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1. 发明授权

US06482568B1 Radiation-sensitive resin composition 失效
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06482568B1
公开(公告)日：2002-11-19
申请号：US09662160
申请日：2000-09-14
申请人： Katsuji Douki , Kiyoshi Murata , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
发明人： Katsuji Douki , Kiyoshi Murata , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A radiation-sensitive resin composition comprising (A) a resin containing an acid-dissociable group which is insoluble or scarcely soluble in alkali and becomes alkali soluble when the acid-dissociable group dissociates, comprising the following recurring unit (I), recurring unit (II), and at least one of the recurring units (III-1) and (III-2), and (B) a photoacid generator. The radiation-sensitive resin composition is suitable for use as a chemically-amplified resist showing sensitivity to active radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser, exhibiting superior dry etching resistance without being affected by types of etching gas, having high radiation transmittance, exhibiting excellent basic characteristics as a resist such as sensitivity, resolution, and pattern shape, possessing excellent storage stability as a composition, and exhibiting sufficient adhesion to substrates.
摘要翻译：一种辐射敏感性树脂组合物，其包含（A）含有酸解离基团的树脂，所述酸分解基团在酸解离基解离时不溶或几乎不溶于碱，并且可溶解，包含以下重复单元（I），重复单元 II）和至少一个重复单元（III-1）和（III-2）和（B）光酸产生剂。辐射敏感性树脂组合物适合用作化学增幅抗蚀剂，显示出对由KrF准分子激光器或ArF准分子激光器表示的深紫外线的活性辐射，表现出优异的耐干蚀刻性，不受蚀刻气体类型的影响，具有高的透射率，表现出作为抗蚀剂的极好的基本特性，例如灵敏度，分辨率，和图案形状，作为组合物具有优异的储存稳定性，并且对基材表现出足够的粘附性。

2. 发明授权

US06753124B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06753124B2
公开(公告)日：2004-06-22
申请号：US09874977
申请日：2001-06-07
申请人： Yukio Nishimura , Katsuji Douki , Toru Kajita , Tsutomu Shimokawa
发明人： Yukio Nishimura , Katsuji Douki , Toru Kajita , Tsutomu Shimokawa
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A radiation-sensitive resin composition used as a chemically amplified positive tone resist responsive to short wavelength active radiation such as KrF excimer laser and ArF excimer laser is disclosed. The resin composition comprises: (A) an acid-dissociable group-containing resin which is insoluble or scarcely soluble in alkali and becomes alkali soluble when the acid-dissociable group dissociates, the resin comprising a lactone cyclic structure of the following formula (1): wherein a is an integer from 1-3, b is an integer from 0-9, and R1 represents a monovalent organic group, and (B) a photoacid generator. The composition has high transmittance of radiation, exhibits high sensitivity, resolution, and pattern shape, and can produce semiconductors at a high yield without producing resolution defects during microfabrication.
摘要翻译：公开了一种用作响应于短波长有效辐射的化学放大正色调抗辐射的辐射敏感树脂组合物，例如KrF准分子激光器和ArF准分子激光器。该树脂组合物包含：（A）一种酸解离基团的树脂，其在酸解离基团解离时不溶或几乎不溶于碱并可溶于碱，该树脂包含下式（1）的内酯环状结构，：其中a是1-3的整数，b是0-9的整数，R 1表示一价有机基团，和（B）光酸产生剂。该组合物具有高透射率的辐射，显示出高灵敏度，分辨率和图案形状，并且可以以高产率制造半导体而不会在微细加工过程中产生分辨率缺陷。

3. 发明授权

US06623907B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06623907B2
公开(公告)日：2003-09-23
申请号：US09774714
申请日：2001-02-01
申请人： Jun Numata , Aki Suzuki , Hiromichi Hara , Norihiro Natsume , Kiyoshi Murata , Masafumi Yamamoto , Akimasa Soyano , Toru Kajita , Tsutomu Shimokawa
发明人： Jun Numata , Aki Suzuki , Hiromichi Hara , Norihiro Natsume , Kiyoshi Murata , Masafumi Yamamoto , Akimasa Soyano , Toru Kajita , Tsutomu Shimokawa
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/038 , G03F7/039 , Y10S430/111 , Y10S430/128
摘要： A positive-tone radiation-sensitive resin composition comprising: (A) a low molecular weight compound having at least one amino group in which the nitrogen atom has at least one hydrogen atom bonded thereto and at least one of the hydrogen atoms is replaced by a t-butoxycarbonyl group, (B) a photoacid generator, and (C-1) a resin insoluble or scarcely soluble in alkali which is protected by an acid-dissociable group and becomes soluble in alkali when the acid-dissociable group dissociates or (C-2) an alkali-soluble resin and an alkali solubility control agent is disclosed. Also disclosed is a negative-tone radiation-sensitive resin composition comprising the low molecular weight compound (A), the photoacid generator (B), an alkali-soluble resin (D), and a compound capable of crosslinking with the alkali-soluble resin in the presence of an acid(E). The composition are useful as a chemically amplified resist which effectively responds to various radiations, exhibits superior sensitivity and resolution, forms fine patterns at a high precision and in a stable manner even if the patterns are isolated line patterns.
摘要翻译：一种正色辐射敏感性树脂组合物，其包含：（A）具有至少一个氨基的低分子量化合物，其中所述氮原子具有与其键合的至少一个氢原子，并且至少一个氢原子被叔丁氧基羰基，（B）光酸产生剂和（C-1）不溶于或几乎不溶于碱的树脂，其被酸解离基团保护并且当酸解离基解离时变得可溶于碱，或（C -2）碱溶性树脂和碱溶性控制剂。还公开了包含低分子量化合物（A），光酸产生剂（B），碱溶性树脂（D）和能够与碱溶性树脂交联的化合物的负色辐射敏感性树脂组合物在酸（E）的存在下。该组合物可用作化学放大抗蚀剂，其有效地响应各种辐射，表现出优异的灵敏度和分辨率，即使图案是隔离线图案，也以高精度和稳定的方式形成精细图案。

