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1. 发明授权

US5610406A Charged particle beam exposure method and apparatus 失效
标题翻译：带电粒子束曝光方法和装置
公开(公告)号：US5610406A
公开(公告)日：1997-03-11
申请号：US410294
申请日：1995-03-24
申请人： Junichi Kai , Mitsuhiro Nakano
发明人： Junichi Kai , Mitsuhiro Nakano
IPC分类号： H01L21/027 , H01J37/304 , H01J37/04
CPC分类号： H01J37/304 , H01J2237/20285 , H01J2237/3175
摘要： A charged particle beam exposure method which irradiates a charged particle beam on a substrate placed on a stage while continuously moving the stage and deflecting the charged particle beam by main deflector means and sub deflector means. The charged particle beam exposure method includes the steps of calculating stage moving information which describes an optimum expected locus of a stage moving speed with respect to a frame region based on a stage moving speed that enables exposure within each cell region within the frame region, by defining the frame region as being made up of a plurality of cell regions arranged in a moving direction of the stage within a drawable range in which the charged particle beam can be deflected by the main deflector means, and controlling a deflected position of the charged particle beam caused by the main deflector means by variably controlling the stage moving speed based on said stage moving information.
摘要翻译：一种带电粒子束曝光方法，其在连续移动所述载物台并且通过主偏转器装置和副偏转装置偏转所述带电粒子束的同时，将放电的粒子束照射在载置在载物台上的基板上。带电粒子束曝光方法包括以下步骤：基于能够在帧区域内的每个单元区域内进行曝光的载物台移动速度，通过以下步骤计算载物台移动速度相对于框架区域的最佳期望轨迹的步骤：将所述框架区域限定为在所述台架的移动方向上布置的多个单元区域，所述多个单元区域在所述带电粒子束可被所述主偏转器装置偏转的可绘制范围内，并且控制所述带电粒子的偏转位置通过可变地控制基于所述载物台移动信息的载物台移动速度，由主偏转装置引起的光束。

2. 发明授权

US5334846A Correction of charged particle beam exposure deflection by detecting stage position and a position detection mark 失效
标题翻译：通过检测级位置和位置检测标记校正带电粒子束曝光偏转
公开(公告)号：US5334846A
公开(公告)日：1994-08-02
申请号：US907018
申请日：1992-07-01
申请人： Mitsuhiro Nakano , Junichi Kai
发明人： Mitsuhiro Nakano , Junichi Kai
IPC分类号： H01J37/147 , H01J37/304 , H01J37/305 , H01J37/317 , H01L21/66
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/304 , H01J37/3174 , H01J2237/3045 , H01J2237/31766
摘要： A charged particle beam exposure apparatus is provided with a source for irradiating a charged particle beam on an object which has a position detection mark provided thereon and is carried on a movable stage, a deflection part for deflecting the charged particle beam based on deflection signals, a first detection part for detecting the position detection mark of the object, a second detection part for detecting a stage position of the object and for outputting a position detection signal, a moving part for moving the stage which carries the object, and a control unit for controlling inputs and outputs of the source, the deflection part, the first and second detection parts and the moving part. The control unit corrects the deflection signals which are supplied to the deflection part so that the position detection mark is irradiated by the charged particle beam based on the position detection signal which is output from the second detection part and is related to the stage position of the object which is continuously moved by the moving part.
摘要翻译：带电粒子束曝光装置设置有用于将带电粒子束照射在其上设置有位置检测标记并携带在可移动台上的物体的源，用于基于偏转信号偏转带电粒子束的偏转部分，用于检测物体的位置检测标记的第一检测部分，用于检测物体的台位置并输出位置检测信号的第二检测部，用于移动携带物体的台的移动部，以及控制部用于控制源，偏转部分，第一和第二检测部分和移动部分的输入和输出。控制单元基于从第二检测部输出的位置检测信号来校正供给到偏转部的偏转信号，使得位置检测标记被带电粒子束照射，并且与位置检测标记被移动部件连续移动的物体。

