专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20130168214A1 THIN PROFILE KEYBOARD 审中-公开
标题翻译：薄型键盘
公开(公告)号：US20130168214A1
公开(公告)日：2013-07-04
申请号：US13340421
申请日：2011-12-29
申请人： KE-JIAN LIOU , Shuo-Hung Chang
发明人： KE-JIAN LIOU , Shuo-Hung Chang
IPC分类号： H01H13/76
CPC分类号： H01H13/705 , H01H2221/044 , H01H2223/022 , H01H2229/028 , H01H2229/034 , H01H2233/032
摘要： A thin profile keyboard is provided with a monoblock having a plurality of rectangular openings arranged in rows, and a plurality of bottom grooves; a plurality of keys each including a rectangular frame movably disposed in the opening of the monoblock, and two lever arms extending from both ends of a forward edge of frame, each lever arm filled in the bottom groove; a printed circuit board (PCB) disposed below the keys and the monoblock; and a base disposed below the PCB. The base, the monoblock, and the PCB are assembled.
摘要翻译：薄型键盘设置有具有排列成行的多个矩形开口的单块和多个底槽; 多个键，每个键包括可移动地设置在整体的开口中的矩形框架，以及从框架的前边缘的两端延伸的两个杠杆臂，每个杠杆臂填充在底部槽中; 设置在键和整体下方的印刷电路板（PCB）; 以及设置在PCB下方的基座。基座，整体和PCB组装在一起。

2. 发明授权

US08791395B2 Nanotube heating device comprising carbon nanotube and manufacturing method thereof 有权
标题翻译：包含碳纳米管的纳米管加热装置及其制造方法
公开(公告)号：US08791395B2
公开(公告)日：2014-07-29
申请号：US13440949
申请日：2012-04-05
申请人： Shuo-Hung Chang , Chih-Chung Su
发明人： Shuo-Hung Chang , Chih-Chung Su
IPC分类号： H05B3/02 , H05B3/22 , H05B3/34 , B05D5/12 , B82Y30/00 , B82Y40/00
CPC分类号： H05B3/22 , B82Y30/00 , B82Y40/00 , H05B3/34 , H05B2214/04 , Y10S977/843
摘要： An embodiment of the present disclosure relates to a heating device comprising a carbon nanotube, which comprises a carbon nanotube layer containing aligned carbon nanotube carpet, a first electrode and a second electrode having a predetermined distance between each other and electrically connected to the carbon nanotube layer respectively, wherein a current produced by applying a voltage to the first electrode passes laterally via the diameter direction of the aligned carbon nanotubes from the first electrode to the second electrode. The present disclosure also includes methods for manufacturing the aligned carbon nanotube carpet.
摘要翻译：本公开的一个实施方案涉及一种加热装置，其包括碳纳米管，其包含含有排列的碳纳米管毡的碳纳米管层，第一电极和彼此之间具有预定距离并与碳纳米管层电连接的第二电极其中通过向所述第一电极施加电压而产生的电流经由所述排列的碳纳米管的直径方向从所述第一电极横向经过所述第二电极。本公开还包括用于制造对准的碳纳米管毡的方法。

3. 发明申请

US20130075386A1 NANOTUBE HEATING DEVICE COMPRISING CARBON NANOTUBE AND MANUFACTURING METHOD THEREOF 有权
标题翻译：包含碳纳米管的纳米管加热装置及其制造方法
公开(公告)号：US20130075386A1
公开(公告)日：2013-03-28
申请号：US13440949
申请日：2012-04-05
申请人： Shuo-Hung Chang , Chih-Chung Su
发明人： Shuo-Hung Chang , Chih-Chung Su
IPC分类号： H05B3/02 , B05D5/12 , B82Y99/00 , B82Y40/00
CPC分类号： H05B3/22 , B82Y30/00 , B82Y40/00 , H05B3/34 , H05B2214/04 , Y10S977/843
摘要： An embodiment of the present disclosure relates to a heating device comprising a carbon nanotube, which comprises a carbon nanotube layer containing aligned carbon nanotube carpet, a first electrode and a second electrode having a predetermined distance between each other and electrically connected to the carbon nanotube layer respectively, wherein a current produced by applying a voltage to the first electrode passes laterally via the diameter direction of the aligned carbon nanotubes from the first electrode to the second electrode. The present disclosure also includes methods for manufacturing the aligned carbon nanotube carpet.
摘要翻译：本公开的一个实施方案涉及一种加热装置，其包括碳纳米管，其包含含有排列的碳纳米管毡的碳纳米管层，第一电极和彼此之间具有预定距离并与碳纳米管层电连接的第二电极其中通过向所述第一电极施加电压而产生的电流经由所述排列的碳纳米管的直径方向从所述第一电极横向经过所述第二电极。本公开还包括用于制造对准的碳纳米管毡的方法。

