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1. 发明授权

US11170971B2 Multiple working distance height sensor using multiple wavelengths 有权
公开(公告)号：US11170971B2
公开(公告)日：2021-11-09
申请号：US16511197
申请日：2019-07-15
申请人： KLA—Tencor Corporation
发明人： Donald Pettibone
IPC分类号： H01J37/28 , H01J37/20 , H01J37/244 , G01N15/02 , G02B21/00
摘要： A system is disclosed. The system includes a stage assembly configured to receive a specimen and maintain a height of the specimen at a first working distance height during a first characterization mode and an additional working distance height during an additional characterization mode. The system further includes an illumination source configured to generate an illumination beam. The system further includes an illumination arm including a set of optical elements configured to direct a portion of the illumination beam including illumination of a first wavelength to the specimen during the first characterization mode, and direct a portion of the illumination beam including illumination of an additional wavelength to the specimen during the additional characterization mode. The system further includes a detector assembly configured to receive illumination emanated from the specimen, and a controller configured to determine a specimen height value based on the illumination received by the detector assembly.

2. 发明申请

US20190137411A1 Minimizing Field Size to Reduce Unwanted Stray Light 审中-公开
公开(公告)号：US20190137411A1
公开(公告)日：2019-05-09
申请号：US15828938
申请日：2017-12-01
申请人： KLA-Tencor Corporation
发明人： Donald Pettibone , Daniel Ivanov Kavaldjiev , Chuanyong Huang , Qing Li , Frank Li , Zhiwei Xu
IPC分类号： G01N21/95 , G01J1/02
摘要： Stray and air scattered light can be reduced by configuring a size of the collection area of a sensor, which reduces a source of sensitivity-limiting noise in the system. By adjusting a size of the collection area, stray deep ultraviolet light and air-scattered deep ultraviolet light can be reduced. A servo can control a position of an illumination spot that is collected by the time delay and integration sensor.

3. 发明申请

US20180292574A1 System, Method and Apparatus For Polarization Control 审中-公开
公开(公告)号：US20180292574A1
公开(公告)日：2018-10-11
申请号：US16005333
申请日：2018-06-11
申请人： KLA-Tencor Corporation
发明人： Ivan Maleev , Donald Pettibone
IPC分类号： G02B1/02 , G02B27/28 , G02B5/30 , G01N21/88 , G01N21/95
摘要： A polarization control device includes a first wave plate having a first surface profile and a second wave plate having a second surface profile complementary to the first surface profile. The optical axis of the first wave plate is orthogonal to the optical axis of the second wave plate. The first wave plate and the second wave plate are positioned to align the first surface profile with the second surface profile and maintain a constant thickness across the polarization control device. The first wave plate and the second wave plate may control polarization rotation as a continuous function of transverse position across a pupil plane of an optical system. The first wave plate and the second wave plate are separated by a sufficiently small distance so as to limit wave front distortion below a selected level.

4. 发明授权

US09995850B2 System, method and apparatus for polarization control 有权
公开(公告)号：US09995850B2
公开(公告)日：2018-06-12
申请号：US14296425
申请日：2014-06-04
申请人： KLA-Tencor Corporation
发明人： Ivan Maleev , Donald Pettibone
IPC分类号： G01N21/21 , G01N21/01 , G02B1/02 , G02B27/28 , G02B5/30 , G01N21/88 , G01N21/95
CPC分类号： G02B1/02 , G01N21/8806 , G01N21/9501 , G01N2021/8848 , G02B5/3083 , G02B27/286
摘要： A polarization control device includes a first wave plate having a first surface profile and a second wave plate having a second surface profile complementary to the first surface profile. The optical axis of the first wave plate is orthogonal to the optical axis of the second wave plate. The first wave plate and the second wave plate are positioned to align the first surface profile with the second surface profile and maintain a constant thickness across the polarization control device. The first wave plate and the second wave plate may control polarization rotation as a continuous function of transverse position across a pupil plane of an optical system. The first wave plate and the second wave plate are separated by a sufficiently small distance so as to limit wave front distortion below a selected level.

