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1. 发明授权

US07041226B2 Methods for improving flow through fluidic channels 有权
标题翻译：改善通过流体通道流动的方法
公开(公告)号：US07041226B2
公开(公告)日：2006-05-09
申请号：US10701225
申请日：2003-11-04
申请人： Karthik Vaideeswaran , Andrew L. McNees , John W. Krawczyk , James M. Mrvos , Cory N. Hammond , Mark L. Doerre , Jason T. Vanderpool , Girish S. Patil , Christopher J. Money , Gary R. Williams , Richard L. Warner
发明人： Karthik Vaideeswaran , Andrew L. McNees , John W. Krawczyk , James M. Mrvos , Cory N. Hammond , Mark L. Doerre , Jason T. Vanderpool , Girish S. Patil , Christopher J. Money , Gary R. Williams , Richard L. Warner
IPC分类号： G01D15/00 , H01L21/00
CPC分类号： B41J2/1632 , B41J2/14145 , B41J2/1603 , B41J2/1623 , B41J2/1628 , B41J2/1631 , B41J2/1645 , B41J2/1646
摘要： A method for improving fluidic flow for a microfluidic device having a through hole or slot therein. The method includes the steps of forming one or more openings through at least part of a thickness of a substrate from a first surface to an opposite second surface using a reactive ion etching process whereby an etch stop layer is applied to side wall surfaces in the one or more openings during alternating etching and passivating steps as the openings are etched through at least a portion of the substrate. Substantially all of the etch stop layer coating is removed from the side wall surfaces by treating the side wall surfaces using a method selected from chemical treatment and mechanical treatment, whereby a surface energy of the treated side wall surfaces is increased relative to a surface energy of the side wall surfaces containing the etch stop layer coating.
摘要翻译：一种用于改善其中具有通孔或槽的微流体装置的流体流动的方法。该方法包括以下步骤：使用反应离子蚀刻工艺从基板的第一表面至相对的第二表面形成穿过衬底的至少一部分厚度的一个或多个开口，由此将蚀刻停止层施加到一个侧壁表面或者在交替蚀刻和钝化步骤期间，当开口被蚀刻通过衬底的至少一部分时，可以有更多的开口。通过使用选自化学处理和机械处理的方法处理侧壁表面，从侧壁表面去除基本上所有的蚀刻停止层涂层，由此所处理的侧壁表面的表面能相对于所述侧壁表面包含所述蚀刻停止层涂层。

2. 发明授权

US07600858B2 Micro-fluid ejection head structure 有权
标题翻译：微流体喷头结构
公开(公告)号：US07600858B2
公开(公告)日：2009-10-13
申请号：US11754715
申请日：2007-05-29
申请人： Johnathan L. Barnes , Craig M. Bertelsen , Brian C. Hart , Gary R. Williams , Sean T. Weaver , Girish S. Patil
发明人： Johnathan L. Barnes , Craig M. Bertelsen , Brian C. Hart , Gary R. Williams , Sean T. Weaver , Girish S. Patil
IPC分类号： B41J2/05
CPC分类号： B41J2/1628 , B41J2/14024 , B41J2/1404 , B41J2/14072 , B41J2/1603 , B41J2/1623 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1635 , B41J2/1639 , B41J2/1645 , Y10T29/49135 , Y10T29/49139 , Y10T29/4914 , Y10T29/49401 , Y10T29/4979 , Y10T29/49798
摘要： A method of making a micro-fluid ejection head structure for a micro-fluid ejection device. The method includes applying a removable mandrel material to a semiconductor substrate wafer containing fluid ejection actuators on a device surface thereof. The mandrel material is shaped to provide fluid chamber and fluid channel locations on the substrate wafer. A micro machinable material is applied to the shaped mandrel and the device surface of the wafer to provide a nozzle plate and flow feature layer on the shaped mandrel and wafer. A plurality of nozzle holes are formed in the nozzle plate and flow feature layer. The shaped mandrel material is then removed from the device surface of the substrate wafer to provide fluid chambers and fluid channels in the nozzle plate and flow feature layer.
摘要翻译：一种制造用于微流体喷射装置的微流体喷射头结构的方法。该方法包括将可移除的心轴材料施加到在其装置表面上含有流体喷射致动器的半导体衬底晶片。心轴材料成型为在衬底晶片上提供流体室和流体通道位置。将微加工材料施加到成形心轴和晶片的装置表面，以在成形心轴和晶片上提供喷嘴板和流动特征层。在喷嘴板和流动特征层中形成多个喷嘴孔。然后将成形的心轴材料从衬底晶片的器件表面移除，以在喷嘴板和流动特征层中提供流体室和流体通道。

