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1. 发明授权

US5587226A Porcelain-coated antenna for radio-frequency driven plasma source 失效
标题翻译：用于射频驱动等离子体源的陶瓷天线
公开(公告)号：US5587226A
公开(公告)日：1996-12-24
申请号：US10108
申请日：1993-01-28
申请人： Ka-Ngo Leung , Russell P. Wells , Glen E. Craven
发明人： Ka-Ngo Leung , Russell P. Wells , Glen E. Craven
IPC分类号： H05H1/46 , B32B9/00
CPC分类号： H05H1/46 , Y10T428/24926 , Y10T428/31714
摘要： A new porcelain-enamel coated antenna creates a clean plasma for volume or surface-conversion ion sources. The porcelain-enamel coating is hard, electrically insulating, long lasting, non fragile, and resistant to puncture by high energy ions in the plasma. Plasma and ion production using the porcelain enamel coated antenna is uncontaminated with filament or extraneous metal ion because the porcelain does not evaporate and is not sputtered into the plasma during operation.Ion beams produced using the new porcelain-enamel coated antenna are useful in ion implantation, high energy accelerators, negative, positive, or neutral beam applications, fusion, and treatment of chemical or radioactive waste for disposal. For ion implantation, the appropriate species ion beam generated with the inventive antenna will penetrate large or small, irregularly shaped conducting objects with a narrow implantation profile.
摘要翻译：一种新的瓷釉涂层天线为体积或表面转换离子源创造了一个干净的等离子体。瓷搪瓷涂层硬质，电绝缘，持久耐用，不易碎，耐高压离子等离子体刺穿。使用瓷釉涂层天线的等离子体和离子生产不受细丝或外来金属离子污染，因为瓷器在操作期间不蒸发并且不溅射到等离子体中。使用新的瓷搪瓷涂层天线产生的离子束可用于离子注入，高能量加速器，负极，正极或中性束应用，熔化和处理化学或放射性废物进行处置。对于离子注入，用本发明的天线产生的合适的物质离子束将穿透具有窄注入轮廓的大或小的不规则形状的导电物体。

2. 发明授权

US08279993B2 Gamma source for active interrogation 有权
标题翻译： Gamma来源用于主动询问
公开(公告)号：US08279993B2
公开(公告)日：2012-10-02
申请号：US12541423
申请日：2009-08-14
申请人： Ka-Ngo Leung , Tak Pui Lou , William A. Barletta
发明人： Ka-Ngo Leung , Tak Pui Lou , William A. Barletta
IPC分类号： G21G1/12
CPC分类号： H05G2/00 , G01V5/0091
摘要： A cylindrical gamma generator includes a coaxial RF-driven plasma ion source and target. A hydrogen plasma is produced by RF excitation in a cylindrical plasma ion generator using an RF antenna. A cylindrical gamma generating target is coaxial with the ion generator, separated by plasma and extraction electrodes which has many openings. The plasma generator emanates ions radially over 360° and the cylindrical target is thus irradiated by ions over its entire circumference. The plasma generator and target may be as long as desired.
摘要翻译：圆柱形γ发生器包括同轴RF驱动的等离子体离子源和靶。在使用RF天线的圆柱形等离子体离子发生器中通过RF激发产生氢等离子体。圆柱形伽马产生靶与离子发生器同轴，由具有许多开口的等离子体和引出电极分离。等离子体发生器径向离子发射离子360°，圆柱形靶因此在其整个圆周上被离子照射。等离子体发生器和靶可以是期望的长度。

