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1. 发明授权

US09281494B2 Display device and organic light emitting diode display 有权
标题翻译：显示设备和有机发光二极管显示
公开(公告)号：US09281494B2
公开(公告)日：2016-03-08
申请号：US13064721
申请日：2011-04-11
申请人： Choong-Ho Lee , Kie Hyun Nam , Jung-Min Lee
发明人： Choong-Ho Lee , Kie Hyun Nam , Jung-Min Lee
IPC分类号： H01L51/52 , H01L27/32
CPC分类号： H01L51/5237 , H01L27/3276 , H01L51/524 , H01L51/5243 , H01L51/5246
摘要： A display device includes: a display substrate; a display unit formed on the display substrate and a sealing substrate affixed to the display substrate by an adhering layer that surrounds the display unit. The sealing substrate includes a composite member including a resin and a plurality of carbon fibers and an insulating member attached to the composite member. The insulating member includes a through hole. A metal film is disposed at one side of the sealing substrate, facing the display substrate; and a conductive connection portion contact the metal film through the through hole.
摘要翻译：显示装置包括：显示基板; 形成在显示基板上的显示单元和通过围绕显示单元的粘合层固定到显示基板的密封基板。密封基板包括复合构件，该复合构件包括树脂和多个碳纤维以及连接到复合构件的绝缘构件。绝缘构件包括通孔。金属膜设置在密封基板的面向显示基板的一侧; 并且导电连接部分通过通孔与金属膜接触。

2. 发明授权

US08907326B2 Organic light-emitting display device and thin film deposition apparatus for manufacturing the same 有权
标题翻译：有机发光显示装置及其制造用薄膜蒸镀装置
公开(公告)号：US08907326B2
公开(公告)日：2014-12-09
申请号：US12814816
申请日：2010-06-14
申请人： Jung-Min Lee , Choong-Ho Lee
发明人： Jung-Min Lee , Choong-Ho Lee
IPC分类号： H01L29/08 , C23C14/04 , C23C14/24 , H01L51/00 , H01L27/32 , H01L51/56
CPC分类号： H01L51/0011 , C23C14/042 , C23C14/044 , C23C14/243 , H01L27/3244 , H01L51/56
摘要： A thin film deposition apparatus that can be used to manufacture large substrates on a mass scale and that improves manufacturing yield, and an organic light-emitting display device manufactured using the thin film deposition apparatus. The organic light-emitting display device includes: a substrate including a plurality of sub-deposition areas arranged parallel to each other; at least one thin film transistor formed on the substrate, the at least one thin film transistor comprising a semiconductor active layer, a gate electrode insulated from the semiconductor active layer, and source and drain electrodes contacting the semiconductor active layer; a plurality of pixel electrodes formed on the thin film transistor; a plurality of organic layers formed on each of the pixel electrodes; and a counter electrode formed on the organic layers, wherein the plurality of organic layers lie in each of the sub-deposition areas and have a larger shadow zone the further a distance from a center of the corresponding deposition area.
摘要翻译：可以用于大规模制造大型基板并提高制造成品率的薄膜沉积装置以及使用薄膜沉积装置制造的有机发光显示装置。有机发光显示装置包括：包括彼此平行布置的多个次沉积区域的基板; 形成在所述基板上的至少一个薄膜晶体管，所述至少一个薄膜晶体管包括半导体有源层，与半导体有源层绝缘的栅极电极以及与半导体活性层接触的源极和漏极; 形成在所述薄膜晶体管上的多个像素电极; 形成在每个像素电极上的多个有机层; 以及形成在所述有机层上的对电极，其中所述多个有机层位于每个所述次沉积区域中，并且具有比相应的沉积区域的中心更远的阴影区域。

