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1. 发明授权

US08420305B2 Method and apparatus for generating periodic patterns by step-and-align interference lithography 有权
标题翻译：用于通过步进和对准干涉光刻产生周期性图案的方法和装置
公开(公告)号：US08420305B2
公开(公告)日：2013-04-16
申请号：US12774556
申请日：2010-05-05
申请人： Lon Wang , Yung-Pin Chen , Chih-Sheng Jao , Shuo-Hung Chang , Jer-Haur Chang
发明人： Lon Wang , Yung-Pin Chen , Chih-Sheng Jao , Shuo-Hung Chang , Jer-Haur Chang
IPC分类号： G03C5/06
CPC分类号： G03F7/70408
摘要： The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.
摘要翻译：本发明提供了一种用于通过逐步对准干涉光刻产生周期性图案的方法和装置，其中至少两个具有图案的相干光束被控制以投射到待暴露的基板上以形成干涉图案区域底物。此后，通过逐步移动基板或光束，可以在基板上形成具有大面积的图案化区域。根据本发明，可以缩短光路和曝光时间，以减少光刻处理期间的缺陷形成并提高产量。

2. 发明申请

US20100216075A1 METHOD AND APPARATUS FOR GENERATING PERIODIC PATTERNS BY STEP-AND-ALIGN INTERFERENCE LITHOGRAPHY 有权
标题翻译：用于通过步进和对齐干涉计算产生周期性图案的方法和装置
公开(公告)号：US20100216075A1
公开(公告)日：2010-08-26
申请号：US12774556
申请日：2010-05-05
申请人： Lon WANG , Yung-Pin Chen , Chih-Sheng Jao , Shuo-Hung Chang , Jer-Haur Chang
发明人： Lon WANG , Yung-Pin Chen , Chih-Sheng Jao , Shuo-Hung Chang , Jer-Haur Chang
IPC分类号： G03F7/20
CPC分类号： G03F7/70408
摘要： The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.
摘要翻译：本发明提供了一种用于通过逐步对准干涉光刻产生周期性图案的方法和装置，其中至少两个具有图案的相干光束被控制以投射到待暴露的基板上以形成干涉图案区域底物。此后，通过逐步移动基板或光束，可以在基板上形成具有大面积的图案化区域。根据本发明，可以缩短光路和曝光时间，以减少光刻处理期间的缺陷形成并提高产量。

3. 发明申请

US20080311531A1 Method and apparatus for generating periodic patterns by step-and-align interference lithography 有权
标题翻译：用于通过步进和对准干涉光刻产生周期性图案的方法和装置
公开(公告)号：US20080311531A1
公开(公告)日：2008-12-18
申请号：US11979896
申请日：2007-11-09
申请人： Lon Wang , Yung-Pin Chen , Chih-Sheng Jao , Shuo-Hung Chang , Jer-Haur Chang
发明人： Lon Wang , Yung-Pin Chen , Chih-Sheng Jao , Shuo-Hung Chang , Jer-Haur Chang
IPC分类号： G03F7/22 , G03B27/42
CPC分类号： G03F7/70408
摘要： The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.
摘要翻译：本发明提供了一种用于通过逐步对准干涉光刻产生周期性图案的方法和装置，其中至少两个具有图案的相干光束被控制以投射到待暴露的基板上以形成干涉图案区域底物。此后，通过逐步移动基板或光束，可以在基板上形成具有大面积的图案化区域。根据本发明，可以缩短光路和曝光时间，以减少光刻处理期间的缺陷形成并提高产量。

4. 发明授权

US08233136B2 Method and apparatus for generating periodic patterns by step-and-align interference lithography 有权
标题翻译：用于通过步进和对准干涉光刻产生周期性图案的方法和装置
公开(公告)号：US08233136B2
公开(公告)日：2012-07-31
申请号：US11979896
申请日：2007-11-09
申请人： Lon Wang , Yung-Pin Chen , Chih-Sheng Jao , Shuo-Hung Chang , Jer-Haur Chang
发明人： Lon Wang , Yung-Pin Chen , Chih-Sheng Jao , Shuo-Hung Chang , Jer-Haur Chang
IPC分类号： G03B27/44
CPC分类号： G03F7/70408
摘要： The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.
摘要翻译：本发明提供了一种用于通过逐步对准干涉光刻产生周期性图案的方法和装置，其中至少两个具有图案的相干光束被控制以投射到待暴露的基板上以形成干涉图案区域底物。此后，通过逐步移动基板或光束，可以在基板上形成具有大面积的图案化区域。根据本发明，可以缩短光路和曝光时间，以减少光刻处理期间的缺陷形成并提高产量。

5. 发明申请

US20100135043A1 COMPOSITE LIGHT GUIDING CURVED SURFACE STRUCTURE 审中-公开
标题翻译：复合光指示曲面结构
公开(公告)号：US20100135043A1
公开(公告)日：2010-06-03
申请号：US12578712
申请日：2009-10-14
申请人： LON WANG , CHIH-SHENG JAO , JER-HAUR CHANG , YUNG-PIN CHEN , HSIN-CHIEH CHIU
发明人： LON WANG , CHIH-SHENG JAO , JER-HAUR CHANG , YUNG-PIN CHEN , HSIN-CHIEH CHIU
IPC分类号： F21V8/00 , F21V5/04
CPC分类号： G02B6/002 , G02B6/0016 , G02B6/0025 , G02F1/133603 , G02F2001/133607
摘要： The present invention provides a composite light guiding curved surface structure, comprising a structure body and at least one light source. The structure body comprises a light-receiving surface being provided with a plurality of curved surfaces formed thereon, each of which being provided with a plurality of micro lenses. Each micro lens is further provided with a plurality of sub-wavelength anti-reflecting structures. The sub-wavelength anti-reflecting structures also cover the entire curved surface among lenses. At least one light source is disposed on one side of the light-receiving surface to generate a light field projecting to each of the curved surfaces on the light-receiving surface. In the present invention, the micro lens is capable of increasing the diffusing angle for light diffusion; meanwhile, the sub-wavelength anti-reflecting structures are capable of increasing the light transmission efficiency to reduce loss of light at the interface and enhance the utilization of light.
摘要翻译：本发明提供了一种复合导光曲面结构，包括结构体和至少一个光源。该结构体包括光接收表面，该光接收表面设置有形成在其上的多个弯曲表面，每个弯曲表面设置有多个微透镜。每个微透镜还设置有多个亚波长抗反射结构。亚波长抗反射结构还覆盖透镜之间的整个弯曲表面。至少一个光源设置在光接收表面的一侧上，以产生向光接收表面上的每个弯曲表面突出的光场。在本发明中，微透镜能够增加光扩散的扩散角; 同时，亚波长抗反射结构能够提高光传输效率，以减少界面处的光损耗并增强光的利用。

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