3. 发明授权

US5329130A Charged particle beam exposure method and apparatus 失效
标题翻译：带电粒子束曝光方法和装置
公开(公告)号：US5329130A
公开(公告)日：1994-07-12
申请号：US924638
申请日：1992-08-04
申请人： Junichi Kai , Hiroshi Yasuda , Kazutaka Taki , Mitsuhiro Nakano
发明人： Junichi Kai , Hiroshi Yasuda , Kazutaka Taki , Mitsuhiro Nakano
IPC分类号： H01J37/317 , H01J37/302
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/30455 , H01J2237/30488 , H01J2237/31766
摘要： A charged particle beam exposure method is used to draw a pattern on a substrate which is carried on a continuously moving stage by deflecting a charged particle beam. The method includes moving the stage in a direction parallel to an axis of a coordinate system of the substrate; generating first deflection data D.sub.1 in a coordinate system of the stage by obtaining a position coordinate of an reference position of a pattern region including the pattern to be drawn relative to a target position of the stage, and for obtaining second deflection data D.sub.2 in a coordinate system of the substrate describing a position coordinate of the pattern to be drawn from the reference position of the pattern region to which the pattern belongs; carrying out with respect to first deflection data D.sub.1 a first correcting operation including correction of pattern distortion inherent to a charged particle beam exposure apparatus, and for carrying out the first correcting operation and a second correcting operation with respect to second deflection data D.sub.2 after making a coordinate conversion to the coordinate system of the stage, where second correcting operation corrects a rotation error component relative to the stage caused by movement of the substrate; obtaining third deflection data D.sub.3 ' which describes a position coordinate of the pattern to be drawn from the present position of the stage by adding corrected first deflection data D.sub.1 ' and corrected second deflection data D.sub.2 '; and controlling a deflector based on third deflection data D.sub.3 '.
摘要翻译：使用带电粒子束曝光方法通过偏转带电粒子束在连续移动的台上承载的基板上绘制图案。该方法包括在平行于基板的坐标系的轴的方向上移动平台; 通过获得包括相对于舞台的目标位置的要绘制的图案的图案区域的基准位置的位置坐标，并且获得坐标系的第二偏转数据D2，从而在舞台的坐标系中产生第一偏转数据D1 描述从图案所属的图案区域的参考位置绘制的图案的位置坐标的基板的系统; 对于第一偏转数据D1执行包括对带电粒子束曝光装置固有的图案失真的校正的第一校正操作，并且在进行第一校正操作和关于第二偏转数据D2的第二校正操作之后坐标转换到舞台的坐标系，其中第二校正操作校正相对于由衬底的移动引起的舞台的旋转误差分量; 获得第三偏转数据D3'，其通过加上校正的第一偏转数据D1'和校正的第二偏转数据D2'来描述从舞台的当前位置绘制的图案的位置坐标; 以及基于第三偏转数据D3'控制偏转器。

4. 发明授权

US08994806B2 Microscope apparatus chronologically storing different types of image information 有权
标题翻译：显微镜仪器按时间顺序存储不同类型的图像信息
公开(公告)号：US08994806B2
公开(公告)日：2015-03-31
申请号：US12828342
申请日：2010-07-01
申请人： Mitsuhiro Nakano , Tatsuo Nakata
发明人： Mitsuhiro Nakano , Tatsuo Nakata
IPC分类号： H04N7/18 , G02B21/36
CPC分类号： G02B21/367
摘要： A microscope apparatus organizes and stores a plurality of types of image information acquired by a plurality of image acquisition methods at different timings. The microscope apparatus includes a time counting unit for counting time, a plurality of different image acquisition units, and a storage unit for storing image information, when acquired by any one of the image acquisition units, and timing information counted by the time counting unit, by having them associated with each other. Even if the image acquisition units acquire different types of image information at different timings, the timing information can be used to call up the image information stored in the storage unit in a chronological order.
摘要翻译：显微镜装置以不同的定时组织并存储通过多个图像获取方法获取的多种类型的图像信息。显微镜装置包括用于计数时间的计时单元，多个不同的图像获取单元，以及用于存储图像信息的存储单元，当由图像获取单元中的任何一个获取时，以及由计时单元计数的定时信息，通过使它们彼此相关联。即使图像获取单元在不同的定时获取不同类型的图像信息，也可以使用定时信息来按照时间顺序调用存储在存储单元中的图像信息。