4. 发明授权

US07202016B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US07202016B2
公开(公告)日：2007-04-10
申请号：US11116269
申请日：2005-04-28
申请人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
发明人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
IPC分类号： G03F7/004
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/122
摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3 and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.
摘要翻译：一种包含特定共聚物和光致酸发生剂的化学放大的辐射敏感性树脂组合物，其中共聚物含有以下重复单元（1）和/或重复单元（2）和重复单元（3-1），

5. 发明授权

US06933094B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06933094B2
公开(公告)日：2005-08-23
申请号：US09953941
申请日：2001-09-18
申请人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
发明人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/122
摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.
摘要翻译：包含特定共聚物和光酸产生剂的化学放大的辐射敏感性树脂组合物，其中所述共聚物包含以下重复单元（1）和/或重复单元（2）和重复单元（3-1），其中R 1是氢或甲基，R 2是C 4-10叔烷基，R 3和R 3 H 4是氢，C 1-12烷基，C 6-15芳族，C 1-12烷氧基，，或R 3和R 4可以与R 3和R 4的氮原子组合形成，基团键合，C 3-15-15环状结构，条件是R 3和R 4不是氢原子同时。该组合物有效响应各种辐射，显示出优异的分辨率和图案配置以及最小的等密度偏差，并能以高精度和稳定的方式形成精细图案。

6. 发明申请

US20050214680A1 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US20050214680A1
公开(公告)日：2005-09-29
申请号：US11116269
申请日：2005-04-28
申请人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
发明人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , G03C1/76
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/122
摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3 and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.
摘要翻译：包含特定共聚物和光酸产生剂的化学放大的辐射敏感性树脂组合物，其中所述共聚物包含以下重复单元（1）和/或重复单元（2）和重复单元（3-1），其中R 1是氢或甲基，R 2是C 4-10叔烷基，R 3和R 3 H 4是氢，C 1-12烷基，C 6-15芳族，C 1-12烷氧基，，或R 3和R 4可以与R 3和R 4的氮原子组合形成，基团键合，C 3-15-15环状结构，条件是R 3和R 4不是氢原子同时。该组合物有效响应各种辐射，显示出优异的分辨率和图案配置以及最小的等密度偏差，并能以高精度和稳定的方式形成精细图案。

7. 发明授权

US06964840B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06964840B2
公开(公告)日：2005-11-15
申请号：US10867892
申请日：2004-06-16
申请人： Yukio Nishimura , Noboru Yamahara , Masafumi Yamamoto , Toru Kajita , Tsutomu Shimokawa , Hiroshi Ito
发明人： Yukio Nishimura , Noboru Yamahara , Masafumi Yamamoto , Toru Kajita , Tsutomu Shimokawa , Hiroshi Ito
IPC分类号： C08K5/00 , C08L33/06 , C08L35/00 , C08L45/00 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0046 , G03F7/0233 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed. The resin has a structure of the formula (1), wherein R1 represents a hydrogen atom, a monovalent acid-labile group, an alkyl group having 1-6 carbon atoms which does not have an acid-labile group, or an alkylcarbonyl group having 2-7 carbon atoms which does not have an acid-labile group, X1 represents a linear or branched fluorinated alkyl group having 1-4 carbon atoms, and R2 represents a hydrogen atom, a linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluorinated alkyl group having 1-10 carbon atoms. The resin composition exhibits high transmittance of radiation, high sensitivity, resolution, and pattern shape, and is useful as a chemically amplified resist in producing semiconductors at a high yield.
摘要翻译：公开了一种包含含酸不稳定基团的树脂和光致酸发生剂的辐射敏感性树脂组合物。树脂具有式（1）的结构，其中R 1表示氢原子，一价酸不稳定基团，具有1-6个碳原子的烷基，其不具有酸 - 不稳定基团或不具有酸不稳定基团的具有2-7个碳原子的烷基羰基，X 1表示具有1-4个碳原子的直链或支链氟代烷基， SUP> 2表示氢原子，具有1-10个碳原子的直链或支链烷基或具有1-10个碳原子的直链或支链氟代烷基。树脂组合物表现出高的透射率，高灵敏度，分辨率和图案形状，并且可以以高产率制造半导体的化学放大抗蚀剂。

