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1. 发明授权

US06486480B1 Plasma formed ion beam projection lithography system 失效
标题翻译：等离子体形成离子束投影光刻系统
公开(公告)号：US06486480B1
公开(公告)日：2002-11-26
申请号：US09289333
申请日：1999-04-09
申请人： Ka-Ngo Leung , Yung-Hee Yvette Lee , Vinh Ngo , Nastaran Zahir
发明人： Ka-Ngo Leung , Yung-Hee Yvette Lee , Vinh Ngo , Nastaran Zahir
IPC分类号： H01J3708
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/08 , H01J37/3007 , H01J37/3175 , H01J37/3177 , H01J2237/31794
摘要： A plasma-formed ion-beam projection lithography (IPL) system eliminates the acceleration stage between the ion source and stencil mask of a conventional IPL system. Instead a much thicker mask is used as a beam forming or extraction electrode, positioned next to the plasma in the ion source. Thus the entire beam forming electrode or mask is illuminated uniformly with the source plasma. The extracted beam passes through an acceleration and reduction stage onto the resist coated wafer. Low energy ions, about 30 eV, pass through the mask, minimizing heating, scattering, and sputtering.
摘要翻译：等离子体形成的离子束投影光刻（IPL）系统消除了常规IPL系统的离子源和模板掩模之间的加速阶段。相反，使用更厚的掩模作为离子源中的等离子体旁边放置的束形成或引出电极。因此，整个光束形成电极或掩模与源等离子体均匀地照射。提取的光束通过加速和还原阶段到抗蚀剂涂覆的晶片上。约30eV的低能离子通过掩模，使加热，散射和溅射最小化。

2. 发明授权

US5945677A Focused ion beam system 有权
标题翻译：聚焦离子束系统
公开(公告)号：US5945677A
公开(公告)日：1999-08-31
申请号：US225996
申请日：1999-01-05
申请人： Ka-Ngo Leung , Richard A. Gough , Qing Ji , Yung-Hee Yvette Lee
发明人： Ka-Ngo Leung , Richard A. Gough , Qing Ji , Yung-Hee Yvette Lee
IPC分类号： G01N23/225 , H01J37/08 , H01J37/30 , H01J37/317 , H01J3/18
CPC分类号： B82Y10/00 , B82Y40/00 , G01N23/225 , H01J37/08 , H01J37/3007 , H01J37/3177 , H01J2237/083 , H01J2237/31755 , H01J2237/31794
摘要： A focused ion beam (FIB) system produces a final beam spot size down to 0.1 .mu.m or less and an ion beam output current on the order of microamps. The FIB system increases ion source brightness by properly configuring the first (plasma) and second (extraction) electrodes. The first electrode is configured to have a high aperture diameter to electrode thickness aspect ratio. Additional accelerator and focusing electrodes are used to produce the final beam. As few as five electrodes can be used, providing a very compact FIB system with a length down to only 20 mm. Multibeamlet arrangements with a single ion source can be produced to increase throughput. The FIB system can be used for nanolithography and doping applications for fabrication of semiconductor devices with minimum feature sizes of 0.1 .mu.m or less.
摘要翻译：聚焦离子束（FIB）系统产生的最终束斑尺寸低至0.1μm或更小，离子束输出电流为微安数量级。 FIB系统通过适当地配置第一（等离子体）和第二（提取）电极来增加离子源亮度。第一电极被配置为具有高孔径至电极厚度纵横比。使用附加的加速器和聚焦电极来产生最终的光束。可以使用少至五个电极，提供非常紧凑的FIB系统，其长度只有20mm。可以生产具有单个离子源的多亚麻子布置以提高生产量。 FIB系统可用于制造半导体器件的纳米光刻和掺杂应用，最小特征尺寸为0.1μm或更小。