3. 发明授权

US08802200B2 Method and apparatus for cleaning organic deposition materials 有权
标题翻译：用于清洁有机沉积材料的方法和装置
公开(公告)号：US08802200B2
公开(公告)日：2014-08-12
申请号：US12795896
申请日：2010-06-08
申请人： Jung-Min Lee , Choong-Ho Lee , Yoon-Chan Oh , Hee-Seong Jeong
发明人： Jung-Min Lee , Choong-Ho Lee , Yoon-Chan Oh , Hee-Seong Jeong
IPC分类号： B05D3/00
CPC分类号： C23C14/042 , B08B7/0035 , B08B7/0042 , C23C14/564 , H01L51/56
摘要： A method of cleaning off organic deposition material accumulated on a mask includes forming an organic deposition material pattern on a substrate using the mask, which includes a plurality of slots, in a deposition chamber including a deposition source; transporting the mask to a stock chamber that is maintained at a vacuum and adjacent to the deposition chamber; and partially cleaning off the organic deposition material accumulated along the boundaries of the slots of the mask in the stock chamber. A system to clean off an organic deposition material accumulated on a mask having a plurality of slots, includes a deposition chamber including a deposition source; and a stock chamber that is maintained at substantially the same vacuum as the deposition chamber and includes a cleaning device that cleans off the organic deposition material accumulated on the mask.
摘要翻译：清理积聚在掩模上的有机沉积材料的方法包括：在包括沉积源的沉积室中，使用包括多个槽的掩模在基板上形成有机沉积材料图案; 将掩模运送到保持在真空并邻近沉积室的储存室; 并且部分地清除沿着储存室中的掩模的槽的边界积聚的有机沉积材料。一种清除积聚在具有多个狭缝的掩模上的有机沉积材料的系统，包括：沉积室，包括沉积源; 以及保持在与沉积室基本相同的真空的储存室，并且包括清除积聚在掩模上的有机沉积材料的清洁装置。

4. 发明授权

US08790750B2 Thin film deposition apparatus 有权
标题翻译：薄膜沉积装置
公开(公告)号：US08790750B2
公开(公告)日：2014-07-29
申请号：US12820270
申请日：2010-06-22
申请人： Jung-Min Lee , Choong-Ho Lee
发明人： Jung-Min Lee , Choong-Ho Lee
IPC分类号： C23C16/44
CPC分类号： C23C14/042 , C23C14/044 , C23C14/12 , C23C14/243
摘要： A thin film deposition apparatus that can be simply applied to manufacture a thin film on a large substrate on a mass scale and that improves manufacturing yield includes a deposition source; a first nozzle disposed at a side of the deposition source and including first slits arranged in a first direction; a second nozzle assembly disposed opposite to the deposition source and including strings arranged in the first direction; and a barrier wall assembly including barrier walls disposed between the first nozzle and the second nozzle assembly to partition a space between the first nozzle and the second nozzle assembly into a plurality of sub-deposition spaces. The second nozzle assembly is movable relative to the target along a plane parallel to a surface of the target, or the target is movable relative to the second nozzle along the plane.
摘要翻译：可以简单地应用于在大型基板上以大规模制造薄膜并且提高制造成品率的薄膜沉积装置包括沉积源; 第一喷嘴，其设置在所述沉积源的一侧，并且包括沿第一方向布置的第一狭缝; 第二喷嘴组件，其布置成与所述沉积源相对并且包括沿所述第一方向布置的弦; 以及阻挡壁组件，其包括设置在第一喷嘴和第二喷嘴组件之间的阻挡壁，以将第一喷嘴和第二喷嘴组件之间的空间分隔成多个次沉积空间。第二喷嘴组件可以沿着平行于靶的表面的平面相对于靶移动，或者靶可沿着平面相对于第二喷嘴移动。

5. 发明授权

US08757088B2 Mask frame assembly 有权
标题翻译：面罩框组装
公开(公告)号：US08757088B2
公开(公告)日：2014-06-24
申请号：US13025084
申请日：2011-02-10
申请人： Choong-Ho Lee , Jung-Min Lee
发明人： Choong-Ho Lee , Jung-Min Lee
IPC分类号： B05C11/00 , C23C14/04
CPC分类号： C23C14/042 , C23C14/04
摘要： A mask frame assembly includes a frame, a mask having a deposition pattern and being installable on the frame in a state of being pulled by a first tension force in a first direction, and a tension force applying portion in the mask and configured to apply a second tension force in a second direction that is perpendicular or substantially perpendicular to the first direction.
摘要翻译：荫罩框架组件包括框架，具有沉积图案的掩模，并且可在第一方向上以第一张力拉动的状态下安装在框架上;以及张力施加部分，在与第一方向垂直或基本垂直的第二方向上的第二张力。

