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    • 8. 发明申请
    • COPPER ETCHING METHOD FOR MANUFACTURING CIRCUIT BOARD
    • 用于制造电路板的铜蚀刻方法
    • US20160262269A1
    • 2016-09-08
    • US14640993
    • 2015-03-06
    • KINSUS INTERCONNECT TECHNOLOGY CORP.
    • Ting-Hao LinChiao-Cheng ChangYi-Nong Lin
    • H05K3/18H05K3/06
    • H05K3/205H05K2201/0376H05K2203/0376
    • Disclosed is a copper etching method for manufacturing a circuit board, including steps of electroplating a metal copper support layer, coating a thermal sensitive photo resist layer, coating a photo resist layer, performing a process of pattern transfer, removing part of the photo resist layer to form a photo resist pattern, electroplating a metal copper layer to form a circuit pattern, peeling off the photo resist layer, pressing a stacked body composed of a stacked substrate and a stacked material layer onto the circuit pattern to embed the circuit pattern in the stacked material layer, removing the base layer, performing a copper etching process to removing the metal copper support layer, and removing the thermal sensitive photo resist layer to expose the circuit pattern. In particular, the circuit pattern protrudes from the stacked material layer so as to facilitate the subsequent process of forming solder balls.
    • 公开了一种用于制造电路板的铜蚀刻方法,包括以下步骤:电镀金属铜支撑层,涂覆热敏光致抗蚀剂层,涂覆光致抗蚀剂层,执行图案转印工艺,去除部分光致抗蚀剂层 以形成光刻胶图形,电镀金属铜层以形成电路图案,剥离光致抗蚀剂层,将由堆叠的基板和堆叠的材料层组成的堆叠体压在电路图案上,以将电路图案嵌入到 层叠材料层,去除基底层,进行铜蚀刻工艺以除去金属铜载体层,以及去除热敏光刻胶层以暴露电路图案。 特别地,电路图案从堆叠的材料层突出,以便于随后的形成焊球的工艺。