3. 发明授权

US6094012A Low energy spread ion source with a coaxial magnetic filter 失效
标题翻译：具有同轴磁性过滤器的低能量扩散离子源
公开(公告)号：US6094012A
公开(公告)日：2000-07-25
申请号：US187540
申请日：1998-11-06
申请人： Ka-Ngo Leung , Yung-Hee Yvette Lee
发明人： Ka-Ngo Leung , Yung-Hee Yvette Lee
IPC分类号： H01J27/18 , H01J27/02
CPC分类号： H01J27/18
摘要： Multicusp ion sources are capable of producing ions with low axial energy spread which are necessary in applications such as ion projection lithography (IPL) and radioactive ion beam production. The addition of a radially extending magnetic filter consisting of a pair of permanent magnets to the multicusp source reduces the energy spread considerably due to the improvement in the uniformity of the axial plasma potential distribution in the discharge region. A coaxial multicusp ion source designed to further reduce the energy spread utilizes a cylindrical magnetic filter to achieve a more uniform axial plasma potential distribution. The coaxial magnetic filter divides the source chamber into an outer annular discharge region in which the plasma is produced and a coaxial inner ion extraction region into which the ions radially diffuse but from which ionizing electrons are excluded. The energy spread in the coaxial source has been measured to be 0.6 eV. Unlike other ion sources, the coaxial source has the capability of adjusting the radial plasma potential distribution and therefore the transverse ion temperature (or beam emittance).
摘要翻译：多重离子源能够产生具有低轴向能量扩散的离子，其在诸如离子投影光刻（IPL）和放射性离子束生产的应用中是必需的。由放电区域中的轴向等离子体电位分布的均匀性的改善，向多焦点源添加由一对永磁体构成的径向延伸的磁性过滤器增加了能量扩散。设计用于进一步降低能量传播的同轴多叶离子源利用圆柱形磁性过滤器来实现更均匀的轴向等离子体电位分布。同轴磁性过滤器将源室划分成其中产生等离子体的外部环形放电区域和离子径向扩散而从其中排除电离电子的同轴内部离子提取区域。同轴源中的能量传播已经被测量为0.6eV。与其他离子源不同，同轴源具有调整径向等离子体电位分布和横向离子温度（或光束发射率）的能力。

4. 发明授权

US08279993B2 Gamma source for active interrogation 有权
标题翻译： Gamma来源用于主动询问
公开(公告)号：US08279993B2
公开(公告)日：2012-10-02
申请号：US12541423
申请日：2009-08-14
申请人： Ka-Ngo Leung , Tak Pui Lou , William A. Barletta
发明人： Ka-Ngo Leung , Tak Pui Lou , William A. Barletta
IPC分类号： G21G1/12
CPC分类号： H05G2/00 , G01V5/0091
摘要： A cylindrical gamma generator includes a coaxial RF-driven plasma ion source and target. A hydrogen plasma is produced by RF excitation in a cylindrical plasma ion generator using an RF antenna. A cylindrical gamma generating target is coaxial with the ion generator, separated by plasma and extraction electrodes which has many openings. The plasma generator emanates ions radially over 360° and the cylindrical target is thus irradiated by ions over its entire circumference. The plasma generator and target may be as long as desired.
摘要翻译：圆柱形γ发生器包括同轴RF驱动的等离子体离子源和靶。在使用RF天线的圆柱形等离子体离子发生器中通过RF激发产生氢等离子体。圆柱形伽马产生靶与离子发生器同轴，由具有许多开口的等离子体和引出电极分离。等离子体发生器径向离子发射离子360°，圆柱形靶因此在其整个圆周上被离子照射。等离子体发生器和靶可以是期望的长度。

5. 发明授权

US07342988B2 Neutron tubes 有权
公开(公告)号：US07342988B2
公开(公告)日：2008-03-11
申请号：US10360245
申请日：2003-02-06
申请人： Ka-Ngo Leung , Tak Pui Lou , Jani Reijonen
发明人： Ka-Ngo Leung , Tak Pui Lou , Jani Reijonen
IPC分类号： G21B1/00
CPC分类号： H05H3/06
摘要： A neutron tube or generator is based on a RF driven plasma ion source having a quartz or other chamber surrounded by an external RF antenna. A deuterium or mixed deuterium/tritium (or even just a tritium) plasma is generated in the chamber and D or D/T (or T) ions are extracted from the plasma. A neutron generating target is positioned so that the ion beam is incident thereon and loads the target. Incident ions cause D-D or D-T (or T-T) reactions which generate neutrons. Various embodiments differ primarily in size of the chamber and position and shape of the neutron generating target. Some neutron generators are small enough for implantation in the body. The target may be at the end of a catheter-like drift tube. The target may have a tapered or conical surface to increase target surface area.