4. 发明申请

US20110064873A1 METHOD FOR PRODUCING CARBON NANOCOILS 有权
标题翻译：生产碳纳米管的方法
公开(公告)号：US20110064873A1
公开(公告)日：2011-03-17
申请号：US12948080
申请日：2010-11-17
申请人： Shuo-Hung Chang , Bing-Chen Wei , Neng-Kai Chang
发明人： Shuo-Hung Chang , Bing-Chen Wei , Neng-Kai Chang
IPC分类号： B05D3/02 , C23C14/34
CPC分类号： B82Y40/00 , B01J23/835 , B01J37/0219 , B01J37/088 , B01J37/14 , B82Y30/00 , C01B32/05 , C01B32/18 , Y10S977/843
摘要： The present invention discloses a method for producing carbon nanocoils, which comprises: providing a metal substrate; depositing a tin precursor on the substrate; heating the substrate with the precursor to a predetermined temperature to form a catalyst on the substrate; placing the substrate in a quartz tube furnace; and introducing carbon source gas and protective gas into the quartz tube furnace to allow carbon nanocoils to grow on the surface of the catalyst. Another method for producing carbon nanocoils is also disclosed, which includes: depositing a mixed solution of iron acetate and tin acetate on a substrate; heating the substrate with the mixing solution to a predetermined temperature to form a catalyst on the substrate; placing the substrate in a quartz tube furnace; and introducing carbon source gas and protective gas into the quartz tube furnace to allow carbon nanocoils to grow on the surface of the catalyst.
摘要翻译：本发明公开了一种生产碳纳米线的方法，包括：提供金属基材; 在基板上沉积锡前体; 用前体将衬底加热至预定温度以在衬底上形成催化剂; 将基板置于石英管炉中; 并将碳源气体和保护气体引入石英管炉中，以使碳纳米线在催化剂表面生长。还公开了生产碳纳米薄膜的另一种方法，其包括：在基材上沉积乙酸铁和乙酸锡的混合溶液; 用混合溶液将衬底加热至预定温度，以在衬底上形成催化剂; 将基板放置在石英管炉中; 并将碳源气体和保护气体引入石英管炉中，以使碳纳米线在催化剂表面生长。

5. 发明授权

US08475761B2 Method for producing carbon nanocoils 有权
公开(公告)号：US08475761B2
公开(公告)日：2013-07-02
申请号：US12948080
申请日：2010-11-17
申请人： Shuo-Hung Chang , Bing-Chen Wei , Neng-Kai Chang
发明人： Shuo-Hung Chang , Bing-Chen Wei , Neng-Kai Chang
IPC分类号： D01C5/00
CPC分类号： B82Y40/00 , B01J23/835 , B01J37/0219 , B01J37/088 , B01J37/14 , B82Y30/00 , C01B32/05 , C01B32/18 , Y10S977/843
摘要： The present invention discloses a method for producing carbon nanocoils, which comprises: providing a metal substrate; depositing a tin precursor on the substrate; heating the substrate with the precursor to a predetermined temperature to form a catalyst on the substrate; placing the substrate in a quartz tube furnace; and introducing carbon source gas and protective gas into the quartz tube furnace to allow carbon nanocoils to grow on the surface of the catalyst. Another method for producing carbon nanocoils is also disclosed, which includes: depositing a mixed solution of iron acetate and tin acetate on a substrate; heating the substrate with the mixing solution to a predetermined temperature to form a catalyst on the substrate; placing the substrate in a quartz tube furnace; and introducing carbon source gas and protective gas into the quartz tube furnace to allow carbon nanocoils to grow on the surface of the catalyst.

6. 发明申请

US20090169464A1 Method for producing carbon nanocoils 有权
标题翻译：生产碳纳米线的方法
公开(公告)号：US20090169464A1
公开(公告)日：2009-07-02
申请号：US12155036
申请日：2008-05-29
申请人： Shuo-Hung Chang , Bing-Chen Wei , Neng-Kai Chang
发明人： Shuo-Hung Chang , Bing-Chen Wei , Neng-Kai Chang
IPC分类号： C01B31/02
CPC分类号： B82Y40/00 , B01J23/835 , B01J37/0219 , B01J37/088 , B01J37/14 , B82Y30/00 , C01B32/05 , C01B32/18 , Y10S977/843
摘要： The present invention discloses a method for producing carbon nanocoils, which comprises: providing a metal substrate; depositing a tin precursor on the substrate; heating the substrate with the precursor to a predetermined temperature to form a catalyst on the substrate; placing the substrate in a quartz tube furnace; and introducing carbon source gas and protective gas into the quartz tube furnace to allow carbon nanocoils to grow on the surface of the catalyst. Another method for producing carbon nanocoils is also disclosed, which includes: depositing a mixed solution of iron acetate and tin acetate on a substrate; heating the substrate with the mixing solution to a predetermined temperature to form a catalyst on the substrate; placing the substrate in a quartz tube furnace; and introducing carbon source gas and protective gas into the quartz tube furnace to allow carbon nanocoils to grow on the surface of the catalyst.
摘要翻译：本发明公开了一种生产碳纳米线的方法，包括：提供金属基材; 在基板上沉积锡前体; 用前体将衬底加热至预定温度以在衬底上形成催化剂; 将基板放置在石英管炉中; 并将碳源气体和保护气体引入石英管炉中，以使碳纳米线在催化剂表面生长。还公开了生产碳纳米薄膜的另一种方法，其包括：在基材上沉积乙酸铁和乙酸锡的混合溶液; 用混合溶液将衬底加热至预定温度，以在衬底上形成催化剂; 将基板放置在石英管炉中; 并将碳源气体和保护气体引入石英管炉中，以使碳纳米线在催化剂表面生长。

