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1. 发明授权

US08486606B2 Acrylate derivative, haloester derivative, polymer compound and photoresist composition 有权
标题翻译：丙烯酸酯衍生物，卤代酯衍生物，高分子化合物和光致抗蚀剂组合物
公开(公告)号：US08486606B2
公开(公告)日：2013-07-16
申请号：US13001738
申请日：2009-06-30
申请人： Junko Sato , Osamu Nakayama , Takashi Fukumoto
发明人： Junko Sato , Osamu Nakayama , Takashi Fukumoto
IPC分类号： G03F7/039 , C07D327/04 , C07D497/08 , C08F20/38
CPC分类号： C07D327/04 , C07D497/18 , C08F220/38 , G03F7/0045 , G03F7/0397 , G03F7/085
摘要： An acrylate derivative represented by the following general formula (1): (in the formula, R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group; each of R2, R3, R5, R7, R8, R9 and R10 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkoxy group; each of R4 and R6 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkoxy group, or R4 and R6 are bonded to each other to represent an alkylene group, —O— or —S—; n represents 0, 1 or 2; and W represents an alkylene group or a cycloalkylene group); an intermediate thereof; a method for producing the same; a polymer compound which is obtainable from polymerization of a raw material containing the foregoing acrylate derivative and which is excellent in solubility in an organic solvent used for the preparation of a photoresist composition; and a photoresist composition containing the polymer compound, an organic solvent and a photo acid generator and having excellent adhesion to substrate and less pattern collapse, are provided.
摘要翻译：由以下通式（1）表示的丙烯酸酯衍生物：（式中，R1表示氢原子，甲基或三氟甲基; R2，R3，R5，R7，R8，R9和R10各自独立地表示氢原子，烷基，环烷基或烷氧基; R 4和R 6各自独立地表示氢原子，烷基，环烷基或烷氧基，或者R 4和R 6相互键合，表示亚烷基，-O-或-S-; n表示0,1或2; W表示亚烷基或亚环烷基）。其中间体; 其制造方法; 可从含有上述丙烯酸酯衍生物的原料的聚合得到的聚合物化合物，其在用于制备光致抗蚀剂组合物的有机溶剂中的溶解性优异; 并且提供了含有高分子化合物，有机溶剂和光酸产生剂并且对基材具有优异粘附性和较少图案折叠的光致抗蚀剂组合物。

2. 发明申请

US20100331508A1 (METH)ACRYLATE DERIVATIVE, INTERMEDIATE THEREOF, AND POLYMER COMPOUND 有权
标题翻译：（METH）丙烯酸酯衍生物，其中间体和聚合物化合物
公开(公告)号：US20100331508A1
公开(公告)日：2010-12-30
申请号：US12918675
申请日：2009-02-20
申请人： Junko Sato , Osamu Nakayama , Takashi Fukumoto
发明人： Junko Sato , Osamu Nakayama , Takashi Fukumoto
IPC分类号： C08F228/06 , C07D339/08 , C07D327/06 , C07D319/12 , C07D339/00 , C07D327/00 , C07D323/00 , C08F224/00
CPC分类号： C07D327/06 , C07D339/08 , C08F220/28 , C08F220/38 , G03F7/0395 , G03F7/0397 , C08F220/18 , C08F222/06 , C08F232/08
摘要： Provided are a polymerizable compound shown below which is useful as a raw material for a polymer having less swelling in developing, a polymer obtained by polymerizing a raw material containing the above polymerizable compound, a photoresist composition which contains the above polymer and which is improved in LWR and an efficient production process for the polymerizable compound described above: wherein n represents an integer of 0 to 2; R1 represents a hydrogen atom, methyl or trifluoromethyl; R2, R3, R4, R5, R6, R7, R8, R9 and R10 represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or the like; W represents an alkylene group having 1 to 10 carbon atoms or the like; and Y1 and Y2 represent an oxygen atom or a sulfur atom.
摘要翻译：提供下述可聚合化合物，其可用作显影时溶胀较小的聚合物的原料，通过聚合含有上述可聚合化合物的原料获得的聚合物，含有上述聚合物的光致抗蚀剂组合物， LWR和上述可聚合化合物的有效制备方法：其中n表示0至2的整数; R1表示氢原子，甲基或三氟甲基; R 2，R 3，R 4，R 5，R 6，R 7，R 8，R 9和R 10表示氢原子，碳原子数1〜6的烷基等; W表示碳原子数1〜10的亚烷基等; Y 1和Y 2表示氧原子或硫原子。

