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1. 发明授权

US08318053B2 Photosensitive resin composition and color filter using the same 有权
标题翻译：感光树脂组合物和使用其的滤色器
公开(公告)号：US08318053B2
公开(公告)日：2012-11-27
申请号：US13217581
申请日：2011-08-25
申请人： Jung-Sik Choi , Chang-Min Lee , Jin-Woo Park , Kyung-Won Ahn , Myung-Ho Cho
发明人： Jung-Sik Choi , Chang-Min Lee , Jin-Woo Park , Kyung-Won Ahn , Myung-Ho Cho
IPC分类号： G02B5/23 , C08F2/50 , C08F2/46 , C08J3/28 , G03F7/033 , G03F7/032
CPC分类号： G03F7/0007 , G02B5/201 , G03F7/027 , G03F7/032 , G03F7/0388
摘要： Disclosed is a photosensitive resin composition including (A) a photopolymerizable monomer including a compound represented by the following Chemical Formula 1, wherein the substituents of Chemical Formula 1 are the same as defined in the specification, (B) a binder resin, (C) a photopolymerization initiator, (D) a pigment and (E) a solvent, and a color filter using the same.
摘要翻译：公开了包含（A）包含由以下化学式1表示的化合物的光聚合性单体的光敏树脂组合物，其中化学式1的取代基与说明书中所定义的相同，（B）粘合剂树脂，（C）光聚合引发剂，（D）颜料和（E）溶剂，以及使用其的滤色器。

2. 发明授权

US08715895B2 Photosensitive resin composition for color filter and color filter using the same 有权
标题翻译：用于滤色片的感光树脂组合物和使用其的滤色器
公开(公告)号：US08715895B2
公开(公告)日：2014-05-06
申请号：US13590471
申请日：2012-08-21
申请人： Jung-Sik Choi , Chang-Min Lee , Min-Sung Kim , Jin-Woo Park , Myung-Ho Cho
发明人： Jung-Sik Choi , Chang-Min Lee , Min-Sung Kim , Jin-Woo Park , Myung-Ho Cho
IPC分类号： G03F7/004 , G02B5/20
CPC分类号： G02B5/20 , G02B5/201 , G02B5/223 , G03F7/0007 , G03F7/004 , G03F7/027 , G03F7/032 , G03F7/033
摘要： Disclosed are a photosensitive resin composition for a color filter that includes (A) a binder resin including phenol-based resin represented by the following Chemical Formula 1; (B) a photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a solvent, and a color filter using the same. In Chemical Formula 1, each substituent is the same as defined in the detailed description.
摘要翻译：公开了一种用于滤色器的感光性树脂组合物，其包含（A）包含由以下化学式1表示的酚类树脂的粘合剂树脂; （B）可光聚合单体; （C）光聚合引发剂; （D）着色剂; 和（E）溶剂，以及使用其的滤色器。在化学式1中，每个取代基与详细说明中所定义的相同。

3. 发明授权

US08273270B2 Photosensitive resin composition and light blocking layer using the same 有权
标题翻译：光敏树脂组合物和使用其的遮光层
公开(公告)号：US08273270B2
公开(公告)日：2012-09-25
申请号：US13161542
申请日：2011-06-16
申请人： Chang-Min Lee , Kil-Sung Lee , Jun-Seok Kim , Jung-Sik Choi
发明人： Chang-Min Lee , Kil-Sung Lee , Jun-Seok Kim , Jung-Sik Choi
IPC分类号： G02B5/23 , C08F2/50 , C08F2/46 , C08J3/28 , G03F7/033 , G03F7/032
CPC分类号： G03F7/0388 , G03F7/032 , G03F7/033 , G03F7/038 , G03F7/0755 , G03F7/091
摘要： Disclosed are a photosensitive resin composition that includes (A) a cardo-based resin including repeating units represented by the following Chemical Formulae 1 and 2, wherein the substituents of Chemical Formulae 1 and 2 are the same as defined in the specification, (B) reactive unsaturated compound, (C) a pigment, (D) an initiator, and (E) a solvent, and a light blocking layer using the photosensitive resin composition.
摘要翻译：公开了包含（A）包含由以下化学式1和2表示的重复单元的cardo基树脂的光敏树脂组合物，其中化学式1和2的取代基与说明书中定义相同，（B）反应性不饱和化合物，（C）颜料，（D）引发剂和（E）溶剂，以及使用该感光性树脂组合物的遮光层。