6. 发明授权

US08746169B2 Mask frame assembly for thin film deposition 有权
标题翻译：用于薄膜沉积的面罩框组件
公开(公告)号：US08746169B2
公开(公告)日：2014-06-10
申请号：US12986894
申请日：2011-01-07
申请人： Choong-Ho Lee , Jung-Min Lee , Yoon-Chan Oh
发明人： Choong-Ho Lee , Jung-Min Lee , Yoon-Chan Oh
IPC分类号： B05C11/00 , C25D1/10 , C23C16/00 , C23C14/04 , H01L51/00 , C23C14/12
CPC分类号： C23C14/042 , C23C14/12 , C25D1/10 , G03F1/10 , H01L51/0011
摘要： A mask frame assembly for thin film deposition includes a frame having an opening and at least two unit masks having end parts in a longitudinal direction fixed to the frame, each of the unit masks comprising first regions and second regions, the first regions having unit masking patterns, each of the unit masking patterns having a plurality of openings for thin film deposition, the unit masking pattern being spaced apart from each other, each of the second regions being interposed between a pair of adjacent ones of the first regions, the first regions having a first thickness from a first surface of the unit masks, and at least a portion of the second regions having a second thickness from a second surface of the unit masks opposite to the first surface of the unit masks, such that the first regions and the at least the portion of the second regions are offset from each other in a direction normal to the first and second surfaces. A plurality of unit masks are each half etched from different surfaces and thus a height of wrinkles generated in the mask of the mask frame assembly may be reduced.
摘要翻译：用于薄膜沉积的掩模框架组件包括具有开口的框架和至少两个单元掩模，其具有沿着固定到框架的纵向方向上的端部，每个单元掩模包括第一区域和第二区域，第一区域具有单元屏蔽图案，每个单位掩模图案具有多个用于薄膜沉积的开口，单元掩模图案彼此间隔开，每个第二区域插入在一对相邻的第一区域之间，第一区域具有来自所述单元掩模的第一表面的第一厚度，并且所述第二区域的至少一部分具有来自所述单元的第二表面的第二厚度，掩模与所述单元掩模的第一表面相反，使得所述第一区域和所述第二区域的至少所述部分在垂直于所述第一和第二表面的方向上彼此偏移。多个单元掩模每个从不同的表面被半蚀刻，因此可以减少在掩模框组件的掩模中产生的皱纹的高度。

7. 发明授权

US08674344B2 Display device and organic light emitting diode display 有权
标题翻译：显示设备和有机发光二极管显示
公开(公告)号：US08674344B2
公开(公告)日：2014-03-18
申请号：US13064865
申请日：2011-04-21
申请人： Jung-Min Lee , Choong-Ho Lee , Kie Hyun Nam
发明人： Jung-Min Lee , Choong-Ho Lee , Kie Hyun Nam
IPC分类号： H01L29/08 , G09G3/06
CPC分类号： H01L51/5246 , G06F1/1601
摘要： A display device includes: a display substrate; a display formed on the display substrate; an encapsulation substrate affixed to the display substrate by an adhering layer surrounding the display, the display substrate including a composite member including a resin matrix and a plurality of carbon fibers and an insulation member attached to an edge of the composite member and forming a through hole; a metal layer positioned on a side of the encapsulation substrate facing the substrate; and a conductive connector filling the through hole and contacting the metal layer. The composite member is stacked with at least two layers with different sizes, and the insulation member contacts sides of the at least two layers and has the same thickness as the composite member.
摘要翻译：显示装置包括：显示基板; 显示基板上形成的显示器; 通过围绕显示器的粘附层固定在显示基板上的封装基板，显示基板包括具有树脂基体和多个碳纤维的复合部件，以及附着在复合部件的边缘上的绝缘部件，并形成通孔 ; 位于所述封装基板的面向所述基板的一侧的金属层; 以及填充所述通孔并与所述金属层接触的导电连接器。复合构件层叠有至少两层不同的尺寸，并且绝缘构件接触至少两层的侧面并且具有与复合构件相同的厚度。

