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1. 发明授权

US07061698B2 Lens system, in particular a projection lens system for semiconductor lithography 失效
标题翻译：透镜系统，特别是用于半导体光刻的投影透镜系统
公开(公告)号：US07061698B2
公开(公告)日：2006-06-13
申请号：US10131957
申请日：2002-04-25
申请人： Karlfrid Osterried , Thomas Petasch , Jens Kugler
发明人： Karlfrid Osterried , Thomas Petasch , Jens Kugler
IPC分类号： G02B7/02 , G03B27/42
CPC分类号： G03F7/70825 , G02B7/02 , G02B13/143
摘要： In the case of a lens system (1), in particular in the case of a projection lens system for semiconductor lithography, it is possible to exchange at least one optical element, in particular the final optical element in the beam direction in the form of an end plate (3). For adjusting the exchangeable optical element (3), an optical quality fit with a fitting surface (6) is set between the optical element (3) and a mount (5) or a part connected to a mount (5).
摘要翻译：在透镜系统（1）的情况下，特别是在用于半导体光刻的投影透镜系统的情况下，可以以至少一个光学元件，特别是沿光束方向的最终光学元件以端板（3）。为了调整可交换光学元件（3），在光学元件（3）和安装件（5）或连接到安装座（5）的部件之间设置与配合表面（6）配合的光学质量。

2. 发明授权

US08300210B2 Optical projection system 有权
标题翻译：光学投影系统
公开(公告)号：US08300210B2
公开(公告)日：2012-10-30
申请号：US11664896
申请日：2005-10-01
申请人： Johannes Rau , Armin Schoeppach , Bernhard Gellrich , Jens Kugler , Martin Mahlmann , Bernhard Geuppert , Thomas Petasch , Gerhard Fuerter
发明人： Johannes Rau , Armin Schoeppach , Bernhard Gellrich , Jens Kugler , Martin Mahlmann , Bernhard Geuppert , Thomas Petasch , Gerhard Fuerter
IPC分类号： G03B27/54 , G03B27/42 , G02B7/02
CPC分类号： G03F7/7015 , G02B7/00 , G02B7/008 , G02B7/021 , G02B7/028 , G02B7/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G03F7/70808 , G03F7/70825 , G03F7/70833 , G03F7/70883
摘要： An optical projection unit comprising a first optical element module and at least one second optical element module is provided. The first optical element module comprises a first housing unit and at least a first optical element, the first optical element being received within the first housing unit and having an optically used first region defining a first optical axis. The at least one second optical element module is located adjacent to the first optical element module and comprises at least one second optical element, the second optical element defining a second optical axis of the optical projection unit. The first housing unit has a central first housing axis and an outer wall extending in a circumferential direction about the first housing axis. The first optical axis is at least one of laterally offset and inclined with respect to the first housing axis. Furthermore, the first housing axis is substantially collinear with the second optical axis.
摘要翻译：提供了包括第一光学元件模块和至少一个第二光学元件模块的光学投影单元。第一光学元件模块包括第一壳体单元和至少第一光学元件，第一光学元件被接收在第一壳体单元内并且具有限定第一光轴的光学使用的第一区域。所述至少一个第二光学元件模块位于与所述第一光学元件模块相邻并且包括至少一个第二光学元件，所述第二光学元件限定所述光学投影单元的第二光轴。第一壳体单元具有中心的第一壳体轴线和围绕第一壳体轴线在圆周方向上延伸的外壁。第一光轴是相对于第一壳体轴线的横向偏移和倾斜中的至少一个。此外，第一壳体轴线与第二光轴基本共线。