4. 发明授权

US07851789B2 Photosensitive resin composition for pad protective layer, and method for making image sensor using the same 有权
标题翻译：用于垫保护层的感光树脂组合物和使用其的图像传感器的制造方法
公开(公告)号：US07851789B2
公开(公告)日：2010-12-14
申请号：US12329650
申请日：2008-12-08
申请人： Kil-Sung Lee , Jae-Hyun Kim , Chang-Min Lee , Eui-June Jeong , Kwen-Woo Han , O-Bum Kwon , Jung-Sik Choi , Jong-Seob Kim , Tu-Won Chang , Jung-Hyun Cho , Seul-Young Jeong
发明人： Kil-Sung Lee , Jae-Hyun Kim , Chang-Min Lee , Eui-June Jeong , Kwen-Woo Han , O-Bum Kwon , Jung-Sik Choi , Jong-Seob Kim , Tu-Won Chang , Jung-Hyun Cho , Seul-Young Jeong
IPC分类号： H01L35/24
CPC分类号： G03F7/033
摘要： The present invention provides a photosensitive resin composition for a pad protective layer that includes (A) an alkali soluble resin, (B) a reactive unsaturated compound, (C) a photoinitiator, and (D) a solvent. The (A) alkali soluble resin includes a copolymer including about 5 to about 50 wt % of a unit having the Chemical Formula 1, about 1 to about 25 wt % of a unit having the Chemical Formula 2, and about 45 to about 90 wt % of a unit having the Chemical Formula 3, and a method of making an image sensor using the photosensitive resin composition.
摘要翻译：本发明提供一种用于垫保护层的感光性树脂组合物，其包含（A）碱溶性树脂，（B）反应性不饱和化合物，（C）光引发剂和（D）溶剂。（A）碱溶性树脂包括共聚物，其包含约5至约50重量％的具有化学式1的单元，约1至约25重量％的具有化学式2的单元和约45至约90重量％具有化学式3的单元的％，以及使用该感光性树脂组合物制造图像传感器的方法。

5. 发明授权

US08036103B2 Portable internet radio access station including multiple management processors and method of controlling the multiple management processors 有权
标题翻译：便携式互联网无线电接入站，包括多个管理处理器和多个管理处理器的控制方法
公开(公告)号：US08036103B2
公开(公告)日：2011-10-11
申请号：US12300041
申请日：2007-05-23
申请人： Jun-Ho Chung , Sung-Soo Oh , Shin-Ha Kang , Jung-Sik Choi
发明人： Jun-Ho Chung , Sung-Soo Oh , Shin-Ha Kang , Jung-Sik Choi
IPC分类号： G01R31/08 , H04L12/66 , H04J3/12
CPC分类号： H04W88/08 , H04W24/00
摘要： The present invention relates to a portable internet radio access station, and more particularly, to a portable internet radio access station including a plurality of management processors and a method of controlling the plurality of management processors. A first management processor of a portable internet radio access station according to the present invention includes: an obstruction sensing unit sensing an obstruction in the first and second management processors; a call processing database storing a call processing information of the portable internet radio access station; an operation state determining unit determining an operation state of the first management processor based on the obstruction; and a database synchronizing unit synchronizing the call processing database with a call processing database of the second management processor based on the operation state of the first management processor Accordingly, continuity and reliability in call processing are obtained in the portable internet radio access station of the present invention.
摘要翻译：便携式无线电接入站技术领域本发明涉及一种便携式无线电接入站，更具体地，涉及包括多个管理处理器的便携式因特网无线电接入站和控制多个管理处理器的方法。根据本发明的便携式因特网无线电接入站的第一管理处理器包括：障碍物感测单元，感测第一和第二管理处理器中的障碍物; 呼叫处理数据库，存储便携式无线电接入站的呼叫处理信息; 操作状态确定单元，基于所述障碍物确定所述第一管理处理器的操作状态; 以及基于第一管理处理器的操作状态的呼叫处理数据库与第二管理处理器的呼叫处理数据库同步的数据库同步单元。因此，在本发明的便携式无线电接入站中获得呼叫处理中的连续性和可靠性发明。