8. 发明授权

US06800414B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06800414B2
公开(公告)日：2004-10-05
申请号：US09879894
申请日：2001-06-14
申请人： Yukio Nishimura , Noboru Yamahara , Masafumi Yamamoto , Toru Kajita , Tsutomu Shimokawa , Hiroshi Ito
发明人： Yukio Nishimura , Noboru Yamahara , Masafumi Yamamoto , Toru Kajita , Tsutomu Shimokawa , Hiroshi Ito
IPC分类号： G03F7004
CPC分类号： G03F7/0046 , G03F7/0233 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed. The resin has a structure of the formula (1), wherein R1 represents a hydrogen atom, a monovalent acid-labile group, an alkyl group having 1-6 carbon atoms which does not have an acid-labile group, or an alkylcarbonyl group having 2-7 carbon atoms which does not have an acid-labile group, X1 represents a linear or branched fluorinated alkyl group having 1-4 carbon atoms, and R2 represents a hydrogen atom, a linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluorinated alkyl group having 1-10 carbon atoms. The resin composition exhibits high transmittance of radiation, high sensitivity, resolution, and pattern shape, and is useful as a chemically amplified resist in producing semiconductors at a high yield.
摘要翻译：公开了一种包含含酸不稳定基团的树脂和光致酸发生剂的辐射敏感性树脂组合物。该树脂具有式（1）的结构，其中R 1表示氢原子，一价酸不稳定基团，不具有酸不稳定基团的具有1-6个碳原子的烷基，或不具有酸不稳定基团的具有2-7个碳原子的烷基羰基，X 1表示具有1-4个碳原子的直链或支链氟代烷基，R 2表示氢原子，直链或具有1-10个碳原子的支链烷基或具有1-10个碳原子的直链或支链氟代烷基。树脂组合物表现出高的透射率，高灵敏度，分辨率和图案形状，并且可以以高产率制造半导体的化学放大抗蚀剂。

9. 发明申请

US20110117489A1 COMPOUND AND RADIATION-SENSITIVE COMPOSITION 有权
标题翻译：化合物和辐射敏感组合物
公开(公告)号：US20110117489A1
公开(公告)日：2011-05-19
申请号：US12673167
申请日：2008-07-30
申请人： Daisuke Shimizu , Ken Maruyama , Toshiyuki Kai , Tsutomu Shimokawa
发明人： Daisuke Shimizu , Ken Maruyama , Toshiyuki Kai , Tsutomu Shimokawa
IPC分类号： G03F7/004 , C07C69/734 , C07C69/96
CPC分类号： C07C69/736 , C07C43/23 , C07C2603/92 , G03F7/0392
摘要： A compound shown by the following formula (1).
摘要翻译：由下式（1）表示的化合物。

10. 发明授权

US07288359B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US07288359B2
公开(公告)日：2007-10-30
申请号：US10309017
申请日：2002-12-04
申请人： Haruo Iwasawa , Akihiro Hayashi , Tsutomu Shimokawa
发明人： Haruo Iwasawa , Akihiro Hayashi , Tsutomu Shimokawa
IPC分类号： G03C1/73 , G03F7/039
CPC分类号： G03F7/0045 , C07C309/17 , C07C309/19 , C07C309/23 , C07C381/12 , C07C2602/42 , C07C2603/86 , C07D333/46 , C07D333/78 , C07D335/02 , C07D347/00 , G03F7/0392 , G03F7/0757 , Y10S430/106 , Y10S430/122 , Y10S430/126
摘要： A radiation-sensitive resin composition comprising (A) an acid-dissociable group-containing polysiloxane and (B) a photoacid generator containing trifluoromethane sulfonic acid or a compound which generates an acid of the following formula (I), wherein Rf individually represents a fluorine atom or a trifluoromethyl group, and Ra represents a hydrogen atom, a fluorine atom, a linear or branched alkyl group having 1-20 carbon atoms, or a linear or branched fluoroalkyl group having 1-20 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 3-20 carbon atoms, or a substituted or unsubstituted monovalent cyclic fluoro-hydrocarbon group having 3-20 carbon atoms. The radiation-sensitive resin composition of the present invention exhibits superior resolution, while maintaining high transparency to radiations and high dry etching resistance. The resin composition thus can greatly contribute to the lithography process that will become more and more minute in the future.
摘要翻译：一种辐射敏感性树脂组合物，其包含（A）含酸解离基的聚硅氧烷和（B）含有三氟甲磺酸的光酸产生剂或产生下式（I）的酸的化合物，其中Rf分别表示氟原子或三氟甲基，Ra表示氢原子，氟原子，具有1-20个碳原子的直链或支链烷基或具有1-20个碳原子的直链或支链氟代烷基，取代或未取代的一价环状具有3-20个碳原子的烃基，或具有3-20个碳原子的取代或未取代的一价环状氟代烃基。本发明的辐射敏感性树脂组合物表现出优异的分辨率，同时保持高的透光透明度和高耐干蚀刻性。因此，树脂组合物可以极大地有助于将来将变得越来越多的光刻工艺。

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