3. 发明申请

US20090174874A1 Optical Projection System 有权
标题翻译：光学投影系统
公开(公告)号：US20090174874A1
公开(公告)日：2009-07-09
申请号：US11664896
申请日：2005-10-01
申请人： Johannes Rau , Armin Schoeppach , Bernhard Gellrich , Jens Kugler , Martin Mahlmann , Bernhard Geuppert , Thomas Petasch , Gerhard Fuerter
发明人： Johannes Rau , Armin Schoeppach , Bernhard Gellrich , Jens Kugler , Martin Mahlmann , Bernhard Geuppert , Thomas Petasch , Gerhard Fuerter
IPC分类号： G03B27/54 , G03B27/62
CPC分类号： G03F7/7015 , G02B7/00 , G02B7/008 , G02B7/021 , G02B7/028 , G02B7/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G03F7/70808 , G03F7/70825 , G03F7/70833 , G03F7/70883
摘要： An optical projection unit comprising a first optical element module and at least one second optical element module is provided. The first optical element module comprises a first housing unit and at least a first optical element, the first optical element being received within the first housing unit and having an optically used first region defining a first optical axis. The at least one second optical element module is located adjacent to the first optical element module and comprises at least one second optical element, the second optical element defining a second optical axis of the optical projection unit. The first housing unit has a central first housing axis and an outer wall extending in a circumferential direction about the first housing axis. The first optical axis is at least one of laterally offset and inclined with respect to the first housing axis. Furthermore, the first housing axis is substantially collinear with the second optical axis.
摘要翻译：提供了包括第一光学元件模块和至少一个第二光学元件模块的光学投影单元。第一光学元件模块包括第一壳体单元和至少第一光学元件，第一光学元件被接收在第一壳体单元内并且具有限定第一光轴的光学使用的第一区域。所述至少一个第二光学元件模块位于与所述第一光学元件模块相邻并且包括至少一个第二光学元件，所述第二光学元件限定所述光学投影单元的第二光轴。第一壳体单元具有中心的第一壳体轴线和围绕第一壳体轴线在圆周方向上延伸的外壁。第一光轴是相对于第一壳体轴线的横向偏移和倾斜中的至少一个。此外，第一壳体轴线与第二光轴基本共线。

4. 发明申请

US20090015947A1 APPARATUS FOR MOUNTING TWO OR MORE ELEMENTS AND METHOD FOR PROCESSING THE SURFACE OF AN OPTICAL ELEMENT 有权
标题翻译：用于安装两个或多个元件的装置和处理光学元件表面的方法
公开(公告)号：US20090015947A1
公开(公告)日：2009-01-15
申请号：US11722091
申请日：2005-12-22
申请人： Hubert Holderer , Thomas Petasch , Chris Reed , Dragos Pariza , Mike Meehan , Gary Krebs
发明人： Hubert Holderer , Thomas Petasch , Chris Reed , Dragos Pariza , Mike Meehan , Gary Krebs
IPC分类号： G02B7/00 , G01M11/00
CPC分类号： G03F7/70825 , G01M11/005 , G01M11/02 , Y10T29/49769
摘要： In an apparatus for mounting two or more optical elements that are each held in an individual mount or in a support structure, said optical elements are mounted in a common mount. The relative positioning of the optical elements (10, 11) in the common mount (18) can be set.
摘要翻译：在用于安装两个或更多个光学元件的装置中，每个光学元件被保持在单独的安装件或支撑结构中，所述光学元件安装在公共安装件中。可以设置光学元件（10,11）在公共安装件（18）中的相对定位。

5. 发明授权

US07082693B2 Adjusting apparatus for devices and for setting adjustments 失效
标题翻译：用于设备的调节装置和设置调整
公开(公告)号：US07082693B2
公开(公告)日：2006-08-01
申请号：US10106962
申请日：2002-03-25
申请人： Klaus-Dieter Klein , Thomas Petasch , Hartmut Muenker
发明人： Klaus-Dieter Klein , Thomas Petasch , Hartmut Muenker
IPC分类号： G02B26/00
CPC分类号： G02B7/023
摘要： An apparatus for adjusting devices and for setting adjustments, in particular in a μm range, nm range and below, in particular of optical elements in semiconductor lithography, comprising a base part and a head part spaced apart therefrom, the two parts being connected to one another by at least one adjustment device, and the adjustment device having side parts, the angle of which, or the spacing between which, can be adjusted or set by a length-adjustment device.
摘要翻译：一种用于调节装置和用于设置调整的装置，特别是在范围和范围内，特别是半导体光刻中的光学元件的范围内，包括基部和与其间隔开的头部，其中两个部分连接到一个另一个通过至少一个调节装置，并且调节装置具有侧部，其角度或其间距可以由长度调节装置调节或设定。