6. 发明申请

US20090233439A1 Method of forming an ohmic layer and method of forming a metal wiring of a semiconductor device using the same 审中-公开
标题翻译：形成欧姆层的方法和使用该欧姆层的半导体器件的金属布线的形成方法
公开(公告)号：US20090233439A1
公开(公告)日：2009-09-17
申请号：US12382008
申请日：2009-03-05
申请人： Myung-Beom Park , Ki-Hag Lee , Hyun-Su Kim , Eun-Ok Lee , Kyoo-Chul Cho , Jung-Sik Choi , Byung-Hee Kim , Dae-Yong Kim
发明人： Myung-Beom Park , Ki-Hag Lee , Hyun-Su Kim , Eun-Ok Lee , Kyoo-Chul Cho , Jung-Sik Choi , Byung-Hee Kim , Dae-Yong Kim
IPC分类号： H01L21/768
CPC分类号： H01L21/28556 , C23C16/18 , H01L21/28562 , H01L21/76843
摘要： A metal organic precursor represented by a formula of R1-CpML is provided onto a substrate having a conductive pattern including silicon. Here, R1 is an alkyl group substituent of Cp, R1 including methyl, ethyl, propyl, pentamethyl, pentaethyl, diethyl, dimethyl or dipropyl, Cp is cyclopentadienyl, M includes nickel (Ni), cobalt (Co), titanium (Ti), platinum (Pt) zirconium (Zr) or ruthenium (Ru), and L is at least one ligand, the at least one ligand including a carbonyl. A deposition process is performed using the metal organic precursor to form a preliminary metal silicide layer and a metal layer on the substrate. The preliminary metal silicidation layer is formed on the conductive pattern. The preliminary metal silicide layer is transformed into a metal silicide layer.
摘要翻译：将由式R1-CpML表示的金属有机前体提供到具有包括硅的导电图案的基板上。这里，R1是Cp的烷基取代基，R1包括甲基，乙基，丙基，五甲基，五乙基，二乙基，二甲基或二丙基，Cp是环戊二烯基，M包括镍（Ni），钴（Co），钛（Ti）铂（Pt）锆（Zr）或钌（Ru），L是至少一种配体，所述至少一种配体包括羰基。使用金属有机前体进行沉积工艺，以在衬底上形成初步金属硅化物层和金属层。在导电图案上形成预备金属硅化层。将初级金属硅化物层转变成金属硅化物层。