3. 发明授权

US08492562B2 (Meth)acrylate derivative, intermediate thereof, and polymer compound 有权
标题翻译：（甲基）丙烯酸酯衍生物，其中间体和高分子化合物
公开(公告)号：US08492562B2
公开(公告)日：2013-07-23
申请号：US12918675
申请日：2009-02-20
申请人： Junko Sato , Osamu Nakayama , Takashi Fukumoto
发明人： Junko Sato , Osamu Nakayama , Takashi Fukumoto
IPC分类号： C07D327/06 , C07D497/00 , C07D327/02 , C07D339/08 , C07D339/00 , C07D321/02 , C07D321/12 , C07D319/06
CPC分类号： C07D327/06 , C07D339/08 , C08F220/28 , C08F220/38 , G03F7/0395 , G03F7/0397 , C08F220/18 , C08F222/06 , C08F232/08
摘要： Provided are a polymerizable compound shown below which is useful as a raw material for a polymer having less swelling in developing, a polymer obtained by polymerizing a raw material containing the above polymerizable compound, a photoresist composition which contains the above polymer and which is improved in LWR and an efficient production process for the polymerizable compound described above: wherein n represents an integer of 0 to 2; R1 represents a hydrogen atom, methyl or trifluoromethyl; R2, R3, R4, R5, R6, R7, R8, R9 and R10 represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or the like; W represents an alkylene group having 1 to 10 carbon atoms or the like; and Y1 and Y2 represent an oxygen atom or a sulfur atom.
摘要翻译：提供下述可聚合化合物，其可用作显影时溶胀较小的聚合物的原料，通过聚合含有上述可聚合化合物的原料获得的聚合物，含有上述聚合物的光致抗蚀剂组合物， LWR和上述可聚合化合物的有效制备方法：其中n表示0至2的整数; R1表示氢原子，甲基或三氟甲基; R 2，R 3，R 4，R 5，R 6，R 7，R 8，R 9和R 10表示氢原子，碳原子数1〜6的烷基等; W表示碳原子数1〜10的亚烷基等; Y 1和Y 2表示氧原子或硫原子。

4. 发明申请

US20110117497A1 ACRYLATE DERIVATIVE, HALOESTER DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION 有权
标题翻译：丙烯酸衍生物，阴离子衍生物，聚合物化合物和光电组合物
公开(公告)号：US20110117497A1
公开(公告)日：2011-05-19
申请号：US13001738
申请日：2009-06-30
申请人： Junko Sato , Osamu Nakayama , Takashi Fukumoto
发明人： Junko Sato , Osamu Nakayama , Takashi Fukumoto
IPC分类号： G03F7/004 , C07D411/14 , C07D327/04 , C08F28/06
CPC分类号： C07D327/04 , C07D497/18 , C08F220/38 , G03F7/0045 , G03F7/0397 , G03F7/085
摘要： An acrylate derivative represented by the following general formula (1): (in the formula, R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group; each of R2, R3, R5, R7, R8, R9 and R10 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkoxy group; each of R4 and R6 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkoxy group, or R4 and R6 are bonded to each other to represent an alkylene group, —O— or —S—; n represents 0, 1 or 2; and W represents an alkylene group or a cycloalkylene group); an intermediate thereof; a method for producing the same; a polymer compound which is obtainable from polymerization of a raw material containing the foregoing acrylate derivative and which is excellent in solubility in an organic solvent used for the preparation of a photoresist composition; and a photoresist composition containing the polymer compound, an organic solvent and a photo acid generator and having excellent adhesion to substrate and less pattern collapse, are provided.
摘要翻译：由以下通式（1）表示的丙烯酸酯衍生物：（式中，R1表示氢原子，甲基或三氟甲基; R2，R3，R5，R7，R8，R9和R10各自独立地表示氢原子，烷基，环烷基或烷氧基; R 4和R 6各自独立地表示氢原子，烷基，环烷基或烷氧基，或者R 4和R 6相互键合，表示亚烷基，-O-或-S-; n表示0,1或2; W表示亚烷基或亚环烷基）。其中间体; 其制造方法; 可从含有上述丙烯酸酯衍生物的原料的聚合得到的聚合物化合物，其在用于制备光致抗蚀剂组合物的有机溶剂中的溶解性优异; 并且提供了含有高分子化合物，有机溶剂和光酸产生剂并且对基材具有优异粘附性和较少图案折叠的光致抗蚀剂组合物。