6. 发明授权

US08605253B2 Lithographic projection objective 有权
标题翻译：光刻投影物镜
公开(公告)号：US08605253B2
公开(公告)日：2013-12-10
申请号：US12334685
申请日：2008-12-15
申请人： Olaf Rogalsky , Boris Bittner , Thomas Petasch , Jochen Haeussler
发明人： Olaf Rogalsky , Boris Bittner , Thomas Petasch , Jochen Haeussler
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F7/70191 , G03F7/70258 , G03F7/70975
摘要： Projection objectives, related systems and components, and methods are disclosed. The methods include providing a projection objective of a lithography projection exposure apparatus, where the projection objective includes a plurality of optical elements between an object plane of the projection objective and an image plane of the projection objective, and the plurality of optical elements includes a first optical element having a refractive power and being disposed in the projection objective at a first location. The methods also include removing the first optical element from the projection objective, and inserting a first spare optical element into the projection objective at the first location, where the removing and inserting steps are performed at a location of use of the lithography projection exposure apparatus in a lithography process.
摘要翻译：公开了投影目标，相关系统和组件以及方法。所述方法包括提供光刻投影曝光装置的投影物镜，其中所述投影物镜包括在所述投影物镜的物平面和所述投影物镜的像平面之间的多个光学元件，并且所述多个光学元件包括第一具有屈光力的光学元件并且设置在第一位置处的投影物镜中。所述方法还包括从投影物镜移除第一光学元件，以及在第一位置将第一备用光学元件插入投影物镜中，其中，在使用光刻投影曝光设备的位置处执行去除和插入步骤光刻工艺。

7. 发明申请

US20090153829A1 LITHOGRAPHIC PROJECTION OBJECTIVE 有权
标题翻译： LITHOGRAPHIC投影目标
公开(公告)号：US20090153829A1
公开(公告)日：2009-06-18
申请号：US12334685
申请日：2008-12-15
申请人： Olaf Rogalsky , Boris Bittner , Thomas Petasch , Jochen Haeussler
发明人： Olaf Rogalsky , Boris Bittner , Thomas Petasch , Jochen Haeussler
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F7/70191 , G03F7/70258 , G03F7/70975
摘要： Projection objectives, such as projection objectives of lithography projection exposure apparatuses, as well as related systems, components and methods, such as methods of revising and/or repairing such objectives, are disclosed.
摘要翻译：公开了诸如光刻投影曝光设备的投影目标的投影目标，以及相关系统，组件和方法，诸如修改和/或修复这些目标的方法。

8. 发明授权

US07457059B2 Adjustment arrangement of an optical element 失效
标题翻译：光学元件的调整布置
公开(公告)号：US07457059B2
公开(公告)日：2008-11-25
申请号：US11533660
申请日：2006-09-20
申请人： Klaus Beck , Bernhard Gellrich , Hubert Holderer , Thomas Petasch , Cornelia Roesch , Alexander Kohl
发明人： Klaus Beck , Bernhard Gellrich , Hubert Holderer , Thomas Petasch , Cornelia Roesch , Alexander Kohl
IPC分类号： G02B7/02
CPC分类号： G03F7/70258 , G02B7/023 , G03F7/70825
摘要： A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).
摘要翻译：一种布置用于调整光学元件（1），特别是光学系统中的透镜的调整，特别是用于半导体光刻的投影透镜系统中。光学元件（1）通过分布在光学元件（1）的圆周上的多个轴承脚（2）安装在安装件（3）中，并且可由致动器（5）选择性地变形。至少一些轴承脚（2）在相应的轴承座（2）的区域中被致动器（5）接合，使得相应的轴承座（2）可以沿着光学方向轴（7）。