6. 发明申请

US20050220244A1 Cylindrical neutron generator 有权
公开(公告)号：US20050220244A1
公开(公告)日：2005-10-06
申请号：US11110310
申请日：2005-04-19
申请人： Ka-Ngo Leung
发明人： Ka-Ngo Leung
IPC分类号： G21B3/00 , G21B1/00
CPC分类号： G21B3/00 , Y02E30/18
摘要： A cylindrical neutron generator is formed with a coaxial RF-driven plasma ion source and target. A deuterium (or deuterium and tritium) plasma is produced by RF excitation in a cylindrical plasma ion generator using an RF antenna. A cylindrical neutron generating target is coaxial with the ion generator, separated by plasma and extraction electrodes which contain many slots. The plasma generator emanates ions radially over 360° and the cylindrical target is thus irradiated by ions over its entire circumference. The plasma generator and target may be as long as desired. The plasma generator may be in the center and the neutron target on the outside, or the plasma generator may be on the outside and the target on the inside. In a nested configuration, several concentric targets and plasma generating regions are nested to increase the neutron flux.

7. 发明授权

US06924493B1 Ion beam lithography system 失效
标题翻译：离子束光刻系统
公开(公告)号：US06924493B1
公开(公告)日：2005-08-02
申请号：US09641467
申请日：2000-08-17
申请人： Ka-Ngo Leung
发明人： Ka-Ngo Leung
IPC分类号： H01J37/302 , H01J37/317
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/08 , H01J2237/0435 , H01J2237/1205 , H01J2237/21 , H01J2237/3175 , H01J2237/31755 , H01J2237/31774 , H01J2237/31788
摘要： A maskless plasma-formed ion beam lithography tool provides for patterning of sub-50 nm features on large area flat or curved substrate surfaces. The system is very compact and does not require an accelerator column and electrostatic beam scanning components. The patterns are formed by switching beamlets on or off from a two electrode blanking system with the substrate being scanned mechanically in one dimension. This arrangement can provide a maskless nano-beam lithography tool for economic and high throughput processing.
摘要翻译：无掩模等离子体形成的离子束光刻工具提供了在大面积平坦或弯曲的衬底表面上的50nm以下特征的图案化。该系统非常紧凑，不需要加速器柱和静电束扫描组件。通过在两个电极消隐系统中切换子束来形成图案，其中衬底在一个维度上被机械地扫描。这种布置可以提供用于经济和高通量处理的无掩模纳米光刻工具。

8. 发明授权

US06870894B2 Compact neutron generator 失效
标题翻译：紧凑型中子发生器
公开(公告)号：US06870894B2
公开(公告)日：2005-03-22
申请号：US10410623
申请日：2003-04-08
申请人： Ka-Ngo Leung , Tak Pui Lou
发明人： Ka-Ngo Leung , Tak Pui Lou
IPC分类号： H05H3/06 , G21B1/00
CPC分类号： H05H3/06
摘要： A compact neutron generator has at its outer circumference a toroidal shaped plasma chamber in which a tritium (or other) plasma is generated. A RF antenna is wrapped around the plasma chamber. A plurality of tritium ion beamlets are extracted through spaced extraction apertures of a plasma electrode on the inner surface of the toroidal plasma chamber and directed inwardly toward the center of neutron generator. The beamlets pass through spaced acceleration and focusing electrodes to a neutron generating target at the center of neutron generator. The target is typically made of titanium tubing. Water is flowed through the tubing for cooling. The beam can be pulsed rapidly to achieve ultrashort neutron bursts. The target may be moved rapidly up and down so that the average power deposited on the surface of the target may be kept at a reasonable level. The neutron generator can produce fast neutrons from a T-T reaction which can be used for luggage and cargo interrogation applications. A luggage or cargo inspection system has a pulsed T-T neutron generator or source at the center, surrounded by associated gamma detectors and other components for identifying explosives or other contraband.
摘要翻译：紧凑的中子发生器在其外圆周处形成环形等离子体室，其中产生氚（或其它）等离子体。 RF天线缠绕在等离子体室周围。多个氚离子束通过环形等离子体室的内表面上的等离子体电极的间隔提取孔提取，并朝向中子发生器的中心。子束通过间隔的加速度和聚焦电极到达中子发生器中心的中子产生目标。目标通常由钛管制成。水流过管道进行冷却。光束可以快速脉冲以实现超短中子爆发。目标可以快速上下移动，使得沉积在目标表面上的平均功率可以保持在合理的水平。中子发生器可以从T-T反应产生快中子，可用于行李和货物询问应用。行李或货物检查系统在中心具有脉冲T-T中子发生器或源，由相关的伽马探测器和其他组件包围，用于识别爆炸物或其他违禁品。