3. 发明授权

US07254890B2 Method of making a microfluid ejection head structure 有权
标题翻译：制造微流体喷射头结构的方法
公开(公告)号：US07254890B2
公开(公告)日：2007-08-14
申请号：US11026504
申请日：2004-12-30
申请人： Johnathan L. Barnes , Craig M. Bertelsen , Brian C. Hart , Gary R. Williams , Sean T. Weaver , Girish S. Patil
发明人： Johnathan L. Barnes , Craig M. Bertelsen , Brian C. Hart , Gary R. Williams , Sean T. Weaver , Girish S. Patil
IPC分类号： B21D53/76 , B41J2/04
CPC分类号： B41J2/1628 , B41J2/14024 , B41J2/1404 , B41J2/14072 , B41J2/1603 , B41J2/1623 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1635 , B41J2/1639 , B41J2/1645 , Y10T29/49135 , Y10T29/49139 , Y10T29/4914 , Y10T29/49401 , Y10T29/4979 , Y10T29/49798
摘要： A method of making a micro-fluid ejection head structure for a micro-fluid ejection device. The method includes applying a removable mandrel material to a semiconductor substrate wafer containing fluid ejection actuators on a device surface thereof. The mandrel material is shaped to provide fluid chamber and fluid channel locations on the substrate wafer. A micro machinable material is applied to the shaped mandrel and the device surface of the wafer to provide a nozzle plate and flow feature layer on the shaped mandrel and wafer. A plurality of nozzle holes are formed in the nozzle plate and flow feature layer. The shaped mandrel material is then removed from the device surface of the substrate wafer to provide fluid chambers and fluid channels in the nozzle plate and flow feature layer.
摘要翻译：一种制造用于微流体喷射装置的微流体喷射头结构的方法。该方法包括将可移除的心轴材料施加到在其装置表面上含有流体喷射致动器的半导体衬底晶片。心轴材料成型为在衬底晶片上提供流体室和流体通道位置。将微加工材料施加到成形心轴和晶片的装置表面，以在成形心轴和晶片上提供喷嘴板和流动特征层。在喷嘴板和流动特征层中形成多个喷嘴孔。然后将成形的心轴材料从衬底晶片的器件表面移除，以在喷嘴板和流动特征层中提供流体室和流体通道。

4. 发明授权

US07603804B2 Ballistic reticle for projectile weapon aiming systems and method of aiming 有权
标题翻译：射弹武器瞄准系统的弹道掩模和瞄准方法
公开(公告)号：US07603804B2
公开(公告)日：2009-10-20
申请号：US10933856
申请日：2004-09-03
申请人： Serge Zaderey , Steven R. Timm , Gary R. Williams , Victoria J. Peters , Laura Peter , Tim Lesser , Tim L. O'Connor
发明人： Serge Zaderey , Steven R. Timm , Gary R. Williams , Victoria J. Peters , Laura Peter , Tim Lesser , Tim L. O'Connor
IPC分类号： F41G1/38
CPC分类号： F41G1/38
摘要： A reticle of a projectile weapon aiming system such as a riflescope includes a primary aiming mark adapted to be sighted-in at a first selected range and further includes a plurality of secondary aiming marks spaced apart below the primary aiming mark. The secondary aiming marks are positioned to compensate for ballistic drop at preselected incremental ranges beyond the first selected range, for a selected group of ammunition having similar ballistic characteristics. Angles subtended by adjacent aiming marks of the reticle can be adjusted by changing the optical power of the riflescope, to thereby compensate for ballistic characteristics of different ammunition. In some embodiments, the reticle includes a set of windage aiming marks spaced apart along at least one secondary horizontal axis intersecting a selected one of the secondary aiming marks, to facilitate compensation for the effect of crosswinds on the trajectory of the projectile.
摘要翻译：射击武器瞄准系统如路镜的掩模版包括适于在第一选定范围内被瞄准的主瞄准标记，并且还包括在主瞄准标记下方间隔开的多个次瞄准标记。第二瞄准标记被定位成补偿具有类似弹道特性的选定组的弹药的超出第一选定范围的预选增量范围的弹道降落。可以通过改变步枪镜的光功率来调整由掩模版的相邻瞄准标记所对向的角度，从而补偿不同弹药的弹道特性。在一些实施例中，掩模版包括沿着与所选择的第二瞄准标记相交的至少一个副水平轴线间隔开的一组风向瞄准标记，以便于补偿侧风对射弹轨迹的影响。

