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    • 6. 发明授权
    • Method and apparatus for cleaning organic deposition materials
    • 用于清洁有机沉积材料的方法和装置
    • US08802200B2
    • 2014-08-12
    • US12795896
    • 2010-06-08
    • Jung-Min LeeChoong-Ho LeeYoon-Chan OhHee-Seong Jeong
    • Jung-Min LeeChoong-Ho LeeYoon-Chan OhHee-Seong Jeong
    • B05D3/00
    • C23C14/042B08B7/0035B08B7/0042C23C14/564H01L51/56
    • A method of cleaning off organic deposition material accumulated on a mask includes forming an organic deposition material pattern on a substrate using the mask, which includes a plurality of slots, in a deposition chamber including a deposition source; transporting the mask to a stock chamber that is maintained at a vacuum and adjacent to the deposition chamber; and partially cleaning off the organic deposition material accumulated along the boundaries of the slots of the mask in the stock chamber. A system to clean off an organic deposition material accumulated on a mask having a plurality of slots, includes a deposition chamber including a deposition source; and a stock chamber that is maintained at substantially the same vacuum as the deposition chamber and includes a cleaning device that cleans off the organic deposition material accumulated on the mask.
    • 清理积聚在掩模上的有机沉积材料的方法包括:在包括沉积源的沉积室中,使用包括多个槽的掩模在基板上形成有机沉积材料图案; 将掩模运送到保持在真空并邻近沉积室的储存室; 并且部分地清除沿着储存室中的掩模的槽的边界积聚的有机沉积材料。 一种清除积聚在具有多个狭缝的掩模上的有机沉积材料的系统,包括:沉积室,包括沉积源; 以及保持在与沉积室基本相同的真空的储存室,并且包括清除积聚在掩模上的有机沉积材料的清洁装置。
    • 8. 发明申请
    • METHOD AND APPARATUS FOR CLEANING ORGANIC DEPOSITION MATERIALS
    • 清洁有机沉积材料的方法和装置
    • US20100310759A1
    • 2010-12-09
    • US12795896
    • 2010-06-08
    • Jung-Min LeeChoong-Ho LeeYoon-Chan OhHee-Seong Jeong
    • Jung-Min LeeChoong-Ho LeeYoon-Chan OhHee-Seong Jeong
    • C23C16/04B05D5/06
    • C23C14/042B08B7/0035B08B7/0042C23C14/564H01L51/56
    • A method of cleaning off organic deposition material accumulated on a mask includes forming an organic deposition material pattern on a substrate using the mask, which includes a plurality of slots, in a deposition chamber including a deposition source; transporting the mask to a stock chamber that is maintained at a vacuum and adjacent to the deposition chamber; and partially cleaning off the organic deposition material accumulated along the boundaries of the slots of the mask in the stock chamber. A system to clean off an organic deposition material accumulated on a mask having a plurality of slots, includes a deposition chamber including a deposition source; and a stock chamber that is maintained at substantially the same vacuum as the deposition chamber and includes a cleaning device that cleans off the organic deposition material accumulated on the mask.
    • 清理积聚在掩模上的有机沉积材料的方法包括:在包括沉积源的沉积室中,使用包括多个槽的掩模在基板上形成有机沉积材料图案; 将掩模运送到保持在真空并邻近沉积室的储存室; 并且部分地清除沿着储存室中的掩模的槽的边界积聚的有机沉积材料。 一种清除积聚在具有多个狭缝的掩模上的有机沉积材料的系统,包括:沉积室,包括沉积源; 以及保持在与沉积室基本相同的真空的储存室,并且包括清除积聚在掩模上的有机沉积材料的清洁装置。