7. 发明申请

US20080213940A1 Methods of forming metal oxide layers, methods of forming gate structures using the same, and methods of forming capacitors using the same 有权
标题翻译：形成金属氧化物层的方法，使用其形成栅极结构的方法以及使用其形成电容器的方法
公开(公告)号：US20080213940A1
公开(公告)日：2008-09-04
申请号：US11985672
申请日：2007-11-16
申请人： Jung-Ho Lee , Jun-Hyun Cho , Youn-Joung Cho , Seung-Min Ryu , Kyoo-Chul Cho , Jung-Sik Choi
发明人： Jung-Ho Lee , Jun-Hyun Cho , Youn-Joung Cho , Seung-Min Ryu , Kyoo-Chul Cho , Jung-Sik Choi
IPC分类号： H01L21/20 , H01L21/00
CPC分类号： C23C16/405 , C23C16/45553 , H01L21/02178 , H01L21/02181 , H01L21/02186 , H01L21/02189 , H01L21/0228 , H01L21/3141 , H01L21/3142 , H01L21/31604 , H01L21/3162 , H01L21/31641 , H01L21/31645
摘要： Provided herein are methods of forming a metal oxide layer that include providing an organometallic compound and an oxidizing agent to the substrate to form the metal oxide layer on the substrate. The organometallic compound may have the general formula of M(NR1R2)3R3, wherein M is a metal; R1 and R2 are each independently hydrogen or alkyl; and R3 is selected from the group consisting of alkyl, cycloalkyl, heterocycloalkyl, aryl and heteroaryl.
摘要翻译：本文提供形成金属氧化物层的方法，其包括向基板提供有机金属化合物和氧化剂以在基板上形成金属氧化物层。有机金属化合物可以具有通式M（NR 1，R 2）3 N 3 R 3，其中M 是金属; R 1和R 2各自独立地为氢或烷基; 和R 3选自烷基，环烷基，杂环烷基，芳基和杂芳基。

8. 发明申请

US20060276053A1 Spin-on glass composition, method of preparing the spin-on glass composition and method of forming a porous silicon oxide layer using the spin-on glass composition 失效
标题翻译：旋涂玻璃组合物，旋涂玻璃组合物的制备方法和使用旋涂玻璃组合物形成多孔氧化硅层的方法
公开(公告)号：US20060276053A1
公开(公告)日：2006-12-07
申请号：US11446152
申请日：2006-06-05
申请人： Jun-Hyun Cho , Jung-Sik Choi , Jung-Ho Lee , Mi-Ae Kim
发明人： Jun-Hyun Cho , Jung-Sik Choi , Jung-Ho Lee , Mi-Ae Kim
IPC分类号： H01L23/58 , H01L21/31
CPC分类号： H01L21/02164 , C03C3/04 , C09D183/04 , H01L21/02203 , H01L21/02282 , H01L21/316
摘要： A spin-on glass composition includes a solvent, about 3 to about 20 percent by weight of a porogen, and about 3 to about 20 percent by weight of a silsesquioxane oligomer represented by formula (1), where, in the formula (1), Y1 and Y2 independently represent a hydrolyzable alkoxy group, R represents a lower alkyl group, and n and m independently represent an integer in a range of one to nine both inclusive.
摘要翻译：旋涂玻璃组合物包括约3至约20重量％的致孔剂和约3至约20重量％的由式（1）表示的倍半硅氧烷低聚物的溶剂，其中在式（1）中， Y 1和Y 2独立地表示可水解的烷氧基，R表示低级烷基，n和m独立地表示1〜9的整数，包括的。