7. 发明授权

US08420305B2 Method and apparatus for generating periodic patterns by step-and-align interference lithography 有权
标题翻译：用于通过步进和对准干涉光刻产生周期性图案的方法和装置
公开(公告)号：US08420305B2
公开(公告)日：2013-04-16
申请号：US12774556
申请日：2010-05-05
申请人： Lon Wang , Yung-Pin Chen , Chih-Sheng Jao , Shuo-Hung Chang , Jer-Haur Chang
发明人： Lon Wang , Yung-Pin Chen , Chih-Sheng Jao , Shuo-Hung Chang , Jer-Haur Chang
IPC分类号： G03C5/06
CPC分类号： G03F7/70408
摘要： The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.
摘要翻译：本发明提供了一种用于通过逐步对准干涉光刻产生周期性图案的方法和装置，其中至少两个具有图案的相干光束被控制以投射到待暴露的基板上以形成干涉图案区域底物。此后，通过逐步移动基板或光束，可以在基板上形成具有大面积的图案化区域。根据本发明，可以缩短光路和曝光时间，以减少光刻处理期间的缺陷形成并提高产量。

8. 发明申请

US20100216075A1 METHOD AND APPARATUS FOR GENERATING PERIODIC PATTERNS BY STEP-AND-ALIGN INTERFERENCE LITHOGRAPHY 有权
标题翻译：用于通过步进和对齐干涉计算产生周期性图案的方法和装置
公开(公告)号：US20100216075A1
公开(公告)日：2010-08-26
申请号：US12774556
申请日：2010-05-05
申请人： Lon WANG , Yung-Pin Chen , Chih-Sheng Jao , Shuo-Hung Chang , Jer-Haur Chang
发明人： Lon WANG , Yung-Pin Chen , Chih-Sheng Jao , Shuo-Hung Chang , Jer-Haur Chang
IPC分类号： G03F7/20
CPC分类号： G03F7/70408
摘要： The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.
摘要翻译：本发明提供了一种用于通过逐步对准干涉光刻产生周期性图案的方法和装置，其中至少两个具有图案的相干光束被控制以投射到待暴露的基板上以形成干涉图案区域底物。此后，通过逐步移动基板或光束，可以在基板上形成具有大面积的图案化区域。根据本发明，可以缩短光路和曝光时间，以减少光刻处理期间的缺陷形成并提高产量。

9. 发明申请

US20080311531A1 Method and apparatus for generating periodic patterns by step-and-align interference lithography 有权
标题翻译：用于通过步进和对准干涉光刻产生周期性图案的方法和装置
公开(公告)号：US20080311531A1
公开(公告)日：2008-12-18
申请号：US11979896
申请日：2007-11-09
申请人： Lon Wang , Yung-Pin Chen , Chih-Sheng Jao , Shuo-Hung Chang , Jer-Haur Chang
发明人： Lon Wang , Yung-Pin Chen , Chih-Sheng Jao , Shuo-Hung Chang , Jer-Haur Chang
IPC分类号： G03F7/22 , G03B27/42
CPC分类号： G03F7/70408
摘要： The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.
摘要翻译：本发明提供了一种用于通过逐步对准干涉光刻产生周期性图案的方法和装置，其中至少两个具有图案的相干光束被控制以投射到待暴露的基板上以形成干涉图案区域底物。此后，通过逐步移动基板或光束，可以在基板上形成具有大面积的图案化区域。根据本发明，可以缩短光路和曝光时间，以减少光刻处理期间的缺陷形成并提高产量。

10. 发明授权

US08233136B2 Method and apparatus for generating periodic patterns by step-and-align interference lithography 有权
标题翻译：用于通过步进和对准干涉光刻产生周期性图案的方法和装置
公开(公告)号：US08233136B2
公开(公告)日：2012-07-31
申请号：US11979896
申请日：2007-11-09
申请人： Lon Wang , Yung-Pin Chen , Chih-Sheng Jao , Shuo-Hung Chang , Jer-Haur Chang
发明人： Lon Wang , Yung-Pin Chen , Chih-Sheng Jao , Shuo-Hung Chang , Jer-Haur Chang
IPC分类号： G03B27/44
CPC分类号： G03F7/70408
摘要： The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.
摘要翻译：本发明提供了一种用于通过逐步对准干涉光刻产生周期性图案的方法和装置，其中至少两个具有图案的相干光束被控制以投射到待暴露的基板上以形成干涉图案区域底物。此后，通过逐步移动基板或光束，可以在基板上形成具有大面积的图案化区域。根据本发明，可以缩短光路和曝光时间，以减少光刻处理期间的缺陷形成并提高产量。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式