5. 发明授权

US08222619B2 Multi-column electron beam exposure apparatus and multi-column electron beam exposure method 有权
标题翻译：多列电子束曝光装置和多列电子束曝光方法
公开(公告)号：US08222619B2
公开(公告)日：2012-07-17
申请号：US12586717
申请日：2009-09-25
申请人： Akio Yamada , Hiroshi Yasuda , Mitsuhiro Nakano , Takashi Kiuchi
发明人： Akio Yamada , Hiroshi Yasuda , Mitsuhiro Nakano , Takashi Kiuchi
IPC分类号： A61N5/00 , G21G5/00
CPC分类号： B82Y40/00 , B82Y10/00 , H01J37/3045 , H01J37/3174 , H01J37/3177 , H01J2237/24507 , H01J2237/24521 , H01J2237/24535 , H01J2237/24542
摘要： A multi-column electron beam exposure apparatus includes: a plurality of column cells; a wafer stage including an electron-beam-property detecting unit for measuring an electron beam property; and a controller for measuring beam properties of electron beams used in all the column cells by using the electron-beam-property detecting unit, and for adjusting the electron beams of the respective column cells so that the properties of the electron beams used in the column cells may be approximately identical. The electron beam property may be any of a beam position, a beam intensity, and a beam shape of the electron beam to be emitted. The electron-beam-property detecting unit may be a chip for calibration with a reference mark formed thereon or a Faraday cup.
摘要翻译：多列电子束曝光装置包括：多个柱单元; 包括用于测量电子束特性的电子束特性检测单元的晶片台; 以及用于通过使用电子束特性检测单元来测量在所有列单元中使用的电子束的光束特性的控制器，并且用于调节各列电池的电子束，使得在列中使用的电子束的性质细胞可以大致相同。电子束特性可以是要发射的电子束的光束位置，光束强度和光束形状中的任何一个。电子束特性检测单元可以是用于在其上形成有参考标记的校准芯片或法拉第杯。

6. 发明授权

US08792703B2 Method for tracking cells 有权
标题翻译：追踪细胞的方法
公开(公告)号：US08792703B2
公开(公告)日：2014-07-29
申请号：US13423510
申请日：2012-03-19
申请人： Mitsuhiro Nakano , Kosuke Takagi
发明人： Mitsuhiro Nakano , Kosuke Takagi
IPC分类号： G06K9/00 , G01N33/554
CPC分类号： G06K9/0014 , G06T7/0012 , G06T7/11 , G06T7/246 , G06T2207/30024
摘要： Simple, high-precision cell tracking is realized. Provided is a method for tracking cells, comprising an image acquisition step (S1) of acquiring a plurality of observation images including a plurality of cells in the field of view at certain time intervals; a feature analysis step (S2) of analyzing predetermined brightnesses of the individual cells in the observation images acquired in the image acquisition step (S1); a grouping step (S3) of grouping the cells for each of the observation images on the basis of the brightnesses analyzed in the feature analysis step (S2) and a predetermined threshold value for classifying the brightnesses; and an associating step (S4) of associating, for each of the groups divided in the grouping step (S3), the cells whose morphological features are substantially the same between the observation images acquired at different times.
摘要翻译：实现简单，高精度的细胞跟踪。提供了一种用于跟踪单元的方法，包括以特定时间间隔获取包括视场中的多个单元的多个观察图像的图像获取步骤（S1）分析在图像获取步骤（S1）中获取的观察图像中的各个单元的预定亮度的特征分析步骤（S2）; 基于在特征分析步骤（S2）中分析的亮度和用于对亮度进行分类的预定阈值，对每个观察图像的单元进行分组的分组步骤（S3）以及关联步骤（S4），对于在分组步骤（S3）中划分的每个组，在不同时间获取的观察图像之间的形态特征基本相同的单元。

7. 发明授权

US07982948B2 Scanning microscope for 3-D imaging of a moving specimen 有权
标题翻译：扫描显微镜用于移动样品的3-D成像
公开(公告)号：US07982948B2
公开(公告)日：2011-07-19
申请号：US12329975
申请日：2008-12-08
申请人： Mitsuhiro Nakano
发明人： Mitsuhiro Nakano
IPC分类号： G02B21/06 , G06T15/00
CPC分类号： G02B21/008
摘要： A scanning microscope includes a source of illumination light; a scanner scanning the illumination light in a two-dimensional direction crossing a light axis; a lens irradiating the illumination light to a sample, and collecting return light from the sample; a focusing position adjuster adjusting a focal position in a light axis direction; and a light detector detecting collected light. A storage section stores the intensity of detected light, and positional information of an irradiating position of the illumination light set by the scanner and the focusing position adjuster. An image processor acquires images parallel to the light axis based on the intensity of return light and the stored positional information, and processes the images to detect a moving distance along a light axis direction of an area of the sample. The focusing position adjuster is controlled to correct a light condensing position of the illumination light.
摘要翻译：扫描显微镜包括照明光源; 扫描仪沿与光轴交叉的二维方向扫描照明光; 将照明光照射到样品的透镜，并从样品收集返回光; 聚焦位置调节器调节光轴方向上的焦点位置; 以及检测所收集的光的光检测器。存储部存储检测光的强度和由扫描仪和聚焦位置调整器设定的照明光的照射位置的位置信息。图像处理器基于返回光的强度和存储的位置信息获取平行于光轴的图像，并且处理图像以检测沿着样本的区域的光轴方向的移动距离。控制聚焦位置调节器以校正照明光的聚光位置。