5. 发明授权

US09891177B2 TDI sensor in a darkfield system 有权
公开(公告)号：US09891177B2
公开(公告)日：2018-02-13
申请号：US14506321
申请日：2014-10-03
申请人： KLA-Tencor Corporation
发明人： Jijen Vazhaeparambil , Guoheng Zhao , Daniel Kavaldjiev , Anatoly Romanovsky , Ivan Maleev , Christian Wolters , Stephen Biellak , Bret Whiteside , Donald Pettibone , Yung-Ho Alex Chuang , David W. Shortt
IPC分类号： G01N21/88 , G01N21/95 , G06T7/00 , G01N21/956
CPC分类号： G01N21/8851 , G01N21/9501 , G01N21/956 , G01N2021/8887 , G01N2021/8896 , G01N2201/06113 , G01N2201/103 , G01N2201/12 , G06T7/0004 , G06T2207/10004 , G06T2207/30148
摘要： A wafer scanning system includes imaging collection optics to reduce the effective spot size. Smaller spot size decreases the number of photons scattered by the surface proportionally to the area of the spot. Air scatter is also reduced. TDI is used to produce a wafer image based on a plurality of image signals integrated over the direction of linear motion of the wafer. An illumination system floods the wafer with light, and the task of creating the spot is allocated to the imaging collection optics.

6. 发明申请

US20160097727A1 TDI Sensor in a Darkfield System 有权
标题翻译： TDI传感器在暗场系统
公开(公告)号：US20160097727A1
公开(公告)日：2016-04-07
申请号：US14506321
申请日：2014-10-03
申请人： KLA-Tencor Corporation
发明人： Jijen Vazhaeparambil , Guoheng Zhao , Daniel Kavaldjiev , Anatoly Romanovsky , Ivan Maleev , Christian Wolters , Stephen Biellak , Bret Whiteside , Donald Pettibone , Yung-Ho Alex Chuang , David W. Shortt
IPC分类号： G01N21/88 , G06T7/00 , G01N21/95
CPC分类号： G01N21/8851 , G01N21/9501 , G01N21/956 , G01N2021/8887 , G01N2021/8896 , G01N2201/06113 , G01N2201/103 , G01N2201/12 , G06T7/0004 , G06T2207/10004 , G06T2207/30148
摘要： A wafer scanning system includes imaging collection optics to reduce the effective spot size. Smaller spot size decreases the number of photons scattered by the surface proportionally to the area of the spot. Air scatter is also reduced. TDI is used to produce a wafer image based on a plurality of image signals integrated over the direction of linear motion of the wafer. An illumination system floods the wafer with light, and the task of creating the spot is allocated to the imaging collection optics.
摘要翻译：晶片扫描系统包括成像采集光学器件以减少有效光斑尺寸。较小的斑点尺寸使得表面散射的光子数量与斑点的面积成比例地减小。空气散射也减少。 TDI用于基于在晶片的线性运动方向上积分的多个图像信号产生晶片图像。照明系统用光淹没晶片，创建光斑的任务被分配给成像采集光学元件。

7. 发明授权

US10921488B2 System, method and apparatus for polarization control 有权
公开(公告)号：US10921488B2
公开(公告)日：2021-02-16
申请号：US16005333
申请日：2018-06-11
申请人： KLA-Tencor Corporation
发明人： Ivan Maleev , Donald Pettibone
IPC分类号： G02B1/02 , G01N21/88 , G01N21/95 , G02B27/28 , G02B5/30
摘要： A polarization control device includes a first wave plate having a first surface profile and a second wave plate having a second surface profile complementary to the first surface profile. The optical axis of the first wave plate is orthogonal to the optical axis of the second wave plate. The first wave plate and the second wave plate are positioned to align the first surface profile with the second surface profile and maintain a constant thickness across the polarization control device. The first wave plate and the second wave plate may control polarization rotation as a continuous function of transverse position across a pupil plane of an optical system. The first wave plate and the second wave plate are separated by a sufficiently small distance so as to limit wave front distortion below a selected level.

