dry thickness. The post-treatment solution contains from 2 to 200 g/liter of at least one water-soluble or water-dispersed materials other than phosphoric esters, and/or from 5 to 200 g/liter of phosphoric esters, and also contains from 2 to 100 g/liter of at least one water-soluble or water-dispersable organic fluoro compound. The post-treatment solution may further contain from 0.01 to 3 g/liter of Cr.sup.6+ ion, and/or from 10 to 100 g/liter of organic amine soap. A suitable pH value of the post-treatment solution is between 3 and 10.
摘要翻译：适用于焊接的电镀钢板通过用0.01〜2μm的干燥厚度的后处理溶液涂覆镀覆钢板来提供。后处理溶液含有2至200g /升至少一种除磷酸酯以外的至少一种水溶性或水分散的材料，和/或5至200g / l的磷酸酯，并且还含有2至 100克/升至少一种水溶性或水分散性有机氟化合物。后处理溶液还可含有0.01至3克/升Cr 6+离子和/或10至100g /升有机胺皂。后处理溶液的合适pH值为3至10。

3. 发明授权

US08813329B2 Chamber replacing method 有权
标题翻译：室更换方法
公开(公告)号：US08813329B2
公开(公告)日：2014-08-26
申请号：US13152369
申请日：2011-06-03
申请人： Junichi Fujimoto , Hakaru Mizoguchi , Tatsuo Enami
发明人： Junichi Fujimoto , Hakaru Mizoguchi , Tatsuo Enami
IPC分类号： B29C73/00
CPC分类号： H01S3/2308 , H01S3/0014 , H01S3/03 , H01S3/10092 , H01S3/225 , Y10T29/49718 , Y10T29/49721 , Y10T29/4973 , Y10T29/49826
摘要： When a chamber of an oscillator and one or more amplifiers is to be replaced at the timing when a predetermined period elapses, one of the chambers of the oscillator and the amplifiers having a low allowable deterioration limit is detached and this chamber is attached in place of one of the chambers of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. Thus, the chamber which has been used in one of the oscillator and amplifiers having a low allowable deterioration limit and has not reached the limit of deterioration is reused in one of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. This enables efficient use of oscillator and amplifier chambers in a multistage amplification laser apparatus, minimizing the labor and parts consumed for replacement thereof.
摘要翻译：当在预定时间段的时间内要更换振荡器和一个或多个放大器的腔室时，分离振荡器的腔室和具有低容许劣化极限的放大器之一，并且该腔室被附接以代替振荡器的一个腔室以及具有低容许劣化极限的放大器之外的放大器。因此，在具有低容许劣化极限且尚未达到劣化极限的振荡器和放大器之一中使用的腔室在具有低容许劣化极限的振荡器和放大器之外的其中之一中被重新使用。这使得能够在多级放大激光装置中有效地使用振荡器和放大器腔室，从而最小化用于更换它们的人工和消耗的部件。

4. 发明申请

US20120119118A1 EXTREME ULTRAVIOLET LIGHT SOURCE SYSTEM 审中-公开
标题翻译：极致超紫外光源系统
公开(公告)号：US20120119118A1
公开(公告)日：2012-05-17
申请号：US13359315
申请日：2012-01-26
申请人： Yukio WATANABE , Osamu Wakabayashi , Junichi Fujimoto , Toshihiro Nishisaka , Hiroshi Someya , Hideo Hoshino
发明人： Yukio WATANABE , Osamu Wakabayashi , Junichi Fujimoto , Toshihiro Nishisaka , Hiroshi Someya , Hideo Hoshino
IPC分类号： G21K5/00
CPC分类号： G03F7/70975 , G03F7/70033
摘要： An extreme ultraviolet (EUV) light source system in which parts of an EUV light source apparatus can easily be replaced. The system includes: (i) an extreme ultraviolet light source apparatus having a chamber in which extreme ultraviolet light is generated, a target supply unit for supplying a target material into the chamber, a driver laser for irradiating the target material supplied by the target supply unit with a laser beam to generate plasma, and a collector mirror for collecting the extreme ultraviolet light radiated from the plasma to allow the extreme ultraviolet light to enter projection optics of exposure equipment; and (ii) a lifting apparatus provided to lift and move a replacement part which is a part of the extreme ultraviolet light source apparatus.
摘要翻译： EUV光源装置的一部分能够容易地更换的极紫外（EUV）光源系统。该系统包括：（i）具有产生极紫外光的室的极紫外光源装置，用于将目标材料供应到室中的目标供给单元，用于照射由目标供给源提供的目标材料的驱动激光具有激光束以产生等离子体的单元，以及用于收集从等离子体辐射的极紫外光的收集器镜，以允许极紫外光进入曝光设备的投影光学器件; 以及（ii）提升装置，其设置为提升和移动作为极紫外光源装置的一部分的替换部件。