5. 发明授权

US08314258B2 Method for producing acrylate derivative, acrylate derivative, and intermediate thereof 有权
标题翻译：丙烯酸酯衍生物，丙烯酸酯衍生物及其中间体的制造方法
公开(公告)号：US08314258B2
公开(公告)日：2012-11-20
申请号：US12918527
申请日：2009-02-20
申请人： Osamu Nakayama , Takashi Fukumoto
发明人： Osamu Nakayama , Takashi Fukumoto
IPC分类号： C07D339/00
CPC分类号： C07D339/08 , C07D339/00 , C08F220/28 , C08F220/38 , G03F7/0397
摘要： Provided are 1) a production process for an acrylic ester derivative capable of being a raw material of a polymer for obtaining a photoresist composition capable of forming a photoresist film which is excellent in a reactivity to acid and a heat stability and is less swollen in developing and which has a refractive index of preferably 1.72 or more in 193 nm and can be patterned, 2) an acrylic ester derivative obtained by the above production process and 3) alcohol and ester which are synthetic intermediates for the above acrylic ester derivative.
摘要翻译： 1）一种丙烯酸酯衍生物的生产方法，其能够作为获得能够形成光致抗蚀剂的聚合物的原料，所述光致抗蚀剂组合物具有优异的反应性和热稳定性，并且在显影中的溶胀性较小并且其在193nm中的折射率优选为1.72以上，并且可以被图案化，2）通过上述制备方法获得的丙烯酸酯衍生物和3）作为上述丙烯酸酯衍生物的合成中间体的醇和酯。

6. 发明申请

US20110009643A1 METHOD FOR PRODUCING ACRYLATE DERIVATIVE, ACRYLATE DERIVATIVE, AND INTERMEDIATE THEREOF 有权
标题翻译：生产丙烯酸酯衍生物，丙烯酸酯衍生物及其中间体的方法
公开(公告)号：US20110009643A1
公开(公告)日：2011-01-13
申请号：US12918527
申请日：2009-02-20
申请人： Osamu Nakayama , Takashi Fukumoto
发明人： Osamu Nakayama , Takashi Fukumoto
IPC分类号： C07D339/00 , C07D339/08
CPC分类号： C07D339/08 , C07D339/00 , C08F220/28 , C08F220/38 , G03F7/0397
摘要： Provided are 1) a production process for an acrylic ester derivative capable of being a raw material of a polymer for obtaining a photoresist composition capable of forming a photoresist film which is excellent in a reactivity to acid and a heat stability and is less swollen in developing and which has a refractive index of preferably 1.72 or more in 193 nm and can be patterned, 2) an acrylic ester derivative obtained by the above production process and 3) alcohol and ester which are synthetic intermediates for the above acrylic ester derivative.
摘要翻译： 1）一种丙烯酸酯衍生物的生产方法，其能够作为获得能够形成光致抗蚀剂的聚合物的原料，所述光致抗蚀剂组合物具有优异的反应性和热稳定性，并且在显影中的溶胀性较小并且其在193nm中的折射率优选为1.72以上，并且可以被图案化，2）通过上述制备方法获得的丙烯酸酯衍生物和3）作为上述丙烯酸酯衍生物的合成中间体的醇和酯。