9. 发明授权

US06479405B2 Method of forming silicon oxide layer in semiconductor manufacturing process using spin-on glass composition and isolation method using the same method 失效
标题翻译：在半导体制造工艺中使用旋涂玻璃组合物和使用相同方法的隔离方法形成氧化硅层的方法
公开(公告)号：US06479405B2
公开(公告)日：2002-11-12
申请号：US09985615
申请日：2001-11-05
申请人： Jung-Ho Lee , Dong-Jun Lee , Dae-Won Kang , Sung-Taek Moon , Gi-Hag Lee , Jung-Sik Choi
发明人： Jung-Ho Lee , Dong-Jun Lee , Dae-Won Kang , Sung-Taek Moon , Gi-Hag Lee , Jung-Sik Choi
IPC分类号： H01L2131
CPC分类号： C23C18/1283 , C08G77/62 , C23C18/1212 , C23C18/122 , C23C18/1279 , H01L21/02164 , H01L21/02222 , H01L21/02282 , H01L21/02337 , H01L21/31051 , H01L21/3125 , H01L21/316 , H01L21/31612 , H01L21/76229 , H01L21/823481 , H01L27/105 , H01L27/11521
摘要： A method of forming a silicon oxide layer of a semiconductor device comprising coating a spin-on glass (SOG) composition including perhydropolysilazane having a compound of the formula (SiH2NH2)n where n represents a positive integer on a semiconductor substrate having a surface discontinuity, to form a planar SOG layer; and forming a silicon oxide layer with a planar surface by implementing a first heat treatment to convert an SOG solution into oxide and a second heat treatment to densify thus obtained oxide. The silicon oxide layer of the present invention can bury a gap between gaps of VLSI having a high aspect ratio and gives the same characteristics as a CVD oxide layer. Further, the oxidation of silicon in the active region is restrained in the present invention to secure dimension stability. Also disclosed is a semiconductor device made by the method.
摘要翻译：一种形成半导体器件的氧化硅层的方法，包括在具有表面不连续性的半导体衬底上涂覆包含具有式（SiH 2 NH 2）n的化合物的全氢聚硅氮烷的旋涂玻璃（SOG）组合物，其中n表示正整数，以形成平面SOG层; 以及通过实施第一热处理以将SOG溶液转化为氧化物并进行第二热处理以致密化由此获得的氧化物，形成具有平坦表面的氧化硅层。本发明的氧化硅层可以在具有高纵横比的VLSI的间隙之间埋设间隙，并赋予与CVD氧化物层相同的特性。此外，本发明中限制了活性区域中硅的氧化以确保尺寸稳定性。还公开了通过该方法制造的半导体器件。

10. 发明授权

US09343326B2 CMP slurry composition for polishing an organic layer and method of forming a semiconductor device using the same 有权
标题翻译：用于研磨有机层的CMP浆料组合物和使用其制备半导体器件的方法
公开(公告)号：US09343326B2
公开(公告)日：2016-05-17
申请号：US14825846
申请日：2015-08-13
申请人： Yun-Jeong Kim , Sang-Kyun Kim , Kwang-Bok Kim , Ye-Hwan Kim , Jung-Sik Choi , Choong-Ho Han , Gi-Sik Hong
发明人： Yun-Jeong Kim , Sang-Kyun Kim , Kwang-Bok Kim , Ye-Hwan Kim , Jung-Sik Choi , Choong-Ho Han , Gi-Sik Hong
IPC分类号： H01L21/302 , H01L21/3105 , C09K3/14 , H01L21/033 , H01L21/311 , H01L21/3213 , H01L27/115
CPC分类号： H01L21/31058 , C09G1/02 , C09K3/1463 , H01L21/0337 , H01L21/0338 , H01L21/31055 , H01L21/31144 , H01L21/32139 , H01L27/11582
摘要： A chemical mechanical polishing (CMP) slurry composition for polishing an organic layer and a method of forming a semiconductor device using the same are disclosed. The CMP slurry composition may include from 0.001% to 5% by weight of oxide-polishing particles; from 0.1% to 5% by weight of an oxidant; from 0% to 5% by weight of a polishing regulator; from 0% to 3% by weight of a surfactant; from 0% to 3% by weight of a pH regulator; and from 79% to 99.889% by weight of deionized water. The use of the CMP slurry composition makes it possible to allow a silicon-free organic layer to be polished with a selectivity higher than 6:1 with respect to an oxide layer.
摘要翻译：公开了一种用于抛光有机层的化学机械抛光（CMP）浆料组合物和使用其形成半导体器件的方法。 CMP浆料组合物可以包含0.001重量％至5重量％的氧化物抛光颗粒; 0.1至5重量％的氧化剂; 0〜5重量％的抛光调节剂; 0〜3重量％的表面活性剂; 0至3重量％的pH调节剂; 和79-99889重量％的去离子水。使用CMP浆料组合物可以使无硅有机层相对于氧化物层以高于6:1的选择性进行抛光。

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