5. 发明申请

US20080115342A1 Chamber replacing method 有权
标题翻译：室更换方法
公开(公告)号：US20080115342A1
公开(公告)日：2008-05-22
申请号：US11984292
申请日：2007-11-15
申请人： Junichi Fujimoto , Hakaru Mizoguchi , Tatsuo Enami
发明人： Junichi Fujimoto , Hakaru Mizoguchi , Tatsuo Enami
IPC分类号： B21D39/00
CPC分类号： H01S3/2308 , H01S3/0014 , H01S3/03 , H01S3/10092 , H01S3/225 , Y10T29/49718 , Y10T29/49721 , Y10T29/4973 , Y10T29/49826
摘要： When a chamber of an oscillator and one or more amplifiers is to be replaced at the timing when a predetermined period elapses, one of the chambers of the oscillator and the amplifiers having a low allowable deterioration limit is detached and this chamber is attached in place of one of the chambers of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. Thus, the chamber which has been used in one of the oscillator and amplifiers having a low allowable deterioration limit and has not reached the limit of deterioration is reused in one of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. This enables efficient use of oscillator and amplifier chambers in a multistage amplification laser apparatus, minimizing the labor and parts consumed for replacement thereof.
摘要翻译：当在预定时间段的时间内要更换振荡器和一个或多个放大器的腔室时，分离振荡器的腔室和具有低容许劣化极限的放大器之一，并且该腔室被附接以代替振荡器的一个腔室以及具有低容许劣化极限的放大器之外的放大器。因此，在具有低容许劣化极限且尚未达到劣化极限的振荡器和放大器之一中使用的腔室在具有低容许劣化极限的振荡器和放大器之外的其中之一中被重新使用。这使得能够在多级放大激光装置中有效地使用振荡器和放大器腔室，从而最小化用于更换它们的人工和消耗的部件。

6. 发明授权

US07006546B2 Gas laser electrode, laser chamber employing the electrode, and gas laser device 有权
标题翻译：气体激光电极，采用电极的激光室和气体激光装置
公开(公告)号：US07006546B2
公开(公告)日：2006-02-28
申请号：US09795401
申请日：2001-03-01
申请人： Tsukasa Hori , Junichi Fujimoto , Takayuki Yabu
发明人： Tsukasa Hori , Junichi Fujimoto , Takayuki Yabu
IPC分类号： H01S3/22
CPC分类号： H01S3/038 , H01S3/225
摘要： Provided is a gas laser electrode in which a stable laser output can be obtained by inhibiting the deterioration of the electrode (discharge characteristics). In an anode 3, a dielectric material 4 is applied on the surface of a discharging portion 3a in order to inhibit the deterioration of the electrode. Used as a dielectric material 4 may be, for example, fluorides such as calcium fluoride and strontium fluoride. Further, the dielectric material 4 is of a thickness (in a range of 0.005 mm˜1.5 mm, preferably 0.1 mm˜1 mm, for example) sufficient to prevent the erosion of halogen gas in the discharging portion 3a of the anode 3 and to secure a conductivity thereof, whereby it is enabled to form mono-fluoride evenly in extreme precision.
摘要翻译：提供一种气体激光电极，其中通过抑制电极的劣化（放电特性）可以获得稳定的激光输出。在阳极3中，为了抑制电极的劣化，在放电部分3a的表面上施加电介质材料4。用作电介质材料4可以是例如氟化物如氟化钙和氟化锶。此外，电介质材料4的厚度（例如在0.005mm〜1.5mm的范围内，优选为0.1mm〜1mm），足以防止阳极3的放电部分3a中的卤素气体的侵蚀，以及以确保其导电性，从而能够以极高的精度均匀地形成单氟化物。

7. 发明授权

US5291509A Gas laser apparatus 失效
标题翻译：气体激光设备
公开(公告)号：US5291509A
公开(公告)日：1994-03-01
申请号：US911137
申请日：1992-07-09
申请人： Hakaru Mizoguchi , Junichi Fujimoto , Yoshiho Amada
发明人： Hakaru Mizoguchi , Junichi Fujimoto , Yoshiho Amada
IPC分类号： H01S3/03 , F16C33/76 , F16J15/43 , H01S3/036
CPC分类号： H01S3/036 , F16C33/765 , F16J15/43
摘要： A gas laser apparatus in which a gas medium in a case and a lubricant for bearings supporting a blower for circulating the gas medium are isolated from each other, so that the lubricant can be prevented from mixing into the gas medium while no substantially large resistance is applied to the blower drive. To isolate the gas medium and the lubricant, magnetic fluid shaft seals (10, 11) are used for sealing between the lubricant for the bearings (6) for supporting rotation shafts (3a, 3b) of the blower (3) and the gas medium in the case (1).
摘要翻译：一种气体激光装置，其中壳体中的气体介质和支撑用于使气体介质循环的鼓风机的轴承的润滑剂彼此隔离，使得可以防止润滑剂混入气体介质中，而基本上没有大的阻力是应用于鼓风机驱动。为了隔离气体介质和润滑剂，磁流体轴密封件（10,11）用于密封用于支撑鼓风机（3）的旋转轴（3a，3b）的轴承（6）的润滑剂和气体介质在（1）的情况下。

