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    • 1. 发明申请
    • LOW TRIGGER VOLTAGE ESD PROTECTION DEVICE
    • 低触发电压ESD保护装置
    • US20080239600A1
    • 2008-10-02
    • US11695316
    • 2007-04-02
    • Kang-Neng HsuWen-Chih LiChien-Hao HuangKun-Huang Chang
    • Kang-Neng HsuWen-Chih LiChien-Hao HuangKun-Huang Chang
    • H02H9/04
    • H05K9/0067H01T4/12
    • The present invention is an electrostatic discharge protection device having a low trigger voltage. The device can utilize a process of manufacturing a PCB to minimize costs and manufacturing time. The device comprises: a discharge area, which is essentially a space within the device and can be filled by a material having a desired breakdown voltage, and at least two electrode areas, wherein the two electrode areas are substantially electrically isolated from each other and simultaneously adjacent to or within the discharge area. When an electric potential difference between the electrode areas exceeds a predetermined value, a conductive path between the electrode areas will be created by discharging through the discharge area. The device is characterized in that each of the two electrodes is a part of a conductive plate, and the two conductive plates become a part of the device by pressing or adhering so that a gap for electric isolation exists between the two electrode areas.
    • 本发明是具有低触发电压的静电放电保护装置。 该设备可以利用制造PCB的过程来最小化成本和制造时间。 该装置包括:放电区域,其基本上是装置内的空间并且可以由具有期望的击穿电压的材料填充,以及至少两个电极区域,其中两个电极区域彼此基本上电隔离并且同时 邻近或在放电区域内。 当电极区域之间的电位差超过预定值时,将通过放电区域放电来产生电极区域之间的导电路径。 该装置的特征在于,两个电极中的每一个是导电板的一部分,并且两个导电板通过按压或粘合而成为器件的一部分,使得在两个电极区域之间存在用于电绝缘的间隙。
    • 6. 发明申请
    • End electrode structure of a surface-mounted resettable over-current protection device
    • 表面安装的可复位过电流保护装置的端电极结构
    • US20070037322A1
    • 2007-02-15
    • US11373787
    • 2006-03-10
    • Chien-Hao HuangWen-Chih Li
    • Chien-Hao HuangWen-Chih Li
    • H01L21/82
    • H01C17/28H01C1/14
    • The present invention relates to an end electrode structure of a surface-mounted resettable over-current protection device. A polymer-based sheet is punched with a mold for manufacturing a plurality of H-shaped through-holes separated at an equal interval, such that several strip-shaped sheets are formed. Then, a first pair of electrodes and a second pair of electrodes are manufactured on each of the strip-shaped sheets through an ordinary through-hole manufacturing process of a printed circuit board. Then, the sheet is divided into several strip-shaped devices, thereby forming several over-current protection devices with five-sided electrodes. Thereby, with the five-sided electrode, the device may be more easily adhered to a circuit board.
    • 本发明涉及一种表面安装的可重置过电流保护装置的端电极结构。 聚合物基片材用用于制造以相等间隔分开的多个H形通孔的模具冲压,从而形成几个带状片材。 然后,通过印刷电路板的普通通孔制造工艺,在每个带状片上制造第一对电极和第二对电极。 然后,将片材分割成几个带状装置,从而形成具有五边电极的数个过电流保护装置。 因此,利用五面电极,该装置可以更容易地粘附到电路板。
    • 9. 发明申请
    • MANUFACTURING METHOD OF JUNCTION FIELD EFFECT TRANSISTOR
    • 连接场效应晶体管的制造方法
    • US20140315358A1
    • 2014-10-23
    • US13866766
    • 2013-04-19
    • Tsung-Yi HuangChien-Hao Huang
    • Tsung-Yi HuangChien-Hao Huang
    • H01L29/66
    • H01L29/66893H01L29/0649H01L29/0843H01L29/66901H01L29/808
    • The present invention discloses a manufacturing method of a junction field effect transistor (JFET). The manufacturing method includes: providing a substrate with a first conductive type, forming a channel region with a second conductive type, forming a field region with the first conductive type, forming a gate with the first conductive type, forming a source with the second conductive type, forming a drain with the second conductive type, and forming a lightly doped region with the second conductive type. The channel region is formed by an ion implantation process step, wherein the lightly doped region is formed by masking a predetermined region from accelerated ions of the ion implantation process step, and diffusing impurities with the second conductive type nearby the predetermined region into it with a thermal process step.
    • 本发明公开了一种结型场效应晶体管(JFET)的制造方法。 该制造方法包括:提供具有第一导电类型的衬底,形成具有第二导电类型的沟道区,形成具有第一导电类型的场区,形成具有第一导电类型的栅极,形成具有第二导电 形成具有第二导电类型的漏极,以及形成具有第二导电类型的轻掺杂区域。 沟道区域通过离子注入工艺步骤形成,其中通过从离子注入工艺步骤的加速离子掩蔽预定区域并且将具有第二导电类型的杂质附近的预定区域的杂质扩散到其中以通过离子注入工艺步骤 热处理步骤。