8. 发明授权

US10739276B2 Minimizing filed size to reduce unwanted stray light 有权
公开(公告)号：US10739276B2
公开(公告)日：2020-08-11
申请号：US15828938
申请日：2017-12-01
申请人： KLA-Tencor Corporation
发明人： Donald Pettibone , Daniel Ivanov Kavaldjiev , Chuanyong Huang , Qing Li , Frank Li , Zhiwei Xu
IPC分类号： G01N21/95 , G01J1/02 , G01J1/04 , G01J1/42
摘要： Stray and air scattered light can be reduced by configuring a size of the collection area of a sensor, which reduces a source of sensitivity-limiting noise in the system. By adjusting a size of the collection area, stray deep ultraviolet light and air-scattered deep ultraviolet light can be reduced. A servo can control a position of an illumination spot that is collected by the time delay and integration sensor.

9. 发明授权

US09970873B1 System and method for luminescent tag based wafer inspection 有权
公开(公告)号：US09970873B1
公开(公告)日：2018-05-15
申请号：US14939959
申请日：2015-11-12
申请人： KLA-Tencor Corporation
发明人： Donald Pettibone , Chuanyong Huang , Kurt Haller
IPC分类号： G01N21/00 , G01N21/64 , G01N21/95
CPC分类号： G01N21/643 , G01N21/9501 , G01N2021/6439
摘要： A luminescent tag based defect detection system comprises a luminescent tag attachment assembly, an illumination source, one or more detectors, and a set of optical elements. The luminescent tag attachment assembly exposes a sample to one or more luminescent tag materials selectively attached to one or more defects on the sample. The illumination source generates illumination including one or more wavelengths corresponding to the one or more absorption spectra associated with the one or more luminescent tags. At least a portion of the set of optical elements directs illumination from the illumination source to the sample, and at least a portion of the set of optical elements directs illumination emitted from the one or more luminescent tag materials to the one or more detectors. A luminescent tag based defect detection system may also include a luminescent tag removal assembly to remove the luminescent tags after detection.

10. 发明申请

US20160025645A1 System and Method for Simultaneous Dark Field and Phase Contrast Inspection 有权
标题翻译：同时进行暗场和相位对比检测的系统和方法
公开(公告)号：US20160025645A1
公开(公告)日：2016-01-28
申请号：US14804296
申请日：2015-07-20
申请人： KLA-Tencor Corporation
发明人： Chuanyong Huang , Qing Li , Donald Pettibone , Buzz Graves
IPC分类号： G01N21/88 , G01N21/95
CPC分类号： G01N21/8806 , G01N21/9501 , G01N2021/8825
摘要： An inspection apparatus for simultaneous dark field (DF) and differential interference contrast (DIC) inspection includes an illumination source and a sample stage configured to secure a sample. The inspection apparatus includes a first sensor, a second sensor and an optical sub-system. The optical sub-system includes an objective, one or more optical elements arranged to direct, through the objective, illumination from the one or more illumination sources to a surface of the sample. The objective is configured to collect a signal from the surface of the sample, wherein the collected signal includes a scattering-based signal and/or a phase-based signal from the sample. The inspection apparatus includes one or more separation optical elements arranged to spatially separate the collected signal into a DF signal and a DIC signal by directing the DF signal and the DIC signal along a DF path and DIC path respectively.
摘要翻译：用于同时暗场（DF）和差分干涉对比（DIC）检查的检查装置包括照明源和被配置为固定样品的样品台。检查装置包括第一传感器，第二传感器和光子系统。光学子系统包括物镜，一个或多个光学元件，被布置成通过物镜引导从一个或多个照明源到样品表面的照明。该目的被配置为从样品的表面收集信号，其中所收集的信号包括来自样品的基于散射的信号和/或基于相位的信号。检查装置包括一个或多个分离光学元件，其被布置为通过分别沿DF路径和DIC路径引导DF信号和DIC信号来将收集的信号空间分离成DF信号和DIC信号。

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