8. 发明授权

US08748853B2 Chamber apparatus 有权
标题翻译：室内设备
公开(公告)号：US08748853B2
公开(公告)日：2014-06-10
申请号：US13494442
申请日：2012-06-12
申请人： Shinji Nagai , Osamu Wakabayashi , Yutaka Shiraishi , Junichi Fujimoto
发明人： Shinji Nagai , Osamu Wakabayashi , Yutaka Shiraishi , Junichi Fujimoto
IPC分类号： H05G2/00
CPC分类号： H05G2/008 , G03F7/70033 , G03F7/70916 , H05G2/003
摘要： A chamber apparatus for operating with a laser apparatus includes a chamber, a target supply unit, a collection unit and a collection container. The chamber includes an inlet through which a laser beam from the laser apparatus enters the chamber. The target supply unit is configured to supply a target material to a predetermined region inside the chamber. The collection unit includes a debris entering surface so that debris generated when the target material is irradiated with the laser beam enters the debris entering surface. The debris entering surface is inclined with respect to a direction in which the debris enters the debris entering surface. The collection container collects the debris flowing out of the collection unit.
摘要翻译：用于利用激光装置操作的腔室装置包括腔室，目标供应单元，收集单元和收集容器。该腔室包括入口，来自激光装置的激光束通过入口进入腔室。目标供给单元被配置为将目标材料供应到室内的预定区域。收集单元包括碎屑进入表面，使得当靶材料被激光束照射时产生的碎屑进入碎片进入表面。碎屑进入表面相对于碎片进入碎片进入表面的方向倾斜。收集容器收集从收集单元流出的碎屑。

9. 发明申请

US20110309270A1 LASER DEVICE, EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE, AND METHOD FOR MAINTAINING THE DEVICES 审中-公开
标题翻译：激光装置，极光紫外线发光装置和用于维持装置的方法
公开(公告)号：US20110309270A1
公开(公告)日：2011-12-22
申请号：US13120998
申请日：2011-02-16
申请人： Yohichi Yamanouchi , Takashi Suganuma , Junichi Fujimoto , Osamu Wakabayashi , Hiroaki Nakarai , Hidenobu Kameda , Hitoshi Oga
发明人： Yohichi Yamanouchi , Takashi Suganuma , Junichi Fujimoto , Osamu Wakabayashi , Hiroaki Nakarai , Hidenobu Kameda , Hitoshi Oga
IPC分类号： G01J3/10 , H01S3/091
CPC分类号： G03F7/70975 , G03F7/70033 , H01S3/0071 , H01S3/03
摘要： Provided is a laser device which is installed within a predetermined space and on a predetermined floor area, the laser device may includes: a master oscillator; at least one amplifier unit that amplifies a laser beam outputted from the master oscillator; at least one power source unit that supplies excitation energy to the at least one amplifier unit; and a movement mechanism which enables at least one among the at least one amplifier unit and the at least one power source unit to be moved in a direction parallel with a floor surface.
摘要翻译：提供一种激光装置，其安装在预定空间内并在预定的地板区域上，激光装置可包括：主振荡器; 至少一个放大单元，放大从主振荡器输出的激光束; 至少一个电源单元，其向所述至少一个放大器单元提供激励能量; 以及使所述至少一个放大器单元和所述至少一个电源单元中的至少一个能够在与地板表面平行的方向上移动的移动机构。

10. 发明授权

US06810061B2 Discharge electrode and discharge electrode manufacturing method 有权
标题翻译：放电电极和放电电极的制造方法
公开(公告)号：US06810061B2
公开(公告)日：2004-10-26
申请号：US10225286
申请日：2002-08-22
申请人： Tsukasa Hori , Akira Sumitani , Takayuki Yabu , Teiichirou Chiba , Hakaru Mizoguchi , Osamu Wakabayashi , Junichi Fujimoto
发明人： Tsukasa Hori , Akira Sumitani , Takayuki Yabu , Teiichirou Chiba , Hakaru Mizoguchi , Osamu Wakabayashi , Junichi Fujimoto
IPC分类号： H01S3097
CPC分类号： H01S3/038 , H01S3/0388 , H01S3/225
摘要： A film is formed on the discharge parts of the main discharge electrodes. In order to prevent erosion of the discharge parts by the halogen gas contained in the laser gas, a substance that tends not to react with the halogen gas, i.e., a halogen-resistant substance, is used for this film. Furthermore, in order to prevent deformation of the discharge parts by the bombardment and heat of the main discharge, a substance that has a higher hardness than the metal of the main discharge electrodes or a substance that has a higher melting point than the metal of the main discharge electrodes is used for this film. As a result, deterioration of the electrodes can be inhibited, so that a stable laser output can be obtained, and the replacement interval of the electrodes can be extended.
摘要翻译：在主放电电极的放电部分上形成膜。为了防止由激光气体中所含的卤素气体引起的排出部件的侵蚀，使用与卤素气体即不耐卤素物质倾向不反应的物质。此外，为了防止放电部件由于主放电的轰击和热而发生变形，所以具有比主放电电极的金属更高的硬度的物质或具有比金属的熔点高的物质主放电电极用于该膜。结果，可以抑制电极的劣化，从而可以获得稳定的激光输出，并且可以延长电极的替换间隔。

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