8. 发明授权

US08502448B2 Display apparatus comprising a composite member of a resin matrix and carbon fibers 有权
标题翻译：显示装置包括树脂基体和碳纤维的复合构件
公开(公告)号：US08502448B2
公开(公告)日：2013-08-06
申请号：US12987623
申请日：2011-01-10
申请人： Jung-Min Lee , Kie-Hyun Nam , Choong-Ho Lee , Dong-Ki Lee , Hoon Kim
发明人： Jung-Min Lee , Kie-Hyun Nam , Choong-Ho Lee , Dong-Ki Lee , Hoon Kim
IPC分类号： H01J1/62 , H01J63/04
CPC分类号： H01L51/5253
摘要： A display apparatus having an improved function for encapsulating a display unit, and comprising a substrate, wherein the display unit is disposed on the substrate; an encapsulation unit facing the display unit, the encapsulation unit comprising: a metal layer; and a composite member; and a sealing unit disposed between the substrate and the encapsulation unit and separated from the display unit so as to adhere the substrate to the encapsulation unit, wherein the composite member comprises a resin matrix and carbon fibers, and wherein the metal layer is disposed between the substrate and the composite member.
摘要翻译：一种具有改进的用于封装显示单元的功能的显示装置，并且包括基板，其中所述显示单元设置在所述基板上; 面向所述显示单元的封装单元，所述封装单元包括：金属层; 和复合构件; 以及密封单元，设置在所述基板和所述封装单元之间并与所述显示单元分离，以将所述基板粘附到所述封装单元，其中所述复合构件包括树脂基体和碳纤维，并且其中所述金属层设置在基板和复合构件。

9. 发明授权

US08175124B2 Frit sealing system 有权
标题翻译：玻璃料密封系统
公开(公告)号：US08175124B2
公开(公告)日：2012-05-08
申请号：US12185279
申请日：2008-08-04
申请人： Jung-Min Lee , Hee-Seong Jeong , Choong-Ho Lee , Jun-Sik Oh , Je-Kil Ryu , Won-Kyu Choe
发明人： Jung-Min Lee , Hee-Seong Jeong , Choong-Ho Lee , Jun-Sik Oh , Je-Kil Ryu , Won-Kyu Choe
IPC分类号： H01S3/10
CPC分类号： H05B33/04 , B23K26/06 , B23K26/206 , H01L51/5246
摘要： A frit sealing system for combining a first substrate and a second substrate using frit comprises a laser generating a laser beam, and a homogenizer normalizing the intensity of the laser beam within a cross section of the laser beam in the transverse direction. The frit sealing system further comprises a support apparatus configured to hold a first and a second substrate with frit interposed between them, wherein the frit is configured to be cured by heat generated from the laser beam and thereby solidifying and binding the first and the second substrates.
摘要翻译：用于使用玻璃料组合第一基板和第二基板的玻璃料密封系统包括产生激光束的激光器和在横向方向上在激光束的横截面内对激光束的强度进行归一化的均质器。玻璃料密封系统还包括支撑装置，其被配置为将第一和第二基板保持在介于它们之间的玻璃料，其中玻璃料被配置为通过由激光束产生的热量固化，从而固化和结合第一和第二基板。

10. 发明申请

US20110293819A1 METHOD AND APPARATUS FOR CLEANING ORGANIC DEPOSITION MATERIALS 有权
标题翻译：清洁有机沉积材料的方法和装置
公开(公告)号：US20110293819A1
公开(公告)日：2011-12-01
申请号：US13208261
申请日：2011-08-11
申请人： Jung-Min Lee , Choong-Ho Lee , Yoon-Chan Oh , Hee-Seong Jeong
发明人： Jung-Min Lee , Choong-Ho Lee , Yoon-Chan Oh , Hee-Seong Jeong
IPC分类号： B05D5/06 , C23C14/04
CPC分类号： B08B7/0035 , B08B7/0042 , C23C14/042 , C23C14/564 , H01L51/0025 , H01L51/56
摘要： A method of cleaning off organic deposition material accumulated on a mask includes forming an organic deposition material pattern on a substrate using the mask, which includes a plurality of slots, in a deposition chamber including a deposition source; transporting the mask to a stock chamber that is maintained at a vacuum and adjacent to the deposition chamber; and partially cleaning off the organic deposition material accumulated along the boundaries of the slots of the mask in the stock chamber. A system to clean off an organic deposition material accumulated on a mask having a plurality of slots, includes a deposition chamber including a deposition source; and a stock chamber that is maintained at substantially the same vacuum as the deposition chamber and includes a cleaning device that cleans off the organic deposition material accumulated on the mask.
摘要翻译：清理积聚在掩模上的有机沉积材料的方法包括：在包括沉积源的沉积室中，使用包括多个槽的掩模在基板上形成有机沉积材料图案; 将掩模运送到保持在真空并邻近沉积室的储存室; 并且部分地清除沿着储存室中的掩模的槽的边界积聚的有机沉积材料。一种清除积聚在具有多个狭缝的掩模上的有机沉积材料的系统，包括：沉积室，包括沉积源; 以及保持在与沉积室基本相同的真空的储存室，并且包括清除积聚在掩模上的有机沉积材料的清洁装置。

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