5. 外观设计

USD506520S1 Reticle for a gunsight or other projectile weapon aiming device 失效
标题翻译：瞄准器或其他射弹武器瞄准装置的光罩
公开(公告)号：USD506520S1
公开(公告)日：2005-06-21
申请号：US29193335
申请日：2003-11-04
申请人： Steven R. Timm , Serge Zaderey , Gary R. Williams , Victoria J. Peters , Laura Peter , Tim Lesser , Tim L. O'Connor
设计人： Steven R. Timm , Serge Zaderey , Gary R. Williams , Victoria J. Peters , Laura Peter , Tim Lesser , Tim L. O'Connor

6. 发明授权

US5493320A Ink jet printing nozzle array bonded to a polymer ink barrier layer 失效
标题翻译：喷墨打印喷嘴阵列结合到聚合物油墨阻挡层上
公开(公告)号：US5493320A
公开(公告)日：1996-02-20
申请号：US312349
申请日：1994-09-26
申请人： David L. Sandbach, Jr. , Lawrence R. Steward , Charles S. Whitman , Gary R. Williams , John D. Zbrozek
发明人： David L. Sandbach, Jr. , Lawrence R. Steward , Charles S. Whitman , Gary R. Williams , John D. Zbrozek
IPC分类号： B41J2/16 , G01D15/18
CPC分类号： B41J2/1603 , B41J2/1623 , B41J2/1631 , B41J2/1643 , Y10T428/12569
摘要： In a print head for ink jet printing a nozzle plate with a nozzle array is gold plated. The gold plated nozzle array is bonded to the polymer ink barrier layer on an electronic chip by a thin layer of tantalum, zirconium, titanium or silicon dioxide. The thin layer greatly increases the ability of the surface to bond chemically to the polymer.
摘要翻译：在用于喷墨打印的打印头中，具有喷嘴阵列的喷嘴板是镀金的。镀金喷嘴阵列通过钽，锆，钛或二氧化硅的薄层与电子芯片上的聚合物油墨阻挡层结合。薄层大大提高了表面与聚合物化学键合的能力。

7. 发明授权

US4928711A Head immobilizer and method for immobilizing 失效
标题翻译：头部固定器和固定方法
公开(公告)号：US4928711A
公开(公告)日：1990-05-29
申请号：US443563
申请日：1989-11-29
申请人： Gary R. Williams
发明人： Gary R. Williams
IPC分类号： A61F5/058
CPC分类号： A61F5/05883
摘要： There is provided a head immobilizer of the type which can be attached to a rigid backboard support, with the head immobilizer including a base and a pair of laterally extending side support panels. Each of these side support panels further comprises an inner panel and an outer panel, with the inner panel being conformable appropriately to a shape necessary to snugly support a head to be immobilized. The inner panel also includes an opening which effectively divides a portion of that inner panel into a pair of spaced inner support members extending laterally from the base. The outer panel has inner and outer edges, and is hingedly attached adjacent its inner edge to the inner panel such that it is foldable relative the inner panel to provide a substantially rigid brace for securing the inner panel in a desired immobilizing position. The outer panel also includes a cutout portion for providing substantial access to the opening of the inner panel when the inner panel is braced in a desired immobilizing position. The outer panel can be secured in a bracing position relative the inner panel, and the outer panel includes an attachment panel hingedly attached adjacent its outer edge for securing the outer panel in bracing position adjacent the base.
摘要翻译：提供了可以附接到刚性背板支撑的类型的头部防盗器，头部防盗器包括底座和一对横向延伸的侧面支撑面板。这些侧支撑板中的每一个进一步包括内板和外板，其中内板适于适合于紧密地支撑固定头的形状。内部面板还包括有效地将该内部面板的一部分分成从基部横向延伸的一对间隔的内部支撑构件的开口。外板具有内边缘和外边缘，并且在其内边缘处铰接地附接到内板，使得其相对于内板可折叠，以提供用于将内板固定在期望的固定位置的基本上刚性的支架。外板还包括切口部分，当内板被支撑在期望的固定位置时，该切口部分用于提供对内板的开口的实质接近。外板可以相对于内板固定在支撑位置，并且外板包括邻近其外边缘铰接地附接的附接面板，用于将外板固定在与基座相邻的支撑位置。

8. 外观设计

USD690018S1 Vacuum splint 有权
标题翻译：真空夹板
公开(公告)号：USD690018S1
公开(公告)日：2013-09-17
申请号：US29416463
申请日：2012-03-22
申请人： Gary R. Williams
设计人： Gary R. Williams