8. 发明申请

US20070269796A1 Microscope apparatus and cell observation method 有权
标题翻译：显微镜装置和细胞观察方法
公开(公告)号：US20070269796A1
公开(公告)日：2007-11-22
申请号：US11800119
申请日：2007-05-04
申请人： Mitsuhiro Nakano , Tatsuo Nakata
发明人： Mitsuhiro Nakano , Tatsuo Nakata
IPC分类号： G06F19/00 , G06T7/20 , C12Q1/00
CPC分类号： C12M41/36 , G02B21/0012 , G02B21/16 , G02B21/32
摘要： The invention provides a microscope apparatus, used for identifying the cell phases of a plurality of cells mounted on a stage, including an analysis/observation optical system used for acquiring an observed-image of the cells and a stimulus optical system used for applying an optical stimulus to prescribed cells. Using these optical systems, the cell phases of the cells mounted on the stage are identified, an optical stimulus is applied to the cells, and the state of the cells before and after applying the stimulus is observed.
摘要翻译：本发明提供了一种用于识别安装在舞台上的多个电池的电池相位的显微镜装置，包括用于获取电池的观察图像的分析/观察光学系统和用于施加光学器件的刺激光学系统刺激规定的细胞。使用这些光学系统，鉴定安装在载物台上的细胞的细胞相，向细胞施加光学刺激，并观察施加刺激之前和之后的细胞状态。

9. 发明申请

US20100019172A1 Multi-column electron beam exposure apparatus and multi-column electron beam exposure method 有权
标题翻译：多列电子束曝光装置和多列电子束曝光方法
公开(公告)号：US20100019172A1
公开(公告)日：2010-01-28
申请号：US12586717
申请日：2009-09-25
申请人： Akio Yamada , Hiroshi Yasuda , Mitsuhiro Nakano , Takashi Kiuchi
发明人： Akio Yamada , Hiroshi Yasuda , Mitsuhiro Nakano , Takashi Kiuchi
IPC分类号： H01J37/30
CPC分类号： B82Y40/00 , B82Y10/00 , H01J37/3045 , H01J37/3174 , H01J37/3177 , H01J2237/24507 , H01J2237/24521 , H01J2237/24535 , H01J2237/24542
摘要： A multi-column electron beam exposure apparatus includes: a plurality of column cells; a wafer stage including an electron-beam-property detecting unit for measuring an electron beam property; and a controller for measuring beam properties of electron beams used in all the column cells by using the electron-beam-property detecting unit, and for adjusting the electron beams of the respective column cells so that the properties of the electron beams used in the column cells may be approximately identical. The electron beam property may be any of a beam position, a beam intensity, and a beam shape of the electron beam to be emitted. The electron-beam-property detecting unit may be a chip for calibration with a reference mark formed thereon or a Faraday cup.
摘要翻译：多列电子束曝光装置包括：多个柱单元; 包括用于测量电子束特性的电子束特性检测单元的晶片台; 以及用于通过使用电子束特性检测单元来测量在所有列单元中使用的电子束的光束特性的控制器，并且用于调节各个列单元的电子束，使得在列中使用的电子束的性质细胞可以大致相同。电子束特性可以是要发射的电子束的光束位置，光束强度和光束形状中的任何一个。电子束特性检测单元可以是用于在其上形成有参考标记的校准用芯片或法拉第杯。

10. 发明授权

US07983466B2 Microscope apparatus and cell observation method 有权
标题翻译：显微镜装置和细胞观察方法
公开(公告)号：US07983466B2
公开(公告)日：2011-07-19
申请号：US11800119
申请日：2007-05-04
申请人： Mitsuhiro Nakano , Tatsuo Nakata
发明人： Mitsuhiro Nakano , Tatsuo Nakata
IPC分类号： G06K9/00
CPC分类号： C12M41/36 , G02B21/0012 , G02B21/16 , G02B21/32
摘要： The invention provides a microscope apparatus, used for identifying the cell phases of a plurality of cells mounted on a stage, including an analysis/observation optical system used for acquiring an observed-image of the cells and a stimulus optical system used for applying an optical stimulus to prescribed cells. Using these optical systems, the cell phases of the cells mounted on the stage are identified, an optical stimulus is applied to the cells, and the state of the cells before and after applying the stimulus is observed.
摘要翻译：本发明提供了一种用于识别安装在舞台上的多个电池的电池相位的显微镜装置，包括用于获取电池的观察图像的分析/观察光学系统和用于施加光学器件的刺激光学系统刺激规定的细胞。使用这些光学系统，鉴定安装在载物台上的细胞的细胞相，向细胞施加光学刺激，并观察施加刺激之前和之后的细胞状态。

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