7. 发明授权

US08367849B2 Production method for sultone derivatives 有权
标题翻译：磺内酯衍生物的生产方法
公开(公告)号：US08367849B2
公开(公告)日：2013-02-05
申请号：US13061560
申请日：2009-09-02
申请人： Osamu Nakayama , Takashi Fukumoto , Jyunko Sato , Toshiki Endo , Hideki Matsuda
发明人： Osamu Nakayama , Takashi Fukumoto , Jyunko Sato , Toshiki Endo , Hideki Matsuda
IPC分类号： C07D327/04
CPC分类号： C07D497/18 , C07C303/02 , C07C2601/16 , C07D327/04 , C07D493/08 , C07C309/85
摘要： There is provided a means to produce industrially a highly pure 2-hydroxy-4-oxa-5-thiatricyclo[4.2.1.03,7]nonane 5,5-dioxide derivative in high yield from highly pure and industrially available raw materials.The production method for a sultone derivative of the present invention comprises a step (A) to obtain a sulfonic acid derivative by hydrolyzing a sulfonyl halide derivative represented by the following chemical formula 1: or an enantiomer thereof and a step (B) to obtain a corresponding sultone derivative represented by the following chemical formula 2: or an enantiomer thereof by treating the sulfonic acid derivative with a oxidizing agent.
摘要翻译：提供了从高纯度和工业上可获得的原料中以高产率从工业上生产高纯度2-羟基-4-氧杂-5-硫杂五环[4.2.1.03,7]壬烷5,5-二氧化物衍生物的方法。本发明的磺内酯衍生物的制造方法包括通过水解下述化学式1表示的磺酰卤衍生物或其对映体和工序（B）得到磺酸衍生物的步骤（A），得到通过用氧化剂处理磺酸衍生物，由以下化学式2表示的对应的磺内酯衍生物或其对映异构体。

8. 发明授权

US08431722B2 Acrylate ester derivatives and polymer compounds 有权
标题翻译：丙烯酸酯衍生物和高分子化合物
公开(公告)号：US08431722B2
公开(公告)日：2013-04-30
申请号：US13572229
申请日：2012-08-10
申请人： Osamu Nakayama , Takashi Fukumoto
发明人： Osamu Nakayama , Takashi Fukumoto
IPC分类号： C07D327/02 , C07D321/02 , C07D321/12
CPC分类号： G03F7/0392 , C07D319/12 , C07D327/00 , C07D327/06 , C08F220/18 , C08F220/28 , C08F220/38 , G03F7/0397
摘要： A cyclic alcohol of formula (II-1): wherein: R2, R3, and R4 are each independently a hydrogen atom, a linear alkyl group comprising 1 to 6 carbon atoms, a branched alkyl group comprising 3 to 6 carbon atoms, or a cyclic alkyl group comprising 3 to 6 carbon atoms; or R2 and R3 or R3 and R4 combine to form an alkylene group comprising 3 to 6 carbon atoms; m is 1 or 2; R5, R6, R7, R8, R9, and R10 are each independently a hydrogen atom, a linear alkyl group comprising 1 to 6 carbon atoms, a branched alkyl group comprising 3 to 6 carbon atoms, or a cyclic alkyl group comprising 3 to 6 carbon atoms; A is an oxygen atom; and B is an oxygen atom or a sulfur atom. In addition, a process for producing the cyclic alcohol of formula (II-1).
摘要翻译：式（II-1）的环状醇：其中：R 2，R 3和R 4各自独立地为氢原子，含有1至6个碳原子的直链烷基，含有3至6个碳原子的支链烷基或含有3〜6个碳原子的环状烷基; 或R 2和R 3或R 3和R 4结合形成含有3至6个碳原子的亚烷基; m为1或2; R 5，R 6，R 7，R 8，R 9和R 10各自独立地为氢原子，碳原子数为1〜6的直链烷基，碳原子数为3〜6的支链烷基或含有3〜6个碳原子的环状烷基碳原子 A是氧原子; B是氧原子或硫原子。另外，制备式（II-1）的环状醇的方法。