3. 发明授权

US07342988B2 Neutron tubes 有权
公开(公告)号：US07342988B2
公开(公告)日：2008-03-11
申请号：US10360245
申请日：2003-02-06
申请人： Ka-Ngo Leung , Tak Pui Lou , Jani Reijonen
发明人： Ka-Ngo Leung , Tak Pui Lou , Jani Reijonen
IPC分类号： G21B1/00
CPC分类号： H05H3/06
摘要： A neutron tube or generator is based on a RF driven plasma ion source having a quartz or other chamber surrounded by an external RF antenna. A deuterium or mixed deuterium/tritium (or even just a tritium) plasma is generated in the chamber and D or D/T (or T) ions are extracted from the plasma. A neutron generating target is positioned so that the ion beam is incident thereon and loads the target. Incident ions cause D-D or D-T (or T-T) reactions which generate neutrons. Various embodiments differ primarily in size of the chamber and position and shape of the neutron generating target. Some neutron generators are small enough for implantation in the body. The target may be at the end of a catheter-like drift tube. The target may have a tapered or conical surface to increase target surface area.

4. 发明申请

US20050220244A1 Cylindrical neutron generator 有权
公开(公告)号：US20050220244A1
公开(公告)日：2005-10-06
申请号：US11110310
申请日：2005-04-19
申请人： Ka-Ngo Leung
发明人： Ka-Ngo Leung
IPC分类号： G21B3/00 , G21B1/00
CPC分类号： G21B3/00 , Y02E30/18
摘要： A cylindrical neutron generator is formed with a coaxial RF-driven plasma ion source and target. A deuterium (or deuterium and tritium) plasma is produced by RF excitation in a cylindrical plasma ion generator using an RF antenna. A cylindrical neutron generating target is coaxial with the ion generator, separated by plasma and extraction electrodes which contain many slots. The plasma generator emanates ions radially over 360° and the cylindrical target is thus irradiated by ions over its entire circumference. The plasma generator and target may be as long as desired. The plasma generator may be in the center and the neutron target on the outside, or the plasma generator may be on the outside and the target on the inside. In a nested configuration, several concentric targets and plasma generating regions are nested to increase the neutron flux.

5. 发明授权

US06924493B1 Ion beam lithography system 失效
标题翻译：离子束光刻系统
公开(公告)号：US06924493B1
公开(公告)日：2005-08-02
申请号：US09641467
申请日：2000-08-17
申请人： Ka-Ngo Leung
发明人： Ka-Ngo Leung
IPC分类号： H01J37/302 , H01J37/317
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/08 , H01J2237/0435 , H01J2237/1205 , H01J2237/21 , H01J2237/3175 , H01J2237/31755 , H01J2237/31774 , H01J2237/31788
摘要： A maskless plasma-formed ion beam lithography tool provides for patterning of sub-50 nm features on large area flat or curved substrate surfaces. The system is very compact and does not require an accelerator column and electrostatic beam scanning components. The patterns are formed by switching beamlets on or off from a two electrode blanking system with the substrate being scanned mechanically in one dimension. This arrangement can provide a maskless nano-beam lithography tool for economic and high throughput processing.
摘要翻译：无掩模等离子体形成的离子束光刻工具提供了在大面积平坦或弯曲的衬底表面上的50nm以下特征的图案化。该系统非常紧凑，不需要加速器柱和静电束扫描组件。通过在两个电极消隐系统中切换子束来形成图案，其中衬底在一个维度上被机械地扫描。这种布置可以提供用于经济和高通量处理的无掩模纳米光刻工具。