9. 发明授权

US06870632B2 Apparatus for mounting an optical element in an optical system 失效
标题翻译：用于将光学元件安装在光学系统中的装置
公开(公告)号：US06870632B2
公开(公告)日：2005-03-22
申请号：US10108878
申请日：2002-03-27
申请人： Thomas Petasch , Hartmut Muenker , Klaus-Dieter Klein
发明人： Thomas Petasch , Hartmut Muenker , Klaus-Dieter Klein
IPC分类号： G02B7/00 , G02B7/02 , G02B7/198 , G03F7/20 , H01L21/027 , G01B7/02 , G01B11/14
CPC分类号： G02B7/023
摘要： An apparatus or mounting an optical element in an optical system, in particular a mirror or a lens, in a projection exposure machine, in particular a projection lens in semiconductor lithography, is connected to an external base structure with the aid of at least three articulation sites that are arranged on the circumference of the optical element and at which a bearing device acts in each case, wherein the bearing device has at least one bending element, resembling a leaf spring, arranged tangentially to the optical element, and at least one bending element, resembling a leaf spring, arranged in the radial direction relative to the optical element.
摘要翻译：用于将光学元件安装在投影曝光机中的光学系统，特别是镜子或透镜中的装置，特别是半导体光刻中的投影透镜，借助于至少三个关节连接到外部基座结构布置在光学元件的圆周上并且在每种情况下轴承装置作用的位置，其中所述轴承装置具有至少一个与所述光学元件相切布置的类似于板簧的弯曲元件，以及至少一个弯曲元件，类似于板簧，相对于光学元件沿径向布置。

10. 发明申请

US20090122288A1 DEVICE FOR THE LOW-DEFORMATION REPLACEABLE MOUNTING OF AN OPTICAL ELEMENT 有权
标题翻译：用于光学元件的低变形可更换安装的装置
公开(公告)号：US20090122288A1
公开(公告)日：2009-05-14
申请号：US12274583
申请日：2008-11-20
申请人： Franz Sorg , Andreas Wurmbrand , Thomas Petasch , Dirk Schaffer , Siegfried Wahl
发明人： Franz Sorg , Andreas Wurmbrand , Thomas Petasch , Dirk Schaffer , Siegfried Wahl
IPC分类号： G03B27/42
CPC分类号： G02B7/00 , G02B7/025 , G02B7/026 , G03F7/70825
摘要： The invention relates to a device for the low-deformation replaceable mounting of an optical element, in particular a closure plate of an objective of a projection exposure system for microlithography for the production of semiconductor components, in a mount (12). The optical element is connected to the mount (12) at least partly via an adhesive connection. This is located between the adjacent circumferential walls of mount (12) and optical element. The mount (12) is provided with at least three support feet (14) distributed over the circumference, by means of which the optical element is mounted laterally and axially. The mount (12) is connected to the housing of the objective in an at least approximately deformation-decoupled manner via three mount bearing points (15).
摘要翻译：本发明涉及一种用于光学元件的低变形可替换安装的装置，特别是用于在安装件（12）中生产半导体部件的用于微光刻的投影曝光系统的目标的封闭板。光学元件至少部分地通过粘合剂连接连接到安装件（12）。它位于安装件（12）的相邻圆周壁和光学元件之间。安装件（12）设置有分布在圆周上的至少三个支撑脚（14），光学元件通过该支撑脚侧向和轴向安装。安装件（12）经由三个安装支承点（15）以至少近似变形 - 解耦的方式连接到物镜的壳体。

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