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    • 1. 发明申请
    • BACKPLANES FOR DISPLAY APPLICATIONS, AND COMPONENTS FOR USE THEREIN
    • 显示应用的背板及其使用的组件
    • US20070035532A1
    • 2007-02-15
    • US11461255
    • 2006-07-31
    • Karl AmundsonYu ChenKevin DenisPaul DrzaicPeter KazlasAndrew Ritenour
    • Karl AmundsonYu ChenKevin DenisPaul DrzaicPeter KazlasAndrew Ritenour
    • G09G5/00
    • H01L27/12G09G3/2011G09G3/344G09G2300/043G09G2310/0262G09G2310/027G09G2310/0297G09G2320/0209H01L27/124H01L27/1285H01L27/1292H01L29/41733H01L29/42384
    • A thin-film transistor includes a gate electrode having a first gate electrode edge and a second gate electrode edge opposite the first gate electrode edge. The TFT also includes a drain electrode having a first drain electrode edge that overlaps the first gate electrode edge, and a second drain electrode edge that overlaps the second gate electrode edge. A method for fabricating a diode array for use in a display includes deposition of a conductive layer adjacent to a substrate, deposition of a doped semiconductor layer adjacent to the substrate, and deposition of an undoped semiconductor layer adjacent to the substrate. A display pixel unit provides reduced capacitative coupling between a pixel electrode and a source line. The unit includes a transistor, the pixel electrode, and the source line. The source line includes an extension that provides a source for the transistor. A patterned conductive portion is disposed adjacent to the source line. Another display pixel unit provides reduced pixel electrode voltage shifts. The unit includes a transistor, a pixel electrode, a source line and a balance line. The invention also provides a driver for driving a display provided with such a balance line.
    • 薄膜晶体管包括具有第一栅电极边缘和与第一栅电极边缘相对的第二栅电极边缘的栅电极。 TFT还包括具有与第一栅电极边缘重叠的第一漏电极边缘和与第二栅极边缘重叠的第二漏电极边缘的漏电极。 用于制造用于显示器的二极管阵列的方法包括:与衬底相邻的导电层的沉积,与衬底相邻的掺杂半导体层的沉积以及与衬底相邻的未掺杂的半导体层的沉积。 显示像素单元在像素电极和源极线之间提供减小的电容耦合。 该单元包括晶体管,像素电极和源极线。 源极线包括提供晶体管源极的扩展。 图案化导电部分邻近源极线设置。 另一显示像素单元提供减小的像素电极电压偏移。 该单元包括晶体管,像素电极,源极线和平衡线。 本发明还提供一种用于驱动具有这种平衡线的显示器的驱动器。
    • 7. 发明授权
    • Method for forming a patterned semiconductor film
    • 用于形成图案化半导体膜的方法
    • US06498114B1
    • 2002-12-24
    • US09651710
    • 2000-08-31
    • Karl AmundsonPaul S. DrzaicJianna WangGregg DuthalerPeter Kazlas
    • Karl AmundsonPaul S. DrzaicJianna WangGregg DuthalerPeter Kazlas
    • H01L2131
    • H01L51/0016B41J3/4076G02F1/1334G02F1/1345G02F1/1362H01L27/28H01L51/0002H01L51/0004H01L51/0014H01L51/0015H01L51/0019H01L51/0508H01L51/0512H01L51/0516H01L51/0541H01L51/0545
    • A process for forming a pattern in a semiconductor film is provided. The process comprises the steps of: providing a substrate; providing an organic semiconductor film adjacent the substrate; and providing a destructive agent adjacent selected portions of the organic semiconductor film, the destructive agent changing a property of selected portions of the organic semiconductor film substantially through the full thickness of the organic semiconductor film such that the property of the selected portions of the organic semiconductor film differs from the property of remaining portions of the organic semiconductor film. A method for manufacturing a transistor comprises the steps of: providing a substrate; providing a gate electrode adjacent the substrate; providing a gate dielectric adjacent the substrate and the gate electrode; providing a source electrode and a drain electrode adjacent the gate dielectric; providing a mask adjacent the gate dielectric in a pattern such that the source electrode, the drain electrode, and a portion of the gate dielectric remain exposed; and providing a semiconductor layer comprising one of an organic semiconductor and a plurality of inorganic colloidal particles, adjacent the source electrode, the drain electrode, the portion of the gate dielectric and the mask, thereby forming the transistor, the semiconductor layer having a thickness less than a thickness of the mask.
    • 提供了一种在半导体膜中形成图案的工艺。 该方法包括以下步骤:提供衬底; 提供邻近所述衬底的有机半导体膜; 并且在所述有机半导体膜的选定部分附近提供破坏性试剂,所述破坏剂基本上改变所述有机半导体膜的全部厚度以改变所述有机半导体膜的选定部分的性质,使得所述有机半导体膜的选定部分的性质 膜与有机半导体膜的剩余部分的性质不同。 一种制造晶体管的方法,包括以下步骤:提供衬底; 在所述衬底附近提供栅电极; 在所述衬底和所述栅极附近提供栅极电介质; 提供邻近栅极电介质的源电极和漏电极; 以图案提供与栅极电介质相邻的掩模,使得源电极,漏电极和栅电介质的一部分保持暴露; 并且提供包括有机半导体和多个无机胶体粒子之一的半导体层,与源电极,漏电极,栅极电介质的部分和掩模相邻,从而形成晶体管,半导体层的厚度较小 比掩模的厚度。