6. 发明授权

US06870894B2 Compact neutron generator 失效
标题翻译：紧凑型中子发生器
公开(公告)号：US06870894B2
公开(公告)日：2005-03-22
申请号：US10410623
申请日：2003-04-08
申请人： Ka-Ngo Leung , Tak Pui Lou
发明人： Ka-Ngo Leung , Tak Pui Lou
IPC分类号： H05H3/06 , G21B1/00
CPC分类号： H05H3/06
摘要： A compact neutron generator has at its outer circumference a toroidal shaped plasma chamber in which a tritium (or other) plasma is generated. A RF antenna is wrapped around the plasma chamber. A plurality of tritium ion beamlets are extracted through spaced extraction apertures of a plasma electrode on the inner surface of the toroidal plasma chamber and directed inwardly toward the center of neutron generator. The beamlets pass through spaced acceleration and focusing electrodes to a neutron generating target at the center of neutron generator. The target is typically made of titanium tubing. Water is flowed through the tubing for cooling. The beam can be pulsed rapidly to achieve ultrashort neutron bursts. The target may be moved rapidly up and down so that the average power deposited on the surface of the target may be kept at a reasonable level. The neutron generator can produce fast neutrons from a T-T reaction which can be used for luggage and cargo interrogation applications. A luggage or cargo inspection system has a pulsed T-T neutron generator or source at the center, surrounded by associated gamma detectors and other components for identifying explosives or other contraband.
摘要翻译：紧凑的中子发生器在其外圆周处形成环形等离子体室，其中产生氚（或其它）等离子体。 RF天线缠绕在等离子体室周围。多个氚离子束通过环形等离子体室的内表面上的等离子体电极的间隔提取孔提取，并朝向中子发生器的中心。子束通过间隔的加速度和聚焦电极到达中子发生器中心的中子产生目标。目标通常由钛管制成。水流过管道进行冷却。光束可以快速脉冲以实现超短中子爆发。目标可以快速上下移动，使得沉积在目标表面上的平均功率可以保持在合理的水平。中子发生器可以从T-T反应产生快中子，可用于行李和货物询问应用。行李或货物检查系统在中心具有脉冲T-T中子发生器或源，由相关的伽马探测器和其他组件包围，用于识别爆炸物或其他违禁品。

7. 发明授权

US06376978B1 Quartz antenna with hollow conductor 失效
标题翻译：带空心导体的石英天线
公开(公告)号：US06376978B1
公开(公告)日：2002-04-23
申请号：US09519139
申请日：2000-03-06
申请人： Ka-Ngo Leung , Elie Benabou
发明人： Ka-Ngo Leung , Elie Benabou
IPC分类号： B32B900
CPC分类号： H01J37/321 , H05H1/46 , Y10T428/24926 , Y10T428/31714
摘要： A radio frequency (RF) antenna for plasma ion sources is formed of a hollow metal conductor tube disposed within a glass tube. The hollow metal tubular conductor has an internal flow channel so that there will be no coolant leakage if the outer glass tube of the antenna breaks. A portion of the RF antenna is formed into a coil; the antenna is used for inductively coupling RF power to a plasma in an ion source chamber. The antenna is made by first inserting the metal tube inside the glass tube, and then forming the glass/metal composite tube into the desired coil shape.
摘要翻译：用于等离子体离子源的射频（RF）天线由设置在玻璃管内的中空金属导体管形成。中空金属管状导体具有内部流动通道，使得如果天线的外部玻璃管断裂，则不会有冷却剂泄漏。 RF天线的一部分形成线圈; 天线用于将RF功率感应耦合到离子源室中的等离子体。天线通过首先将金属管插入玻璃管内，然后将玻璃/金属复合管形成为所需的线圈形状。

8. 发明申请

US20110096885A1 PLASMA DRIVEN NEUTRON/GAMMA GENERATOR 有权
标题翻译：等离子体驱动中子/游戏发电机
公开(公告)号：US20110096885A1
公开(公告)日：2011-04-28
申请号：US12992188
申请日：2009-06-09
申请人： Ka-Ngo Leung , Arlyn Antolak
发明人： Ka-Ngo Leung , Arlyn Antolak
IPC分类号： H05H3/06
CPC分类号： H05H3/06
摘要： An apparatus for the generation of neutron/gamma rays is described including a chamber which defines an ion source, said apparatus including an RF antenna positioned outside of or within the chamber. Positioned within the chamber is a target material. One or more sets of confining magnets are also provided to create a cross B magnetic field directly above the target. To generate neutrons/gamma rays, the appropriate source gas is first introduced into the chamber, the RF antenna energized and a plasma formed. A series of high voltage pulses are then applied to the target. A plasma sheath, which serves as an accelerating gap, is formed upon application of the high voltage pulse to the target. Depending upon the selected combination of source gas and target material, either neutrons or gamma rays are generated, which may be used for cargo inspection, and the like.
摘要翻译：描述了用于产生中子/γ射线的装置，其包括限定离子源的室，所述装置包括位于室内或室内的RF天线。定位在室内是目标材料。还提供了一组或多组约束磁体以在靶上方产生交叉B磁场。为了产生中子/γ射线，首先将合适的源气体引入腔室，RF天线通电并形成等离子体。然后将一系列高电压脉冲施加到目标。用作加速间隙的等离子体护套是在向目标施加高电压脉冲时形成的。取决于所选择的源气体和目标材料的组合，产生可用于货物检查的中子或γ射线等。