9. 发明授权

US08546587B2 Method for producing acrylate derivative, acrylate derivative, and intermediate thereof 有权
标题翻译：丙烯酸酯衍生物，丙烯酸酯衍生物及其中间体的制造方法
公开(公告)号：US08546587B2
公开(公告)日：2013-10-01
申请号：US13617023
申请日：2012-09-14
申请人： Osamu Nakayama , Takashi Fukumoto
发明人： Osamu Nakayama , Takashi Fukumoto
IPC分类号： C07D339/00
CPC分类号： C07D339/08 , C07D339/00 , C08F220/28 , C08F220/38 , G03F7/0397
摘要： Provided are 1) a production process for an acrylic ester derivative capable of being a raw material of a polymer for obtaining a photoresist composition capable of forming a photoresist film which is excellent in a reactivity to acid and a heat stability and is less swollen in developing and which has a refractive index of preferably 1.72 or more in 193 nm and can be patterned, 2) an acrylic ester derivative obtained by the above production process and 3) alcohol and ester which are synthetic intermediates for the above acrylic ester derivative.
摘要翻译： 1）一种丙烯酸酯衍生物的生产方法，其能够作为获得能够形成光致抗蚀剂的聚合物的原料，所述光致抗蚀剂组合物具有优异的反应性和热稳定性，并且在显影中的溶胀性较小并且其在193nm中的折射率优选为1.72以上，并且可以被图案化，2）通过上述制备方法获得的丙烯酸酯衍生物和3）作为上述丙烯酸酯衍生物的合成中间体的醇和酯。

10. 发明申请

US20110160465A1 PRODUCTION METHOD FOR SULTONE DERIVATIVES 有权
标题翻译：硫代衍生物的生产方法
公开(公告)号：US20110160465A1
公开(公告)日：2011-06-30
申请号：US13061560
申请日：2009-09-02
申请人： Osamu Nakayama , Takashi Fukumoto , Jyunko Sato , Toshiki Endo , Hideki Matsuda
发明人： Osamu Nakayama , Takashi Fukumoto , Jyunko Sato , Toshiki Endo , Hideki Matsuda
IPC分类号： C07D327/04
CPC分类号： C07D497/18 , C07C303/02 , C07C2601/16 , C07D327/04 , C07D493/08 , C07C309/85
摘要： There is provided a means to produce industrially a highly pure 2-hydroxy-4-oxa-5-thiatricyclo[4.2.1.03,7]nonane 5,5-dioxide derivative in high yield from highly pure and industrially available raw materials.The production method for a sultone derivative of the present invention comprises a step (A) to obtain a sulfonic acid derivative by hydrolyzing a sulfonyl halide derivative represented by the following chemical formula 1: or an enantiomer thereof and a step (B) to obtain a corresponding sultone derivative represented by the following chemical formula 2: or an enantiomer thereof by treating the sulfonic acid derivative with a oxidizing agent.
摘要翻译：提供了从高纯度和工业上可获得的原料中以高产率从工业上生产高纯度2-羟基-4-氧杂-5-硫杂五环[4.2.1.03,7]壬烷5,5-二氧化物衍生物的方法。本发明的磺内酯衍生物的制造方法包括通过水解下述化学式1表示的磺酰卤衍生物或其对映体和工序（B）得到磺酸衍生物的步骤（A），得到通过用氧化剂处理磺酸衍生物，由以下化学式2表示的对应的磺内酯衍生物或其对映异构体。

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