9. 发明申请

US20090199702A1 BALLISTIC RANGE COMPENSATION FOR PROJECTILE WEAPON AIMING BASED ON AMMUNITION CLASSIFICATION 有权
标题翻译：基于弹药分类的计划武器瞄准的弹道范围补偿
公开(公告)号：US20090199702A1
公开(公告)日：2009-08-13
申请号：US12163333
申请日：2008-06-27
申请人： Serge Zaderey , Steven R. Timm , Gary R. Williams , Victoria J. Peters , Laura Peter , Tim Lesser , Tim L. O'Connor
发明人： Serge Zaderey , Steven R. Timm , Gary R. Williams , Victoria J. Peters , Laura Peter , Tim Lesser , Tim L. O'Connor
IPC分类号： F41G1/00 , F41G1/38
CPC分类号： F41G1/38
摘要： A reticle of a projectile weapon aiming system such as a riflescope includes a primary aiming mark adapted to be sighted-in at a first selected range and further includes a plurality of secondary aiming marks spaced apart below the primary aiming mark. The secondary aiming marks are positioned to compensate for ballistic drop at preselected incremental ranges beyond the first selected range, for a selected group of ammunition having similar ballistic characteristics. Angles subtended by adjacent aiming marks of the reticle can be adjusted by changing the optical power of the riflescope, to thereby compensate for ballistic characteristics of different ammunition. In some embodiments, the reticle includes a set of windage aiming marks spaced apart along at least one secondary horizontal axis intersecting a selected one of the secondary aiming marks, to facilitate compensation for the effect of crosswinds on the trajectory of the projectile.
摘要翻译：射击武器瞄准系统如路镜的掩模版包括适于在第一选定范围内被瞄准的主瞄准标记，并且还包括在主瞄准标记下方间隔开的多个次瞄准标记。第二瞄准标记被定位成补偿具有类似弹道特性的选定组的弹药的超出第一选定范围的预选增量范围的弹道降落。可以通过改变步枪镜的光功率来调整由掩模版的相邻瞄准标记所对向的角度，从而补偿不同弹药的弹道特性。在一些实施例中，掩模版包括沿着与所选择的第二瞄准标记相交的至少一个副水平轴线间隔开的一组风向瞄准标记，以便于补偿侧风对射弹轨迹的影响。

10. 发明申请

US20090199451A1 BALLISTIC RETICLE AND RIFLESCOPE FOR PROJECTILE WEAPON AIMING SYSTEM 审中-公开
标题翻译：用于计划武器瞄准系统的弹道导弹和弹药
公开(公告)号：US20090199451A1
公开(公告)日：2009-08-13
申请号：US12163301
申请日：2008-06-27
申请人： Serge Zaderey , Steven R. Timm , Gary R. Williams , Victoria J. Peters , Laura Peter , Tim Lesser , Tim L. O'Connor
发明人： Serge Zaderey , Steven R. Timm , Gary R. Williams , Victoria J. Peters , Laura Peter , Tim Lesser , Tim L. O'Connor
IPC分类号： F41G1/387 , G02B23/00
CPC分类号： F41G1/38
摘要： A reticle of a projectile weapon aiming system such as a riflescope includes a primary aiming mark adapted to be sighted-in at a first selected range and further includes a plurality of secondary aiming marks spaced apart below the primary aiming mark. The secondary aiming marks are positioned to compensate for ballistic drop at preselected incremental ranges beyond the first selected range, for a selected group of ammunition having similar ballistic characteristics. Angles subtended by adjacent aiming marks of the reticle can be adjusted by changing the optical power of the riflescope, to thereby compensate for ballistic characteristics of different ammunition. In some embodiments, the reticle includes a set of windage aiming marks spaced apart along at least one secondary horizontal axis intersecting a selected one of the secondary aiming marks, to facilitate compensation for the effect of crosswinds on the trajectory of the projectile.
摘要翻译：射击武器瞄准系统如路镜的掩模版包括适于在第一选定范围内被瞄准的主瞄准标记，并且还包括在主瞄准标记下方间隔开的多个次瞄准标记。第二瞄准标记被定位成补偿具有类似弹道特性的选定组的弹药的超出第一选定范围的预选增量范围的弹道降落。可以通过改变步枪镜的光功率来调整由掩模版的相邻瞄准标记所对向的角度，从而补偿不同弹药的弹道特性。在一些实施例中，掩模版包括沿着与所选择的第二瞄准标记相交的至少一个副水平轴线间隔开的一组风向瞄准标记，以便于补偿侧风对射弹轨迹的影响。

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