9. 发明授权

US07176469B2 Negative ion source with external RF antenna 有权
标题翻译：负离子源与外部RF天线
公开(公告)号：US07176469B2
公开(公告)日：2007-02-13
申请号：US10656848
申请日：2003-09-06
申请人： Ka-Ngo Leung , Sami K. Hahto , Sari T. Hahto
发明人： Ka-Ngo Leung , Sami K. Hahto , Sari T. Hahto
IPC分类号： H01J27/00 , H01J7/24 , H05B31/26 , C23C16/00 , C23F1/00
CPC分类号： H01J27/18 , H01J2237/0815 , H05H1/46
摘要： A radio frequency (RF) driven plasma ion source has an external RF antenna, i.e. the RF antenna is positioned outside the plasma generating chamber rather than inside. The RF antenna is typically formed of a small diameter metal tube coated with an insulator. An external RF antenna assembly is used to mount the external RF antenna to the ion source. The RF antenna tubing is wound around the external RF antenna assembly to form a coil. The external RF antenna assembly is formed of a material, e.g. quartz, which is essentially transparent to the RF waves. The external RF antenna assembly is attached to and forms a part of the plasma source chamber so that the RF waves emitted by the RF antenna enter into the inside of the plasma chamber and ionize a gas contained therein. The plasma ion source is typically a multi-cusp ion source. A converter can be included in the ion source to produce negative ions.
摘要翻译：射频（RF）驱动的等离子体离子源具有外部RF天线，即RF天线位于等离子体发生室的外部而不是内部。 RF天线通常由涂覆有绝缘体的小直径金属管形成。外部RF天线组件用于将外部RF天线安装到离子源。 RF天线管缠绕在外部RF天线组件上以形成线圈。外部RF天线组件由材料形成，例如，石英，其基本上对RF波是透明的。外部RF天线组件附接并形成等离子体源室的一部分，使得由RF天线发射的RF波进入等离子体室的内部并电离其中所含的气体。等离子体离子源通常是多尖点离子源。 A转换器可以包含在离子源中以产生负离子。

10. 发明授权

US06888146B1 Maskless micro-ion-beam reduction lithography system 失效
标题翻译：无掩模微离子束还原光刻系统
公开(公告)号：US06888146B1
公开(公告)日：2005-05-03
申请号：US09289332
申请日：1999-04-09
申请人： Ka-Ngo Leung , William A. Barletta , David O. Patterson , Richard A. Gough
发明人： Ka-Ngo Leung , William A. Barletta , David O. Patterson , Richard A. Gough
IPC分类号： H01J3/18
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J2237/0435
摘要： A maskless micro-ion-beam reduction lithography system is a system for projecting patterns onto a resist layer on a wafer with feature size down to below 100 nm. The MMRL system operates without a stencil mask. The patterns are generated by switching beamlets on and off from a two electrode blanking system or pattern generator. The pattern generator controllably extracts the beamlet pattern from an ion source and is followed by a beam reduction and acceleration column.
摘要翻译：无掩模微离子束还原光刻系统是用于将图案投影到具有低于100nm的特征尺寸的晶片上的抗蚀剂层上的系统。 MMRL系统在没有模板掩模的情况下运行。通过从两个电极消隐系统或图案发生器切换小束来产生图案。图案发生器可控地从离子源提取子束图案，然后是光束减小和加速柱。

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