9. 发明授权

US06376978B1 Quartz antenna with hollow conductor 失效
标题翻译：带空心导体的石英天线
公开(公告)号：US06376978B1
公开(公告)日：2002-04-23
申请号：US09519139
申请日：2000-03-06
申请人： Ka-Ngo Leung , Elie Benabou
发明人： Ka-Ngo Leung , Elie Benabou
IPC分类号： B32B900
CPC分类号： H01J37/321 , H05H1/46 , Y10T428/24926 , Y10T428/31714
摘要： A radio frequency (RF) antenna for plasma ion sources is formed of a hollow metal conductor tube disposed within a glass tube. The hollow metal tubular conductor has an internal flow channel so that there will be no coolant leakage if the outer glass tube of the antenna breaks. A portion of the RF antenna is formed into a coil; the antenna is used for inductively coupling RF power to a plasma in an ion source chamber. The antenna is made by first inserting the metal tube inside the glass tube, and then forming the glass/metal composite tube into the desired coil shape.
摘要翻译：用于等离子体离子源的射频（RF）天线由设置在玻璃管内的中空金属导体管形成。中空金属管状导体具有内部流动通道，使得如果天线的外部玻璃管断裂，则不会有冷却剂泄漏。 RF天线的一部分形成线圈; 天线用于将RF功率感应耦合到离子源室中的等离子体。天线通过首先将金属管插入玻璃管内，然后将玻璃/金属复合管形成为所需的线圈形状。

10. 发明申请

US20110096885A1 PLASMA DRIVEN NEUTRON/GAMMA GENERATOR 有权
标题翻译：等离子体驱动中子/游戏发电机
公开(公告)号：US20110096885A1
公开(公告)日：2011-04-28
申请号：US12992188
申请日：2009-06-09
申请人： Ka-Ngo Leung , Arlyn Antolak
发明人： Ka-Ngo Leung , Arlyn Antolak
IPC分类号： H05H3/06
CPC分类号： H05H3/06
摘要： An apparatus for the generation of neutron/gamma rays is described including a chamber which defines an ion source, said apparatus including an RF antenna positioned outside of or within the chamber. Positioned within the chamber is a target material. One or more sets of confining magnets are also provided to create a cross B magnetic field directly above the target. To generate neutrons/gamma rays, the appropriate source gas is first introduced into the chamber, the RF antenna energized and a plasma formed. A series of high voltage pulses are then applied to the target. A plasma sheath, which serves as an accelerating gap, is formed upon application of the high voltage pulse to the target. Depending upon the selected combination of source gas and target material, either neutrons or gamma rays are generated, which may be used for cargo inspection, and the like.
摘要翻译：描述了用于产生中子/γ射线的装置，其包括限定离子源的室，所述装置包括位于室内或室内的RF天线。定位在室内是目标材料。还提供了一组或多组约束磁体以在靶上方产生交叉B磁场。为了产生中子/γ射线，首先将合适的源气体引入腔室，RF天线通电并形成等离子体。然后将一系列高电压脉冲施加到目标。用作加速间隙的等离子体护套是在向目标施加高电压脉冲时形成的。取决于所选择的源气体和目标材料的组合，产生可用于货物检查的中子或γ射线等。

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